US20020050040A1 - Method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device and method for producing an edge reflection type surface acoustic wave device - Google Patents
Method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device and method for producing an edge reflection type surface acoustic wave device Download PDFInfo
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- US20020050040A1 US20020050040A1 US09/940,988 US94098801A US2002050040A1 US 20020050040 A1 US20020050040 A1 US 20020050040A1 US 94098801 A US94098801 A US 94098801A US 2002050040 A1 US2002050040 A1 US 2002050040A1
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
- H03H9/6483—Ladder SAW filters
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02637—Details concerning reflective or coupling arrays
- H03H9/02669—Edge reflection structures, i.e. resonating structures without metallic reflectors, e.g. Bleustein-Gulyaev-Shimizu [BGS], shear horizontal [SH], shear transverse [ST], Love waves devices
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
- H03H9/6436—Coupled resonator filters having one acoustic track only
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
- H03H9/644—Coupled resonator filters having two acoustic tracks
- H03H9/6456—Coupled resonator filters having two acoustic tracks being electrically coupled
- H03H9/6459—Coupled resonator filters having two acoustic tracks being electrically coupled via one connecting electrode
- H03H9/6463—Coupled resonator filters having two acoustic tracks being electrically coupled via one connecting electrode the tracks being electrically cascaded
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
- H03H9/14544—Transducers of particular shape or position
- H03H9/14552—Transducers of particular shape or position comprising split fingers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49004—Electrical device making including measuring or testing of device or component part
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49005—Acoustic transducer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49009—Dynamoelectric machine
- Y10T29/49011—Commutator or slip ring assembly
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/4908—Acoustic transducer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
Abstract
A method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device includes the step of obtaining a frequency characteristic of an edge reflection type surface acoustic wave device having a piezoelectric substrate. The edge reflection type surface acoustic wave device has a pair of edges of the piezoelectric substrate which define a predetermined distance therebetween. Then, the piezoelectric substrate is cut at at least one of a pair of positions which define a distance that is shorter than the predetermined distance when a final frequency characteristic of the edge reflection type surface acoustic wave device is to be higher than the obtained frequency characteristic. The piezoelectric substrate is cut at at least one of a pair of positions which define a distance that is longer than the predetermined distance when a final frequency characteristic of the edge reflection type surface acoustic wave device is to be lower than the obtained frequency characteristic.
Description
- 1. Field of the Invention
- The present invention relates to a method for producing an edge reflection type surface wave device for use in a band pass filter, a trap or other suitable device, and a method for adjusting a resonance frequency of an edge reflection type surface wave device.
- 2. Description of the Related Art
- As disclosed in, for example, Japanese Unexamined Patent Application Publications No. 5-183376 and No. 5-145370, various edge reflection type surface wave devices which utilize a Shear Horizontal (SH) type surface wave such as a BGS wave have been previously proposed.
- In an edge reflection type surface wave device, an interdigital transducer is disposed on a piezoelectric substrate having two opposing edges. A plurality of electrode fingers in the interdigital transducer are extended in the direction parallel to the edges. An excited surface acoustic wave is reflected between the two opposing edges, a standing wave occurs, and the resonance characteristic based on the standing wave is utilized.
- Since the edge reflection type surface wave device requires no reflector, it allows for miniaturization of a surface wave device.
- For the production of the above-described edge reflection type surface wave device, a wafer made of a piezoelectric material is prepared. Then, a plurality of interdigital transducers are formed on the wafer. Next, the wafer is cut, two opposing edges thereof are formed, and a plurality of edge reflection type surface wave devices is cut out from the single wafer.
- In the edge reflection type surface wave device, unless the two opposing edges are correctly formed, desired resonance characteristic and filter characteristic cannot be achieved. Therefore, when forming edges using a single electrode type interdigital transducer, each of the edges has been previously cut out at the position spaced apart by λ/2 or an integral multiple of λ/2, outward in the propagation direction of a surface acoustic wave, from the center of the electrode finger adjacent to each of the outermost electrode fingers. On the other hand, when forming edges using a double electrode type interdigital transducer including a pair of electrode finger portions, each of the edges has been cut out at the position spaced apart by an integral multiple of λ/2, in the propagation direction of a surface acoustic wave, outward from the center between the pair of electrode finger portions of the electrode finger adjacent to each of the electrode fingers which are disposed on the outermost sides of the interdigital transducer in the propagation direction of a surface acoustic wave.
- In an actual manufacturing process, a plurality of edge reflection type surface wave devices is cut out from a wafer. Also, when mass-producing edge reflection type surface wave devices, interdigital transducers have been formed on each of a plurality of wafers in the same manner, and the plurality of wafers have been cut from above.
- However, even if a plurality of wafers are prepared, as well as a plurality of interdigital transducers are formed in the same manner, and edges are formed with high accuracy by cutting, a problem occurs in that the frequency characteristics vary among the numerous edge reflection type surface wave devices obtained. This is because the piezoelectric characteristics vary from wafer to wafer.
- In order to overcome the problems described above, preferred embodiments of the present invention provide a method for manufacturing an edge reflection type surface wave device so as to eliminate variations in the frequency characteristics among the edge reflection type surface wave devices produced, and allowing a desired frequency characteristic to be realized.
- The method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device according to a preferred embodiment of the present invention includes the step of determining a frequency characteristic of an edge reflection type surface acoustic wave device having a piezoelectric substrate. The edge reflection type surface acoustic wave device has a pair of edges of the piezoelectric substrate which define a predetermined distance therebetween. The piezoelectric substrate is cut at at least one of a pair of positions which define a distance that is shorter than the predetermined distance when a final frequency characteristic of the edge reflection type surface acoustic wave device is to be higher than the determined frequency characteristic, and is cut at at least one of a pair of positions which define a distance that is longer than the predetermined distance when a final frequency characteristic of the edge reflection type surface acoustic wave device is to be lower than the determined frequency characteristic.
- The positions at which the piezoelectric substrate is cut in the piezoelectric substrate cutting step is preferably shifted from positions of the edges which define the predetermined distance in the frequency characteristic determining step by about λ/8 or less and more preferably by about λ/16, where the λ is wavelength of a shear horizontal type surface wave to be excited in the edge reflection type surface acoustic wave device.
- The edge reflection type surface acoustic wave device may include a single electrode type interdigital transducer. In this case, the positions of the edges which define the predetermined distance are preferably located at approximate centers of electrodes.
- Alternatively, the edge reflection type surface acoustic wave device may include a double electrode type interdigital transducer. In this case, each of the positions of the edges which defines the predetermined distance is located at an approximate center of a pair of electrode fingers constituting a double electrode.
- According to another preferred embodiment of the present invnetion, the method for producing an edge reflection type surface acoustic wave device which includes at least one interdigital transducer and utilizes a shear horizontal type surface wave, includes the steps of forming a plurality of interdigital transducers on a piezoelectric substrate, cutting the piezoelectric substrate and producing a reference edge reflection type surface acoustic wave device including at least one of the interdigital transducers and a pair of edges of the piezoelectric substrate, the pair of edges defining a predetermined distance therebetween, measuring a frequency characteristic of the reference edge reflection type surface acoustic wave, determining positions of a pair of edges defining each of remaining edge reflection type surface acoustic wave devices based on the measured frequency characteristic, and cutting the piezoelectric substrate at the determined positions to produce the remaining edge reflection type surface acoustic wave devices.
- In the position determining step, a distance between the pair of edges of the remaining edge reflection type surface acoustic wave devices is preferably made shorter than the predetermined distance when a final frequency characteristic of the remaining edge reflection type surface acoustic wave devices is to be higher than the measured frequency characteristic, and a distance between the pair of edges of the remaining edge reflection type surface acoustic wave devices is preferably made longer than the predetermined distance when a final frequency characteristic of the remaining edge reflection type surface acoustic wave devices is to be lower than the measured frequency characteristic.
- The above and other elements, characteristics, features, and advantages of the present invention will be clear from the following detailed description of preferred embodiments of the present invention in conjunction with the accompanying drawings.
- FIG. 1 is a perspective view showing an edge reflection type surface wave device in accordance with a first preferred embodiment of the present invention;
- FIG. 2 is a diagram showing the relationship between the amount that the edge formed by cutting is shifted from the designed position, and the ratio of the deviation amount Δf of the measured resonant frequency from the target resonant frequency f with respect to the target resonant frequency f, in the first preferred embodiment;
- FIG. 3 is a diagram showing frequency characteristics when the positions of the edge are the designed position of −λ/4, the designed position of −λ/8, and the designed position of −λ/16, in the first preferred embodiment;
- FIG. 4 is a schematic plan view showing the electrode configuration of an edge reflection type surface wave device in accordance with a second preferred embodiment of the present invention;
- FIG. 5 is a partially enlarged plan view explaining the cutting position at which an edge is formed, in the edge reflection type surface wave device in accordance with a second preferred embodiment shown in FIG. 4;
- FIG. 6 is a diagram showing the relationship between the position of the edge formed by cutting, and the ratio of the deviation amount Δf of the measured center frequency from the target center frequency f0 with respect to the target center frequency f0, in the second preferred embodiment of the present invention;
- FIG. 7 is a diagram showing frequency characteristics when the positions of the edge are the designed position of −λ/4, the designed position of −λ/8, and the designed position of −λ/16, in the second preferred embodiment of the present invention;
- FIG. 8 is a perspective view showing a transversally coupled type surface wave filter including single electrode type interdigital transducers, as an example of surface acoustic wave device to which preferred embodiments of the present invention are applied;
- FIG. 9 is a schematic plan view showing a transversally coupled type surface wave filter including double electrode type interdigital transducers, as an example of surface wave device to which preferred embodiments of the present invention are applied;
- FIG. 10 is a diagram showing variations in the frequency characteristics in the transversally coupled type resonator filter including single electrode type interdigital transducers when the position of the edge is varied;
- FIG. 11 is a perspective view showing a longitudinally-coupled type surface acoustic wave filter including single electrode type interdigital transducers, as another example of surface wave device to which preferred embodiments of the present invention are applied;
- FIG. 12 is a schematic plan view showing the electrode configuration of a longitudinally-coupled type surface acoustic wave filter including double electrode type interdigital transducers, as still another example of a surface wave device to which preferred embodiments of the present invention are applied;
- FIG. 13 is a plan view showing a ladder type filter including single electrode type interdigital transducers, as another example of an end surface reflection type surface wave device to which preferred embodiments of the present invention are applied; and
- FIG. 14 is a plan view showing a ladder type filter including double electrode type interdigital transducers, as still another example of an end surface reflection type surface wave device to which preferred embodiments of the present invention are applied.
- FIG. 1 is a perspective view showing an example of edge reflection type surface wave device in accordance with a first preferred embodiment of the present invention. The edge reflection type
surface wave device 1 in accordance with this preferred embodiment is preferably an edge reflection type surface wave device utilizing a BGS wave as an SH type surface wave. - The edge reflection type
surface wave device 1 has apiezoelectric substrate 2 having a substantially rectangular plate shape. Thepiezoelectric substrate 2 is preferably made of a piezoelectric single crystal such as LiNbO3, LiTaO3, or a piezoelectric ceramic such as a lead titanate zirconate-based ceramic (PZT). When thepiezoelectric substrate 2 is a piezoelectric ceramic, thepiezoelectric substrate 2 is subjected to a polarization process in the direction of the arrow P shown in FIG. 1. Thepiezoelectric substrate 2 hasend surfaces - An
interdigital transducer 3 is disposed on the top surface of thepiezoelectric substrate 2. Theinterdigital transducer 3 has a pair of comb-shaped electrodes shaped electrodes electrode fingers interdigital transducer 3, the width of each of the electrode fingers sa and 5 c which are located on the outermost sides in the propagation direction of a surface wave, is preferably about λ/8. Here, λ denotes a wavelength of an excited surface wave. - The width of each of the
remaining electrode fingers - A distance between the
end surface interdigital transducer 3 and N is an integer greater than one so that the excited wave becomes a standing wave between theend surfaces - In the manufacturing method for the edge reflection type
surface wave device 1 in accordance with this preferred embodiment, firstly a wafer for forming thepiezoelectric substrate 2 is prepared. Specifically, a large-sized wafer constructed of the above-described piezoelectric single crystal or piezoelectric ceramic is prepared, and a plurality ofinterdigital transducers 3 is disposed on the wafer in order to configure a plurality of edge reflection typesurface wave devices 1. - Next, the end surfaces2 a and 2 b are formed by cutting the wafer in the thickness, and thus the edge reflection type
surface wave device 1 is cut out. In the case, the distance between the end surfaces 2 a and 2 b is set at a designed value so that the edge reflection typesurface wave device 1 has a designed characteristics including a resonance frequency. - As described above, however, the piezoelectric characteristics vary from wafer to wafer, and consequently, when numerous edge reflection type
surface wave devices 1 are obtained from a plurality of wafers, the resonance characteristics vary among these edge reflection type surface wave devices. - Accordingly, in this preferred embodiment, firstly a pair of
edges surface wave device 1 with the edges formed, are measured. Thus, other edge reflection type surface wave devices to be cut out from the remaining portion of the wafer are presumed to have the same measured frequency characteristics by cutting out from a wafer at the designed positions. When the frequency characteristic thus measured deviates from a desired one, the cutting positions of the two opposing edges are changed so as to correct the deviation, and then two opposing edges of each of the edge reflection type surface wave devices configured at the remaining portion of the wafer, are formed by cutting. - Specifically, an adjustment of the frequency is performed by adjusting the forming position of the edges, i.e., a distance between the edges. Conventionally, the actual position of the
edges edges edges edges edges - This may be explained with reference to the relative position from the position of an inner next electrode finger adjacent to the outermost electrode finger. More specifically, each of the positions of2 a and 2 b has been conventionally set at position spaced apart by λ/2, outward in the propagation direction of a surface acoustic wave, from the center of each of the
electrode fingers 4 a and 4 b adjacent to theoutermost electrode fingers electrode fingers 4 a and 4 b, outward in the propagation direction of a surface acoustic wave. - FIG. 2 shows the variation in the resonant frequency of the edge reflection type
surface wave device 1 when theedge 2 b is formed at positions shifted outwardly from the designed position, which is spaced apart by about λ/2 from the center of theelectrode finger 4 b, in an edge reflection typesurface wave device 1 having fifteen pairs of electrodes and eighty pairs of electrode, respectively. The results shown in FIG. 2 are obtained from the experiments wherein fifteen pairs and eighty pairs of electrode fingers are disposed on a piezoelectric substrate made of PZT, in the edge reflection typesurface wave device 1, and wherein λ is about 58 μm. It is to be noted that the term “pair” referred to one electrode finger belonging to the comb-shapedelectrode 4 and one electrode finger belonging to the comb-shapedelectrode 5 which are adjacent with each other. - The vertical axis in FIG. 2 represents the ratio Δf/f of the deviation amount Δf=f1−f of the measured resonant frequency f1 from the target resonant frequency f with respect to the target resonant frequency f. The “0” on the horizontal axis represents the designed position, which is spaced apart by λ/2 from the center of the
electrode finger 4 b, outward in the propagation direction of a surface acoustic wave. “The edge position” on the horizontal axis refers to an edge forming position when the designed position is set at the origin (that is, 0). Here, the “+” direction from the designedposition 0 means that an edge is formed outside the designed position in the propagation direction of a surface acoustic wave. - It is to be noted that FIG. 2 indicates the results when both the
edge 2 a and theedge 2 b are formed with the same shift amount and in the same direction. It is preferable that both theedge 2 a and theedge 2 b are formed with the same shift amount and in the same direction so that the edge reflection type surface wave device is symmetric with respect to a center line that is substantially parallel to electrode fingers of the interdigital lines. However, it is possible to shift a resonance frequency only by shifting either theedge 2 a or theedge 2 b from the respective designed position. - As can be seen from FIG. 2, the resonant frequency deviates by shifting the forming position of each of the
edges edges edges - In this way, the resonant frequency can be adjusted by performing cutting at a position shifted from the designed position outward or inward along the propagation direction of a surface wave.
- Accordingly, according to preferred embodiments of the present invention, a calibration which indicates the frequency shift with respect to positional shift from the designed position of the edges such as FIG. 2 is first obtained through an experiment. Then, a reference edge reflection type surface wave device having a pair of
edges - Thereafter, a deviation of the measured resonance frequency from a designed resonance frequency is calculated, and a positional shift amount and the direction of the shift are obtained form the calibration based on the difference so that the difference is canceled. In this way, an edge reflection type surface wave device having an intended resonant frequency can be achieved with reliability.
- It is to be noted that, when the forming position of each of the
edges edges - The arrow P2 in FIG. 3 indicates the frequency characteristic when the forming position of each of the edges is within the range of the designed positions of about ±λ/8, for example, at the designed position of about ±λ/8. It can be seen that the spurious response marked by “X” in P1 shown in FIG. 3 has been significantly reduced.
- It is therefore recognized that the spurious response can be effectively suppressed by forming each of the edges at a position within the range of the designed position of about ±λ/8, and that the resonant frequency can be adjusted with ease and reliability as evident from FIG. 2.
- More preferably, each of the
edges edges - The edge reflection type
surface wave device 1 shown in FIG. 1 is an application example of a surface wave resonator including a single electrode typeinterdigital transducer 3. The present invention, however, can also be applied to a method for manufacturing a surface wave device which includes a double electrode type interdigital transducer having a pair of electrode finger portions. - FIG. 4 is a schematic plan view showing the electrode configuration of an edge reflection type surface wave device11 having a double electrode type
interdigital transducer 12 in accordance with a second preferred embodiment of the present invention. - The
interdigital transducer 12 has a plurality of electrode fingers. Each of the electrode fingers has a double electrode (or split electrode) configuration wherein a pair of electrode finger portions are provided. For example, theelectrode fingers interdigital transducer 12 in FIG. 4 are configured so thatelectrode finger portions - In this preferred embodiment, the position spaced apart by about λ/2, outward in the propagation direction of a surface acoustic wave, from the center of the
electrode 13, i.e., the center of theelectrode finger portions outermost electrode finger 14 in the propagation direction of a surface acoustic wave, is set to be a designed position, and an edge is formed by performing cutting at a position within the range of about +λ/8 from the designed position. - FIG. 5 is an enlarged partial cutaway plan view showing the portion where an edge is to be formed outside the
electrode fingers interdigital transducer 12 shown in FIG. 4, in the propagation direction of a surface acoustic wave. - More specifically, the
interdigital transducer 12 is configured so that theelectrode finger 13 thereof has a pair ofelectrode finger portions outermost electrode finger 14 thereof has a pair ofelectrode finger portions electrode 13, i.e., the center of theelectrode finger portions electrode finger portion 14 b in theoutermost electrode finger 14 is cut off. - FIG. 6 shows the variation in the resonant frequency when each of the edges is formed in the manner described above, and the position thereof is shifted from the designed position which gives a distance of about λ/2×N in the edge reflection type
surface wave device 1. The results shown in FIG. 6 are obtained from the experiments wherein aninterdigital transducer 12 having fifteen, thirty-four and eighty pairs of electrode fingers are disposed on a piezoelectric substrate constituted of PZT, respectively, and wherein λ is about 36 μm. - The vertical axis in FIG. 6 represents the ratio of the deviation amount Δf=f2−f0 of the measured resonant frequency f2 from the target resonant frequency f0 with respect to the target resonant frequency f0, and the horizontal axis represents the position of the end surface. The “0” on the horizontal axis means that the edge is positioned at the designed position (position C), which is spaced apart by about λ/2 from the center of the
electrode finger portions - As can be seen from FIG. 6, in the edge reflection type reflector including the double electrode type
interdigital transducer 12, the resonant frequencies vary in the same manner as the first preferred embodiment by shifting the position of each of the edges. - In the second preferred embodiment also, when each of the edges is formed at a position that is shifted too much from the designed position outward or inward, a significant spurious response occurs in the frequency characteristic.
- The characteristic indicated by the arrow Q1 in FIG. 7 show the frequency characteristic when each of the edges is formed at the position shifted from the designed position by about −λ/4 along the propagation direction of a surface wave. As indicated by the arrow Y in the figure, a significant spurious response is observed.
- The characteristic indicated by the arrow Q2 in FIG. 7 shows the frequency characteristic when each of the edges is located at the position that is shifted from the designed position by about −λ/8. It can been seen that the above-described spurious response has been considerably suppressed.
- Also, the characteristic indicated by the arrow Q3 in FIG. 7 shows the frequency characteristic when each of the edges is located at the position that is shifted from the designed positions by about −λ/16. It is recognized that the above-described spurious response is suppressed more effectively when the position of each of the edges is within the range of about ±λ/16 from the designed position.
- In the second preferred embodiment also, therefore, it is confirmed that a superior frequency characteristic with low spurious response can be achieved by forming each of the edges at a position within the range of about +λ/8 from the designed position, more preferably, within the range of about ±/16 therefrom.
- In the first and second preferred embodiments, descriptions have been made of the example of the surface wave resonator using a single electrode type interdigital transducer, and that of the surface wave resonator using a double electrode type interdigital transducer, respectively. The present invention, however, can be applied to a method for manufacturing various surface wave devices which include single electrode type and double electrode type transducers. FIGS. 8 and 14 shows other examples of surface wave devices to which preferred embodiments of the present invention is applied.
- Edge reflection type
surface wave devices interdigital transducers interdigital transducers - FIG. 10 illustrates characteristic examples of transversally coupled type resonator filter using a piezoelectric substrate preferably made of PZT, shown in FIG. 9. In FIG. 10, C indicates a characteristic when each of the edges is formed at the designed position, and D, E, F, and G indicate characteristics when each of the edges is formed at the positions shifted outside the designed position by about λ/32, λ/16, λ/8, and λ/4, respectively. As can be seen, the center frequency can be adjusted by varying the edge forming position. With respect to the filter characteristics, it is noticed that the insertion loss is very inferior and the spurious response are very large when each of the edges is formed at the position shifted outside the designed position by about λ/4. When the edge forming position is shifted outside the designed position by about λ/8, these filter characteristics exhibit moderate results, and when the forming position is shifted outside the designed position by about λ/16, the filter characteristics exhibit superior results. Although FIG. 10 shows the results of the case where the edge forming position is shifted outside the designed position, the shifting of the edge forming position inside the designed position allows the center frequency to be adjusted to shift toward a higher frequency. In this case, the insertion loss and the spurious response exhibits the same values as the case where the edge forming position is shifted outside the designed position. A longitudinally-coupled type resonator filter which will be described below also shows similar results.
- A
surface wave device 41 shown in FIG. 11 is a longitudinally-coupled type surface acoustic wave filter wherein single electrode typeinterdigital transducers piezoelectric substrate 42 along the propagation direction of a surface wave. - An edge reflection type
surface wave device 51 shown in FIG. 12 is a longitudinally-coupled type surface acoustic wave filter having double electrode typeinterdigital transducers - Edge reflection type
surface wave devices - The method for manufacturing an edge reflection type surface wave device in accordance with preferred embodiments of the present invention can generally be applied to the production of various edge reflection type surface wave devices besides the different edge reflection type surface wave devices shown in FIGS.8 to 14 as described above.
- As is evident from the foregoing, in the method for manufacturing an edge reflection type surface wave device in accordance with various preferred embodiments of the present invention, even when the deviation of the frequency characteristic due to wafers has occurred, an edge reflection type surface wave device which has an intended frequency characteristic can be easily achieved by measuring the characteristic of the edge reflection type surface wave device which has firstly been formed on the identical wafer, and by adjusting the edge forming position in the remaining edge reflection type surface wave devices on the identical wafer depending on the deviation of the obtained characteristic from the target characteristic.
- In the first aspect of preferred embodiments of the present invention, each of the two opposing edges is formed by cutting the piezoelectric at a position within the range of about +λ/8 from the designed position, and thereby the frequency is adjusted to become lower. On the other hand, in the second aspect of preferred embodiments of the present invention, each of the two opposing edges is formed by cutting the piezoelectric at a position inside the designed position, for example, within the range of about −λ/8 from the designed position, and thereby the frequency is adjusted to become higher.
- In the first or second aspect of preferred embodiments of the present invention, particularly when each of the edges is formed by performing cutting at a position within the range of the designed position of about +λ/16, or the designed position of about −λ/16, the unwanted spurious response is even more suppressed, thereby achieving a superior resonant characteristic or filter characteristic.
- In the third and fourth aspects of preferred embodiments of the present invention also, after the interdigital transducer has been formed on the piezoelectric substrate, the position that is spaced apart by about λ/2, outward in the propagation direction of a surface acoustic wave, from the center of the electrode finger adjacent to each of the outermost electrode fingers, is set to be a designed position, and each of the two opposing edges is formed by performing cutting at a position within the range of the designed position of about +λ/8 or the designed position of about −λ/8. The unwanted spurious response, therefore, can be effectively suppressed, thereby achieving superior resonant characteristic or filter characteristic. Furthermore, when forming each of the edges by performing cutting at a position within the range of the designed position of about +λ/8 or the designed position of about −λ/8, the resonant frequency or the center frequency can be easily adjusted to become lower or higher by adjusting the position of each of the edges.
- In the third or fourth aspects of preferred embodiments of the present invention also, when each of the edges is preferably formed by performing cutting within the range of the designed position of about +λ/16, or the designed position of about −λ/16, the unwanted spurious response can be more effectively suppressed.
- While the present invention has been described with reference to what are at present considered to be preferred embodiments, it is to be understood that various changes and modifications may be made thereto without departing from the invention in its broader aspects and therefore, it is intended that the appended claims cover all such changes and modifications that fall within the true spirit and scope of the invention.
Claims (15)
1. A method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device, comprising the steps of:
determining a frequency characteristic of an edge reflection type surface acoustic wave device having a piezoelectric substrate, the edge reflection type surface acoustic wave device having a pair of edges of the piezoelectric substrate which define a predetermined distance therebetween; and
cutting the piezoelectric substrate at at least one of a pair of positions which define a distance that is shorter than the predetermined distance when a final frequency characteristic of the edge reflection type surface acoustic wave device is to be higher than the obtained frequency characteristic, and cutting the piezoelectric substrate at at least one of a pair of positions which define a distance that is longer than the predetermined distance when a final frequency characteristic of the edge reflection type surface acoustic wave device is to be lower than the obtained frequency characteristic.
2. A method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device according to claim 1 , wherein the positions at which the piezoelectric substrate is cut in the piezoelectric substrate cutting step is shifted from positions of the edges which define the predetermined distance in the frequency characteristic obtaining step by about λ/8 or less, where the λ is wavelength of a shear horizontal type surface wave to be excited in the edge reflection type surface acoustic wave device.
3. A method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device according to claim 1 , wherein the positions at which the piezoelectric substrate is cut in the piezoelectric substrate cutting step is shifted from positions of the edges which define the predetermined distance in the frequency characteristic obtaining step by about λ/16 or less, where the λ is wavelength of a shear horizontal type surface wave to be excited in the edge reflection type surface acoustic wave device.
4. A method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device according to claim 1 , wherein the edge reflection type surface acoustic wave device comprises a single electrode type interdigital transducer.
5. A method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device according to claim 4 , wherein the positions of the edges which define the predetermined distance are located at approximate centers of electrodes.
6. A method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device according to claim 1 , wherein the edge reflection type surface acoustic wave device comprises a double electrode type interdigital transducer.
7. A method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device according to claim 6 , wherein each of the positions of the edges which define the predetermined distance is located at an approximate center of a pair of electrode fingers constituting a double electrode.
8. A method for producing an edge reflection type surface acoustic wave device which includes at least one interdigital transducer and utilizes a shear horizontal type surface wave, comprising the steps of:
forming a plurality of interdigital transducers on a piezoelectric substrate;
cutting the piezoelectric substrate and producing a reference edge reflection type surface acoustic wave device including at least one of the interdigital transducers and a pair of edges of the piezoelectric substrate, the pair of edges defining a predetermined distance therebetween;
measuring a frequency characteristic of the reference edge reflection type surface acoustic wave;
determining positions of a pair of edges defining each of remaining edge reflection type surface acoustic wave devices based on the measured frequency characteristic; and
cutting the piezoelectric substrate at the determined positions to producing the remaining edge reflection type surface acoustic wave devices.
9. A method for producing an edge reflection type surface acoustic wave device according to claim 8 , wherein in the position determining step, a distance between the pair of edges of the remaining edge reflection type surface acoustic wave devices is shorter than the predetermined distance when a final frequency characteristic of the remaining edge reflection type surface acoustic wave devices is to be higher than the measured frequency characteristic, and a distance between the pair of edges of the remaining edge reflection type surface acoustic wave devices is longer than the predetermined distance when a final frequency characteristic of the remaining edge reflection type surface acoustic wave devices is to be lower than the measured frequency characteristic.
10. A method for producing an edge reflection type surface acoustic wave device according to claim 9 , wherein the positions of edges of the remaining edge reflection type surface acoustic wave devices are shifted from positions of the reference edges of the reference edge reflection type surface acoustic wave devices by about λ/8 or less, where the λ is a wavelength of a shear horizontal type surface wave to be excited in the remaining edge reflection type surface acoustic wave device.
11. A method for producing an edge reflection type surface acoustic wave device according to claim 9 , wherein the positions of edges of the remaining edge reflection type surface acoustic wave devices are shifted from positions of the reference edges of the reference edge reflection type surface acoustic wave devices by about λ/16 or less, where the λ is wavelength of a shear horizontal type surface wave to be excited in the remaining edge reflection type surface acoustic wave device.
12. A method for producing an edge reflection type surface acoustic wave device according to claim 9 , wherein the edge reflection type surface acoustic wave device comprises a single electrode type interdigital transducer.
13. A method for producing an edge reflection type surface acoustic wave device according to claim 12 , wherein the positions of the edges which define the predetermined distance are located at approximate centers of electrodes.
14. A method for producing an edge reflection type surface acoustic wave device according to claim 9 , wherein the edge reflection type surface acoustic wave device comprises a double electrode type interdigital transducer.
15. A method for producing an edge reflection type surface acoustic wave device according to claim 14 , wherein each of the positions of the edges which define the predetermined distance is located at an approximate center of a pair of electrode fingers constituting a double electrode.
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US10/844,940 US7194793B2 (en) | 2000-09-06 | 2004-05-13 | Method for producing an edge reflection type surface acoustic wave device |
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JP2000-270586 | 2000-09-06 | ||
JP2000270586 | 2000-09-06 |
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US10/844,940 Division US7194793B2 (en) | 2000-09-06 | 2004-05-13 | Method for producing an edge reflection type surface acoustic wave device |
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US20020050040A1 true US20020050040A1 (en) | 2002-05-02 |
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US09/940,988 Abandoned US20020050040A1 (en) | 2000-09-06 | 2001-08-28 | Method for adjusting a frequency characteristic of an edge reflection type surface acoustic wave device and method for producing an edge reflection type surface acoustic wave device |
US10/844,940 Expired - Lifetime US7194793B2 (en) | 2000-09-06 | 2004-05-13 | Method for producing an edge reflection type surface acoustic wave device |
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US10/844,940 Expired - Lifetime US7194793B2 (en) | 2000-09-06 | 2004-05-13 | Method for producing an edge reflection type surface acoustic wave device |
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US (2) | US20020050040A1 (en) |
JP (1) | JP3797155B2 (en) |
KR (2) | KR100635763B1 (en) |
CN (2) | CN100388624C (en) |
DE (1) | DE10143730B4 (en) |
Families Citing this family (73)
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---|---|---|---|---|
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US11323095B2 (en) | 2018-06-15 | 2022-05-03 | Resonant Inc. | Rotation in XY plane to suppress spurious modes in XBAR devices |
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WO2020092414A2 (en) * | 2018-10-31 | 2020-05-07 | Resonant Inc. | Solidly-mounted transversely-excited film bulk acoustic resonator |
WO2020186261A1 (en) | 2019-03-14 | 2020-09-17 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with half-lambda dielectric layer |
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US11482981B2 (en) | 2020-07-09 | 2022-10-25 | Resonanat Inc. | Transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate |
US11264969B1 (en) | 2020-08-06 | 2022-03-01 | Resonant Inc. | Transversely-excited film bulk acoustic resonator comprising small cells |
