EP2337878A1 - Silicide zur photoelektrochemischen wasserspaltung und/oder erzeugung von elektrizität - Google Patents
Silicide zur photoelektrochemischen wasserspaltung und/oder erzeugung von elektrizitätInfo
- Publication number
- EP2337878A1 EP2337878A1 EP09764700A EP09764700A EP2337878A1 EP 2337878 A1 EP2337878 A1 EP 2337878A1 EP 09764700 A EP09764700 A EP 09764700A EP 09764700 A EP09764700 A EP 09764700A EP 2337878 A1 EP2337878 A1 EP 2337878A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- silicides
- silicide
- electricity
- water
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910021332 silicide Inorganic materials 0.000 title claims abstract description 156
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 39
- 230000005611 electricity Effects 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 55
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000001301 oxygen Substances 0.000 claims abstract description 27
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 27
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000001257 hydrogen Substances 0.000 claims abstract description 26
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 26
- 239000003054 catalyst Substances 0.000 claims abstract description 5
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 62
- 230000008569 process Effects 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 26
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 239000003792 electrolyte Substances 0.000 claims description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 11
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 229910008484 TiSi Inorganic materials 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000000975 dye Substances 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 125000002080 perylenyl group Chemical class C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 claims description 6
- 229910017052 cobalt Inorganic materials 0.000 claims description 5
- 239000010941 cobalt Substances 0.000 claims description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 5
- 238000010276 construction Methods 0.000 claims description 5
- 239000007772 electrode material Substances 0.000 claims description 5
- 238000005516 engineering process Methods 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 5
- 206010010144 Completed suicide Diseases 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 4
- 230000009257 reactivity Effects 0.000 claims description 4
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910021341 titanium silicide Inorganic materials 0.000 claims description 4
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims description 4
- WEAMLHXSIBDPGN-UHFFFAOYSA-N (4-hydroxy-3-methylphenyl) thiocyanate Chemical compound CC1=CC(SC#N)=CC=C1O WEAMLHXSIBDPGN-UHFFFAOYSA-N 0.000 claims description 3
- VLJQDHDVZJXNQL-UHFFFAOYSA-N 4-methyl-n-(oxomethylidene)benzenesulfonamide Chemical compound CC1=CC=C(S(=O)(=O)N=C=O)C=C1 VLJQDHDVZJXNQL-UHFFFAOYSA-N 0.000 claims description 3
- 229910019001 CoSi Inorganic materials 0.000 claims description 3
- 229910005329 FeSi 2 Inorganic materials 0.000 claims description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- 229910006249 ZrSi Inorganic materials 0.000 claims description 3
- CHXGWONBPAADHP-UHFFFAOYSA-N [Si].[Si].[Cr] Chemical compound [Si].[Si].[Cr] CHXGWONBPAADHP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052785 arsenic Inorganic materials 0.000 claims description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 3
- 239000011575 calcium Substances 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 230000001419 dependent effect Effects 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 3
- 230000031700 light absorption Effects 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 125000002524 organometallic group Chemical group 0.000 claims description 3
- 229910021340 platinum monosilicide Inorganic materials 0.000 claims description 3
- 229910021339 platinum silicide Inorganic materials 0.000 claims description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910021355 zirconium silicide Inorganic materials 0.000 claims description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- 229910005347 FeSi Inorganic materials 0.000 claims description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- VKTGMGGBYBQLGR-UHFFFAOYSA-N [Si].[V].[V].[V] Chemical compound [Si].[V].[V].[V] VKTGMGGBYBQLGR-UHFFFAOYSA-N 0.000 claims description 2
- FHTCLMVMBMJAEE-UHFFFAOYSA-N bis($l^{2}-silanylidene)manganese Chemical compound [Si]=[Mn]=[Si] FHTCLMVMBMJAEE-UHFFFAOYSA-N 0.000 claims description 2
- MANYRMJQFFSZKJ-UHFFFAOYSA-N bis($l^{2}-silanylidene)tantalum Chemical compound [Si]=[Ta]=[Si] MANYRMJQFFSZKJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 230000000536 complexating effect Effects 0.000 claims description 2
- 239000000446 fuel Substances 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 2
- 150000002602 lanthanoids Chemical class 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 238000006552 photochemical reaction Methods 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- NUSDCJCJVURPFV-UHFFFAOYSA-N silicon tetraboride Chemical compound B12B3B4[Si]32B41 NUSDCJCJVURPFV-UHFFFAOYSA-N 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 230000003068 static effect Effects 0.000 claims description 2
- 229910052716 thallium Inorganic materials 0.000 claims description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052723 transition metal Inorganic materials 0.000 claims description 2
- 229910000314 transition metal oxide Inorganic materials 0.000 claims description 2
- 150000003624 transition metals Chemical class 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 229920005372 Plexiglas® Polymers 0.000 claims 2
- 239000004952 Polyamide Substances 0.000 claims 2
- 229920002647 polyamide Polymers 0.000 claims 2
- 239000004425 Makrolon Substances 0.000 claims 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims 1
- KZYDBKYFEURFNC-UHFFFAOYSA-N dioxorhodium Chemical compound O=[Rh]=O KZYDBKYFEURFNC-UHFFFAOYSA-N 0.000 claims 1
- 238000005485 electric heating Methods 0.000 claims 1
- 230000036541 health Effects 0.000 claims 1
- 108091008695 photoreceptors Proteins 0.000 claims 1
- 229920000515 polycarbonate Polymers 0.000 claims 1
- 239000004926 polymethyl methacrylate Substances 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 claims 1
- -1 surfaces Substances 0.000 claims 1
- 230000036642 wellbeing Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229920000557 Nafion® Polymers 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- TWRSDLOICOIGRH-UHFFFAOYSA-N [Si].[Si].[Hf] Chemical compound [Si].[Si].[Hf] TWRSDLOICOIGRH-UHFFFAOYSA-N 0.000 description 2
- LKTZODAHLMBGLG-UHFFFAOYSA-N alumanylidynesilicon;$l^{2}-alumanylidenesilylidenealuminum Chemical compound [Si]#[Al].[Si]#[Al].[Al]=[Si]=[Al] LKTZODAHLMBGLG-UHFFFAOYSA-N 0.000 description 2
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000011244 liquid electrolyte Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910021344 molybdenum silicide Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- SBEQWOXEGHQIMW-UHFFFAOYSA-N silicon Chemical compound [Si].[Si] SBEQWOXEGHQIMW-UHFFFAOYSA-N 0.000 description 2
- 229910006585 β-FeSi Inorganic materials 0.000 description 2
- OFEAOSSMQHGXMM-UHFFFAOYSA-N 12007-10-2 Chemical compound [W].[W]=[B] OFEAOSSMQHGXMM-UHFFFAOYSA-N 0.000 description 1
- 229910017743 AgSi Inorganic materials 0.000 description 1
- 229910016344 CuSi Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- WCMKFCQUZDOHAQ-UHFFFAOYSA-N [As].[Ta] Chemical compound [As].[Ta] WCMKFCQUZDOHAQ-UHFFFAOYSA-N 0.000 description 1
- NADDYNUVLPNTIE-UHFFFAOYSA-N [As].[Ti] Chemical compound [As].[Ti] NADDYNUVLPNTIE-UHFFFAOYSA-N 0.000 description 1
- CYKMNKXPYXUVPR-UHFFFAOYSA-N [C].[Ti] Chemical compound [C].[Ti] CYKMNKXPYXUVPR-UHFFFAOYSA-N 0.000 description 1
- RIRXDDRGHVUXNJ-UHFFFAOYSA-N [Cu].[P] Chemical compound [Cu].[P] RIRXDDRGHVUXNJ-UHFFFAOYSA-N 0.000 description 1
- JUZTWRXHHZRLED-UHFFFAOYSA-N [Si].[Cu].[Cu].[Cu].[Cu].[Cu] Chemical compound [Si].[Cu].[Cu].[Cu].[Cu].[Cu] JUZTWRXHHZRLED-UHFFFAOYSA-N 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- OTJXRUHUGBSPCL-UHFFFAOYSA-N arsanylidynechromium Chemical compound [As]#[Cr] OTJXRUHUGBSPCL-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- LGLOITKZTDVGOE-UHFFFAOYSA-N boranylidynemolybdenum Chemical compound [Mo]#B LGLOITKZTDVGOE-UHFFFAOYSA-N 0.000 description 1
- QDMRQDKMCNPQQH-UHFFFAOYSA-N boranylidynetitanium Chemical compound [B].[Ti] QDMRQDKMCNPQQH-UHFFFAOYSA-N 0.000 description 1
- ZDVYABSQRRRIOJ-UHFFFAOYSA-N boron;iron Chemical compound [Fe]#B ZDVYABSQRRRIOJ-UHFFFAOYSA-N 0.000 description 1
- 229910021346 calcium silicide Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- NUEWEVRJMWXXFB-UHFFFAOYSA-N chromium(iii) boride Chemical compound [Cr]=[B] NUEWEVRJMWXXFB-UHFFFAOYSA-N 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000010668 complexation reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910021360 copper silicide Inorganic materials 0.000 description 1
- 229910000071 diazene Inorganic materials 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- YTHCQFKNFVSQBC-UHFFFAOYSA-N magnesium silicide Chemical compound [Mg]=[Si]=[Mg] YTHCQFKNFVSQBC-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000003863 metallic catalyst Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- SIBIBHIFKSKVRR-UHFFFAOYSA-N phosphanylidynecobalt Chemical compound [Co]#P SIBIBHIFKSKVRR-UHFFFAOYSA-N 0.000 description 1
- DPTATFGPDCLUTF-UHFFFAOYSA-N phosphanylidyneiron Chemical compound [Fe]#P DPTATFGPDCLUTF-UHFFFAOYSA-N 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- WNUPENMBHHEARK-UHFFFAOYSA-N silicon tungsten Chemical compound [Si].[W] WNUPENMBHHEARK-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/04—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of inorganic compounds, e.g. ammonia
- C01B3/042—Decomposition of water
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/02—Preparation of oxygen
- C01B13/0203—Preparation of oxygen from inorganic compounds
- C01B13/0207—Water
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/50—Processes
- C25B1/55—Photoelectrolysis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0328—Inorganic materials including, apart from doping materials or other impurities, semiconductor materials provided for in two or more of groups H01L31/0272 - H01L31/032
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/07—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the Schottky type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2045—Light-sensitive devices comprising a semiconductor electrode comprising elements of the fourth group of the Periodic System (C, Si, Ge, Sn, Pb) with or without impurities, e.g. doping materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
- Y02P20/133—Renewable energy sources, e.g. sunlight
Definitions
- the invention relates to a process for the photoelectrochemical production of hydrogen and oxygen from water and of electricity, in the presence of silicides (suicides) in general and especially of metal silicides and non-metallic silicides such as boron silicides, carbon silides and nitrogen-containing Silicides, ie compounds containing silicon and having the composition RSi x .
- R may be an organic, metallic, organometallic, non-metallic or inorganic radical and Si is the element silicon (silicon) with an increasing number of atoms X> 0.
- silicides these substance classes are referred to as silicides.
- the silicide subunits of these substances are characterized by an increased electron density.
- silicides in the previously mentioned reaction processes to be catalytically active can proceed with or without light.
- an increase in gas evolution is observed, using artificial and sunlight.
- Higher reaction temperatures are often reaction-accelerating.
- Silicides are mostly semiconductor materials.
- the silicides are used as an electrode material (optionally as an anode or cathode) coupled to a counter electrode (eg, a metal, metal oxide, or other conductive material) and / or as a light collection material as part of a photoelectronic / electrical process. So they can be used as part of a photovoltaic system.
- the silicides serve to (a) generate hydrogen and oxygen from water in the presence of light, and (b) also to produce electricity (electrical energy) simultaneously or separately.
- liquid and / or non-liquid electrolytes are used and for the purely photovoltaic application can be completely dispensed with a suitable doping of the electrodes to the electrolyte.
- the coupling or complexation of a dye, such as perylenes and analogs thereof, to the silicides has an advantageous effect on the light absorption of these substances, as well as the charge separation and, consequently, the reactivity of the silicides.
- the reactions with silicides for the cleavage of water into hydrogen and oxygen with light for the production of hydrogen and oxygen, as well as for the generation of electricity can also be carried out with silicides in immobilized form, ie with silicides on or in polymeric materials, and / or on or in glasses or glass-like materials, as well as generally on or in electrically / electronically conductive materials.
- the method according to the invention also supplies electricity in addition to hydrogen and oxygen, ie electrical energy.
- lanthanide-type photocatalysts such as NaTaO 3 : La
- the processes for producing hydrogen and oxygen from water are based on the reduction and / or oxidation of water by means of semiconductor materials and light. Processes of this kind are also called water splitting. The processes described so far use UV light. Although a considerable evolution of hydrogen and oxygen has been found in some cases, the required exposure conditions are not suitable for solar application of the method. In addition, the preparation of the catalysts is labor-intensive and requires the use of uneconomically high temperatures, starting from expensive materials of extremely high purity. Furthermore, the application of very clean water (triply distilled) is required for carrying out the processes mentioned. In most cases, no indication is given regarding long-term applicability and the associated stability of the catalysts.
- silicides silicides
- ie metal silicides and non-metallic silicides such as boron silicides, carbon-containing silicides and nitrogen-containing silicides, ie compounds containing silicon and the composition RSi x
- R can be an organic, metallic, organometallic or inorganic radical
- Si stands for the element silicon (silicon) with an increasing number of atoms X> 0.
- silicides The silicide subunits of these compounds are characterized by an increased electron density, ie by a negative charge density or they have a negative charge.
- non-metallic silicides such as boron silicides, carbon-containing silicides and nitrogen-containing silicides are also called silicon borides, carbides and nitrides.
- silicides, metal silicides and non-metallic silicides such as boron silicides, carbon silicides and nitrogen-containing silicides are nickel silicide (Ni 2 Si), iron silicides (FeSi 2 , FeSi), thallium silicide (ThSi 2 ), boron silicide also called silicon tetraboride ( B 4 Si), cobalt silicide (CoSi 2 ), platinum silicides (PtSi, Pt 2 Si), manganese silicide (MnSi 2 ), titanium carbon silicide (Ti 3 C 2 Si), carbon silicide / poly-carbon silicide or also silicon carbide / poly silicon carbide carbide called ( CSi / poly-CSi or SiC / poly-SiC), iridium silicide (IrSi 2 ), zirconium silicide (ZrSi 2 ), tantalum silicide (TaSi 2 ), vana
- Silicides are inexpensive, easily accessible materials (predominantly semiconductor materials) and have not hitherto been used for title applications in a photoelectric, that is a photoelectrochemical as well as a photovoltaic application.
- the silicides are predominantly semiconductor-like materials with high electron densities (negative charge densities) on silicon, carbon, nitrogen and boron.
- the claimed processes for the production of hydrogen and / or oxygen by silicides efficiently emit light.
- the light energy used can be artificially or solar generated (emission range: 200 - 15000 nm) and can be diffuse or even concentrated nature.
