DE3370199D1 - Method and device for the optical alignment of motives in close planes in an exposing apparatus provided with a diverging radiation source - Google Patents

Method and device for the optical alignment of motives in close planes in an exposing apparatus provided with a diverging radiation source

Info

Publication number
DE3370199D1
DE3370199D1 DE8383402543T DE3370199T DE3370199D1 DE 3370199 D1 DE3370199 D1 DE 3370199D1 DE 8383402543 T DE8383402543 T DE 8383402543T DE 3370199 T DE3370199 T DE 3370199T DE 3370199 D1 DE3370199 D1 DE 3370199D1
Authority
DE
Germany
Prior art keywords
motives
radiation source
apparatus provided
optical alignment
exposing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383402543T
Other languages
English (en)
Inventor
Bernard Fay
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Application granted granted Critical
Publication of DE3370199D1 publication Critical patent/DE3370199D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
DE8383402543T 1982-12-30 1983-12-27 Method and device for the optical alignment of motives in close planes in an exposing apparatus provided with a diverging radiation source Expired DE3370199D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8222080A FR2538923A1 (fr) 1982-12-30 1982-12-30 Procede et dispositif d'alignement optique de motifs dans deux plans rapproches dans un appareil d'exposition comprenant une source de rayonnement divergent

Publications (1)

Publication Number Publication Date
DE3370199D1 true DE3370199D1 (en) 1987-04-16

Family

ID=9280689

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383402543T Expired DE3370199D1 (en) 1982-12-30 1983-12-27 Method and device for the optical alignment of motives in close planes in an exposing apparatus provided with a diverging radiation source

Country Status (5)

Country Link
US (1) US4600309A (de)
EP (1) EP0113633B1 (de)
JP (1) JPS59134830A (de)
DE (1) DE3370199D1 (de)
FR (1) FR2538923A1 (de)

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US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
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US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
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US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
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EP1774407B1 (de) * 2004-06-03 2017-08-09 Board of Regents, The University of Texas System System und verfahren zur verbesserung von ausrichtung und overlay für die mikrolithographie
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
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JP5027468B2 (ja) * 2006-09-15 2012-09-19 日本ミクロコーティング株式会社 プローブクリーニング用又はプローブ加工用シート、及びプローブ加工方法
TWI347428B (en) * 2007-11-02 2011-08-21 Ind Tech Res Inst Overlay alignment structure and method for overlay metrology using the same
JP4919521B2 (ja) * 2009-03-30 2012-04-18 孝彰 福田 文字入力方法、及び入力文字校正方法
KR101122520B1 (ko) * 2011-11-25 2012-03-19 짚트랙코리아 주식회사 짚 트렉 시스템
JP2015079830A (ja) * 2013-10-16 2015-04-23 三菱電機株式会社 光半導体装置、光半導体装置の製造方法、及び光モジュールの製造方法
JP2023512917A (ja) 2020-02-05 2023-03-30 エーエスエムエル ホールディング エヌ．ブイ． アライメントマークを感知するための装置

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US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
DE2723902C2 (de) * 1977-05-26 1983-12-08 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Parallelausrichtung und Justierung der Lage einer Halbleiterscheibe relativ zu einer Bestrahlungsmaske bei der Röntgenstrahl-Fotolithografie
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure
US4292576A (en) * 1980-02-29 1981-09-29 The United States Of America As Represented By The Secretary Of The Air Force Mask-slice alignment method
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JPS5717132A (en) * 1980-07-07 1982-01-28 Fujitsu Ltd Formation of microscopic pattern using lithography and device thereof
JPS57109335A (en) * 1980-12-26 1982-07-07 Toshiba Corp Positional matching method between mask substrate and wafer

Also Published As

Publication number Publication date
JPS59134830A (ja) 1984-08-02
US4600309A (en) 1986-07-15
FR2538923B1 (de) 1985-03-08
JPS6352453B2 (de) 1988-10-19
FR2538923A1 (fr) 1984-07-06
EP0113633B1 (de) 1987-03-11
EP0113633A1 (de) 1984-07-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee