DE69121183D1 - Herstellung von leiterplatten unter benutzung selektiv ätzbarer metallschichten - Google Patents

Herstellung von leiterplatten unter benutzung selektiv ätzbarer metallschichten

Info

Publication number
DE69121183D1
DE69121183D1 DE69121183T DE69121183T DE69121183D1 DE 69121183 D1 DE69121183 D1 DE 69121183D1 DE 69121183 T DE69121183 T DE 69121183T DE 69121183 T DE69121183 T DE 69121183T DE 69121183 D1 DE69121183 D1 DE 69121183D1
Authority
DE
Germany
Prior art keywords
production
circuit boards
metal layers
etchable metal
selective etchable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69121183T
Other languages
English (en)
Other versions
DE69121183T2 (de
Inventor
Christopher Whewell
Sidney Clouser
Chin-Ho Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gould Electronics Inc
Original Assignee
Gould Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gould Electronics Inc filed Critical Gould Electronics Inc
Application granted granted Critical
Publication of DE69121183D1 publication Critical patent/DE69121183D1/de
Publication of DE69121183T2 publication Critical patent/DE69121183T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0147—Carriers and holders
    • H05K2203/0152—Temporary metallic carrier, e.g. for transferring material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0376—Etching temporary metallic carrier substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0726—Electroforming, i.e. electroplating on a metallic carrier thereby forming a self-supporting structure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0793—Aqueous alkaline solution, e.g. for cleaning or etching
DE69121183T 1990-08-24 1991-03-26 Herstellung von leiterplatten unter benutzung selektiv ätzbarer metallschichten Expired - Lifetime DE69121183T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/572,849 US5017271A (en) 1990-08-24 1990-08-24 Method for printed circuit board pattern making using selectively etchable metal layers
PCT/US1991/002026 WO1992003599A1 (en) 1990-08-24 1991-03-26 Method for printed circuit board pattern making using selectively etchable metal layers

Publications (2)

Publication Number Publication Date
DE69121183D1 true DE69121183D1 (de) 1996-09-05
DE69121183T2 DE69121183T2 (de) 1996-12-05

Family

ID=24289615

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69121183T Expired - Lifetime DE69121183T2 (de) 1990-08-24 1991-03-26 Herstellung von leiterplatten unter benutzung selektiv ätzbarer metallschichten

Country Status (10)

Country Link
US (1) US5017271A (de)
EP (1) EP0497925B1 (de)
JP (1) JPH05504658A (de)
KR (1) KR920702440A (de)
AU (1) AU649666B2 (de)
BR (1) BR9105877A (de)
DE (1) DE69121183T2 (de)
FI (1) FI921810A (de)
HU (1) HU208715B (de)
WO (1) WO1992003599A1 (de)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2259812B (en) * 1991-09-06 1996-04-24 Toa Gosei Chem Ind Method for making multilayer printed circuit board having blind holes and resin-coated copper foil used for the method
US6568073B1 (en) 1991-11-29 2003-05-27 Hitachi Chemical Company, Ltd. Process for the fabrication of wiring board for electrical tests
US5504992A (en) * 1991-11-29 1996-04-09 Hitachi Chemical Company, Ltd. Fabrication process of wiring board
DE69218344T2 (de) * 1991-11-29 1997-10-23 Hitachi Chemical Co Ltd Herstellungsverfahren für eine gedruckte Schaltung
US6133534A (en) * 1991-11-29 2000-10-17 Hitachi Chemical Company, Ltd. Wiring board for electrical tests with bumps having polymeric coating
US5240582A (en) * 1992-04-01 1993-08-31 Gould Inc. Drum cathode for use in the production of metal foils and a method of producing the same
US5190637A (en) * 1992-04-24 1993-03-02 Wisconsin Alumni Research Foundation Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers
US5622782A (en) * 1993-04-27 1997-04-22 Gould Inc. Foil with adhesion promoting layer derived from silane mixture
US5620558A (en) * 1993-07-19 1997-04-15 Lucent Technologies Inc. Etching of copper-containing devices
TW324737B (en) * 1994-03-30 1998-01-11 Gould Wlectronics Inc Epoxy adhesive composition and copper foil and laminate using the same
US5707893A (en) * 1995-12-01 1998-01-13 International Business Machines Corporation Method of making a circuitized substrate using two different metallization processes
AU2993997A (en) * 1996-05-01 1997-11-19 Allied-Signal Inc. New method of forming fine circuit lines
US6117300A (en) * 1996-05-01 2000-09-12 Honeywell International Inc. Method for forming conductive traces and printed circuits made thereby
US5662788A (en) 1996-06-03 1997-09-02 Micron Technology, Inc. Method for forming a metallization layer
US7126195B1 (en) 1996-06-03 2006-10-24 Micron Technology, Inc. Method for forming a metallization layer
US5908544A (en) * 1997-09-04 1999-06-01 Gould Electronics, Inc. Zinc-chromium stabilizer containing a hydrogen inhibiting additive
US6884944B1 (en) 1998-01-14 2005-04-26 Mitsui Mining & Smelting Co., Ltd. Multi-layer printed wiring boards having blind vias
US6162365A (en) * 1998-03-04 2000-12-19 International Business Machines Corporation Pd etch mask for copper circuitization
US6632292B1 (en) * 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces
US6331490B1 (en) * 1998-03-13 2001-12-18 Semitool, Inc. Process for etching thin-film layers of a workpiece used to form microelectric circuits or components
ES2367838T3 (es) 1998-09-10 2011-11-10 JX Nippon Mining & Metals Corp. Laminado que comprende una hoja de cobre tratada y procedimiento para su fabricación.
US6117536A (en) * 1998-09-10 2000-09-12 Ga-Tek Inc. Adhesion promoting layer for use with epoxy prepregs
US6132589A (en) * 1998-09-10 2000-10-17 Ga-Tek Inc. Treated copper foil and process for making treated copper foil
JP2000340911A (ja) * 1999-05-25 2000-12-08 Mitsui Mining & Smelting Co Ltd プリント配線板用銅箔
US6265075B1 (en) 1999-07-20 2001-07-24 International Business Machines Corporation Circuitized semiconductor structure and method for producing such
US6506314B1 (en) 2000-07-27 2003-01-14 Atotech Deutschland Gmbh Adhesion of polymeric materials to metal surfaces
US6610417B2 (en) 2001-10-04 2003-08-26 Oak-Mitsui, Inc. Nickel coated copper as electrodes for embedded passive devices
US6841084B2 (en) * 2002-02-11 2005-01-11 Nikko Materials Usa, Inc. Etching solution for forming an embedded resistor
US6984456B2 (en) * 2002-05-13 2006-01-10 Mitsui Mining & Smelting Co., Ltd. Flexible printed wiring board for chip-on flexibles
CN1329979C (zh) * 2002-12-26 2007-08-01 三井金属矿业株式会社 电子部件封装用薄膜载带及其制造方法
DE10354760A1 (de) * 2003-11-21 2005-06-23 Enthone Inc., West Haven Verfahren zur Abscheidung von Nickel und Chrom(VI)freien metallischen Mattschichten
US7534555B2 (en) * 2003-12-10 2009-05-19 Hitachi Global Storage Technologies Netherlands B.V. Plating using copolymer
JP2005317836A (ja) * 2004-04-30 2005-11-10 Nitto Denko Corp 配線回路基板およびその製造方法
KR100663266B1 (ko) * 2005-07-11 2007-01-02 삼성전기주식회사 미세 배선의 형성방법 및 도전성 기판
US20100015329A1 (en) * 2008-07-16 2010-01-21 National Semiconductor Corporation Methods and systems for packaging integrated circuits with thin metal contacts
JP2010123821A (ja) * 2008-11-21 2010-06-03 Kyushu Institute Of Technology 配線用電子部品及びその製造方法、並びに該配線用電子部品を組み込んで用いる電子デバイスパッケージ及びその製造方法
JPWO2010103941A1 (ja) * 2009-03-09 2012-09-13 株式会社村田製作所 フレキシブル基板
US20120318568A1 (en) * 2010-01-15 2012-12-20 Jx Nippon Mining & Metals Corporation Electronic circuit, method for forming same, and copper clad laminate for forming electronic circuit
CN112680732A (zh) * 2020-12-21 2021-04-20 江西遂川光速电子有限公司 一种精细线路刻蚀液

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE503299A (de) * 1949-10-29
FR1156419A (fr) * 1956-07-18 1958-05-16 Thomson Houston Comp Francaise Perfectionnements à la fabrication des câblages et circuits imprimés
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3857681A (en) * 1971-08-03 1974-12-31 Yates Industries Copper foil treatment and products produced therefrom
US3984598A (en) * 1974-02-08 1976-10-05 Universal Oil Products Company Metal-clad laminates
US3981691A (en) * 1974-07-01 1976-09-21 Minnesota Mining And Manufacturing Company Metal-clad dielectric sheeting having an improved bond between the metal and dielectric layers
JPS5856758B2 (ja) * 1975-12-17 1983-12-16 ミツイアナコンダドウハク カブシキガイシヤ ドウハクヒヨウメンシヨリホウホウ
US4082620A (en) * 1977-04-29 1978-04-04 Bell Telephone Laboratories, Incorporated Process for chromating metallic surfaces
US4401521A (en) * 1980-11-28 1983-08-30 Asahi Kasei Kogyo Kabushiki Kaisha Method for manufacturing a fine-patterned thick film conductor structure
US4863808A (en) * 1985-09-13 1989-09-05 Gould Inc. Copper-chromium-polyimide composite
DE3576900D1 (de) * 1985-12-30 1990-05-03 Ibm Deutschland Verfahren zum herstellen von gedruckten schaltungen.
JPH108694A (ja) * 1996-06-24 1998-01-13 Matsushita Electric Works Ltd 床 材
JPH1124286A (ja) * 1997-07-02 1999-01-29 Citizen Watch Co Ltd 感光性樹脂のパターン形成方法

Also Published As

Publication number Publication date
AU7653791A (en) 1992-03-17
BR9105877A (pt) 1992-11-17
EP0497925A4 (en) 1993-03-17
HU208715B (en) 1993-12-28
EP0497925A1 (de) 1992-08-12
EP0497925B1 (de) 1996-07-31
WO1992003599A1 (en) 1992-03-05
DE69121183T2 (de) 1996-12-05
KR920702440A (ko) 1992-09-04
HUT62042A (en) 1993-03-29
AU649666B2 (en) 1994-06-02
JPH05504658A (ja) 1993-07-15
FI921810A0 (fi) 1992-04-23
FI921810A (fi) 1992-04-23
US5017271A (en) 1991-05-21

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Legal Events

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