- the thermal energy of a light source, or thermal energy in general, which is generated along with the photonic energy, can accelerate the gas-producing, stressed processes. In general, the use of higher temperatures, but also of higher light concentrations can lead to a higher efficiency of the claimed processes. This applies not only to the splitting of water into hydrogen and oxygen, but also to the generation of electricity (photovoltaic), i. electrical energy, may occur simultaneously or separately from the water splitting.
- the silicides are used as electrode material (optionally as cathode or anode) in these photoelectrochemical and photovoltaic processes and are electrically conductively coupled to one or more counterelectrode (s) (optionally anode (s) or cathode (s)).
- the counterelectrodes must be metallic or non-metallic but electrically conductive. In this arrangement, an electrolyte is inserted between the electrodes.
- silicides can be dispensed with suitable p- / n-doping of the electrode materials on the electrolyte and the electrodes are brought into direct contact.
- undoped or doped are silicides used in electrically conductive ones Be brought in contact.
- other photoelectrically / photovoltaically active materials can be used in addition, this also outside the system as a light receiver.
- the silicides themselves tend to absorb sufficient solar or artificial radiant energy without the need for major surface modifications to cause splitting of water to produce hydrogen and oxygen, or for concurrent or separate generation of electricity (photovoltaic).
- the reactivity of the silicides claimed in this application for splitting water to produce hydrogen and oxygen and / or for the simultaneous or separate production of electricity is predominantly of a catalytic nature.
- silicides for the splitting of water for the production of hydrogen and oxygen and / or for the simultaneous or separate production of electricity (photovoltaics) can also be operated with silicides in immobilized form, ie that these processes can also be carried out with compounds which are bound / fixed to or in polymeric surfaces or materials, as well as to or in glasses or glass-like materials as well as to or in other solid surfaces or also to nanoparticles, and in particular if these materials are electrically conductive, that is, charge-conducting.
- the silicides may be present as a solid composite, preferably crystalline; but these can also be of amorphous nature.
- the above-mentioned higher temperatures can be electrically generated by geothermal, light energy, solar energy, heaters, microwave discharge, or any other source of thermal energy.
- silicides can be used for title applications individually or in combinations of two or more silicides. It is also possible to carry out the title processes with one or more silicides with simultaneous use of additional non-silicide-type semiconductor materials, such as ruthenium dioxide (RuO 2 ), manganese dioxide (MnO 2 ), tungsten trioxide ( WO 3 ) and more generally other semiconductor materials to support the title processes.
- additional non-silicide-type semiconductor materials such as ruthenium dioxide (RuO 2 ), manganese dioxide (MnO 2 ), tungsten trioxide ( WO 3 ) and more generally other semiconductor materials to support the title processes.
- the new technology based on the above-described uses of silicides, can find, for example, the following applications: for novel heating systems, fuel cell technology and / or generation of electricity in general.
- Example 1 Crystalline titanium silicide (TiSi 2) in solid form (.sputtering target ', 5 cm diameter) is positioned in a vessel (cylindrical shape, and cooled with a free gas space, reaction temperature 25-30 0 C) and (with a counter electrode such as IrO 2 or RuO 2 ) electrically conductively connected.
- TiSi 2 Crystalline titanium silicide
- a membrane of, for example Nafion or Teflon is attached, which is not permeable to oxygen and hydrogen.
- the water phase is treated with an electrolyte (acidified to pH 2, for example, with sulfuric acid) and exposed in the longitudinal direction of the cylindrical apparatus (white light, 500-1000 W or sunlight); while the silicide is exposed.
- the gas analyzes are carried out by gas chromatography.
- the water used can be filtered through ion exchange material; however, normal water can also be used.
- the silicide serves in this arrangement as a cathode (hydrogen evolution) and the transition metal oxides as an anode (oxygen evolution). In addition, a significant electrical current flow can be measured.
- EXAMPLE 2 instead of the silicides mentioned in Example 1, other silicides were also used, such as cobalt silicide (CoSi 2 ), platinum silicides (PtSi, Pt 2 Si), titanium carbosilicide (Ti 3 C 2 Si), carbosilicide / polycarbosilicide (also silicon carbide). poly-silicon carbide (CSi / poly-CSi or SiC / poly-SiC), zirconium silicide (ZrSi 2 ) or chromium silicide (CrSi 2 ) The reactions are carried out as described in Example 1. In principle, it is suitable for this application every silicide.
- cobalt silicide CoSi 2
- platinum silicides PtSi, Pt 2 Si
- Ti 3 C 2 Si titanium carbosilicide
- carbosilicide / polycarbosilicide also silicon carbide.
- poly-silicon carbide CSi / poly-CSi or SiC
- Example 3 Same experimental arrangement as mentioned in Example 1, but with titanium silicide (TiSi 2 I) as the anode and platinum as the counter electrode (cathode) performed. Less oxygen and hydrogen is produced, but an increased electrical current flow is measured, which can be used for example for drives and other energy-dependent systems.
- TiSi 2 I titanium silicide
- platinum platinum as the counter electrode
- Example 4 When TiSi is used as the cathode in the processes described in Experiments 1 and 2, no gas evolution is observed, but a significant electric current flow is measured.
- Example 5 Example 4 can also be carried out without contact with water. Instead of the aqueous sulfuric acid as the electrolyte, an electrolyte gel must be used as the contact between the electrodes.
- Example 6 If higher reaction temperatures are (45-100 0 C) used in the processes described in Experiments 1 and 2, a more vivid gas evolution is observed. Conveniently, these temperatures can be achieved using flatbed solar reactors and sunlight as the radiation source.
- Example 7 Perylene soluble in, for example, chloroform (but not water) such as the N, N'-bis-phenyl-ethyl-perylene-3,4,9,10-tetracarboxyl-diimide (2 g) is dissolved (in 5 ml of chloroform), mixed with titanium silicide in solid form (TiSi 2 or Ti 5 Si 3 ) and stirred for 2 hours at room temperature and exposed (Example 1). After removal of the solvent in vacuo, the residue is used according to the conditions as described in Example 1, for the further reaction. In this case, an increased hydrogen and oxygen evolution was found.
- chloroform but not water
- Example 8 As an alternative to the reaction conditions described in Examples 1 and 2, flatbed solar reactors or a sunlight concentrating system (parabolic trough or Fresnel optics) can be used. Heating the silicide, for example, 200 0 C under these conditions is no problem for the success of the title reactions and even reafördemd. This also applies to the use of concentrated light energy.
- Example 9 The silicide (eg TiSi 2 ) was Pt doped (doped) on the basis of standard techniques and a reaction was carried out in analogy to Example 1. In this case, a higher gas yield and an increased electrical current flow was measured as in Example 1.
- Example 10 Both the water splitting for the production of hydrogen and oxygen, as well as the generation of electricity succeeds in external use of a suicide (for example as a plate), electrically connected to a platinum electrode and a transition metal electrode as the counter electrode.
- the electrode spaces for the water splitting can be separated by a membrane (Nafion or Teflon) and an electrolyte, as mentioned in Example 1, can be used.
- Example 11 For the generation of electricity (photovoltaic) can also be dispensed with the water contact and in analogy to Example 5, an electrolyte gel between the electrodes are used.
- Example 12 Carried out as Example 11, but with several electrodes in series (electrically connected) and provided with an electrolyte (as Examples 5 or 11).
- the electrodes used were TiSi / beta-FeSi 2 / RuO 2 ) alfa-FeSi 2 ).
- Example 13 With suitable p / n doping of the electrodes, it is possible to dispense with the use of an electrolyte and to bring the electrodes into direct contact with electrical connection.
- aluminum was selected on TiSi 2 and for the n-doping phosphorous on TiSi, the two layers were brought into contact. A significant current flow was measured. Several layers can also be brought into contact, wherein a markedly increased current flow is measured when this arrangement is exposed to artificial light as well as solar radiation.
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102008051670A DE102008051670A1 (de) | 2008-10-15 | 2008-10-15 | Silicide zur photoelektrochemischen Wasserspaltung und/oder Erzeugung von Elektrizität |
PCT/DE2009/001428 WO2010043208A1 (de) | 2008-10-15 | 2009-10-14 | Silicide zur photoelektrochemischen wasserspaltung und/oder erzeugung von elektrizität |
Publications (1)
Publication Number | Publication Date |
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EP2337878A1 true EP2337878A1 (de) | 2011-06-29 |
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Application Number | Title | Priority Date | Filing Date |
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EP09764700A Withdrawn EP2337878A1 (de) | 2008-10-15 | 2009-10-14 | Silicide zur photoelektrochemischen wasserspaltung und/oder erzeugung von elektrizität |
Country Status (5)
Country | Link |
---|---|
US (1) | US9005421B2 (de) |
EP (1) | EP2337878A1 (de) |
JP (1) | JP2012505962A (de) |
DE (1) | DE102008051670A1 (de) |
WO (1) | WO2010043208A1 (de) |
Families Citing this family (6)
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KR101196793B1 (ko) * | 2010-08-25 | 2012-11-05 | 엘지전자 주식회사 | 태양 전지 및 그 제조 방법 |
JP6099262B2 (ja) * | 2012-06-04 | 2017-03-22 | 達彦 山田 | 水分解方法および水分解装置 |
JP6193688B2 (ja) * | 2013-05-07 | 2017-09-06 | 株式会社豊田自動織機 | 太陽光−熱変換装置及び太陽熱発電装置 |
RU2539523C1 (ru) * | 2013-09-27 | 2015-01-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования Кабардино-Балкарский государственный университет им. Х.М. Бербекова" (КБГУ) | Электролитический способ получения наноразмерного порошка дисилицида церия |
JP6383565B2 (ja) * | 2014-05-13 | 2018-08-29 | 大和ハウス工業株式会社 | 人工光合成システム |
JP2017206426A (ja) * | 2016-05-17 | 2017-11-24 | 森男 梶塚 | 水を三重構造に分解する |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3297487A (en) * | 1964-10-16 | 1967-01-10 | Du Pont | Fuel cell |
US3669751A (en) * | 1967-03-15 | 1972-06-13 | Peter D Richman | Electric battery comprising a fuel cell hydrogen generator and heat exchanger |
JPS598031B2 (ja) * | 1975-12-29 | 1984-02-22 | 松下電器産業株式会社 | コウキデンリヨクソウチ |
JPH0650783B2 (ja) * | 1982-03-29 | 1994-06-29 | 株式会社半導体エネルギ−研究所 | 光発電装置 |
JPS58166680A (ja) * | 1982-03-29 | 1983-10-01 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
US4492743A (en) * | 1982-10-15 | 1985-01-08 | Standard Oil Company (Indiana) | Multilayer photoelectrodes and photovoltaic cells |
US4521800A (en) * | 1982-10-15 | 1985-06-04 | Standard Oil Company (Indiana) | Multilayer photoelectrodes utilizing exotic materials |
US4534099A (en) | 1982-10-15 | 1985-08-13 | Standard Oil Company (Indiana) | Method of making multilayer photoelectrodes and photovoltaic cells |
JPS59110179A (ja) * | 1982-12-16 | 1984-06-26 | Hitachi Ltd | 半導体装置およびその製造法 |
US4461691A (en) * | 1983-02-10 | 1984-07-24 | The United States Of America As Represented By The United States Department Of Energy | Organic conductive films for semiconductor electrodes |
AU2422684A (en) * | 1983-02-18 | 1985-07-04 | Energy Conversion Devices Inc. | Liquid junction photoelectrodes |
US4656103A (en) * | 1983-02-18 | 1987-04-07 | Energy Conversion Devices, Inc. | Liquid junction photoelectrodes using amorphous silicon-based thin film semiconductor |
US5140397A (en) * | 1985-03-14 | 1992-08-18 | Ricoh Company, Ltd. | Amorphous silicon photoelectric device |
JPS63138843U (de) * | 1987-03-04 | 1988-09-13 | ||
AU695669B2 (en) * | 1994-05-19 | 1998-08-20 | Canon Kabushiki Kaisha | Photovoltaic element, electrode structure thereof, and process for producing the same |
JPH0888394A (ja) * | 1994-09-20 | 1996-04-02 | Seiko Instr Inc | 光電変換半導体装置及びその製造方法 |
JPH08125210A (ja) * | 1994-10-24 | 1996-05-17 | Jiyousuke Nakada | 受光素子及び受光素子アレイ並びにそれらを用いた電解装置 |
EP0883199B1 (de) * | 1997-06-03 | 2003-05-07 | Matsushita Electric Industrial Co., Ltd. | Negative Elektrodenaktivmaterialen für nicht-wässerige Elektrolyt Sekundärbatterien und entsprechenden Batterien |
US6203985B1 (en) * | 1998-09-08 | 2001-03-20 | Motorola, Inc. | Bio-molecule analyzer with photosensitive material and fabrication |
DE10210465A1 (de) * | 2002-03-04 | 2003-10-09 | Fraunhofer Ges Forschung | Photokatalytisches Element zur Aufspaltung von Wasserstoff enthaltenden Verbindungen |
JP2004266023A (ja) * | 2003-02-28 | 2004-09-24 | Sharp Corp | 太陽電池およびその製造方法 |
AU2003902117A0 (en) * | 2003-05-05 | 2003-05-22 | Sustainable Technologies International Pty Ltd | Photovoltaic device |
US20060243587A1 (en) * | 2004-05-05 | 2006-11-02 | Sustainable Technologies International Pty Ltd | Photoelectrochemical device |
US7811541B2 (en) * | 2004-06-14 | 2010-10-12 | Signa Chemistry, Inc. | Silicide compositions containing alkali metals and methods of making the same |
US20080113271A1 (en) * | 2005-06-03 | 2008-05-15 | Tomohiro Ueda | Non-Aqueous Electrolyte Secondary Battery and Method for Producing Negative Electrode Therefor |
DE102005040255A1 (de) * | 2005-08-24 | 2007-03-22 | Martin Prof. Dr. Demuth | Herstellung von Wasserstoff und Sauerstoff aus Wasser und Speicherung dieser Gase mittels Siliciden |
US8105469B2 (en) * | 2006-03-17 | 2012-01-31 | Andrew John Whitehead | Microelectrode array |
US20100000874A1 (en) * | 2008-06-24 | 2010-01-07 | Sundrop Fuels, Inc. | Various methods and apparatus for solar assisted fuel production |
US20090313886A1 (en) * | 2008-06-24 | 2009-12-24 | Sundrop Fuels, Inc. | Various methods and apparatus for solar assisted chemical and energy processes |
-
2008
- 2008-10-15 DE DE102008051670A patent/DE102008051670A1/de not_active Withdrawn
-
2009
- 2009-10-14 US US13/124,396 patent/US9005421B2/en not_active Expired - Fee Related
- 2009-10-14 JP JP2011531350A patent/JP2012505962A/ja active Pending
- 2009-10-14 EP EP09764700A patent/EP2337878A1/de not_active Withdrawn
- 2009-10-14 WO PCT/DE2009/001428 patent/WO2010043208A1/de active Application Filing
Non-Patent Citations (2)
Title |
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None * |
See also references of WO2010043208A1 * |
Also Published As
Publication number | Publication date |
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DE102008051670A1 (de) | 2009-11-05 |
US9005421B2 (en) | 2015-04-14 |
WO2010043208A1 (de) | 2010-04-22 |
JP2012505962A (ja) | 2012-03-08 |
US20110303548A1 (en) | 2011-12-15 |
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