US11671070B2 (en) | 2020-08-19 | 2023-06-06 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonators using multiple dielectric layer thicknesses to suppress spurious modes |
US11271539B1 (en) | 2020-08-19 | 2022-03-08 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with tether-supported diaphragm |
US11894835B2 (en) | 2020-09-21 | 2024-02-06 | Murata Manufacturing Co., Ltd. | Sandwiched XBAR for third harmonic operation |
US11728784B2 (en) | 2020-10-05 | 2023-08-15 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with split die sub-filters |
US11405017B2 (en) | 2020-10-05 | 2022-08-02 | Resonant Inc. | Acoustic matrix filters and radios using acoustic matrix filters |
US11476834B2 (en) | 2020-10-05 | 2022-10-18 | Resonant Inc. | Transversely-excited film bulk acoustic resonator matrix filters with switches in parallel with sub-filter shunt capacitors |
US11658639B2 (en) | 2020-10-05 | 2023-05-23 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with noncontiguous passband |
US11405019B2 (en) | 2020-10-05 | 2022-08-02 | Resonant Inc. | Transversely-excited film bulk acoustic resonator matrix filters |
US11929733B2 (en) | 2020-10-05 | 2024-03-12 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with input and output impedances matched to radio frequency front end elements |
US11463066B2 (en) | 2020-10-14 | 2022-10-04 | Resonant Inc. | Transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate |
US11496113B2 (en) | 2020-11-13 | 2022-11-08 | Resonant Inc. | XBAR devices with excess piezoelectric material removed |
US11405020B2 (en) | 2020-11-26 | 2022-08-02 | Resonant Inc. | Transversely-excited film bulk acoustic resonators with structures to reduce acoustic energy leakage |
US11239816B1 (en) | 2021-01-15 | 2022-02-01 | Resonant Inc. | Decoupled transversely-excited film bulk acoustic resonators |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6041809A (en) | 1983-08-17 | 1985-03-05 | Fujitsu Ltd | Surface acoustic wave resonator |
JPS60211674A (en) * | 1984-04-05 | 1985-10-24 | Matsushita Electric Ind Co Ltd | Vtr editing control method |
JPH0614608B2 (en) | 1984-06-20 | 1994-02-23 | 富士通株式会社 | Elastic wave device |
JPS6271317A (en) | 1985-09-24 | 1987-04-02 | Nec Kansai Ltd | Manufacture of surface acoustic wave device |
US5283037A (en) * | 1988-09-29 | 1994-02-01 | Hewlett-Packard Company | Chemical sensor utilizing a surface transverse wave device |
US5099459A (en) * | 1990-04-05 | 1992-03-24 | General Electric Company | Phased array ultrosonic transducer including different sized phezoelectric segments |
JP3239399B2 (en) * | 1991-11-15 | 2001-12-17 | 株式会社村田製作所 | Surface wave device |
JPH05183376A (en) * | 1991-12-27 | 1993-07-23 | Murata Mfg Co Ltd | Surface wave device |
JPH07307640A (en) | 1994-03-17 | 1995-11-21 | Fujitsu Ltd | Surface acoustic wave device |
JP3206285B2 (en) * | 1994-03-25 | 2001-09-10 | 株式会社村田製作所 | Edge reflection type surface acoustic wave resonator |
JPH0846467A (en) * | 1994-07-27 | 1996-02-16 | Oki Electric Ind Co Ltd | Adjusting method for frequency of resonator surface acoustic wave filter |
JPH08204498A (en) * | 1995-01-24 | 1996-08-09 | Murata Mfg Co Ltd | End face reflection type surface acoustic wave device |
JP3106912B2 (en) * | 1995-06-30 | 2000-11-06 | 株式会社村田製作所 | Method of manufacturing edge reflection type surface acoustic wave device |
JPH0969751A (en) * | 1995-08-30 | 1997-03-11 | Murata Mfg Co Ltd | Surface acoustic wave filter |
JP3106924B2 (en) * | 1995-08-31 | 2000-11-06 | 株式会社村田製作所 | Surface wave resonator |
JP3514015B2 (en) * | 1995-12-28 | 2004-03-31 | 株式会社村田製作所 | Surface acoustic wave device and method of manufacturing the same |
JP3233087B2 (en) * | 1997-01-20 | 2001-11-26 | 株式会社村田製作所 | Surface acoustic wave filter |
JP3171144B2 (en) * | 1997-07-07 | 2001-05-28 | 株式会社村田製作所 | Surface wave device |
US5986523A (en) * | 1997-08-29 | 1999-11-16 | Murata Manufacturing Co., Ltd. | Edge reflection type longitudinally coupled surface acoustic wave filter |
JP3341709B2 (en) | 1998-06-01 | 2002-11-05 | 株式会社村田製作所 | Surface wave device and communication device using the same |
JP2000156620A (en) * | 1998-11-19 | 2000-06-06 | Japan Radio Co Ltd | Center frequency adjustment method for surface acoustic wave device and production of the device |
JP2000165184A (en) * | 1998-11-20 | 2000-06-16 | Fujitsu Ltd | Surface acoustic wave element |
JP3341699B2 (en) * | 1999-02-18 | 2002-11-05 | 株式会社村田製作所 | Edge reflection type surface acoustic wave device |
-
2001
- 2001-08-14 JP JP2001246248A patent/JP3797155B2/en not_active Expired - Lifetime
- 2001-08-28 US US09/940,988 patent/US20020050040A1/en not_active Abandoned
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- 2004-05-13 US US10/844,940 patent/US7194793B2/en not_active Expired - Lifetime
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2005
- 2005-06-27 KR KR1020050055833A patent/KR100658306B1/en active IP Right Grant
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JP2002158554A (en) | 2002-05-31 |
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