DE60217489D1 - Verfahren zur herstellung von vollfarbenen anzeigetafeln - Google Patents

Verfahren zur herstellung von vollfarbenen anzeigetafeln

Info

Publication number
DE60217489D1
DE60217489D1 DE60217489T DE60217489T DE60217489D1 DE 60217489 D1 DE60217489 D1 DE 60217489D1 DE 60217489 T DE60217489 T DE 60217489T DE 60217489 T DE60217489 T DE 60217489T DE 60217489 D1 DE60217489 D1 DE 60217489D1
Authority
DE
Germany
Prior art keywords
color display
producing full
display tables
tables
full
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60217489T
Other languages
English (en)
Other versions
DE60217489T2 (de
Inventor
A Haase
F Baude
C Williams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of DE60217489D1 publication Critical patent/DE60217489D1/de
Publication of DE60217489T2 publication Critical patent/DE60217489T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/125—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers specially adapted for multicolour light emission, e.g. for emitting white light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
DE60217489T 2001-06-21 2002-04-05 Verfahren zur herstellung von vollfarbenen anzeigetafeln Expired - Fee Related DE60217489T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US886447 2001-06-21
US09/886,447 US6791258B2 (en) 2001-06-21 2001-06-21 Organic light emitting full color display panel
PCT/US2002/010591 WO2003001598A1 (en) 2001-06-21 2002-04-05 Method of making full color display panels

Publications (2)

Publication Number Publication Date
DE60217489D1 true DE60217489D1 (de) 2007-02-22
DE60217489T2 DE60217489T2 (de) 2007-10-11

Family

ID=25389063

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60217489T Expired - Fee Related DE60217489T2 (de) 2001-06-21 2002-04-05 Verfahren zur herstellung von vollfarbenen anzeigetafeln

Country Status (5)

Country Link
US (3) US6791258B2 (de)
EP (2) EP1768184A3 (de)
JP (1) JP2004534361A (de)
DE (1) DE60217489T2 (de)
WO (1) WO2003001598A1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1357602A1 (de) * 2002-03-19 2003-10-29 Scheuten Glasgroep Selbstjustierende Serienverschaltung von Dünnschichten und Verfahren zur Herstellung
JP4251553B2 (ja) * 2002-03-29 2009-04-08 パイオニア株式会社 有機エレクトロルミネッセンス素子
US6667215B2 (en) 2002-05-02 2003-12-23 3M Innovative Properties Method of making transistors
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
CN1310270C (zh) * 2003-03-26 2007-04-11 清华大学 一种场发射显示器的制备方法
US20050023974A1 (en) * 2003-08-01 2005-02-03 Universal Display Corporation Protected organic electronic devices and methods for making the same
US20080272985A1 (en) * 2003-12-16 2008-11-06 Koninklijke Philips Electronic, N.V. Display Panel
US7126267B2 (en) * 2004-05-28 2006-10-24 Eastman Kodak Company Tandem OLED having stable intermediate connectors
US20060081184A1 (en) * 2004-10-19 2006-04-20 Yeh Te L Evaporation mask with high precision deposition pattern
WO2006045199A1 (en) * 2004-10-28 2006-05-04 Zheng-Hong Lu Organic light-emitting devices with multiple hole injection layers containing fullerene
US7271111B2 (en) * 2005-06-08 2007-09-18 Advantech Global, Ltd Shadow mask deposition of materials using reconfigurable shadow masks
US7532181B2 (en) * 2005-07-20 2009-05-12 Eastman Kodak Company Visible and invisible image display
JP4777796B2 (ja) * 2006-02-28 2011-09-21 京セラ株式会社 有機ｅｌディスプレイの製造方法
JP2007257897A (ja) * 2006-03-20 2007-10-04 Seiko Epson Corp 発光素子の製造方法、発光装置の製造方法および電子機器の製造方法
JP2007266160A (ja) * 2006-03-28 2007-10-11 Canon Inc 有機発光素子アレイ
JP5013048B2 (ja) * 2006-04-06 2012-08-29 ソニー株式会社 赤色有機発光素子およびこれを備えた表示装置
TWI303499B (en) * 2006-05-30 2008-11-21 Au Optronics Corp Full-color organic electroluminescence panel and method of fabricating the same
US20080117362A1 (en) * 2006-11-21 2008-05-22 3M Innovative Properties Company Organic Light Emitting Diode Devices With Optical Microstructures
KR100796620B1 (ko) 2007-01-10 2008-01-22 삼성에스디아이 주식회사 유기전계발광표시장치 및 그의 제조 방법
TWI343648B (en) * 2007-04-19 2011-06-11 Au Optronics Corp Organic electroluminescent structure and method of making the same
KR100994118B1 (ko) 2009-01-13 2010-11-15 삼성모바일디스플레이주식회사 유기 발광 소자 및 그 제조 방법
TW201123957A (en) * 2009-12-17 2011-07-01 Au Optronics Corp Light-emitting apparatus, pixel structure, contact structure and method for fabricting the same
KR101193186B1 (ko) * 2010-02-01 2012-10-19 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
JP6366100B2 (ja) 2012-03-30 2018-08-01 Ｎｅｃライティング株式会社 有機エレクトロルミネッセンス照明パネル、その製造方法及び有機エレクトロルミネッセンス照明装置
KR101975020B1 (ko) 2012-04-24 2019-05-07 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR101950836B1 (ko) * 2012-05-22 2019-02-22 엘지디스플레이 주식회사 유기 발광 소자 및 그의 제조 방법
DE102013110037B4 (de) 2013-09-12 2018-05-09 Osram Oled Gmbh Verfahren zum Herstellen eines optoelektronischen Bauelementes
KR20150031819A (ko) * 2013-09-17 2015-03-25 삼성디스플레이 주식회사 박막 증착방법 및 그를 이용한 유기전계발광 표시장치의 제조방법
KR102283853B1 (ko) * 2013-12-24 2021-07-29 엘지디스플레이 주식회사 유기발광표시장치 및 그 제조방법
KR102501705B1 (ko) * 2017-03-24 2023-02-21 삼성디스플레이 주식회사 투명 표시 패널 및 이를 포함하는 표시 장치
WO2021092759A1 (zh) * 2019-11-12 2021-05-20 京东方科技集团股份有限公司 掩模板

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5294870A (en) 1991-12-30 1994-03-15 Eastman Kodak Company Organic electroluminescent multicolor image display device
US5294869A (en) 1991-12-30 1994-03-15 Eastman Kodak Company Organic electroluminescent multicolor image display device
DE4241045C1 (de) * 1992-12-05 1994-05-26 Bosch Gmbh Robert Verfahren zum anisotropen Ätzen von Silicium
JP3451680B2 (ja) * 1993-11-15 2003-09-29 三菱化学株式会社 有機電界発光素子
FR2730240A1 (fr) * 1995-02-07 1996-08-09 Atochem Elf Sa Stabilisation d'un polymere par un radical libre stable
US5641611A (en) * 1995-08-21 1997-06-24 Motorola Method of fabricating organic LED matrices
KR980005265A (ko) * 1996-06-06 1998-03-30 빈센트 비. 인그라시아 정공수송층으로 부터 방출되는 유기 전자발광장치
US6037712A (en) 1996-06-10 2000-03-14 Tdk Corporation Organic electroluminescence display device and producing method thereof
JP2833605B2 (ja) * 1997-02-07 1998-12-09 日本電気株式会社 発光ディスプレイの製造方法
JP3760556B2 (ja) * 1997-04-07 2006-03-29 三菱化学株式会社 有機電界発光素子
JPH10319870A (ja) 1997-05-15 1998-12-04 Nec Corp シャドウマスク及びこれを用いたカラー薄膜ｅｌ表示装置の製造方法
JP3206646B2 (ja) * 1998-01-22 2001-09-10 日本電気株式会社 多色発光有機ｅｌパネルおよびその製造方法
GB9817745D0 (en) 1998-08-15 1998-10-14 Philips Electronics Nv Manufacture of electronic devices comprising thin-film circuit elements
JP2000132762A (ja) 1998-10-27 2000-05-12 Matsushita Electric Works Ltd 受光量表示ユニット付き光電式分離型感知器及び波形確認端子ユニット付き光電式分離型感知器
US6384529B2 (en) 1998-11-18 2002-05-07 Eastman Kodak Company Full color active matrix organic electroluminescent display panel having an integrated shadow mask
JP3641963B2 (ja) * 1999-02-15 2005-04-27 双葉電子工業株式会社 有機ｅｌ素子とその製造方法
US6310360B1 (en) * 1999-07-21 2001-10-30 The Trustees Of Princeton University Intersystem crossing agents for efficient utilization of excitons in organic light emitting devices
WO2001080319A2 (en) * 2000-04-14 2001-10-25 Emagin Corporation Improved method of fabrication of color changing medium layers in organic light emitting devices resulting in improved light extraction
JP4053209B2 (ja) 2000-05-01 2008-02-27 三星エスディアイ株式会社 有機ｅｌディスプレイの製造方法
US6244448B1 (en) * 2000-05-03 2001-06-12 Enzo Hang Bathroom bracket free of installation
TW451601B (en) * 2000-08-07 2001-08-21 Ind Tech Res Inst The fabrication method of full color organic electroluminescent device

Also Published As

Publication number Publication date
US20040217699A1 (en) 2004-11-04
DE60217489T2 (de) 2007-10-11
JP2004534361A (ja) 2004-11-11
EP1768184A2 (de) 2007-03-28
EP1399967B1 (de) 2007-01-10
US20020195929A1 (en) 2002-12-26
EP1399967A1 (de) 2004-03-24
EP1768184A3 (de) 2008-04-30
WO2003001598A1 (en) 2003-01-03
US6791258B2 (en) 2004-09-14
US20050208205A1 (en) 2005-09-22
US6965198B2 (en) 2005-11-15

Similar Documents

Publication Publication Date Title
DE60217489D1 (de) Verfahren zur herstellung von vollfarbenen anzeigetafeln
DE60221399D1 (de) Verfahren zur herstellung von mitteldistillaten
ATE403641T1 (de) Verfahren zur herstellung von o- desmethylvenlafaxin
ATE364497T1 (de) Verfahren zur herstellung von verbindungsprofilen
ATE468309T1 (de) Verfahren zur herstellung von olefinen
DE60230908D1 (de) Verfahren zur herstellung von polyarylenethern
ATE382631T1 (de) Verfahren zur herstellung von virusinaktiviertem humanem gammaglobulin g
DE50201891D1 (de) Verfahren zur herstellung von 1-octen
DE60223070D1 (de) Verfahren zur herstellung von dihalogenadamantanen
ATE374463T1 (de) Verfahren zur herstellung von oxazolidinonen
DE60225539D1 (de) Verfahren zur kontinuierlichen herstellung von polyarylensulfid
ATE315099T1 (de) Verfahren zur herstellung von tagatose
DE60208738D1 (de) Verfahren zur Herstellung von Chlorfluorpolyoxyalkylenolen
ATE316959T1 (de) Verfahren zur herstellung von 2- halogenpyridincarbonsäureamiden
ATE316518T1 (de) Verfahren zur herstellung von (r)-2-alkyl-3- phenyl-1-propanolen
DE60236754D1 (de) Verfahren zur herstellung von polyoxyalkylenpolyetherprodukten
ATE506351T1 (de) Verfahren zur herstellung von 10,11-dihydro-10- oxo-5h-dibenzoäb,füazepin-5-carboxamid
ATE441662T1 (de) Verfahren zur herstellung von echinocandinderivaten
ATE360610T1 (de) Verfahren zur herstellung von cilastatin
DE60210911D1 (de) Verfahren zur Herstellung von dehnungserfassenden Vorrichtungen
ATE273315T1 (de) Verfahren zur herstellung von n- phosphonomethyliminodiessigsäure
DE50303611D1 (de) Verfahren zur herstellung von polyisobuten
DE50200870D1 (de) Verfahren zur herstellung von hydroxyalkylpolysiloxanen
DE50210487D1 (de) Verfahren zur Herstellung von 1-Amino-4-hydroxyanthrachinonen
ATE402138T1 (de) Verfahren zur herstellung von 2- aminoindanderivaten

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee