DE3169238D1 - Photosensitive material - Google Patents

Photosensitive material

Info

Publication number
DE3169238D1
DE3169238D1 DE8181103963T DE3169238T DE3169238D1 DE 3169238 D1 DE3169238 D1 DE 3169238D1 DE 8181103963 T DE8181103963 T DE 8181103963T DE 3169238 T DE3169238 T DE 3169238T DE 3169238 D1 DE3169238 D1 DE 3169238D1
Authority
DE
Germany
Prior art keywords
photosensitive material
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181103963T
Other languages
English (en)
Inventor
Takahiro Tsunoda
Tsuguo Yamaoka
Sinji Tamaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd, Daikin Kogyo Co Ltd filed Critical Daikin Industries Ltd
Application granted granted Critical
Publication of DE3169238D1 publication Critical patent/DE3169238D1/de
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/22Esters containing halogen
    • C08F220/24Esters containing halogen containing perhaloalkyl radicals
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/012Macromolecular azides; Macromolecular additives, e.g. binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group
DE8181103963T 1980-05-27 1981-05-23 Photosensitive material Expired DE3169238D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7116480A JPS56167139A (en) 1980-05-27 1980-05-27 Sensitive material

Publications (1)

Publication Number Publication Date
DE3169238D1 true DE3169238D1 (en) 1985-04-18

Family

ID=13452719

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181103963T Expired DE3169238D1 (en) 1980-05-27 1981-05-23 Photosensitive material

Country Status (4)

Country Link
US (1) US4424325A (de)
EP (1) EP0040841B1 (de)
JP (1) JPS56167139A (de)
DE (1) DE3169238D1 (de)

Families Citing this family (63)

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JPS56139515A (en) * 1980-03-31 1981-10-31 Daikin Ind Ltd Polyfluoroalkyl acrylate copolymer
JPS589146A (ja) * 1981-07-09 1983-01-19 Nippon Paint Co Ltd 水不要平版用版材
JPS58215411A (ja) * 1982-06-09 1983-12-14 Daikin Ind Ltd 感応性材料
JPS6042425A (ja) * 1983-08-17 1985-03-06 Toray Ind Inc 化学線感応性重合体組成物
DE3415975A1 (de) * 1984-04-28 1985-10-31 Hoechst Ag, 6230 Frankfurt Fluorhaltige copolymerisate, verfahren zu ihrer herstellung und ihre verwendung
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
DE3421511A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Polymerisierbare, perfluoralkylgruppen aufweisende verbindungen, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
US4612356A (en) * 1984-10-01 1986-09-16 Ciba-Geigy Corporation Homo- and co- (addition) polymers of di-perfluoroalkyl carbamyl group containing (meth) acrylate monomers
US4617363A (en) * 1985-02-28 1986-10-14 E. I. Du Pont De Nemours And Company ω-perfluoroalkyl-α-olefin polymers
US5175023A (en) * 1986-04-28 1992-12-29 Nippondenso Co., Ltd. Method for forming insulating coating material for electronic circuit board
US4909806A (en) * 1987-12-31 1990-03-20 Minnesota Mining And Manufacturing Company Fluorine- and chromophore-containing polymer
US5484822A (en) * 1991-06-24 1996-01-16 Polaroid Corporation Process and composition for cladding optic fibers
US5314930A (en) * 1993-04-05 1994-05-24 Gerald Sugerman Beta keto mixed acylate monomers
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5525457A (en) * 1994-12-09 1996-06-11 Japan Synthetic Rubber Co., Ltd. Reflection preventing film and process for forming resist pattern using the same
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
WO1996039646A1 (en) 1995-06-05 1996-12-12 Kimberly-Clark Worldwide, Inc. Novel pre-dyes
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
MX9710016A (es) 1995-06-28 1998-07-31 Kimberly Clark Co Colorantes novedosos y modificadores de colorante.
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
DE69620428T2 (de) 1995-11-28 2002-11-14 Kimberly Clark Co Lichtstabilisierte fabstoffzusammensetzungen
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
KR100591999B1 (ko) 1998-06-03 2006-06-22 킴벌리-클라크 월드와이드, 인크. 마이크로에멀젼 기술에 의해 제조된 네오나노플라스트 및잉크젯 프린팅용 잉크
AU4818299A (en) 1998-06-03 1999-12-20 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
BR9912003A (pt) 1998-07-20 2001-04-10 Kimberly Clark Co Composições de tinta para jato de tinta aperfeiçoadas
JP2003533548A (ja) 1998-09-28 2003-11-11 キンバリー クラーク ワールドワイド インコーポレイテッド 光重合開始剤であるキノイド基を含むキレート
WO2000042110A1 (en) 1999-01-19 2000-07-20 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
JP4458389B2 (ja) * 2000-05-01 2010-04-28 コダック株式会社 感光性組成物および感光性平版印刷版
JP2004501987A (ja) 2000-06-19 2004-01-22 キンバリー クラーク ワールドワイド インコーポレイテッド 新規な光開始剤及びその用途
JP2002055446A (ja) * 2000-08-11 2002-02-20 Fuji Photo Film Co Ltd 平版印刷版原版
US6787286B2 (en) * 2001-03-08 2004-09-07 Shipley Company, L.L.C. Solvents and photoresist compositions for short wavelength imaging
US7285363B2 (en) * 2002-11-08 2007-10-23 The University Of Connecticut Photoactivators, methods of use, and the articles derived therefrom
US7682771B2 (en) * 2004-12-29 2010-03-23 3M Innovative Properties Company Compositions containing photosensitive fluorochemical and uses thereof
KR101420527B1 (ko) * 2012-11-30 2014-07-17 인하대학교 산학협력단 광이합체화 반응을 이용하는 포토레지스트 및 이를 이용한 유기발광 다이오드 표시장치 제조 방법
JP6308775B2 (ja) * 2013-12-25 2018-04-11 株式会社ネオス 含フッ素共重合体
KR101782783B1 (ko) 2016-06-07 2017-09-28 한국화학연구원 유사 석유 검출용 광센서
KR101914284B1 (ko) 2017-05-19 2018-11-08 한국화학연구원 알코올 이성질체 식별용 광센서

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US3637614A (en) 1969-02-27 1972-01-25 Du Pont Solvent soluble dry soil resistant fluoropolymers
US3645989A (en) 1970-01-29 1972-02-29 Du Pont Fluorinated oil- and water-repellent and dry soil resistant polymers
US3882084A (en) 1970-06-16 1975-05-06 Agency Ind Science Techn Optically cross-linkable polymer
US3923761A (en) * 1972-07-18 1975-12-02 Western Litho Plate & Supply Photopolymers
JPS5921542B2 (ja) * 1974-11-15 1984-05-21 住友化学工業株式会社 印刷版の製法
JPS51141003A (en) * 1975-05-16 1976-12-04 Minnesota Mining & Mfg Developmenttfree driographic plate and monueacture thereof
US4062886A (en) 1975-07-16 1977-12-13 Xerox Corporation Fluorenone carboxyle acid esters
US4007043A (en) 1975-07-16 1977-02-08 Xerox Corporation Photoconductive elements with copolymer charge transport layers
JPS5274404A (en) * 1975-10-31 1977-06-22 Ricoh Kk Damping waterrfree lithographic press plate
US4074009A (en) * 1975-12-08 1978-02-14 Minnesota Mining And Manufacturing Company Driographic master
JPS5290269A (en) 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns
US4171417A (en) 1978-10-30 1979-10-16 Calgon Corporation Polymers with improved solvent holdout in electroconductive paper
JPS56139515A (en) * 1980-03-31 1981-10-31 Daikin Ind Ltd Polyfluoroalkyl acrylate copolymer

Also Published As

Publication number Publication date
EP0040841A1 (de) 1981-12-02
EP0040841B1 (de) 1985-03-13
US4424325A (en) 1984-01-03
JPS56167139A (en) 1981-12-22

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: TUERK, D., DIPL.-CHEM. DR.RER.NAT. GILLE, C., DIPL.-ING., PAT.-ANW., 4000 DUESSELDORF

8339 Ceased/non-payment of the annual fee