CN1313870C - Colour optical filter and producing method thereof - Google Patents

Colour optical filter and producing method thereof Download PDF

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Publication number
CN1313870C
CN1313870C CNB031234860A CN03123486A CN1313870C CN 1313870 C CN1313870 C CN 1313870C CN B031234860 A CNB031234860 A CN B031234860A CN 03123486 A CN03123486 A CN 03123486A CN 1313870 C CN1313870 C CN 1313870C
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China
Prior art keywords
shading
electrode layer
district
line
insulated wire
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Expired - Fee Related
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CNB031234860A
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Chinese (zh)
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CN1549015A (en
Inventor
陈志昌
戴亚翔
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TPO Displays Corp
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Toppoly Optoelectronics Corp
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Priority to CNB031234860A priority Critical patent/CN1313870C/en
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Abstract

The present invention relates to a color optical filter and a production method thereof; the color optical filter comprises a transparent basal plate, a shading matrix region arranged on the transparent basal plate, a sub-pixel area, a color filtration area, an electrode layer, at least an insulation wire, and a conductive wire, wherein the shading matrix region is composed of a plurality of mutually parallel first shading rays extending towards a first direction and a plurality of mutually parallel second shading rays extending towards a second direction; the sub-pixel area is formed between the middle of the two adjacent first shading rays and the two adjacent second shading rays; the color filtration area is formed in the sub-pixel area; an electrode layer is formed on the transparent basal plate; the insulation wire is formed on the electrode layer of which the lower part corresponds to the shading matrix area; in addition, the conductive wire is formed above the instrument wire, and the conductive wire is longer than the insulation wire. The conductive wire extending to both ends of the insulation wire is connected with the electrode layer.

Description

Colored filter and preparation method thereof
Technical field
The present invention relates to colored filter and preparation method thereof, particularly can improve colored filter of crosstalk phenomenon and preparation method thereof.
Background technology
LCD (liquid crystal display, hereinafter to be referred as LCD) be the main flow of present flat-panel screens development, its displaying principle is dielectric anisotropy and the electric anisotropy that utilizes liquid crystal molecule to have, when extra electric field, make the ordered state conversion of liquid crystal molecule, make liquid crystal film produce various photoelectric effect.
The panel construction of LCD generally is formed by stacking by two plate bases, and the space of certain distance is left with the perfusion liquid crystal in the centre, and is forming counter electrode respectively on the two substrates up and down, turning to and arranging with the control liquid crystal molecule.
General thin film transistor (TFT) (Thin Film Transistor; TFT) panel of LCD is provided with the tft array substrate of thin film transistor (TFT) array and colored filter that a slice is provided with colored light filter membrane layer is formed by a slice, the following describes the detailed structure of colored filter.
Please refer to Fig. 1, the structure of general colored filter is described.The basic structure of colored filter is on a glass substrate 201, make black matrix 202 (the black matrix of an antireflection earlier, BM), then red 203, green 204, the blue trichromatic colored light filter membrane layer of 205 (RGB) (shape of colored light filter membrane layer, size, color and luster, arrangement are decided on the LCD of different purposes) of sequentially built light-permeable again, sputter last layer electrode layer 206 more at last, its material generally is that nesa coating is (as tin indium oxide, ITO), with counter electrode as pixel capacitors on the thin-film transistor array base-plate.
When panel develops towards the large scale direction at present, because electrode layer 206 is formed on the colored filter substrate 201 comprehensively, large-sized panel also represents the area that forms pixel capacitors layer 206 above colored light filter membrane layer big more, and cause resistance value big more, this moment, signal caused decay because of interference, noise (noise) etc. easily, cause crosstalk phenomenon, picture quality is bad when causing showing, influences qualification rate.
Summary of the invention
The objective of the invention is to improve the crosstalk phenomenon of LCD, and improve the display frame quality.
Therefore, the present invention is difficult for because of interference, noise cause decay when making the signal transmission, thereby avoids crosstalk phenomenon by the resistance value that reduces colored filter substrate upper electrode layer, improves the picture quality when showing, and improves the qualification rate of panel.
For reducing the resistance value of colored filter substrate upper electrode layer, colored filter provided by the present invention comprises: a transparency carrier; One shading matrix district, be set on this transparency carrier, the shading matrix district is parallel to each other by many and is parallel to each other with many and is formed towards the second shading line that second direction is extended towards the first shading line that first direction extends, and at adjacent two first shading lines and adjacent two second a shading lines centre formation pixel region (sub pixel); One colorized optical filtering district is formed at pixel region above-mentioned time; One electrode layer is formed on the transparency carrier; At least one insulated wire is formed on the electrode layer, and its below is corresponding to the shading matrix district; And one conductor wire be formed at insulated wire top, its length is than insulation line length, and extends to the insulated wire two ends to be connected with electrode layer.
Above-mentioned color filter making method comprises: a transparency carrier is provided; Form a shading matrix district on above-mentioned transparency carrier, this shading matrix district is parallel to each other by many and is parallel to each other with many and is formed towards the second shading line that second direction is extended towards the first shading line that first direction extends, and at adjacent two first shading lines and adjacent two second a shading lines centre formation pixel region (sub pixel); Form a colorized optical filtering district in above-mentioned pixel region; Form an electrode layer on transparency carrier; Form at least one insulated wire on electrode layer, its below is corresponding to the shading matrix district; And form a conductor wire in the insulated wire top, its length ratio insulation line length, and extend to the insulated wire two ends to be connected with electrode layer.
According to the present invention, above-mentioned insulated wire below is the first shading line corresponding to this shading matrix district; Above-mentioned conductor wire can be chromium, aluminium or aluminium neodymium; The material of electrode layer and pixel capacitors is unqualified, preferably tin indium oxide (ITO) or indium zinc oxide (IZO).
According to the present invention, above-mentioned colored filter or panel of LCD can further comprise many bar insulations line, correspond respectively to the top of these first shading lines; And can further comprise many conductor wires, correspond respectively to the top of these first shading lines.
According to colored filter of the present invention and preparation method thereof, structural design by colored filter, promptly by above the correspondence of shading line, forming at least one extra conductor wire, this conductor wire is also isolated via a length insulated wire and the electrode layer shorter than conductor wire, to form a circuit in parallel with electrode layer, can reduce the resistance of above-mentioned conductor wire below counter electrode layer, and by the reduction of electrode layer overall electrical resistance, be difficult in the time of can making the signal transmission because of disturbing, noise and cause decay, thereby avoid crosstalk phenomenon, improve the picture quality when showing, and improve the qualification rate of panel.
For above-mentioned purpose of the present invention, feature and advantage are become apparent, cited below particularlyly go out preferred embodiment, and conjunction with figs., be described in detail below.
Description of drawings
Fig. 1 shows the structure of an existing colored filter;
Fig. 2 shows the top view of embodiment of the invention TFT-LCD active array substrate;
Fig. 3 A~3L shows the technology of embodiment of the invention colored filter;
Fig. 4 shows the fragmentary cross-sectional view of embodiment of the invention panel of LCD.
Description of reference numerals
0 substrate, 0 ' substrate
201 substrates, 202 light shield layers
203 red filter membranous layer 204 green filter film layers
205 blue filter membranous layer 206 nesa coatings
3 liquid crystal, 300 gate lines
301 gate lines, 306 pixel regions
307 contact holes, 310 transistor area
312 grids, 313 n +α-Si layer
314 drain electrodes, 316 source electrodes
400 signal wires, 401 signal wires
701 light shield layers, 701 ' matrix pattern
The 701a first shading line 701b second shading line
701c pixel region 702 red filter membranous layers
703 blue filter membranous layer 704 green filter film layers
705 flatness layers, 706 electrode layers
707 ' insulating layer pattern, 707 " insulated wires
708 conductive layers, 708 ' conductive layer pattern
708 " conductor wire 801 pixel capacitors
Embodiment
Embodiment
(making of TFT-LCD active array substrate)
Fig. 2 shows the top view of present embodiment TFT-LCD active array substrate.
As shown in Figure 2, at first in a substrate 0, form gate line 300,301, grid 312 as glass.Then, in substrate 0, form a gate insulator (not shown).Wherein gate line 300,301 and grid 312 for example are metal levels, and gate insulator for example is silicon dioxide layer, silicon nitride (SiN x) layer or silicon oxynitride layer.
Then on the part of grid pole insulation course, form α-Si layer (at n +α-Si layer 313 below does not show) and n +α-Si layer 313 is positioned at the semiconductor island (α-Sisemiconductor island) of transistor area 310 with formation.
Then form signal wire 400,401, source electrode 316 and a drain electrode 314, so promptly constituted a thin film transistor (TFT) (TFT) structure, wherein source electrode 316 is electrically connected with signal wire 400.
Then on the surface of substrate 0, form a transparent photic resist layer (not shown) comprehensively, and above correspondence drain electrode 314, form a contact hole 307, to expose the surface of drain electrode 314.
At last, on pixel region 306, form pixel capacitors 801.The material of pixel capacitors 801 for example is a tin indium oxide.Pixel capacitors 801 forms with drain electrode 314 via contact hole 307 and is electrically connected.
(making of colored filter)
Colored filter has many method for makings, as pigment dispersing method, decoration method, electricity work method, print process etc.Below lifting the pigment dispersing method is example, and the technology of colored filter in the present embodiment is described.With reference to Fig. 3 A~3L, the making flow process of colored filter is described.
As Fig. 3 A, at first provide a glass substrate 0 ', and form a light shield layer 701 thereon, its material for example is crome metal or black photosensitive resin, then as Fig. 3 B, utilize photoetching formation matrix pattern 701 ', be called black matrix, make shading usefulness, and be used for separating the chromatic filter layer that continues and make, to increase the comparative of color.Fig. 3 C display matrix pattern 701 ' top view, many of matrix pattern 701 ' include are parallel to each other and are parallel to each other and towards the second shading line 701b of horizontal expansion towards the first shading line 701a of longitudinal extension and many, and form a pixel region 701c in the middle of adjacent two first shading line 701a and adjacent two second shading line 701b.
The optical filtering pixel of next sequentially built Red.At first as Fig. 3 D, utilize the spin coating mode substrate 0 ' the surface form a red pigment photoresist 702, then as Fig. 3 E, mode with exposure imaging, stay red pigment photoresist 702 at the predetermined inferior pixel region that forms red pixel, and remove the red pigment photoresist of all the other positions.As Fig. 3 F, with the same manner, order forms blue 703 and green 704 optical filtering pixel respectively on substrate 0 ' surface in the inferior pixel region 701c that black matrix 701 is separated.The arrangement position of pixel does not limit in the colored filter, and forms such as red, green, blue three looks can the mosaic mode, vertical bar formula or triangle are arranged.
As Fig. 3 G, last then at the flatness layer 705 of substrate 0 ' surface coverage layer of transparent as Fig. 3 H, form one deck electrode layer 706 on flatness layer 705 surfaces again, its material generally is a nesa coating, for example is ITO or IZO, is used for driving the arrangement of liquid crystal molecule.Carry out a committed step of the present invention subsequently:
On electrode layer 706, form a layer insulating, its material such as silicon dioxide, silicon nitride.And then on this insulation course, form one deck photoresist (not shown), and through one photoetching process, divest on electrode layer 706, form behind the photoresist insulating layer pattern 707 ', as Fig. 3 I.Below the position of insulating layer pattern 707 ' by at least one insulated wire 707 " institute forms; this insulated wire 707 in the present embodiment " corresponding to matrix pattern 701 ' in the first shading line 701a, but also can be, or simultaneously corresponding to the first shading line 701a and the second shading line 701b corresponding to the second shading line 701b.
Then make " the conductor wire of top that covers insulated wire 707.At first on electrode layer 706, form one deck conductive layer 708, its material such as chromium, aluminium or aluminium neodymium.And then on this conductive layer 708, form one deck photoresist (not shown), and through one photoetching process, divest form behind the photoresist conductive layer pattern 708 ', as Fig. 3 J.Conductive layer pattern 708 ' form by covering insulated wire 707 " at least one conductor wire 708 of top ", according to the present invention, the length and the quantity of insulated wire 707 "/conductor wire 708 " do not limit, reason is only to need to form above electrode layer 706 at least one bar insulation line 707 "/conductor wire 708 ", can reach the effect that reduces electrode layer 706 resistance, and the length of insulated wire 707 "/conductor wire 708 " and quantity can more effectively reduce the resistance of electrode layer 706 with length, much better.The design of present embodiment is the corresponding insulated wire 707 "/conductor wire 708 " that forms above all first shading line 701a, and its top view is shown in Fig. 3 K.
Insulated wire and conductor wire utilize independently lithography step making in the present embodiment, yet also can make in same lithography step.
Cut the sectional view of insulated wire 707 "/conductor wire 708 " among Fig. 3 L displayed map 3K along the parallel first shading line 701a direction, as shown in the figure, conductor wire 708 " length than insulated wire 707 " is long, and its two ends extend to insulated wire 707 respectively, and " two ends are to be connected with electrode layer 706; " two ends are the parallel circuit of contact, can reduce the original resistance value of electrode layer 706 thereby form one with insulated wire 707.
(cell technology)
Then, as panel of LCD technology, carry out colored filter substrate 0 ' with the aiming at and the applying step of TFT-LCD active array substrate 0, make each pixel region 306 top respectively to a colorized optical filtering district 702,703,704 should be arranged.
At last, perfusion liquid crystal 3 in the panel of LCD after applying is promptly finished the present embodiment panel of LCD after sealing again, and its fragmentary cross-sectional view as shown in Figure 4.
As mentioned above, colored filter of the present invention and preparation method thereof, by above the correspondence of shading line, forming at least one extra conductor wire, this conductor wire is also isolated via a length insulated wire and the electrode layer shorter than conductor wire, to form a circuit in parallel with electrode layer, can reduce the resistance of above-mentioned conductor wire below counter electrode layer, and by the reduction of electrode layer overall electrical resistance, be difficult for causing decay in the time of can making the signal transmission because of interference, noise, thereby avoid crosstalk phenomenon, improve the picture quality when showing, and improve the qualification rate of panel.
Though the present invention discloses as above in conjunction with the preferred embodiments; right its is not in order to qualification the present invention, those skilled in the art, without departing from the spirit and scope of the present invention; can do a little change and retouching, so protection scope of the present invention is with being as the criterion that claims were defined.

Claims (10)

1. a colored filter is applicable to panel of LCD, comprising:
One transparency carrier;
One shading matrix district, be set on this transparency carrier, this shading matrix district is parallel to each other by many and the first shading line that extends towards first direction and many are parallel to each other and are formed towards the second shading line that second direction is extended, and at pixel region of adjacent two first shading lines and the formation of adjacent two second shading lines centre;
One colorized optical filtering district is formed at pixel region above-mentioned time;
One electrode layer is formed on this transparency carrier, is positioned at shading matrix district and colorized optical filtering district top;
At least one insulated wire is formed on this electrode layer, and its below is corresponding to this shading matrix district; And
One conductor wire is formed at this insulated wire top, and its length is than this insulation line length, and extends to these exhausted grade of line two ends to be connected with this electrode layer.
2. color filter making method is applicable to comprise the technology of panel of LCD:
One transparency carrier is provided;
Form a shading matrix district on this transparency carrier, this shading matrix district is parallel to each other by many and the first shading line that extends towards first direction and many are parallel to each other and are formed towards the second shading line that second direction is extended, and at pixel region of adjacent two first shading lines and the formation of adjacent two second shading lines centre;
Form a colorized optical filtering district in above-mentioned pixel region;
Form an electrode layer on this transparency carrier, be positioned at shading matrix district and colorized optical filtering district top;
Form at least one insulated wire on this electrode layer, its below is corresponding to this shading matrix district; And
Form a conductor wire in this insulated wire top, its length is than this line length that insulate, and extends to these insulated wire two ends to be connected with this electrode layer.
3. color filter making method as claimed in claim 1 or 2, wherein this transparency carrier is a glass substrate.
4. color filter making method as claimed in claim 1 or 2, wherein this shading matrix district is a chromium.
5. color filter making method as claimed in claim 1 or 2, wherein this electrode layer is tin indium oxide or indium zinc oxide.
6. color filter making method as claimed in claim 1 or 2, wherein this insulated wire below is this first shading line or this second shading line or this first shading line of part and this second shading line of part corresponding to this shading matrix district.
7. color filter making method as claimed in claim 1 or 2, wherein this conductor wire is chromium, aluminium or aluminium neodymium.
8. color filter making method as claimed in claim 1 or 2, wherein above-mentioned first direction is vertical with second direction.
9. as color filter making method as described in the claim 2, wherein this insulated wire and conductor wire utilize lithography step to make respectively.
10. color filter making method is applicable to comprise the technology of panel of LCD:
One transparency carrier is provided;
Form a shading matrix district on this transparency carrier, this shading matrix district is parallel to each other by many and the first shading line that extends towards first direction and many are parallel to each other and are formed towards the second shading line that second direction is extended, and at pixel region of adjacent two first shading lines and the formation of adjacent two second shading lines centre;
Form a colorized optical filtering district in above-mentioned pixel region;
Form an electrode layer on this transparency carrier, be positioned at shading matrix district and colorized optical filtering district top;
Utilize same lithography step to form at least one insulated wire on this electrode layer and form a conductor wire in this insulated wire top, the below of insulated wire is corresponding to this shading matrix district, with the length of conductor wire than this insulation line length and extend to these insulated wire two ends to be connected with this electrode layer.
CNB031234860A 2003-05-09 2003-05-09 Colour optical filter and producing method thereof Expired - Fee Related CN1313870C (en)

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CNB031234860A CN1313870C (en) 2003-05-09 2003-05-09 Colour optical filter and producing method thereof

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Application Number Priority Date Filing Date Title
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CN1313870C true CN1313870C (en) 2007-05-02

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5187601A (en) * 1988-03-07 1993-02-16 Semiconductor Energy Laboratory Co., Ltd. Method for making a high contrast liquid crystal display including laser scribing opaque and transparent conductive strips simultaneously
US5323252A (en) * 1990-07-31 1994-06-21 Canon Kabushiki Kaisha Liquid crystal display device with opaque metal electrodes parallel to transparent electrodes with notch at their intersection
US5721599A (en) * 1996-01-16 1998-02-24 Industrial Technology Research Institute Black matrix for liquid crystal display
CN1180880A (en) * 1996-05-24 1998-05-06 特克特朗尼克公司 Plasma addressed liquid crystal display panel with reduced data drive electrode capacitance
US5959271A (en) * 1997-04-01 1999-09-28 Metrol Co., Ltd. Stopping device with a switch
JP2001154012A (en) * 1999-11-30 2001-06-08 Optrex Corp Color filter for liquid crystal and method of producing the same
JP2001194518A (en) * 2000-01-07 2001-07-19 Nec Corp Color filter
CN1343900A (en) * 2000-09-20 2002-04-10 株式会社日立制作所 Liquid crystal display

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5187601A (en) * 1988-03-07 1993-02-16 Semiconductor Energy Laboratory Co., Ltd. Method for making a high contrast liquid crystal display including laser scribing opaque and transparent conductive strips simultaneously
US5323252A (en) * 1990-07-31 1994-06-21 Canon Kabushiki Kaisha Liquid crystal display device with opaque metal electrodes parallel to transparent electrodes with notch at their intersection
US5721599A (en) * 1996-01-16 1998-02-24 Industrial Technology Research Institute Black matrix for liquid crystal display
CN1180880A (en) * 1996-05-24 1998-05-06 特克特朗尼克公司 Plasma addressed liquid crystal display panel with reduced data drive electrode capacitance
US5959271A (en) * 1997-04-01 1999-09-28 Metrol Co., Ltd. Stopping device with a switch
JP2001154012A (en) * 1999-11-30 2001-06-08 Optrex Corp Color filter for liquid crystal and method of producing the same
JP2001194518A (en) * 2000-01-07 2001-07-19 Nec Corp Color filter
CN1343900A (en) * 2000-09-20 2002-04-10 株式会社日立制作所 Liquid crystal display

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