DE69738688D1 - Aktivmatrizenanzeige und deren herstellungsverfahren - Google Patents

Aktivmatrizenanzeige und deren herstellungsverfahren

Info

Publication number
DE69738688D1
DE69738688D1 DE69738688T DE69738688T DE69738688D1 DE 69738688 D1 DE69738688 D1 DE 69738688D1 DE 69738688 T DE69738688 T DE 69738688T DE 69738688 T DE69738688 T DE 69738688T DE 69738688 D1 DE69738688 D1 DE 69738688D1
Authority
DE
Germany
Prior art keywords
gate
matrix
multilayer
transistors
aluminum layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69738688T
Other languages
English (en)
Inventor
Scott H Holmberg
Swaminathan Rajesh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix America Inc
Original Assignee
Hyundai Electronics America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics America Inc filed Critical Hyundai Electronics America Inc
Application granted granted Critical
Publication of DE69738688D1 publication Critical patent/DE69738688D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78636Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device with supplementary region or layer for improving the flatness of the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409Unipolar field-effect transistors
    • H01L29/66477Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742Thin film unipolar transistors
    • H01L29/6675Amorphous silicon or polysilicon transistors
    • H01L29/66765Lateral single gate single channel transistors with inverted structure, i.e. the channel layer is formed after the gate
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • G02F1/13629Multilayer wirings
DE69738688T 1996-03-27 1997-03-26 Aktivmatrizenanzeige und deren herstellungsverfahren Expired - Fee Related DE69738688D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/618,597 US5731216A (en) 1996-03-27 1996-03-27 Method of making an active matrix display incorporating an improved TFT
PCT/US1997/004899 WO1997036324A1 (en) 1996-03-27 1997-03-26 Active matrix displays and method of making

Publications (1)

Publication Number Publication Date
DE69738688D1 true DE69738688D1 (de) 2008-06-26

Family

ID=24478344

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69738688T Expired - Fee Related DE69738688D1 (de) 1996-03-27 1997-03-26 Aktivmatrizenanzeige und deren herstellungsverfahren

Country Status (9)

Country Link
US (2) US5731216A (de)
EP (1) EP0898785B1 (de)
JP (1) JP3360831B2 (de)
CN (1) CN1117393C (de)
AT (1) ATE395718T1 (de)
AU (1) AU2547897A (de)
DE (1) DE69738688D1 (de)
TW (1) TW299503B (de)
WO (1) WO1997036324A1 (de)

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KR101432716B1 (ko) * 2008-02-25 2014-08-21 삼성디스플레이 주식회사 박막 트랜지스터, 박막 트랜지스터를 포함하는 표시 장치및 그 제조 방법
KR101234382B1 (ko) 2008-05-23 2013-02-18 엘지디스플레이 주식회사 플렉서블 표시장치 및 그 제조 방법
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KR101267277B1 (ko) * 2011-05-19 2013-05-24 한국기계연구원 유연기판의 금속배선 형성방법
CN102629575B (zh) * 2011-08-23 2014-09-24 京东方科技集团股份有限公司 一种阵列基板及其制造方法
CN103400802B (zh) * 2013-07-30 2016-04-13 京东方科技集团股份有限公司 阵列基板及其制作方法和显示装置
KR20150034947A (ko) * 2013-09-27 2015-04-06 삼성디스플레이 주식회사 표시 장치의 금속 배선, 박막 트랜지스터 기판 및 박막 트랜지스터 기판의 제조 방법
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Also Published As

Publication number Publication date
JP3360831B2 (ja) 2003-01-07
TW299503B (en) 1997-03-01
US6160270A (en) 2000-12-12
WO1997036324A1 (en) 1997-10-02
JP2000505602A (ja) 2000-05-09
CN1117393C (zh) 2003-08-06
EP0898785A4 (de) 2002-03-13
AU2547897A (en) 1997-10-17
CN1214799A (zh) 1999-04-21
EP0898785B1 (de) 2008-05-14
ATE395718T1 (de) 2008-05-15
EP0898785A1 (de) 1999-03-03
US5731216A (en) 1998-03-24

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