DE68921585T2 - Photoinitiatoren mit Sulphonium-Gruppen für die freie radikale Polymerisation. - Google Patents
Photoinitiatoren mit Sulphonium-Gruppen für die freie radikale Polymerisation.Info
- Publication number
- DE68921585T2 DE68921585T2 DE68921585T DE68921585T DE68921585T2 DE 68921585 T2 DE68921585 T2 DE 68921585T2 DE 68921585 T DE68921585 T DE 68921585T DE 68921585 T DE68921585 T DE 68921585T DE 68921585 T2 DE68921585 T2 DE 68921585T2
- Authority
- DE
- Germany
- Prior art keywords
- photoinitiators
- free radical
- radical polymerization
- sulphonium group
- sulphonium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical group S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 title 1
- 238000010526 radical polymerization reaction Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/096—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/112—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/287,909 US4954416A (en) | 1988-12-21 | 1988-12-21 | Tethered sulfonium salt photoinitiators for free radical polymerization |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE68921585D1 DE68921585D1 (de) | 1995-04-13 |
| DE68921585T2 true DE68921585T2 (de) | 1995-10-12 |
Family
ID=23104892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE68921585T Expired - Fee Related DE68921585T2 (de) | 1988-12-21 | 1989-11-22 | Photoinitiatoren mit Sulphonium-Gruppen für die freie radikale Polymerisation. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4954416A (de) |
| EP (1) | EP0375160B1 (de) |
| JP (1) | JPH02242803A (de) |
| CA (1) | CA2003569A1 (de) |
| DE (1) | DE68921585T2 (de) |
Families Citing this family (93)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5141969A (en) * | 1988-11-21 | 1992-08-25 | Eastman Kodak Company | Onium salts and the use thereof as photoinitiators |
| JP2599007B2 (ja) * | 1989-11-13 | 1997-04-09 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
| US5089374A (en) * | 1990-08-20 | 1992-02-18 | Eastman Kodak Company | Novel bis-onium salts and the use thereof as photoinitiators |
| JPH04113362A (ja) * | 1990-09-03 | 1992-04-14 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| US5500453A (en) * | 1992-02-07 | 1996-03-19 | Toyo Ink Manufacturing Co., Ltd. | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition |
| US5302757A (en) * | 1992-09-14 | 1994-04-12 | Eastman Kodak Company | Ultraviolet light sensitive onium salts |
| US5380923A (en) * | 1993-04-29 | 1995-01-10 | Minnesota Mining And Manufacturing Company | Polymeric sulfonium salts and method of preparation thereof |
| US5354689A (en) * | 1993-05-10 | 1994-10-11 | The United States Of America As Represented By The Department Of Health And Human Services | Method of detecting isocyanates |
| US5502083A (en) * | 1993-06-18 | 1996-03-26 | Nippon Kayaku Kabushiki Kaisha | Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product |
| US5539100A (en) * | 1993-07-01 | 1996-07-23 | The United States Of America As Represented By The United States Department Of Energy | Organic solid state switches incorporating porphyrin compounds and method for producing organic solid state optical switches |
| US6211383B1 (en) | 1993-08-05 | 2001-04-03 | Kimberly-Clark Worldwide, Inc. | Nohr-McDonald elimination reaction |
| US5643356A (en) | 1993-08-05 | 1997-07-01 | Kimberly-Clark Corporation | Ink for ink jet printers |
| US5721287A (en) | 1993-08-05 | 1998-02-24 | Kimberly-Clark Worldwide, Inc. | Method of mutating a colorant by irradiation |
| US5681380A (en) | 1995-06-05 | 1997-10-28 | Kimberly-Clark Worldwide, Inc. | Ink for ink jet printers |
| US5773182A (en) | 1993-08-05 | 1998-06-30 | Kimberly-Clark Worldwide, Inc. | Method of light stabilizing a colorant |
| US5865471A (en) | 1993-08-05 | 1999-02-02 | Kimberly-Clark Worldwide, Inc. | Photo-erasable data processing forms |
| US5700850A (en) | 1993-08-05 | 1997-12-23 | Kimberly-Clark Worldwide | Colorant compositions and colorant stabilizers |
| CA2120838A1 (en) | 1993-08-05 | 1995-02-06 | Ronald Sinclair Nohr | Solid colored composition mutable by ultraviolet radiation |
| US6017661A (en) | 1994-11-09 | 2000-01-25 | Kimberly-Clark Corporation | Temporary marking using photoerasable colorants |
| US5733693A (en) | 1993-08-05 | 1998-03-31 | Kimberly-Clark Worldwide, Inc. | Method for improving the readability of data processing forms |
| US6017471A (en) | 1993-08-05 | 2000-01-25 | Kimberly-Clark Worldwide, Inc. | Colorants and colorant modifiers |
| US5645964A (en) | 1993-08-05 | 1997-07-08 | Kimberly-Clark Corporation | Digital information recording media and method of using same |
| US5739175A (en) | 1995-06-05 | 1998-04-14 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer |
| US6071979A (en) | 1994-06-30 | 2000-06-06 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition method of generating a reactive species and applications therefor |
| US5685754A (en) * | 1994-06-30 | 1997-11-11 | Kimberly-Clark Corporation | Method of generating a reactive species and polymer coating applications therefor |
| US6242057B1 (en) | 1994-06-30 | 2001-06-05 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition and applications therefor |
| US6008268A (en) | 1994-10-21 | 1999-12-28 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition, method of generating a reactive species, and applications therefor |
| US5811199A (en) | 1995-06-05 | 1998-09-22 | Kimberly-Clark Worldwide, Inc. | Adhesive compositions containing a photoreactor composition |
| US5786132A (en) | 1995-06-05 | 1998-07-28 | Kimberly-Clark Corporation | Pre-dyes, mutable dye compositions, and methods of developing a color |
| US5747550A (en) | 1995-06-05 | 1998-05-05 | Kimberly-Clark Worldwide, Inc. | Method of generating a reactive species and polymerizing an unsaturated polymerizable material |
| US5798015A (en) | 1995-06-05 | 1998-08-25 | Kimberly-Clark Worldwide, Inc. | Method of laminating a structure with adhesive containing a photoreactor composition |
| WO1996039646A1 (en) | 1995-06-05 | 1996-12-12 | Kimberly-Clark Worldwide, Inc. | Novel pre-dyes |
| MX9710016A (es) | 1995-06-28 | 1998-07-31 | Kimberly Clark Co | Colorantes novedosos y modificadores de colorante. |
| US5807937A (en) * | 1995-11-15 | 1998-09-15 | Carnegie Mellon University | Processes based on atom (or group) transfer radical polymerization and novel (co) polymers having useful structures and properties |
| US5855655A (en) | 1996-03-29 | 1999-01-05 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| DE69620428T2 (de) | 1995-11-28 | 2002-11-14 | Kimberly Clark Co | Lichtstabilisierte fabstoffzusammensetzungen |
| US6099628A (en) | 1996-03-29 | 2000-08-08 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5782963A (en) | 1996-03-29 | 1998-07-21 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5891229A (en) | 1996-03-29 | 1999-04-06 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US7125938B2 (en) * | 1997-03-11 | 2006-10-24 | Carnegie Mellon University | Atom or group transfer radical polymerization |
| US6524379B2 (en) | 1997-08-15 | 2003-02-25 | Kimberly-Clark Worldwide, Inc. | Colorants, colorant stabilizers, ink compositions, and improved methods of making the same |
| AU4818299A (en) | 1998-06-03 | 1999-12-20 | Kimberly-Clark Worldwide, Inc. | Novel photoinitiators and applications therefor |
| KR100591999B1 (ko) | 1998-06-03 | 2006-06-22 | 킴벌리-클라크 월드와이드, 인크. | 마이크로에멀젼 기술에 의해 제조된 네오나노플라스트 및잉크젯 프린팅용 잉크 |
| BR9912003A (pt) | 1998-07-20 | 2001-04-10 | Kimberly Clark Co | Composições de tinta para jato de tinta aperfeiçoadas |
| JP2003533548A (ja) | 1998-09-28 | 2003-11-11 | キンバリー クラーク ワールドワイド インコーポレイテッド | 光重合開始剤であるキノイド基を含むキレート |
| WO2000042110A1 (en) | 1999-01-19 | 2000-07-20 | Kimberly-Clark Worldwide, Inc. | Novel colorants, colorant stabilizers, ink compositions, and improved methods of making the same |
| US6331056B1 (en) | 1999-02-25 | 2001-12-18 | Kimberly-Clark Worldwide, Inc. | Printing apparatus and applications therefor |
| AU3919500A (en) | 1999-03-23 | 2000-10-09 | Carnegie Wave Energy Limited | Catalytic processes for the controlled polymerization of free radically (co)polymerizable monomers and functional polymeric systems prepared thereby |
| US6294698B1 (en) | 1999-04-16 | 2001-09-25 | Kimberly-Clark Worldwide, Inc. | Photoinitiators and applications therefor |
| US6368395B1 (en) | 1999-05-24 | 2002-04-09 | Kimberly-Clark Worldwide, Inc. | Subphthalocyanine colorants, ink compositions, and method of making the same |
| US7414081B2 (en) * | 1999-07-27 | 2008-08-19 | Draka Comteq B.V. | Colored, radiation-curable composition |
| US7091257B2 (en) * | 1999-07-27 | 2006-08-15 | Alcatel | Radiation-curable composition with simultaneous color formation during cure |
| US7049373B2 (en) * | 1999-08-06 | 2006-05-23 | Carnegie Mellon University | Process for preparation of graft polymers |
| US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
| US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| US7118845B2 (en) * | 2000-06-15 | 2006-10-10 | 3M Innovative Properties Company | Multiphoton photochemical process and articles preparable thereby |
| JP2004501987A (ja) | 2000-06-19 | 2004-01-22 | キンバリー クラーク ワールドワイド インコーポレイテッド | 新規な光開始剤及びその用途 |
| US7332550B2 (en) * | 2000-10-06 | 2008-02-19 | Carnegie Mellon University | Stabilization of transition metal complexes for catalysis in diverse environments |
| US6790919B2 (en) * | 2000-10-06 | 2004-09-14 | Carnegie Mellon University | Catalyst system for controlled polymerization |
| US7056455B2 (en) * | 2001-04-06 | 2006-06-06 | Carnegie Mellon University | Process for the preparation of nanostructured materials |
| US6596786B2 (en) | 2001-08-17 | 2003-07-22 | Alcatel | Radiation-curable coating composition including oligomeric photoinitiator and/or oligomeric adhesion promoter |
| WO2003031481A2 (en) | 2001-10-12 | 2003-04-17 | Carnegie Mellon University | Simultaneous reverse and normal initiation of atrp |
| AU2002351471A1 (en) * | 2001-10-12 | 2003-04-22 | Carnegie Mellon University | Process for monomer sequence control in polymerizations |
| US20030216528A1 (en) * | 2002-03-13 | 2003-11-20 | Krzysztof Matyjaszewski | Novel (co)polymers and a novel polymerization process based on atom (or group) transfer radical polymerization |
| EP1534764B1 (de) * | 2002-08-09 | 2014-07-16 | Carnegie Mellon University | Polymere, superweichelastomere und verfahren zur herstellung derselben |
| US7030169B2 (en) | 2003-09-26 | 2006-04-18 | 3M Innovative Properties Company | Arylsulfinate salts in initiator systems for polymeric reactions |
| US7064152B2 (en) | 2003-09-26 | 2006-06-20 | 3M Innovative Properties Company | Arylsulfinate salts in photoinitiator systems for polymerization reactions |
| US7026367B2 (en) * | 2003-09-26 | 2006-04-11 | 3M Innovative Properties Company | Photoiniators having triarylsulfonium and arylsulfinate ions |
| US7250452B2 (en) | 2003-09-26 | 2007-07-31 | 3M Innovative Properties Company | Dental compositions and methods with arylsulfinate salts |
| WO2005087819A1 (en) * | 2004-03-05 | 2005-09-22 | Carnegie Mellon University | Atom transfer radical polymerization process |
| WO2005087818A1 (en) * | 2004-03-05 | 2005-09-22 | Carnegie Mellon University | Preparation of functional polymers |
| US20060160916A1 (en) * | 2004-08-13 | 2006-07-20 | Dyer Daniel J | Process for modifying substrates with grafted polymers |
| JP5050336B2 (ja) * | 2005-03-09 | 2012-10-17 | Ｊｓｒ株式会社 | ポジ型感放射線性樹脂組成物 |
| US7323498B2 (en) * | 2005-05-25 | 2008-01-29 | Xerox Corporation | Wax-tethered photoinitiators |
| JP4533799B2 (ja) * | 2005-05-31 | 2010-09-01 | 東洋インキ製造株式会社 | 感光性着色組成物およびカラーフィルタ |
| US8273823B2 (en) | 2005-08-23 | 2012-09-25 | Carnegie Mellon University | Atom transfer radical polymerization in microemulsion and true emulsion polymerization processes |
| DE602006017416D1 (de) * | 2005-08-26 | 2010-11-18 | Univ Carnegie Mellon | Polymerisationsverfahren mit katalysatorreaktivierung |
| JP4946094B2 (ja) * | 2006-03-01 | 2012-06-06 | Ｊｓｒ株式会社 | 新規化合物、それを用いた感放射線性酸発生剤及びポジ型感放射線性樹脂組成物 |
| WO2008057163A2 (en) * | 2006-10-09 | 2008-05-15 | Carnegie Mellon University | Preparation of functional gel particles with a dual crosslink network |
| US8252880B2 (en) * | 2007-05-23 | 2012-08-28 | Carnegie Mellon University | Atom transfer dispersion polymerization |
| GB2463198B (en) * | 2007-05-23 | 2013-05-22 | Univ Carnegie Mellon | Hybrid particle composite structures with reduced scattering |
| WO2010111708A1 (en) | 2009-03-27 | 2010-09-30 | Carnegie Mellon University | Preparation of functional star macromolecules |
| WO2012091965A1 (en) | 2010-12-17 | 2012-07-05 | Carnegie Mellon University | Electrochemically mediated atom transfer radical polymerization |
| US20140275420A1 (en) | 2011-08-22 | 2014-09-18 | Carnegie Mellon University | Atom transfer radical polymerization under biologically compatible conditions |
| US9533297B2 (en) | 2012-02-23 | 2017-01-03 | Carnegie Mellon University | Ligands designed to provide highly active catalyst complexes |
| GB201218352D0 (en) * | 2012-10-12 | 2012-11-28 | Ucl Business Plc | Compounds and their synthesis |
| JP6088827B2 (ja) * | 2013-01-10 | 2017-03-01 | 富士フイルム株式会社 | ネガ型レジスト組成物、それを用いたレジスト膜及びパターン形成方法、並びにレジスト膜を備えたマスクブランクス |
| US9982070B2 (en) | 2015-01-12 | 2018-05-29 | Carnegie Mellon University | Aqueous ATRP in the presence of an activator regenerator |
| JP6998769B2 (ja) * | 2015-10-01 | 2022-01-18 | 東洋合成工業株式会社 | ポリマー、該ポリマーを含有するレジスト組成物及びそれを用いたデバイスの製造方法 |
| WO2018132582A1 (en) | 2017-01-12 | 2018-07-19 | Carnegie Mellon University | Surfactant assisted formation of a catalyst complex for emulsion atom transfer radical polymerization processes |
| CN109456242B (zh) | 2017-09-06 | 2021-02-12 | 常州强力电子新材料股份有限公司 | 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用 |
| CN112300042B (zh) * | 2020-09-27 | 2022-06-07 | 同济大学 | 4-苯并五元环-苯基硫鎓盐类化合物及其制备方法和应用 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
| US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| US4423136A (en) * | 1977-08-05 | 1983-12-27 | General Electric Company | Free radical curable resin compositions containing triarylsulfonium salt |
| DE2966764D1 (en) * | 1978-10-27 | 1984-04-12 | Ici Plc | Polymerisable compositions, derived coatings and other polymerised products |
| US4250053A (en) * | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
| US4245029A (en) * | 1979-08-20 | 1981-01-13 | General Electric Company | Photocurable compositions using triarylsulfonium salts |
| US4250203A (en) * | 1979-08-30 | 1981-02-10 | American Can Company | Cationically polymerizable compositions containing sulfonium salt photoinitiators and odor suppressants and method of polymerization using same |
| US4610952A (en) * | 1983-09-14 | 1986-09-09 | General Electric Company | Photoresist compositions and method |
| JPS61190524A (ja) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
| JPS61212555A (ja) * | 1985-03-15 | 1986-09-20 | Asahi Denka Kogyo Kk | 有機ヒドロキシ化合物残基を有する芳香族スルホニウム塩の製法 |
| US4735632A (en) * | 1987-04-02 | 1988-04-05 | Minnesota Mining And Manufacturing Company | Coated abrasive binder containing ternary photoinitiator system |
-
1988
- 1988-12-21 US US07/287,909 patent/US4954416A/en not_active Expired - Lifetime
-
1989
- 1989-11-22 DE DE68921585T patent/DE68921585T2/de not_active Expired - Fee Related
- 1989-11-22 EP EP89312106A patent/EP0375160B1/de not_active Expired - Lifetime
- 1989-11-22 CA CA002003569A patent/CA2003569A1/en not_active Abandoned
- 1989-12-20 JP JP1330937A patent/JPH02242803A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP0375160B1 (de) | 1995-03-08 |
| JPH02242803A (ja) | 1990-09-27 |
| DE68921585D1 (de) | 1995-04-13 |
| CA2003569A1 (en) | 1990-06-21 |
| US4954416A (en) | 1990-09-04 |
| EP0375160A3 (de) | 1991-04-10 |
| EP0375160A2 (de) | 1990-06-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |