DE69521969D1 - Verfahren und Vorrichtung zur Lichtbogen unterstützten CVD - Google Patents
Verfahren und Vorrichtung zur Lichtbogen unterstützten CVDInfo
- Publication number
- DE69521969D1 DE69521969D1 DE69521969T DE69521969T DE69521969D1 DE 69521969 D1 DE69521969 D1 DE 69521969D1 DE 69521969 T DE69521969 T DE 69521969T DE 69521969 T DE69521969 T DE 69521969T DE 69521969 D1 DE69521969 D1 DE 69521969D1
- Authority
- DE
- Germany
- Prior art keywords
- arc
- assisted cvd
- cvd
- assisted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/272—Diamond only using DC, AC or RF discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/338,844 US5478608A (en) | 1994-11-14 | 1994-11-14 | Arc assisted CVD coating method and apparatus |
US08/518,830 US5587207A (en) | 1994-11-14 | 1995-08-24 | Arc assisted CVD coating and sintering method |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69521969D1 true DE69521969D1 (de) | 2001-09-06 |
DE69521969T2 DE69521969T2 (de) | 2002-04-04 |
Family
ID=26991381
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69521969T Expired - Lifetime DE69521969T2 (de) | 1994-11-14 | 1995-11-10 | Verfahren und Vorrichtung zur Lichtbogen unterstützten CVD |
Country Status (4)
Country | Link |
---|---|
US (1) | US5587207A (de) |
EP (1) | EP0711847B1 (de) |
CA (1) | CA2162529C (de) |
DE (1) | DE69521969T2 (de) |
Families Citing this family (52)
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DE4440521C1 (de) * | 1994-11-12 | 1995-11-02 | Rowo Coating Ges Fuer Beschich | Vorrichtung zum Beschichten von Substraten mit einem Materialdampf im Unterdruck oder Vakuum |
KR100275597B1 (ko) * | 1996-02-23 | 2000-12-15 | 나카네 히사시 | 플리즈마처리장치 |
US6057235A (en) * | 1997-09-15 | 2000-05-02 | Micron Technology, Inc. | Method for reducing surface charge on semiconducter wafers to prevent arcing during plasma deposition |
AU9410498A (en) * | 1997-11-26 | 1999-06-17 | Vapor Technologies, Inc. | Apparatus for sputtering or arc evaporation |
US6015597A (en) * | 1997-11-26 | 2000-01-18 | 3M Innovative Properties Company | Method for coating diamond-like networks onto particles |
BE1011927A3 (nl) * | 1998-05-20 | 2000-03-07 | Vito | Plasmamethode voor de afzetting van deklagen. |
US6929727B2 (en) * | 1999-04-12 | 2005-08-16 | G & H Technologies, Llc | Rectangular cathodic arc source and method of steering an arc spot |
CA2268659C (en) * | 1999-04-12 | 2008-12-30 | Vladimir I. Gorokhovsky | Rectangular cathodic arc source and method of steering an arc spot |
US5997705A (en) * | 1999-04-14 | 1999-12-07 | Vapor Technologies, Inc. | Rectangular filtered arc plasma source |
US6241858B1 (en) * | 1999-09-03 | 2001-06-05 | Flex Products, Inc. | Methods and apparatus for producing enhanced interference pigments |
US6524381B1 (en) | 2000-03-31 | 2003-02-25 | Flex Products, Inc. | Methods for producing enhanced interference pigments |
DE10010126C2 (de) | 2000-03-03 | 2002-10-10 | Cobes Gmbh Nachrichten Und Dat | Verfahren und Vorrichtung zum Plasmabehandeln der Oberfläche von Substraten durch Ionenbeschuß |
US7300559B2 (en) * | 2000-04-10 | 2007-11-27 | G & H Technologies Llc | Filtered cathodic arc deposition method and apparatus |
CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
JP2002093598A (ja) * | 2000-07-11 | 2002-03-29 | Daihen Corp | プラズマ発生装置 |
US6586098B1 (en) | 2000-07-27 | 2003-07-01 | Flex Products, Inc. | Composite reflective flake based pigments comprising reflector layers on bothside of a support layer |
US6686042B1 (en) | 2000-09-22 | 2004-02-03 | Flex Products, Inc. | Optically variable pigments and foils with enhanced color shifting properties |
US6569529B1 (en) | 2000-10-10 | 2003-05-27 | Flex Product, Inc. | Titanium-containing interference pigments and foils with color shifting properties |
US6936145B2 (en) | 2002-02-28 | 2005-08-30 | Ionedge Corporation | Coating method and apparatus |
US7034739B2 (en) * | 2002-04-05 | 2006-04-25 | Osepchuk John M | Delivery of quasi-periodic pulses of EM energy utilizing the principle of beating-wave amplification |
AU2003248835A1 (en) * | 2002-07-02 | 2004-01-23 | Academy Precision Materials A Division Of Academy Corporation | Rotary target and method for onsite mechanical assembly of rotary target |
US20050276381A1 (en) * | 2003-07-02 | 2005-12-15 | Academy Corporation | Rotary target locking ring assembly |
US20070231485A1 (en) * | 2003-09-05 | 2007-10-04 | Moffat William A | Silane process chamber with double door seal |
US7118782B2 (en) * | 2003-11-25 | 2006-10-10 | Eastman Kodak Company | Method for manufacturing diamond coatings |
US20050176251A1 (en) * | 2004-02-05 | 2005-08-11 | Duong Chau H. | Polishing pad with releasable slick particles |
ATE546824T1 (de) * | 2004-06-08 | 2012-03-15 | Dichroic Cell S R L | System zur plasmaunterstützten chemischen aufdampfung bei niedrigen energien |
US7541069B2 (en) * | 2005-03-07 | 2009-06-02 | Sub-One Technology, Inc. | Method and system for coating internal surfaces using reverse-flow cycling |
US7606592B2 (en) * | 2005-09-19 | 2009-10-20 | Becker Charles D | Waveguide-based wireless distribution system and method of operation |
CA2570965A1 (en) | 2005-12-15 | 2007-06-15 | Jds Uniphase Corporation | Security device with metameric features using diffractive pigment flakes |
US9681529B1 (en) * | 2006-01-06 | 2017-06-13 | The United States Of America As Represented By The Secretary Of The Air Force | Microwave adapting plasma torch module |
US7498587B2 (en) * | 2006-05-01 | 2009-03-03 | Vapor Technologies, Inc. | Bi-directional filtered arc plasma source |
US9630162B1 (en) | 2007-10-09 | 2017-04-25 | University Of Louisville Research Foundation, Inc. | Reactor and method for production of nanostructures |
KR20100072316A (ko) * | 2007-10-19 | 2010-06-30 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 높은 가스 유량 공정을 위한 환형 플라즈마 챔버 |
GB0819183D0 (en) * | 2008-10-20 | 2008-11-26 | Univ Gent | Atomic layer deposition powder coating |
IT1394113B1 (it) * | 2009-05-13 | 2012-05-25 | Enea Ente Nuove Tec | Dispositivo cvd e relativo metodo per la deposizione di diamante nanocristallino |
DE102010009024A1 (de) * | 2010-02-24 | 2011-08-25 | Siemens Aktiengesellschaft, 80333 | HF-Resonatorkavität und Beschleuniger |
US10304665B2 (en) | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
US9761424B1 (en) | 2011-09-07 | 2017-09-12 | Nano-Product Engineering, LLC | Filtered cathodic arc method, apparatus and applications thereof |
US20130335898A1 (en) * | 2012-06-18 | 2013-12-19 | Hzo, Inc. | Systems and methods for applying protective coatings to internal surfaces of fully assembled electronic devices |
US10449568B2 (en) | 2013-01-08 | 2019-10-22 | Hzo, Inc. | Masking substrates for application of protective coatings |
CN104245157B (zh) | 2013-01-08 | 2018-09-18 | Hzo股份有限公司 | 从基底上除去保护性涂层的选定部分 |
US9894776B2 (en) | 2013-01-08 | 2018-02-13 | Hzo, Inc. | System for refurbishing or remanufacturing an electronic device |
SG11201605856UA (en) * | 2014-02-10 | 2016-08-30 | Philip Morris Products Sa | An aerosol-generating system having a fluid-permeable heater assembly |
DE102015215051A1 (de) * | 2015-08-06 | 2017-02-09 | Terraplasma Gmbh | Vorrichtung und Verfahren zum Erzeugen eines Plasmas, sowie Verwendung einer solchen Vorrichtung |
US11255606B2 (en) * | 2015-12-30 | 2022-02-22 | Mattson Technology, Inc. | Gas flow control for millisecond anneal system |
US11339464B2 (en) * | 2017-03-31 | 2022-05-24 | Agm Container Controls, Inc. | Plasma nitriding with PECVD coatings using hollow cathode ion immersion technology |
JP2020515723A (ja) * | 2017-03-31 | 2020-05-28 | デュララ テクノロジーズ、エルエルシー | 表面をコーティングするシステム及び方法 |
US11834204B1 (en) | 2018-04-05 | 2023-12-05 | Nano-Product Engineering, LLC | Sources for plasma assisted electric propulsion |
CN112335342B (zh) | 2018-06-14 | 2023-07-14 | Mks仪器公司 | 用于远程等离子源的自由基输出监控器和使用方法 |
KR102183006B1 (ko) * | 2019-02-13 | 2020-11-25 | 경북대학교 산학협력단 | 상압 플라즈마 장치 |
CN111560610A (zh) * | 2020-04-16 | 2020-08-21 | 江苏大学 | 一种交变磁场辅助激光沉积修复钛合金飞机承力梁的方法 |
CN115466940B (zh) * | 2022-08-15 | 2023-10-20 | 中国电子科技集团公司第十二研究所 | 一种金刚石基微波体衰减材料,制备及应用 |
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US3253944A (en) * | 1964-01-13 | 1966-05-31 | Wisconsin Alumni Res Found | Particle coating process |
US3630677A (en) * | 1968-06-26 | 1971-12-28 | Univ Case Western Reserve | Manufacture of synthetic diamonds |
JPS5664441A (en) * | 1979-10-30 | 1981-06-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
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FR2501963A1 (fr) * | 1981-03-23 | 1982-09-24 | Jobert Claude | Litiere complete pour chats prete a l'emploi, jetable et son conditionnement |
IN160089B (de) * | 1982-07-14 | 1987-06-27 | Standard Oil Co Ohio | |
US4505947A (en) * | 1982-07-14 | 1985-03-19 | The Standard Oil Company (Ohio) | Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma |
CH658545A5 (de) * | 1982-09-10 | 1986-11-14 | Balzers Hochvakuum | Verfahren zum gleichmaessigen erwaermen von heizgut in einem vakuumrezipienten. |
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US5256479A (en) * | 1988-12-29 | 1993-10-26 | Tdk Corporation | Ferromagnetic ultrafine particles, method of making, and recording medium using the same |
DE4029270C1 (de) * | 1990-09-14 | 1992-04-09 | Balzers Ag, Balzers, Li | |
WO1992020464A1 (en) * | 1991-05-10 | 1992-11-26 | Celestech, Inc. | Method and apparatus for plasma deposition |
JPH05275345A (ja) * | 1992-03-30 | 1993-10-22 | Nippon Sheet Glass Co Ltd | プラズマcvd方法およびその装置 |
US5435900A (en) | 1992-11-04 | 1995-07-25 | Gorokhovsky; Vladimir I. | Apparatus for application of coatings in vacuum |
US5478608A (en) * | 1994-11-14 | 1995-12-26 | Gorokhovsky; Vladimir I. | Arc assisted CVD coating method and apparatus |
-
1995
- 1995-08-24 US US08/518,830 patent/US5587207A/en not_active Expired - Lifetime
- 1995-11-09 CA CA002162529A patent/CA2162529C/en not_active Expired - Fee Related
- 1995-11-10 DE DE69521969T patent/DE69521969T2/de not_active Expired - Lifetime
- 1995-11-10 EP EP95117826A patent/EP0711847B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5587207A (en) | 1996-12-24 |
DE69521969T2 (de) | 2002-04-04 |
EP0711847A1 (de) | 1996-05-15 |
CA2162529C (en) | 2003-10-14 |
EP0711847B1 (de) | 2001-08-01 |
CA2162529A1 (en) | 1996-05-15 |
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