DE68923318T2 - Photosensitive Zusammensetzungen und Materialien. - Google Patents

Photosensitive Zusammensetzungen und Materialien.

Info

Publication number
DE68923318T2
DE68923318T2 DE68923318T DE68923318T DE68923318T2 DE 68923318 T2 DE68923318 T2 DE 68923318T2 DE 68923318 T DE68923318 T DE 68923318T DE 68923318 T DE68923318 T DE 68923318T DE 68923318 T2 DE68923318 T2 DE 68923318T2
Authority
DE
Germany
Prior art keywords
materials
photosensitive compositions
photosensitive
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68923318T
Other languages
English (en)
Other versions
DE68923318D1 (de
Inventor
Peter Gottschalk
Gary Benjamin Schuster
Douglas Carlyle Neckers
Paul C Adair
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mead Corp
Original Assignee
Mead Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mead Corp filed Critical Mead Corp
Application granted granted Critical
Publication of DE68923318D1 publication Critical patent/DE68923318D1/de
Publication of DE68923318T2 publication Critical patent/DE68923318T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/30—Compositions for temporarily or permanently fixing teeth or palates, e.g. primers for dental adhesives
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
    • A61K6/62—Photochemical radical initiators
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
    • A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
    • A61K6/887—Compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00—Dental prostheses; Making same
    • A61C13/0003—Making bridge-work, inlays, implants or the like
    • A61C13/0006—Production methods
    • A61C13/0013—Production methods using stereolithographic techniques
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00—Dental auxiliary appliances
    • A61C19/003—Apparatus for curing resins by radiation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing
DE68923318T 1988-04-13 1989-04-13 Photosensitive Zusammensetzungen und Materialien. Expired - Fee Related DE68923318T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/180,915 US4977511A (en) 1985-11-20 1988-04-13 Photosensitive materials containing ionic dye compound as initiators

Publications (2)

Publication Number Publication Date
DE68923318D1 DE68923318D1 (de) 1995-08-10
DE68923318T2 true DE68923318T2 (de) 1996-02-08

Family

ID=22662184

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68923318T Expired - Fee Related DE68923318T2 (de) 1988-04-13 1989-04-13 Photosensitive Zusammensetzungen und Materialien.

Country Status (5)

Country Link
US (1) US4977511A (de)
EP (1) EP0339841B1 (de)
JP (3) JPH0211607A (de)
KR (1) KR890016422A (de)
DE (1) DE68923318T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009031889B4 (de) 2008-10-01 2019-03-21 Kabushiki Kaisha Shofu Set von mischbaren und Farbton frei reproduzierbaren Dentalfärbematerialzusammensetzungen und Verfahren hierzu

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5216616A (en) * 1989-06-26 1993-06-01 Masters William E System and method for computer automated manufacture with reduced object shape distortion
KR910003446A (ko) * 1989-07-07 1991-02-27 데이비드 엘. 산테즈 염료-할로페닐 보레이트 광개시제
DE3939998A1 (de) * 1989-12-02 1991-06-06 Ivoclar Ag Verfahren zur optischen unterscheidung eines dentalwerkstoffes sowie dentalwerkstoff dafuer
JP2677457B2 (ja) * 1991-01-22 1997-11-17 日本ペイント株式会社 光重合性組成物
US5230986A (en) * 1991-02-01 1993-07-27 Stereographics Limited Partnership Photosensitive compositions containing benzospiropyrans and uses thereof
FR2678748B1 (fr) * 1991-07-05 1997-05-16 Centre Nat Etd Spatiales Compositions photopolymerisables, sensibles dans le rouge, utiles pour l'enregistrement d'hologrammes de phase.
ES2060537B1 (es) * 1992-12-22 1995-06-16 Univ Alicante Composiciones fotopolimerizables sensibles a la luz visible y materiales de registro obtenidos a partir de las mismas.
JP2558431B2 (ja) * 1993-01-15 1996-11-27 ストラタシイス，インコーポレイテッド ３次元構造体を製造するシステムを作動する方法及び３次元構造体製造装置
US5775870A (en) * 1995-08-03 1998-07-07 Hogan; Sherman David Vehicle side tilting apparatus
JP3882147B2 (ja) * 1995-09-09 2007-02-14 バンティコ リミテッド 選択的に彩色された領域を有するポリマー層を製造する方法
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
WO1997023191A1 (fr) * 1995-12-22 1997-07-03 Tokuyama Corporation Composition d'agent de decapage dentaire et catalyseur de polymerisation
JPH09274315A (ja) * 1996-04-09 1997-10-21 Brother Ind Ltd 感光記録媒体
US5922783A (en) 1997-02-27 1999-07-13 Loctite Corporation Radiation-curable, cyanoacrylate-containing compositions
JPH11202484A (ja) * 1998-01-16 1999-07-30 Brother Ind Ltd 画像形成媒体
AU756080B2 (en) 1998-06-04 2003-01-02 New York University Endovascular thin film devices and methods for treating and preventing stroke
US6932145B2 (en) 1998-11-20 2005-08-23 Rolls-Royce Corporation Method and apparatus for production of a cast component
US7418993B2 (en) 1998-11-20 2008-09-02 Rolls-Royce Corporation Method and apparatus for production of a cast component
US6971875B2 (en) 1999-09-24 2005-12-06 Cao Group, Inc. Dental curing light
US6979193B2 (en) 1999-09-24 2005-12-27 Cao Group, Inc. Curing light
US6955537B2 (en) 1999-09-24 2005-10-18 Cao Group, Inc. Light for use in activating light-activated materials, the light having a plurality of light emitting semiconductor chips emitting light of differing peak wavelengths to provide a wide light spectrum profile
US6926524B2 (en) 1999-09-24 2005-08-09 Cao Group, Inc. Curing light
US6929472B2 (en) 1999-09-24 2005-08-16 Cao Group, Inc. Curing light
US6780010B2 (en) 1999-09-24 2004-08-24 Cao Group, Inc. Curing light
US6910886B2 (en) 1999-09-24 2005-06-28 Cao Group, Inc. Curing light
US6719558B2 (en) 1999-09-24 2004-04-13 Densen Cao Curing light
US6974319B2 (en) 1999-09-24 2005-12-13 Cao Group, Inc. Curing light
US6755649B2 (en) 1999-09-24 2004-06-29 Cao Group, Inc. Curing light
US7077648B2 (en) 1999-09-24 2006-07-18 Cao Group, Inc. Curing light
US6988891B2 (en) 1999-09-24 2006-01-24 Cao Group, Inc. Curing light
US6824294B2 (en) 1999-09-24 2004-11-30 Cao Group, Inc. Light for use in activating light-activated materials, the light having a plurality of chips mounted in a gross well of a heat sink, and a dome covering the chips
US7294364B2 (en) 1999-09-24 2007-11-13 Cao Group, Inc. Method for curing composite materials
US7066732B2 (en) 1999-09-24 2006-06-27 Cao Group, Inc. Method for curing light-curable materials
US6719559B2 (en) 1999-09-24 2004-04-13 Densen Cao Curing light
US6755648B2 (en) 1999-09-24 2004-06-29 Cao Group, Inc. Curing light
US6981867B2 (en) 1999-09-24 2006-01-03 Cao Group, Inc. Curing light
US6988890B2 (en) 1999-09-24 2006-01-24 Cao Group, Inc. Curing light
US6971876B2 (en) 1999-09-24 2005-12-06 Cao Group, Inc. Curing light
US6932600B2 (en) 1999-09-24 2005-08-23 Cao Group, Inc. Curing light
US7108504B2 (en) 2001-07-10 2006-09-19 Cao Group, Inc. Light for use in activating light-activated materials, the light having insulators and an air jacket
US6799967B2 (en) 2001-07-10 2004-10-05 Cao Group, Inc. Light for use in activating light-activated materials, the light having a plurality of light emitting single chip arrays
JP2004287138A (ja) * 2003-03-24 2004-10-14 Konica Minolta Holdings Inc ホログラフィック記録用組成物、ホログラフィック記録メディア及びその記録方法
JP2005309359A (ja) * 2004-03-25 2005-11-04 Fuji Photo Film Co Ltd ホログラム記録材料、ホログラム記録方法、光記録媒体、３次元ディスプレイホログラムおよびホログラフィック光学素子。
JP4649158B2 (ja) * 2004-09-30 2011-03-09 富士フイルム株式会社 ホログラム記録方法
WO2006086559A1 (en) * 2005-02-08 2006-08-17 Dentsply International Inc. Self-cure activator
JP2006235386A (ja) * 2005-02-25 2006-09-07 Fuji Photo Film Co Ltd ホログラム記録材料およびこれを用いた光記録媒体
CN100363419C (zh) * 2005-07-06 2008-01-23 李岩青 辐射能固化有机无机纳米杂化复合材料及产品的合成方法
DE102007001862A1 (de) 2007-01-12 2008-07-17 Clariant International Ltd. Flammwidrige Harzformulierung und ihre Verwendung
EP2116527A4 (de) 2007-01-23 2011-09-14 Fujifilm Corp Oximverbindung, photosensible zusammensetzung, farbfilter, verfahren zur herstellung des farbfilters und flüssigkristallanzeigeelement
JP5535064B2 (ja) 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
CN102702073B (zh) 2007-05-11 2015-06-10 巴斯夫欧洲公司 肟酯光引发剂
US8052829B2 (en) 2007-10-26 2011-11-08 Dymax Corporation Photopolymerizable compositions containing an oxonol dye
CN105175315B (zh) 2009-03-23 2018-08-28 巴斯夫欧洲公司 光致抗蚀剂组合物
EP2411359B1 (de) 2009-03-24 2017-02-01 Basf Se Neuartige oligofunktionelle fotoinitiatoren
US8906979B2 (en) 2009-07-30 2014-12-09 Basf Se Macrophotoinitiators
AU2010285107A1 (en) 2009-08-21 2012-03-15 Basf Se Apparatus and method for a sub microscopic and optically variable image carrying device
WO2012045736A1 (en) 2010-10-05 2012-04-12 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
WO2012101245A1 (en) 2011-01-28 2012-08-02 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
US9078815B2 (en) 2011-07-13 2015-07-14 Dentsply International Inc. Self-cure activator
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
KR102013541B1 (ko) 2012-05-09 2019-08-22 바스프 에스이 옥심 에스테르 광개시제
WO2014060450A1 (en) 2012-10-19 2014-04-24 Basf Se Hybrid photoinitiators
BR112015010983B8 (pt) * 2012-11-14 2021-04-13 Dentsply Int Inc método para produzir uma prótese dentária tridimensional por uma impressora 3d baseada em um método dlp (processador de luz digital) ou estereolitografia
JP6161089B2 (ja) 2012-12-18 2017-07-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ ナフタレンジイミド−ビニレン−オリゴチオフェン−ビニレンポリマーに基づく半導体材料
CN110845530A (zh) 2012-12-19 2020-02-28 Igm集团公司 双酰基次膦酸的衍生物、其制备及其作为光敏引发剂的用途
ES2720726T3 (es) 2013-07-08 2019-07-24 Igm Group B V Fotoiniciador líquido de óxido de bisacilfosfina
CN105358527B (zh) 2013-07-08 2018-09-25 巴斯夫欧洲公司 肟酯光引发剂
KR102282647B1 (ko) 2013-09-10 2021-07-28 바스프 에스이 옥심 에스테르 광개시제
ITMI20132131A1 (it) * 2013-12-19 2015-06-20 Heraeus Kulzer Gmbh Procedimento di stratificazione sopra un'interfaccia sagomata per la realizzazione di sovrastrutture di tipo migliorato per protesi e sovrastruttura per protesi dentale realizzata con questo procedimento
CN106604912A (zh) 2014-08-29 2017-04-26 巴斯夫欧洲公司 肟磺酸酯衍生物
JP6449445B2 (ja) 2014-09-04 2019-01-09 アイ ジー エム マルタ リミテッド 多環式光開始剤
JP6940410B2 (ja) * 2015-03-19 2021-09-29 ダウ グローバル テクノロジーズ エルエルシー 光規制ラジカル重合を使用して付加製造する方法
US9868871B2 (en) * 2015-06-10 2018-01-16 Full Spectrum Laser Water-washable resin formulations for use with 3D printing systems and methods
US11891485B2 (en) * 2015-11-05 2024-02-06 Carbon, Inc. Silicone dual cure resins for additive manufacturing
WO2018041935A1 (en) 2016-09-02 2018-03-08 Igm Group B.V. Polycyclic glyoxylates as photoinitiators
EP3585301B1 (de) 2017-02-22 2024-05-01 Inter-Med, Inc. Vorrichtung zum erwärmen und austragen von dentalmaterial
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
TW202138351A (zh) 2020-03-04 2021-10-16 德商巴地斯顏料化工廠 肟酯光起始劑
CN115461312A (zh) * 2020-03-13 2022-12-09 康宁股份有限公司 多色玻璃陶瓷的低温激光漂白

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3495987A (en) * 1965-09-03 1970-02-17 Du Pont Photopolymerizable products
JPS509178B1 (de) * 1970-12-28 1975-04-10
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
US4399209A (en) * 1981-11-12 1983-08-16 The Mead Corporation Transfer imaging system
US4440846A (en) * 1981-11-12 1984-04-03 Mead Corporation Photocopy sheet employing encapsulated radiation sensitive composition and imaging process
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4450227A (en) * 1982-10-25 1984-05-22 Minnesota Mining And Manufacturing Company Dispersed imaging systems with tetra (hydrocarbyl) borate salts
US4434891A (en) * 1983-03-18 1984-03-06 M.U. Engineering & Mfg., Inc. Disc package
US4608330A (en) * 1983-09-19 1986-08-26 The Mead Corporation Method for producing microcapsules and photosensitive microcapsules produced thereby
US4576891A (en) * 1984-06-15 1986-03-18 The Mead Corporation Photosensitive microcapsules useful in polychromatic imaging having radiation absorber
US4587194A (en) * 1984-11-20 1986-05-06 The Mead Corporation Photosensitive material employing microcapsules having different photographic speeds
DE3677527D1 (de) * 1985-11-20 1991-03-21 Mead Corp Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien.
US4772541A (en) * 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4895880A (en) * 1986-05-06 1990-01-23 The Mead Corporation Photocurable compositions containing photobleachable ionic dye complexes
GB8806527D0 (en) * 1988-03-18 1988-04-20 Ward Blenkinsop & Co Ltd Benzophenone derivatives

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009031889B4 (de) 2008-10-01 2019-03-21 Kabushiki Kaisha Shofu Set von mischbaren und Farbton frei reproduzierbaren Dentalfärbematerialzusammensetzungen und Verfahren hierzu

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EP0339841B1 (de) 1995-07-05
JPH10265317A (ja) 1998-10-06
US4977511A (en) 1990-12-11
EP0339841A2 (de) 1989-11-02
DE68923318D1 (de) 1995-08-10
JPH0211607A (ja) 1990-01-16
KR890016422A (ko) 1989-11-29
EP0339841A3 (en) 1990-04-11
JP2000003123A (ja) 2000-01-07

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