DE69733102D1 - Reinigungsmittel - Google Patents

Reinigungsmittel

Info

Publication number
DE69733102D1
DE69733102D1 DE69733102T DE69733102T DE69733102D1 DE 69733102 D1 DE69733102 D1 DE 69733102D1 DE 69733102 T DE69733102 T DE 69733102T DE 69733102 T DE69733102 T DE 69733102T DE 69733102 D1 DE69733102 D1 DE 69733102D1
Authority
DE
Germany
Prior art keywords
cleaning supplies
supplies
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69733102T
Other languages
English (en)
Other versions
DE69733102T2 (de
Inventor
Masahiko Kakizawa
Osamu Ichikawa
Ichiro Hayashida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Wako Pure Chemical Corp
Original Assignee
Wako Pure Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wako Pure Chemical Industries Ltd filed Critical Wako Pure Chemical Industries Ltd
Publication of DE69733102D1 publication Critical patent/DE69733102D1/de
Application granted granted Critical
Publication of DE69733102T2 publication Critical patent/DE69733102T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/264—Aldehydes; Ketones; Acetals or ketals
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3245—Aminoacids
    • C11D2111/22—
DE69733102T 1996-06-05 1997-06-03 Reinigungsmittel Expired - Lifetime DE69733102T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP16535396 1996-06-05
JP16535396 1996-06-05

Publications (2)

Publication Number Publication Date
DE69733102D1 true DE69733102D1 (de) 2005-06-02
DE69733102T2 DE69733102T2 (de) 2006-03-02

Family

ID=15810758

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69733102T Expired - Lifetime DE69733102T2 (de) 1996-06-05 1997-06-03 Reinigungsmittel

Country Status (5)

Country Link
US (2) US6143705A (de)
EP (1) EP0812011B1 (de)
KR (1) KR100322392B1 (de)
DE (1) DE69733102T2 (de)
TW (1) TW416987B (de)

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EP0784336A3 (de) * 1995-12-15 1998-05-13 Texas Instruments Incorporated Verbesserungen bei der Herstellung und Bearbeitung von Halbleitervorrichtungen

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US6143705A (en) 2000-11-07
EP0812011B1 (de) 2005-04-27
EP0812011A3 (de) 1998-05-13
US6514921B1 (en) 2003-02-04
KR980005773A (ko) 1998-03-30
DE69733102T2 (de) 2006-03-02
TW416987B (en) 2001-01-01
KR100322392B1 (ko) 2002-03-08
EP0812011A2 (de) 1997-12-10

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