DE59209143D1 - Photoempfindliches Gemisch auf Basis von Acrylaten - Google Patents

Photoempfindliches Gemisch auf Basis von Acrylaten

Info

Publication number
DE59209143D1
DE59209143D1 DE59209143T DE59209143T DE59209143D1 DE 59209143 D1 DE59209143 D1 DE 59209143D1 DE 59209143 T DE59209143 T DE 59209143T DE 59209143 T DE59209143 T DE 59209143T DE 59209143 D1 DE59209143 D1 DE 59209143D1
Authority
DE
Germany
Prior art keywords
acrylates
mixture based
photosensitive mixture
photosensitive
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE59209143T
Other languages
English (en)
Inventor
Bettina Dr Steinmann
Rolf Dr Wiesendanger
Adrian Dr Schulthess
Max Dr Hunziker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of DE59209143D1 publication Critical patent/DE59209143D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
DE59209143T 1991-03-27 1992-03-19 Photoempfindliches Gemisch auf Basis von Acrylaten Expired - Fee Related DE59209143D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH93691 1991-03-27
CH19992 1992-01-23

Publications (1)

Publication Number Publication Date
DE59209143D1 true DE59209143D1 (de) 1998-02-26

Family

ID=25683853

Family Applications (1)

Application Number Title Priority Date Filing Date
DE59209143T Expired - Fee Related DE59209143D1 (de) 1991-03-27 1992-03-19 Photoempfindliches Gemisch auf Basis von Acrylaten

Country Status (7)

Country Link
US (1) US5476749A (de)
EP (1) EP0506616B1 (de)
JP (1) JP3252331B2 (de)
KR (1) KR100199479B1 (de)
CA (1) CA2063982C (de)
DE (1) DE59209143D1 (de)
HK (1) HK1005630A1 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW418346B (en) * 1993-03-05 2001-01-11 Ciba Sc Holding Ag Photopolymerisable compositions containing tetraacrylates
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
AU680700B2 (en) * 1993-10-26 1997-08-07 Toray Industries, Inc. Dry lithographic forme
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
DE4424101A1 (de) * 1994-07-08 1996-01-11 Basf Lacke & Farben Strahlenhärtbare Lacke und deren Verwendung zur Herstellung matter Lackfilme
JP3117394B2 (ja) * 1994-11-29 2000-12-11 帝人製機株式会社 光学的立体造形用樹脂組成物
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
RU2074673C1 (ru) * 1995-06-01 1997-03-10 Межотраслевой научно-технический комплекс "Микрохирургия глаза" Эластичный искусственный хрусталик и способ его изготовления
JPH0971707A (ja) * 1995-06-29 1997-03-18 Takemoto Oil & Fat Co Ltd プラスチック成形型用光硬化性組成物及びプラスチック成形型
EP0763779A3 (de) * 1995-09-18 1997-07-30 Mitsubishi Chem Corp Ungesättigte Urethanderivate, sie enthaltende photopolymerisierbare Zusammensetzungen und photoempfindliche lithographische Druckplätte
EP0802455B1 (de) * 1996-04-15 2002-10-16 Teijin Seiki Co., Ltd. Verwendung einer photohärtbaren Harzzusammensetzung zur Herstellung eines Objektes mittels Stereolithographie
EP0897558B1 (de) 1996-05-09 2000-09-27 Dsm N.V. Lichtempfindliche harzzusammensetzung für rapid prototyping und ein verfahren zur herstellung von dreidimensionalen objekten
US5910979A (en) * 1997-10-20 1999-06-08 At&T Corp. Method for billing local communication services provided by an interexchange communication network
US6201036B1 (en) * 1998-07-21 2001-03-13 Mezhoiraslevoi Nauchno-Tekhnichesky Komplex “Mikrokhirurgia Glaza” Light-curable polymer material, method for making an elastic intraocular lens, and an elastic intraocular lens
US6187374B1 (en) 1998-09-02 2001-02-13 Xim Products, Inc. Coatings with increased adhesion
DE19851567A1 (de) * 1998-11-09 2000-05-11 Emtec Magnetics Gmbh Durch UV-Bestrahlung härtbare Bindemittelzusammensetzung für magnetische Aufzeichnungsmedien und Photoinitiatormischung
TWI306546B (de) 2000-05-29 2009-02-21 Hitachi Chemical Co Ltd
JP2002148802A (ja) * 2000-11-07 2002-05-22 Tokyo Ohka Kogyo Co Ltd サンドブラスト用感光性組成物及びそれを用いた感光性フィルム
US6811937B2 (en) 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US20040054025A1 (en) * 2002-06-20 2004-03-18 Lawton John A. Compositions comprising a benzophenone photoinitiator
FR2856145B1 (fr) * 2003-06-16 2005-09-02 Michelin Soc Tech Detection des revolutions d'un ensemble pneumatique et roue, a l'aide du champ magnetique terrestre.
US7375144B2 (en) * 2005-06-16 2008-05-20 Eastman Chemical Company Abrasion resistant coatings
KR100771367B1 (ko) 2005-07-25 2007-10-30 주식회사 엘지화학 기계적 물성이 우수한 수지, 및 이를 포함하는 감광성조성물
JP5063127B2 (ja) 2007-02-06 2012-10-31 株式会社Ａｄｅｋａ 重合性光学活性化合物及び該重合性光学活性化合物を含有する重合性組成物
WO2009086491A1 (en) * 2007-12-28 2009-07-09 E. I. Du Pont De Nemours And Company Actinically curable adhesive composition
CN101939391A (zh) * 2007-12-28 2011-01-05 E.I.内穆尔杜邦公司 可热固化和光化固化的粘合剂组合物
KR101876598B1 (ko) 2011-02-18 2018-07-09 쇼오트 아게 유리，특히 유리 솔더 또는 가용성 유리
CN103361021A (zh) * 2013-07-24 2013-10-23 吴波 一种低收缩率光学透明胶
JP6337523B2 (ja) * 2014-03-07 2018-06-06 東洋インキＳｃホールディングス株式会社 活性エネルギー線重合性樹脂組成物および積層体
ITUB20154169A1 (it) * 2015-10-02 2017-04-02 Thelyn S R L Metodo e apparato di foto-indurimento a substrato auto-lubrificante per la formazione di oggetti tridimensionali.
JP2020528479A (ja) 2017-07-25 2020-09-24 スリーエム イノベイティブ プロパティズ カンパニー ウレタン成分及び反応性希釈剤を含む光重合性組成物、物品、並びに方法
US11904031B2 (en) 2017-11-22 2024-02-20 3M Innovative Properties Company Orthodontic articles comprising polymerized composition comprising at least two free-radical initiators
JP7350738B2 (ja) 2017-11-22 2023-09-26 スリーエム イノベイティブ プロパティズ カンパニー ウレタン成分及び単官能性反応性希釈剤を含む光重合性組成物、物品、並びに方法
JP7015682B2 (ja) * 2017-12-06 2022-02-03 ナガセケムテックス株式会社 光造形用樹脂組成物
US11616302B2 (en) 2018-01-15 2023-03-28 Rogers Corporation Dielectric resonator antenna having first and second dielectric portions
US11633908B2 (en) * 2018-03-02 2023-04-25 Formlabs, Inc. Latent cure resins and related methods
JP7306612B2 (ja) 2018-04-20 2023-07-11 コベストロ （ネザーランズ） ビー．ブイ． 付加造形のための放射線硬化性組成物
KR102302706B1 (ko) 2018-06-29 2021-09-15 쓰리엠 이노베이티브 프로퍼티즈 캄파니 폴리카르보네이트 다이올을 사용하여 제조된 폴리우레탄 메타크릴레이트 중합체를 포함하는 광중합성 조성물, 물품, 및 방법
JP2021529858A (ja) 2018-06-29 2021-11-04 スリーエム イノベイティブ プロパティズ カンパニー 水性環境において改善された強度を有する硬化したフリーラジカル重合性組成物を含む歯科矯正物品
CN112384188A (zh) 2018-06-29 2021-02-19 3M创新有限公司 使用聚碳酸酯二醇制备的正畸制品、可聚合组合物以及制备制品的方法
JP7010455B2 (ja) 2018-06-29 2022-01-26 スリーエム イノベイティブ プロパティズ カンパニー ポリカーボネートジオールを使用して調製された歯科矯正物品、及びその製造方法
GB201814535D0 (en) 2018-09-06 2018-10-24 Uea Enterprises Ltd Intraocular devices
US11552390B2 (en) 2018-09-11 2023-01-10 Rogers Corporation Dielectric resonator antenna system
CN113169455A (zh) 2018-12-04 2021-07-23 罗杰斯公司 电介质电磁结构及其制造方法
CN113906066A (zh) * 2019-05-30 2022-01-07 罗杰斯公司 用于立体光刻的可光固化组合物、使用所述组合物的立体光刻方法、通过立体光刻方法形成的聚合物组件、以及包含所述聚合物组件的装置
JP2023500370A (ja) 2019-11-07 2023-01-05 ビーエーエスエフ ソシエタス・ヨーロピア ３ｄ印刷で使用するための水洗可能な組成物
US11482790B2 (en) 2020-04-08 2022-10-25 Rogers Corporation Dielectric lens and electromagnetic device with same
US11413819B2 (en) 2020-09-03 2022-08-16 NEXA3D Inc. Multi-material membrane for vat polymerization printer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4100141A (en) * 1976-07-02 1978-07-11 Loctite (Ireland) Limited Stabilized adhesive and curing compositions
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates
EP0286594A2 (de) * 1987-04-06 1988-10-12 Ciba-Geigy Ag Verfahren zur Herstellung von photostrukturierbaren Ueberzügen
EP0378144B1 (de) * 1989-01-10 1995-03-08 Ciba-Geigy Ag Photohärtbare Zusammensetzungen
EP0425441B1 (de) * 1989-10-27 1995-12-27 Ciba-Geigy Ag Photoempfindliches Gemisch

Also Published As

Publication number Publication date
JP3252331B2 (ja) 2002-02-04
CA2063982C (en) 2002-05-28
HK1005630A1 (en) 1999-01-15
CA2063982A1 (en) 1992-09-28
JPH05224412A (ja) 1993-09-03
EP0506616A1 (de) 1992-09-30
EP0506616B1 (de) 1998-01-21
KR920018522A (ko) 1992-10-22
US5476749A (en) 1995-12-19
KR100199479B1 (ko) 1999-06-15

Similar Documents

Publication Publication Date Title
DE59209143D1 (de) Photoempfindliches Gemisch auf Basis von Acrylaten
DE69215436T2 (de) Projektor
FI925387A0 (fi) Soekarrangemang i centralsystem foer cellulaer mobiltelefoni
FI930855A (fi) Tillaempningarnas modularitet i datakommunikationscentraler
FI933855A0 (fi) Kontinuerlig blandningsmaskin uppdelad i sektioner
DE69302650D1 (de) Lichtempfindliche Zusammensetzung
FI932245A0 (fi) Faskombinationsfoerfarande och -anordning foer anvaendning i en flerantennmottagare
DE69226920T2 (de) Lichtempfindliche Zusammensetzung
DE59108086D1 (de) Photoresist
FI921435A (fi) Skydd foer saenkpump i svaora foerhaollanden
FI922759A (fi) Loesningsmedelskompositioner foer anvaendning i tryckkaensligt kopieringspapper
FI923724A (fi) Monterings- och distansanordning foer braenslestavarna i en kokvattenreaktor
FI925206A (fi) Rengoerningsprodukt i vaetskeform
FI935507A (fi) Foerbaettring i en lyftbommekanism
DE69209162D1 (de) Recarbonisierung von Wasser
FI935566A (fi) Insertionsmutationer i mycobakterier
FI924750A0 (fi) Zirkoniumbaserad legering foer komponenter i kaernreaktorer
FI923607A (fi) Foerbaettringar i pulpmaskiner foer att dispergera sellulosapulp
DE69219747T2 (de) Lichtempfindliche Zusammensetzung
FI922180A (fi) Tuggummi innehaollande tuggummibas i en valsningsblandning
DE69221471T2 (de) Photographisches bleichmittel
DE69322989D1 (de) Lichtempfindliche Zusammensetzung
FI920998A (fi) Skaermad hytt i modulkonstruktion
FI925038A (fi) Anordning i spegel foer att foehindra fuktbildning
FI922714A (fi) Anordning i en sf6-isolerad hoegspaenningslindningskopplare

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: VANTICO AG, BASEL, CH

8339 Ceased/non-payment of the annual fee