DE69501432T2 - Verfahren zur Herstellung eines Festkörperbildsensors - Google Patents

Verfahren zur Herstellung eines Festkörperbildsensors

Info

Publication number
DE69501432T2
DE69501432T2 DE69501432T DE69501432T DE69501432T2 DE 69501432 T2 DE69501432 T2 DE 69501432T2 DE 69501432 T DE69501432 T DE 69501432T DE 69501432 T DE69501432 T DE 69501432T DE 69501432 T2 DE69501432 T2 DE 69501432T2
Authority
DE
Germany
Prior art keywords
solid
manufacturing
image sensor
state image
state
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69501432T
Other languages
English (en)
Other versions
DE69501432D1 (de
Inventor
Keisuke Hatano
Kazuma Minami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Electronics Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Application granted granted Critical
Publication of DE69501432D1 publication Critical patent/DE69501432D1/de
Publication of DE69501432T2 publication Critical patent/DE69501432T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H01L31/02164—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors for shielding light, e.g. light blocking layers, cold shields for infrared detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
DE69501432T 1994-05-31 1995-05-31 Verfahren zur Herstellung eines Festkörperbildsensors Expired - Fee Related DE69501432T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6119116A JP2571018B2 (ja) 1994-05-31 1994-05-31 固体撮像装置の製造方法

Publications (2)

Publication Number Publication Date
DE69501432D1 DE69501432D1 (de) 1998-02-19
DE69501432T2 true DE69501432T2 (de) 1998-08-20

Family

ID=14753333

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501432T Expired - Fee Related DE69501432T2 (de) 1994-05-31 1995-05-31 Verfahren zur Herstellung eines Festkörperbildsensors

Country Status (5)

Country Link
US (1) US5576239A (de)
EP (1) EP0687017B1 (de)
JP (1) JP2571018B2 (de)
KR (1) KR100194841B1 (de)
DE (1) DE69501432T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6306676B1 (en) * 1996-04-04 2001-10-23 Eastman Kodak Company Method of making self-aligned, high-enegry implanted photodiode for solid-state image sensors
US5761115A (en) * 1996-05-30 1998-06-02 Axon Technologies Corporation Programmable metallization cell structure and method of making same
JP3070513B2 (ja) * 1997-04-07 2000-07-31 日本電気株式会社 固体撮像素子及びその製造方法
JPH1187675A (ja) * 1997-07-16 1999-03-30 Sony Corp 固体撮像素子の製造方法および固体撮像素子
US6057586A (en) * 1997-09-26 2000-05-02 Intel Corporation Method and apparatus for employing a light shield to modulate pixel color responsivity
JP3180748B2 (ja) * 1997-12-11 2001-06-25 日本電気株式会社 固体撮像装置
JP3343071B2 (ja) * 1998-03-03 2002-11-11 富士写真フイルム株式会社 撮像素子の実装方法
US6218719B1 (en) * 1998-09-18 2001-04-17 Capella Microsystems, Inc. Photodetector and device employing the photodetector for converting an optical signal into an electrical signal
US7010644B2 (en) 2002-08-29 2006-03-07 Micron Technology, Inc. Software refreshed memory device and method
KR100574353B1 (ko) * 2004-02-13 2006-04-27 삼성전자주식회사 고체 촬상 장치 및 그 제조 방법
JP2005286094A (ja) * 2004-03-30 2005-10-13 Sanyo Electric Co Ltd 光半導体集積回路装置
JP4836409B2 (ja) * 2004-03-30 2011-12-14 オンセミコンダクター・トレーディング・リミテッド 光半導体集積回路装置
US7791155B2 (en) * 2006-12-22 2010-09-07 Masimo Laboratories, Inc. Detector shield
WO2010028016A2 (en) * 2008-09-02 2010-03-11 Drexel University Titania dispersion and method for making
WO2010028017A2 (en) * 2008-09-02 2010-03-11 Drexel University Metal or metal oxide deposited fibrous materials
DE102014110560A1 (de) * 2014-07-25 2016-01-28 Epcos Ag Sensorelement, Sensoranordnung und Verfahren zur Herstellung eines Sensorelements und einer Sensoranordnung
JP2021166259A (ja) * 2020-04-07 2021-10-14 キヤノン株式会社 光電変換装置および機器

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6353949A (ja) * 1986-08-25 1988-03-08 Hitachi Ltd 金属配線の形成方法
US4894701A (en) * 1988-05-09 1990-01-16 General Electric Company Semiconductor device detector and method of forming same
JPH039563A (ja) * 1989-06-07 1991-01-17 Matsushita Electron Corp 固体撮像装置
JP2523873B2 (ja) * 1989-06-07 1996-08-14 松下電子工業株式会社 固体撮像装置
JP3134332B2 (ja) * 1991-04-15 2001-02-13 ソニー株式会社 固体撮像素子
JPH05129296A (ja) * 1991-11-05 1993-05-25 Fujitsu Ltd 導電膜の平坦化方法
JP2833906B2 (ja) * 1992-01-31 1998-12-09 九州日本電気株式会社 固体撮像素子
US5254480A (en) * 1992-02-20 1993-10-19 Minnesota Mining And Manufacturing Company Process for producing a large area solid state radiation detector
KR0171625B1 (ko) * 1992-02-20 1999-02-01 단죠 카즈마 고체촬상장치의 제조방법
US5416344A (en) * 1992-07-29 1995-05-16 Nikon Corporation Solid state imaging device and method for producing the same
US5443995A (en) * 1993-09-17 1995-08-22 Applied Materials, Inc. Method for metallizing a semiconductor wafer
US5492852A (en) * 1993-10-07 1996-02-20 Nec Corporation Method for fabricating a solid imaging device having improved smear and breakdown voltage characteristics
US5436458A (en) * 1993-12-06 1995-07-25 Minnesota Mining And Manufacturing Company Solid state radiation detection panel having tiled photosensitive detectors arranged to minimize edge effects between tiles

Also Published As

Publication number Publication date
JP2571018B2 (ja) 1997-01-16
KR950034811A (ko) 1995-12-28
JPH07326725A (ja) 1995-12-12
KR100194841B1 (ko) 1999-06-15
US5576239A (en) 1996-11-19
EP0687017A1 (de) 1995-12-13
EP0687017B1 (de) 1998-01-14
DE69501432D1 (de) 1998-02-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: NEC ELECTRONICS CORP., KAWASAKI, KANAGAWA, JP

8339 Ceased/non-payment of the annual fee