DE60323911D1 - Lithographischer Projektionsapparat und Reflektoranordnung für die Verwendung in diesem Apparat - Google Patents

Lithographischer Projektionsapparat und Reflektoranordnung für die Verwendung in diesem Apparat

Info

Publication number
DE60323911D1
DE60323911D1 DE60323911T DE60323911T DE60323911D1 DE 60323911 D1 DE60323911 D1 DE 60323911D1 DE 60323911 T DE60323911 T DE 60323911T DE 60323911 T DE60323911 T DE 60323911T DE 60323911 D1 DE60323911 D1 DE 60323911D1
Authority
DE
Germany
Prior art keywords
lithographic projection
reflector assembly
projection apparatus
reflector
assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60323911T
Other languages
English (en)
Inventor
Frank Jeroen Pieter Schuurmans
Levinus Pieter Bakker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60323911D1 publication Critical patent/DE60323911D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60323911T 2002-08-27 2003-08-25 Lithographischer Projektionsapparat und Reflektoranordnung für die Verwendung in diesem Apparat Expired - Lifetime DE60323911D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02078528 2002-08-27

Publications (1)

Publication Number Publication Date
DE60323911D1 true DE60323911D1 (de) 2008-11-20

Family

ID=32241326

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60323911T Expired - Lifetime DE60323911D1 (de) 2002-08-27 2003-08-25 Lithographischer Projektionsapparat und Reflektoranordnung für die Verwendung in diesem Apparat

Country Status (7)

Country Link
US (2) US7233009B2 (de)
JP (1) JP3662574B2 (de)
KR (1) KR100589233B1 (de)
CN (1) CN100447671C (de)
DE (1) DE60323911D1 (de)
SG (1) SG129254A1 (de)
TW (1) TWI262362B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6838684B2 (en) * 2002-08-23 2005-01-04 Asml Netherlands B.V. Lithographic projection apparatus and particle barrier for use therein
US7233009B2 (en) * 2002-08-27 2007-06-19 Asml Netherlands B.V. Lithographic projection apparatus and reflector assembly for use therein
SG112034A1 (en) * 2003-11-06 2005-06-29 Asml Netherlands Bv Optical element, lithographic apparatus comprising such optical element and device manufacturing method
WO2005096099A2 (en) * 2004-03-31 2005-10-13 Philips Intellectual Property & Standards Gmbh Removal of particles generated by a radiation source
JP4903691B2 (ja) * 2004-05-06 2012-03-28 カール ツァイス レーザー オプティクス ゲーエムベーハー 熱挙動が改良された光学部品
US8094288B2 (en) 2004-05-11 2012-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7736820B2 (en) * 2006-05-05 2010-06-15 Asml Netherlands B.V. Anti-reflection coating for an EUV mask
DE102008014832A1 (de) 2007-04-19 2008-10-23 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
US7629593B2 (en) * 2007-06-28 2009-12-08 Asml Netherlands B.V. Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
DE102009014701A1 (de) * 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Optische Baugruppe
JP5093267B2 (ja) * 2010-03-11 2012-12-12 ウシオ電機株式会社 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置
KR101853008B1 (ko) 2010-06-25 2018-04-30 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 방법
CN105122140B (zh) * 2013-04-17 2018-06-01 Asml荷兰有限公司 辐射收集器、辐射源以及光刻设备
CN103869633B (zh) * 2014-04-11 2015-08-05 哈尔滨工业大学 极紫外光刻光源收集及照明系统
CN105573346A (zh) * 2014-10-15 2016-05-11 光之源工业(以色列)有限公司 用于定日镜的反射镜
DE102017204312A1 (de) 2016-05-30 2017-11-30 Carl Zeiss Smt Gmbh Optische Wellenlängen-Filterkomponente für ein Lichtbündel
DE102020203750A1 (de) * 2020-03-24 2021-09-30 Carl Zeiss Smt Gmbh Vorrichtung zur Erfassung einer Temperatur, Anlage zur Herstellung eines optischen Elementes und Verfahren zur Herstellung eines optischen Elementes

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4206494A (en) * 1978-09-05 1980-06-03 Gca Corporation High throughput illuminator
AT393334B (de) * 1988-01-22 1991-09-25 Ims Ionen Mikrofab Syst Anordnung zur stabilisierung einer bestrahlten maske
JPH07115512A (ja) * 1993-10-14 1995-05-02 Nikon Corp 光源装置
US5682415A (en) * 1995-10-13 1997-10-28 O'hara; David B. Collimator for x-ray spectroscopy
US6566667B1 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6452199B1 (en) * 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
US6064072A (en) 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US6744060B2 (en) * 1997-05-12 2004-06-01 Cymer, Inc. Pulse power system for extreme ultraviolet and x-ray sources
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6377655B1 (en) * 1998-05-08 2002-04-23 Nikon Corporation Reflective mirror for soft x-ray exposure apparatus
US6621557B2 (en) * 2000-01-13 2003-09-16 Nikon Corporation Projection exposure apparatus and exposure methods
US6285737B1 (en) * 2000-01-21 2001-09-04 Euv Llc Condenser for extreme-UV lithography with discharge source
CN1256628C (zh) * 2001-04-17 2006-05-17 皇家菲利浦电子有限公司 远紫外线可透过的界面结构
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
JP2005505945A (ja) * 2001-10-12 2005-02-24 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ リソグラフィック装置及びデバイス製造方法
US6700127B2 (en) * 2002-01-09 2004-03-02 Biomed Solutions Llc Point source for producing electrons beams
US7233009B2 (en) * 2002-08-27 2007-06-19 Asml Netherlands B.V. Lithographic projection apparatus and reflector assembly for use therein
US7002168B2 (en) * 2002-10-15 2006-02-21 Cymer, Inc. Dense plasma focus radiation source

Also Published As

Publication number Publication date
TW200416492A (en) 2004-09-01
US20040094724A1 (en) 2004-05-20
SG129254A1 (en) 2007-02-26
US20060006350A1 (en) 2006-01-12
US7256407B2 (en) 2007-08-14
US7233009B2 (en) 2007-06-19
KR100589233B1 (ko) 2006-06-14
CN100447671C (zh) 2008-12-31
JP2004134794A (ja) 2004-04-30
CN1495532A (zh) 2004-05-12
KR20040030268A (ko) 2004-04-09
TWI262362B (en) 2006-09-21
JP3662574B2 (ja) 2005-06-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition