DE68921019T2 - Lichtempfindliche Zusammensetzungen. - Google Patents

Lichtempfindliche Zusammensetzungen.

Info

Publication number
DE68921019T2
DE68921019T2 DE68921019T DE68921019T DE68921019T2 DE 68921019 T2 DE68921019 T2 DE 68921019T2 DE 68921019 T DE68921019 T DE 68921019T DE 68921019 T DE68921019 T DE 68921019T DE 68921019 T2 DE68921019 T2 DE 68921019T2
Authority
DE
Germany
Prior art keywords
photosensitive compositions
photosensitive
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68921019T
Other languages
English (en)
Other versions
DE68921019D1 (de
Inventor
Kouichi C O Fuji Phot Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE68921019D1 publication Critical patent/DE68921019D1/de
Application granted granted Critical
Publication of DE68921019T2 publication Critical patent/DE68921019T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/116Redox or dye sensitizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring
DE68921019T 1988-05-11 1989-05-11 Lichtempfindliche Zusammensetzungen. Expired - Lifetime DE68921019T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11444088 1988-05-11

Publications (2)

Publication Number Publication Date
DE68921019D1 DE68921019D1 (de) 1995-03-23
DE68921019T2 true DE68921019T2 (de) 1995-06-01

Family

ID=14637786

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68921019T Expired - Lifetime DE68921019T2 (de) 1988-05-11 1989-05-11 Lichtempfindliche Zusammensetzungen.

Country Status (4)

Country Link
US (1) US5262276A (de)
EP (1) EP0341720B1 (de)
JP (1) JP2720195B2 (de)
DE (1) DE68921019T2 (de)

Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
US5187045A (en) * 1988-09-07 1993-02-16 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a sensitizer moiety
US5387682A (en) * 1988-09-07 1995-02-07 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a monomeric moiety
CA2034274A1 (en) * 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
DE4132467A1 (de) * 1991-09-30 1993-04-01 Bayer Ag Fotochemisch reaktive initiatoren fuer die radikalische polymerisation
US5219709A (en) * 1992-02-26 1993-06-15 Mitsubishi Kasei Corporation Photopolymerizable composition
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
JPH08101498A (ja) 1994-08-03 1996-04-16 Fuji Photo Film Co Ltd 感光性平版印刷版
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5561029A (en) * 1995-04-28 1996-10-01 Polaroid Corporation Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
SK160497A3 (en) 1995-06-05 1998-06-03 Kimberly Clark Co Novel pre-dyes
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
MX9710016A (es) 1995-06-28 1998-07-31 Kimberly Clark Co Colorantes novedosos y modificadores de colorante.
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
DE69620428T2 (de) 1995-11-28 2002-11-14 Kimberly Clark Co Lichtstabilisierte fabstoffzusammensetzungen
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
JP2002517540A (ja) 1998-06-03 2002-06-18 キンバリー クラーク ワールドワイド インコーポレイテッド インク及びインクジェット印刷用のネオナノプラスト及びマイクロエマルション技術
SK1552000A3 (en) 1998-06-03 2000-08-14 Kimberly Clark Co Novel photoinitiators and applications therefor
BR9912003A (pt) 1998-07-20 2001-04-10 Kimberly Clark Co Composições de tinta para jato de tinta aperfeiçoadas
CA2353685A1 (en) 1998-09-28 2000-04-06 Kimberly-Clark Worldwide, Inc. Chelates comprising chinoid groups as photoinitiators
ES2195869T3 (es) 1999-01-19 2003-12-16 Kimberly Clark Co Nuevos colorantes, estabilizantes de colorantes, compuestos de tinta y metodos mejorados para su fabricacion.
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
US20030092788A1 (en) * 1999-09-17 2003-05-15 Tigran Galstian Near infrared sensitive photopolymerizable composition
US20030091733A1 (en) * 1999-09-17 2003-05-15 Tigran Galstian Near infrared sensitive photopolymerizable composition
US6486227B2 (en) 2000-06-19 2002-11-26 Kimberly-Clark Worldwide, Inc. Zinc-complex photoinitiators and applications therefor
JP2005049608A (ja) * 2003-07-29 2005-02-24 Fuji Photo Film Co Ltd 体積型ホログラム記録用感光性組成物及びそれを用いた体積型ホログラム記録媒体
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
JP2006065074A (ja) 2004-08-27 2006-03-09 Fuji Photo Film Co Ltd 感光性平版印刷版
EP1701213A3 (de) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Lichtempfindliche Zusammensetzung
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
JP2008203573A (ja) * 2007-02-20 2008-09-04 Fujifilm Corp 感光性組成物および2光子吸収光記録媒体
JP2008201913A (ja) * 2007-02-20 2008-09-04 Fujifilm Corp 光重合性組成物
JP5264427B2 (ja) 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
JP5248203B2 (ja) 2008-05-29 2013-07-31 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5228631B2 (ja) 2008-05-29 2013-07-03 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5405141B2 (ja) 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
EP2320274A4 (de) 2008-08-22 2011-12-14 Fujifilm Corp Verfahren zur herstellung einer lithografieplatte
JP5171483B2 (ja) 2008-08-29 2013-03-27 富士フイルム株式会社 平版印刷版の作製方法
US20120295999A1 (en) * 2011-05-16 2012-11-22 Deepak Shukla Photoinitiator and photocurable compositions and uses
EP2757417B1 (de) 2011-09-15 2016-05-25 FUJIFILM Corporation Verfahren zur wiederverwertung von abwasser durch ein plattenherstellungsverfahren
CN103907062B (zh) 2011-11-04 2017-11-28 富士胶片株式会社 制版处理废液的再循环方法
EP2814610B1 (de) 2012-02-17 2020-08-19 Stratec Consumables GmbH Mikrostrukturierte polymerbauteile

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3574622A (en) * 1968-10-09 1971-04-13 Eastman Kodak Co Photopolymerization using n-alkoxy heterocyclic initiators
JPS492284B1 (de) * 1969-05-30 1974-01-19
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
JPS492284A (de) * 1972-04-25 1974-01-10
US3962055A (en) * 1974-11-21 1976-06-08 Eastman Kodak Company Photosensitive compositions containing benzothiazole sensitizers
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
FI81916C (fi) * 1983-05-09 1990-12-10 Vickers Plc Foer straolning kaenslig skiva.
JPH0766185B2 (ja) * 1985-09-09 1995-07-19 富士写真フイルム株式会社 感光性組成物
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives
JPS62212643A (ja) * 1986-03-14 1987-09-18 Fuji Photo Film Co Ltd 光重合性組成物
US4895880A (en) * 1986-05-06 1990-01-23 The Mead Corporation Photocurable compositions containing photobleachable ionic dye complexes
US4837128A (en) * 1986-08-08 1989-06-06 Fuji Photo Film Co., Ltd. Light-sensitive composition
JPH0642074B2 (ja) * 1986-09-10 1994-06-01 富士写真フイルム株式会社 感光性組成物
JP2806474B2 (ja) * 1987-07-28 1998-09-30 三菱化学株式会社 感光性組成物
JPH01250945A (ja) * 1988-03-30 1989-10-05 Sumitomo Chem Co Ltd ポジ型レジスト組成物
US5187045A (en) * 1988-09-07 1993-02-16 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a sensitizer moiety

Also Published As

Publication number Publication date
DE68921019D1 (de) 1995-03-23
EP0341720A3 (en) 1990-03-07
EP0341720B1 (de) 1995-02-08
US5262276A (en) 1993-11-16
EP0341720A2 (de) 1989-11-15
JPH0263054A (ja) 1990-03-02
JP2720195B2 (ja) 1998-02-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP