DE60116143D1 - Mikroreplicationsharz mit hohem brechungsindex - Google Patents
Mikroreplicationsharz mit hohem brechungsindexInfo
- Publication number
- DE60116143D1 DE60116143D1 DE60116143T DE60116143T DE60116143D1 DE 60116143 D1 DE60116143 D1 DE 60116143D1 DE 60116143 T DE60116143 T DE 60116143T DE 60116143 T DE60116143 T DE 60116143T DE 60116143 D1 DE60116143 D1 DE 60116143D1
- Authority
- DE
- Germany
- Prior art keywords
- sup
- methyl
- sub
- hydrogen
- microreplication
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F128/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
- C08F128/02—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
- C08F228/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31573—Next to addition polymer of ethylenically unsaturated monomer
- Y10T428/31576—Ester monomer type [polyvinylacetate, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31645—Next to addition polymer from unsaturated monomers
- Y10T428/31649—Ester, halide or nitrile of addition polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
- Y10T428/31797—Next to addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/3188—Next to cellulosic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31909—Next to second addition polymer from unsaturated monomers
- Y10T428/31913—Monoolefin polymer
- Y10T428/31917—Next to polyene polymer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Pens And Brushes (AREA)
- Dental Preparations (AREA)
- Laminated Bodies (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US746613 | 1985-06-19 | ||
US09/746,613 US6541591B2 (en) | 2000-12-21 | 2000-12-21 | High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers |
PCT/US2001/014040 WO2002051892A1 (en) | 2000-12-21 | 2001-05-01 | High refractive index microreplication resin |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60116143D1 true DE60116143D1 (de) | 2006-01-26 |
DE60116143T2 DE60116143T2 (de) | 2006-08-03 |
Family
ID=25001587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60116143T Expired - Fee Related DE60116143T2 (de) | 2000-12-21 | 2001-05-01 | Mikroreplicationsharz mit hohem brechungsindex |
Country Status (8)
Country | Link |
---|---|
US (2) | US6541591B2 (de) |
EP (1) | EP1352000B1 (de) |
JP (1) | JP2004516367A (de) |
KR (1) | KR100727501B1 (de) |
CN (1) | CN1226321C (de) |
AT (1) | ATE313572T1 (de) |
DE (1) | DE60116143T2 (de) |
WO (1) | WO2002051892A1 (de) |
Families Citing this family (88)
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US6663978B1 (en) * | 2000-06-28 | 2003-12-16 | 3M Innovative Properties Company | High refractive index pressure-sensitive adhesives |
DE60139620D1 (de) * | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
JP4786858B2 (ja) * | 2000-06-15 | 2011-10-05 | スリーエム イノベイティブ プロパティズ カンパニー | 封入光学素子を提供するための多光子硬化 |
EP1292852B1 (de) * | 2000-06-15 | 2005-11-09 | 3M Innovative Properties Company | Mikroherstellungsverfahren für organische optische bauteile |
KR100811017B1 (ko) * | 2000-06-15 | 2008-03-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 다중방향성 광반응성 흡수 방법 |
AU2001269837A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Process for producing microfluidic articles |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
WO2001096952A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
US7166686B2 (en) * | 2000-06-28 | 2007-01-23 | 3M Innovative Properties Company | High refractive index pressure-sensitive adhesives |
TWI245034B (en) * | 2000-07-24 | 2005-12-11 | Matsushita Electric Ind Co Ltd | Capacitor |
US7404825B2 (en) * | 2001-06-11 | 2008-07-29 | Herrick Ii Robert S | Implant capable of forming a differential image in an eye |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US6692201B2 (en) * | 2002-01-28 | 2004-02-17 | Richard Soderman | Portable drill press |
US7125131B2 (en) * | 2002-12-06 | 2006-10-24 | General Electric Company | Brightness enhancement film with improved view angle |
US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
GB0304011D0 (en) * | 2003-02-21 | 2003-03-26 | Microsharp Corp Ltd | High refractive index material |
US20060056031A1 (en) * | 2004-09-10 | 2006-03-16 | Capaldo Kevin P | Brightness enhancement film, and methods of making and using the same |
US20050037240A1 (en) * | 2003-03-31 | 2005-02-17 | Daisaku Haoto | Protective coat and method for manufacturing thereof |
US7046439B2 (en) * | 2003-05-22 | 2006-05-16 | Eastman Kodak Company | Optical element with nanoparticles |
DE602004003377T2 (de) * | 2003-05-27 | 2007-10-18 | General Electric Co. | Härtbare (meth)acrylatmassen |
US6833391B1 (en) | 2003-05-27 | 2004-12-21 | General Electric Company | Curable (meth)acrylate compositions |
US7271283B2 (en) * | 2003-08-29 | 2007-09-18 | General Electric Company | High refractive index, UV-curable monomers and coating compositions prepared therefrom |
US7045558B2 (en) | 2003-08-29 | 2006-05-16 | General Electric Company | Method of making a high refractive index optical management coating and the coating |
US7282272B2 (en) | 2003-09-12 | 2007-10-16 | 3M Innovative Properties Company | Polymerizable compositions comprising nanoparticles |
US7289202B2 (en) * | 2004-09-10 | 2007-10-30 | 3M Innovative Properties Company | Methods for testing durable optical elements |
US7074463B2 (en) * | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
US6844417B1 (en) * | 2003-09-19 | 2005-01-18 | General Electric Company | Brominated polycarbonate films |
TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板,其製造方法,液晶顯示元件,液晶顯示裝置,及影像顯示裝置 |
US20050148735A1 (en) * | 2003-12-30 | 2005-07-07 | Olson David B. | Polymerizable composition for optical articles |
US20050147838A1 (en) * | 2003-12-30 | 2005-07-07 | 3M Innovative Properties Company | Polymerizable compositions for optical articles |
JP4961744B2 (ja) * | 2004-02-17 | 2012-06-27 | 東亞合成株式会社 | 活性エネルギー線硬化型光学材料用組成物 |
KR101245946B1 (ko) * | 2004-06-17 | 2013-03-21 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 광학 필름, 어셈블리 및 디스플레이 장치 |
TWI317444B (en) * | 2004-09-03 | 2009-11-21 | Eternal Chemical Co Ltd | Optical film having high hardness and use thereof |
CN100476534C (zh) * | 2004-09-08 | 2009-04-08 | 长兴化学工业股份有限公司 | 高硬度光学膜及其用途 |
US7341784B2 (en) * | 2004-09-10 | 2008-03-11 | General Electric Company | Light management film and its preparation and use |
WO2006137884A2 (en) * | 2004-09-28 | 2006-12-28 | Brewer, Science Inc. | Curable high refractive index resins for optoelectronic applications |
US20060105483A1 (en) * | 2004-11-18 | 2006-05-18 | Leatherdale Catherine A | Encapsulated light emitting diodes and methods of making |
GB0427607D0 (en) * | 2004-12-16 | 2005-01-19 | Microsharp Corp Ltd | Structured optical film |
KR20130008643A (ko) * | 2004-12-28 | 2013-01-22 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 불소- 또는 규소-함유 프리즘을 갖는 프리즘 역반사 물품 |
US7195360B2 (en) * | 2004-12-28 | 2007-03-27 | 3M Innovative Properties Company | Prismatic retroreflective article and method |
US7264872B2 (en) * | 2004-12-30 | 2007-09-04 | 3M Innovative Properties Company | Durable high index nanocomposites for AR coatings |
US7491441B2 (en) * | 2004-12-30 | 2009-02-17 | 3M Innovative Properties Company | High refractive index, durable hard coats |
US7241437B2 (en) * | 2004-12-30 | 2007-07-10 | 3M Innovative Properties Company | Zirconia particles |
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US20060182409A1 (en) * | 2005-02-11 | 2006-08-17 | Eastman Kodak Company | Optical films of differing refractive indices |
KR20070103033A (ko) * | 2005-02-17 | 2007-10-22 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 낮은 유리 전이 온도를 가진 중합된 유기 상을 포함하는밝기 증진 필름 |
US7326448B2 (en) | 2005-02-17 | 2008-02-05 | 3M Innovative Properties Company | Polymerizable oligomeric urethane compositions comprising nanoparticles |
WO2006098899A2 (en) * | 2005-03-11 | 2006-09-21 | 3M Innovative Properties Company | Light management films with zirconia particles |
US20060204676A1 (en) * | 2005-03-11 | 2006-09-14 | Jones Clinton L | Polymerizable composition comprising low molecular weight organic component |
US20060204745A1 (en) * | 2005-03-14 | 2006-09-14 | Jones Clint L | Light management films with zirconia particles |
WO2006099168A2 (en) * | 2005-03-11 | 2006-09-21 | 3M Innovative Properties Company | Polymerizable compositions comprising nanoparticles |
US7400445B2 (en) * | 2005-05-31 | 2008-07-15 | 3M Innovative Properties Company | Optical filters for accelerated weathering devices |
US20060293463A1 (en) * | 2005-06-28 | 2006-12-28 | General Electric Company | Compositions for brightness enhancing films |
US20070082988A1 (en) * | 2005-10-06 | 2007-04-12 | General Electric Company | Compositions for articles comprising replicated microstructures |
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US20080101759A1 (en) * | 2006-10-26 | 2008-05-01 | K Laser Technology, Inc. | Prism matrix with random phase structures |
US8441730B2 (en) | 2006-11-14 | 2013-05-14 | Xiper Innovations, Inc. | Non-attenuating light collimating articles for graphic arts |
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EP2125914B1 (de) | 2007-03-09 | 2014-01-22 | 3M Innovative Properties Company | Für mikrostrukturierte optische folien geeignete triphenyl-monomere |
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CN102952071B (zh) * | 2011-08-30 | 2015-11-25 | 比亚迪股份有限公司 | 紫外光固化单体及其制备方法、可聚合组合物和背光模块 |
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CN103508887B (zh) * | 2012-06-19 | 2015-12-16 | 比亚迪股份有限公司 | 紫外光固化单体及其制备方法、可聚合组合物、增亮膜和背光模块 |
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-
2000
- 2000-12-21 US US09/746,613 patent/US6541591B2/en not_active Expired - Lifetime
-
2001
- 2001-05-01 AT AT01932822T patent/ATE313572T1/de not_active IP Right Cessation
- 2001-05-01 DE DE60116143T patent/DE60116143T2/de not_active Expired - Fee Related
- 2001-05-01 CN CNB018207715A patent/CN1226321C/zh not_active Expired - Fee Related
- 2001-05-01 WO PCT/US2001/014040 patent/WO2002051892A1/en active IP Right Grant
- 2001-05-01 EP EP01932822A patent/EP1352000B1/de not_active Expired - Lifetime
- 2001-05-01 KR KR1020037008351A patent/KR100727501B1/ko not_active IP Right Cessation
- 2001-05-01 JP JP2002552980A patent/JP2004516367A/ja active Pending
-
2002
- 2002-11-12 US US10/292,275 patent/US6953623B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR20030097797A (ko) | 2003-12-31 |
US6953623B2 (en) | 2005-10-11 |
US20030100693A1 (en) | 2003-05-29 |
US6541591B2 (en) | 2003-04-01 |
US20020123589A1 (en) | 2002-09-05 |
KR100727501B1 (ko) | 2007-06-12 |
CN1481398A (zh) | 2004-03-10 |
EP1352000A1 (de) | 2003-10-15 |
DE60116143T2 (de) | 2006-08-03 |
EP1352000B1 (de) | 2005-12-21 |
JP2004516367A (ja) | 2004-06-03 |
WO2002051892A1 (en) | 2002-07-04 |
CN1226321C (zh) | 2005-11-09 |
ATE313572T1 (de) | 2006-01-15 |
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