CN1130472C - 低蒸汽压化合物的等离子体增强化学沉积方法 - Google Patents

低蒸汽压化合物的等离子体增强化学沉积方法 Download PDF

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CN1130472C
CN1130472C CN98809599.8A CN98809599A CN1130472C CN 1130472 C CN1130472 C CN 1130472C CN 98809599 A CN98809599 A CN 98809599A CN 1130472 C CN1130472 C CN 1130472C
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J·D·阿菲尼托
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    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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Abstract

本发明的设备通常为(a)闪蒸壳体(116),该壳体带有一单体雾化器(120),用于制备单体颗粒(122)、加热蒸发表面(124),用于从单体颗粒制备蒸发物、和蒸发物出口(128),联接于(b)辉光放电电极(204),该电极从蒸发物产生辉光放电等离子体,其中(c)衬底(104)靠近辉光放电等离子体,以便在其上接受和冷凝辉光放电等离子体。本发明的方法具有下列步骤:(a)闪蒸液体单体,在蒸发物出口形成蒸发物;(b)使蒸发物通过辉光放电电极,从蒸发物产生辉光放电单体等离子体;以及(c)将辉光放电单体等离子体低温冷凝于衬底上,并使辉光放电等离子体交联其上,其中由辉光放电等离子体中产生的自由基导致交联,并达到自固化。

Description

低蒸汽压化合物的等离子体 增强化学沉积方法
发明领域
本发明总的涉及一种制造等离子体聚合膜的方法。具体而言,本发明涉及用闪蒸的低蒸汽压化合物的原料源经等离子体增强化学沉积以制造等离子体聚合膜。本文所用术语“(甲基)丙烯酸的”系指“丙烯酸的或甲基丙烯酸的”。本文所用术语“低温冷凝”及其形态系指当气体与温度低于气体露点的表面接触时气相转变为液相的相变物理现象。
发明背景
等离子体增强化学蒸汽沉积(PECVD)的基本方法叙述于“薄膜过程”,由J.L.Vossen,W.Kern编,Academie Press,1978,部分IV,章IV-1无机化合物的等离子体沉积,章IV-2辉光放电聚合,本文引为参考。大致说来,辉光放电等离子体产生在平滑的或有尖突物的电极上。按照传统,气体入口将高蒸汽压单体气体引入等离子体区,在其中形成自由基,致使其随后与衬底撞击,单体中的一些自由基在衬底上发生化学键合或交联(固化)。高蒸汽压单体气体包括CH4、SiH4、C2H6、C2H2或从高蒸汽压液体中产生的气体,例如苯乙烯(87.4°F(30.8℃)下为10乇),环己环(60.4°F(15.8℃)下为100乇),四甲基二硅氧烷(82.9°F(28.3℃)下的1,3二氯四甲基二硅氧烷为10乇)和它们的组合,它们能用温和的可控加热蒸发。由于这些高蒸汽压单体气体不易在室温或升温下低温冷凝,依靠自由基对相关表面的化学键合代替低温冷凝会使沉积速度低(最大只有零点几微米/分)。由于相关衬底被等离子体蚀刻对此问题的缓解使之可与低温冷凝相竞争。较低蒸汽压物质不能用于PECVD,因为将较高分子量的单体加热到足以使其蒸发的温度时通常会在蒸发之前引起反应或者使气体的计量难于控制,这二者都是不可行的。
闪蒸方法叙述于美国专利4,954,371中,本文引为参考。这种基本方法亦称为聚合物多层(PML)闪蒸。大体上,一种可辐射聚合和/或可交联的材料在低于该材料的分解温度和聚合温度的温度下供入。该材料雾化为微滴,该微滴尺寸界于1-50微米。通常采用超声雾化器。微滴然后在真空下与其温度高于该材料沸点但其温度又低于引起热解的加热表面接触以被闪蒸。蒸汽低温冷凝在衬底上,然后辐射聚合或交联为很薄的聚合物层。
该材料可包括基本单体或其混合物、交联剂和/或引发剂。闪蒸的缺点在于要求两个相连的步骤,低温冷凝后紧接固化或交联,而且两者在空间和时间上是分开的。
根据等离子体聚合膜制造的技术现状,PECVD和闪蒸或辉光放电等离子体沉积和闪蒸都未组合使用。但是据J.D.Affinito、M.E.Gross、C.A.Coronado和P.M.Martin在“聚合物电解质在柔性衬底上的真空沉积”中的报导,无机化合物辉光放电等离子体发生器已与低压气氛下(真空)的闪蒸组合用于衬底的等离子加工。文章发表于“第九届国际真空丝网涂复会议论文集”的全会报告中,1995.11.R.Baskin编,Baskin出版社1995,20-36页,并示于图1。在这个系统中,等离子体发生器100用于蚀刻移动衬底104的表面102,以便接受来自闪蒸106的单体气体流出物,单体气体在被蚀刻的表面102上低温冷凝,然后经过第一固化装置(末示),例如电子束或紫外辐射,以引发交联和固化。等离子体发生器100具有壳体108、气体入口110。气体可以是氧、氮、水或惰性气体如氩、或它们的组合。在其内部,电极112是平滑的或具有一个或多个尖突物114,电极112产生辉光放电并使气体形成等离子体,等离子体蚀刻表面102。闪蒸器106具有壳体116、单体入口118和雾化喷嘴120,例如超声雾化器。流经喷嘴120的物流被雾化为颗粒或微滴122,它们撞击加热表面124,颗粒或微滴122在其上闪蒸为气体,该气体流经一系列挡板126(可任选用)至出口128并在表面102上低温冷凝。虽然采用过其它的气流分布装置,但发现挡板126能够提供适宜的气流分布或均匀度,同时可使表面102易于放大。固化装置(未示)位于闪蒸器106的下游。
因此,这里需要一种制造等离子体聚合层的设备和方法,其速度快且能自固化,无需固化装置。这种设备和方法将特别有利于制造PML聚合物层。
发明简述
本发明可从两方面来看,其(1)低蒸汽压单体材料用等离子体增强化学蒸汽沉积在衬底上的设备和方法,其(2)制造自固化聚合物层,特别是自固化PML聚合物层的设备和方法。从两方面来看,本发明是闪蒸和等离子体增强化学蒸汽沉积(PECVD)的组合,这种组合提供了一些出人意料的优点,它能在PECVD方法中应用低蒸汽压单体材料,并提供来自闪蒸方法的自固化,其沉积速率令人吃惊地快于标准PECVD的沉积速率。
一般说来,本发明的设备为(a)闪蒸壳体,其内部有用于制备单体颗粒的单体雾化器,用于将单体颗粒制成蒸汽的加热蒸发表面及蒸发物出口,(b)辉光放电电极,位于蒸发物出口下游,用于从蒸发物制备辉光放电等离子体,其中(c)衬底,它靠近辉光放电等离子体,用于接受辉光放电等离子体并使其衬底上低温冷凝。全部部件宜置于低压(真空)室中。
本发明的方法具有如下步骤:(a)闪蒸液体单体,在蒸发物出口形成蒸发物;(b)使蒸发物通至辉光放电电极,将蒸发物制成辉光放电单体等离子体;和(c)辉光放电单体等离子体在衬底上低温冷凝,并使辉光放电等离子体在其上交联,其中辉光放电等离子体中产生的自由基导致交联,并达到自固化。
本发明的一个目的在于提供一种组合闪蒸与辉光放电等离子体沉积的设备和方法。
本发明的一个目的在于提供一种制备自固化聚合物层的设备和方法。
本发明的另一目的在于提供一种制备自固化PML聚合物层的设备和方法。
本发明的还一目的在于提供一种低蒸汽压单体的PECVD沉积的设备和方法。
本发明的优点在于,它对衬底的移动方向是不敏感的,因为沉积的单体层是自固化的。在现有技术中,沉积的单体层需要辐射固化设备,以致衬底的移动应必须从沉积位置移向辐射设备。本发明的另一优点在于,可组合多层材料,例如,本文引作参考的美国专利5,547,508和5,396,644、5,260,095所列的多聚合物层、聚合物和金属的交替层和其它的层皆可用本发明在真空环境中制备。
本说明书结论部分具体和明确地对本发明的主题提出了权利要求,但是操作和编排方法两者及其其它优点和目的最好参阅下面的详细叙述结合附图来理解,其中相似的代码系指类似部件。
附图描述
图1是现有技术中无机化合物辉光发电等离子体发生器与闪蒸相组合的剖面图。
图2是本发明的闪蒸发和辉光放电等离子体沉积相组合的设备的剖面图。
图2a是本发明的设备的剖面端视图。
图3是本发明的以衬底作电极的剖面图。
优选实施方案描述
本发明的设备示于图2。本发明的设备和方法宜于在低压(真空)环境或室中实施。压力宜界于10-1乇-10-6乇。闪蒸器106拥有壳体116、单体入口118和雾化喷嘴120。经喷嘴120的物流雾化为颗粒或微滴122,颗粒或微滴122撞击加热表面124,并在其上颗粒或微滴闪蒸为气体或蒸发物,后者流经一系列挡板126至蒸发物出口128并低温冷凝在表面102上。防止在挡板126和其它内部构件表面上的低温冷凝的措施是将挡板126和其它内部构件表面加热到超过蒸发物的低温冷凝温度或其露点。虽然采用过其它的气流分布装置,但发现挡板126能提供适宜的气流分布和均匀度,同时易使表面102放大。蒸发物出口128将气体导向辉光放电电极204,使蒸发物生成辉光放电等离子体。在图2所示的实施方案中,辉光放电电极204置于辉光放电壳体200之中,壳体有蒸发物入口202,它靠近蒸发物出口128。在这个实施方案中,辉光放电壳体200和辉光放电电极204的温度保持在蒸发物露点以上。辉光放电等离子体流出辉光放电壳体200并在衬底104的表面102上低温冷凝。衬底104的温度宜保持在蒸发物露点以下,宜为室温或冷却至室温以下,以便提高低温冷凝速率。在这个实施方案中,衬底104是在移动,并可以是不导电的、导电的或经外加电压加上偏压,以便将带电粒子从辉光放电等离子体中引出。如果衬底104带偏压,它甚至可取代电极204,本身成为使单体气形成辉光放电等离子体的电极。基本上无偏压意味着未施加外电压,虽然可由于静电或由于与等离子体的相互作用会积累电荷。
辉光放电电极的一种优选形状示于图2a。在这个实施方案中,辉光放电电极204与衬底104是分开的,而且其形状使从蒸发物入口202来的物流基本上流经电极开口206。任何一种电极形状皆可用于形成辉光放电,但是电极204的优选形状不遮挡从出口202流出的蒸发物形成的等离子体,并且它相对于单体出口缝202和衬底104的对称关系提供在衬底宽度上蒸发物蒸汽流对等离子体的均匀性,同时横向宽度均匀性由衬底的移动来得到。
电极204与衬底材104形成的空间是能使等离子体撞击在衬底上的间隙或距离。等离子体从电极延伸出的这段距离将取决于蒸发的物质、电极204/底材104的几何、电压和频率以及压力,其标准方式详细叙述于“气体中的放电”,F.M.Penning,Gordon and Breach Seience出版社,1965,并摘要载于“薄膜方法”,J.L.Vossen、W.Kern编,科学出版社,1978,Part II,Chapter II-1,“辉光放电溅射沉积”,本文将两者均引此为参考。
一种适于间歇操作的设备示于图3。在这个实施方案中,辉光放电电极204与部件300(衬底)足够靠近,以致部件300成了电极204的延伸或组成部分。此外,该部件温度低于露点,以使辉光放电等离子体在部件300上低温冷凝,从而以单体冷凝物涂复部件300并自固化为聚合物层。足够靠近可以是与之连接、靠在其上直接接触或用能使等离子体撞击衬底的间隙或距离。等离子体从电极延伸出的这段距离将取决于蒸发的物质、电极204/底材104的几何、电压和频率以及压力,其标准方式叙述于“气体中的放电”,F.M.Penning,Cordon and Breach出版社,1965,本文引为参考。衬底300在低温冷凝过程中可处于静止或移动中。移动包括旋转和平移,并可以用于控制其上低温冷凝的单体层的厚度和均匀度。由于低温冷凝发生很快,在毫秒和秒之间发生,部件可在涂复之后和在超过涂复温度限值之前卸出。
操作中,不管是作为在衬底上进行低蒸汽压单体材料的等离子体增强化学蒸汽沉积方法,或者是作为形成自固化聚合物层(特别是PML)方法,本发明的方法具有下列步骤:(a)闪蒸液体单体,在蒸发物出口形成蒸发物;(b)使蒸发物通过辉光放电电极使蒸发物形成辉光放电单体等离子体;和(c)将辉光放电单体等离子体低温冷凝在衬底上,并将辉光放电等离子体交联其上。辉光放电等离子体中产生的自由基导致交联,从而能实现自固化。
闪蒸具有下列步骤:单体液体流入入口;单体液体经喷嘴雾化;和喷雾形成大量单体液体的单体颗粒。喷雾朝向在其上蒸发的加热蒸发表面,并通过蒸发物出口流出。
该液体单体可以是任何液体单体。但是,优选的单体材料或液体在室温下具有低蒸汽压,以致它易于低温冷凝。单体材料的蒸汽压在83°F(28.3℃)下宜小于10乇,优选在83°F(28.3℃)下低于1乇,最优选在83°F(28.3℃)下低于10毫乇。对于同一化学族的单体,低蒸汽压的单体通常亦具有较高的分子量,并比较高蒸汽压、较低分子量的单体易于低温冷凝。液体单体包括但不限于丙烯酸单体例如三丙二醇二丙烯酸酯、四甘醇二丙烯酸酯、三丙二醇单丙烯酸酯、己内酯丙烯酸酯及其组合;甲基丙烯酸单体;及其组合。(甲基)丙烯酸单体特别适于制造分子掺杂聚合物(MDP),光发射聚合物(LEP)和光发射电化学电池(LEC)。
借助于采用闪蒸,单体很快蒸发,以致通常在从加热液体单体到蒸发温度之间发生的反应不再发生。此外,蒸发物供给速率严格地用进入闪蒸器106的进口118的液体单体的进料速率控制。
除了从液体单体产生的蒸发物外,在闪蒸器106中可以加入附加气体,该气体通过蒸发物出口128上游的气体入口130加入,优选在加热表面124和最靠近加热表面124的第一块挡板126之间加入。附加气体可以是有机的或无机的,其目的包括但不限于镇流、反应及其组合。镇流系指提供足够的分子,以便在低蒸发流量下保持等离子体点火。反应系指生成不同于蒸发物的化合物的化学反应。镇流气体包括但不限于周期表VIII族元素,氢、氧、氮、氯、溴、多原子气体包括例如二氢化碳、一氧化碳、水蒸气及它们的组合。一个示例性的反应是将氧添加到六甲基二硅氧烷中以得到二氧化硅。
实施例1
曾经进行了一个实验,以论证示于图2和上面所述的本发明。采用四甘醇二丙烯酸酯作液体单体。加热表面的温度设定在约650°F(343℃)。液体单体经内径为0.032英寸的毛细管引入入口。超声雾化器喷嘴的内径为0.051英寸。聚合物层的沉积速率对25微米厚聚合物层而言为0.5m/min,对1微米厚的聚合物层而言为100m/min。目检固化的聚合物层未发现任何针孔或裂痕。
结束语
尽管给出和叙述了本发明的优选实施方案,但对本专业技术人员来说,在不偏离本发明较宽的范围的前提下可作很多变更和修改。因此附录的权利要求试图概括在本发明的实质和范围内的所有这些变化和修改。

Claims (13)

1.一种用于在真空室中制造自固化聚合物层的设备,包括:
(a)闪蒸壳体,该壳体带有单体入口、单体雾化器,用于从该单体入口接受液体单体并制成单体颗粒、加热的蒸发表面,用于从该单体颗粒制备蒸发物、以及蒸发物出口;和
(b)辉光放电电极,该电极位于蒸发物出口25的下游,并从蒸发物制备辉光放电等离子体;以及
(c)衬底,用于在其上接受低温冷凝和交联辉光放电等离子体,辉光放电等离子体中产生的自由基导致交联,使其自固化。
2.权利要求1的设备,其中衬底靠近辉光放电电极,并由外加电压施加偏压。
3.权利要求1的设备,其中该辉光放电电极置于辉光放电壳体内部,该壳体具有靠近蒸发物出口的蒸发物入口,该辉光放电壳体和该辉光放电电极的温度保持在该蒸发物的露点以上。
4.权利要求1的设备,其中该闪蒸壳体具有置于加热表面和蒸汽出口之间的对立置放的挡板。
5.权利要求1的设备,还包括气体入口。
6.一种在真空室中用于制备自固化聚合物层的方法,包括:
(a)闪蒸低蒸汽压的液体单体为蒸发物;
(b)使蒸发物通过辉光放电电极,并从蒸发物制备辉光放电单体等离子体;和
(c)将该辉光放电单体等离子体低温冷凝在衬底上,作为低温冷凝单体,并使该低温冷凝单体交联于衬底上,该辉光放电等离子体中产生的自由基导致交联,使其自固化。
7.权利要求6的方法,其中衬底靠近辉光放电电极,并被外加电压施加偏压,接受冷凝其上的单体等离子体。
8.权利要求6的方法,其中该辉光放电电极置于辉光放电壳体内部,该壳体有靠近蒸发物出口的蒸发物入口,该辉光放电壳体和该辉光放电电极的温度保持在该蒸发物的露点以上,衬底位于该单体等离子体的下游,未施加外电压,虽然可由于静电或由于与等离子体的相互作用会积累电荷,用于接受冷凝其上的单体等离子体。
9.权利要求6的方法,其中该单体选自丙烯酸单体、甲基丙烯酸单体及其组合。
10.权利要求9的方法,其中该丙烯酸单体选自三丙二醇二丙烯酸酯、四甘醇二丙烯酸酯、三丙二醇单丙烯酸酯、己内酯丙烯酸酯及其组合。
11.权利要求6的方法,其中该衬底是经冷却的。
12.权利要求6的方法,其中,该低蒸汽压是在83°F(28.3℃)下小于10乇。
13.权利要求6的方法,其中辉光放电电极位于壳体中,而衬底位于单体等离子体的下游。
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107058982A (zh) * 2017-01-23 2017-08-18 无锡荣坚五金工具有限公司 一种具有多层结构防液涂层的制备方法

Families Citing this family (86)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6224948B1 (en) 1997-09-29 2001-05-01 Battelle Memorial Institute Plasma enhanced chemical deposition with low vapor pressure compounds
US6228436B1 (en) * 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making light emitting polymer composite material
WO2000036665A1 (en) 1998-12-16 2000-06-22 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
US6274204B1 (en) 1998-12-16 2001-08-14 Battelle Memorial Institute Method of making non-linear optical polymer
US6268695B1 (en) 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
US6228434B1 (en) * 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making a conformal coating of a microtextured surface
US6207238B1 (en) * 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition for high and/or low index of refraction polymers
US6207239B1 (en) * 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition of conjugated polymer
US6217947B1 (en) 1998-12-16 2001-04-17 Battelle Memorial Institute Plasma enhanced polymer deposition onto fixtures
US6172810B1 (en) 1999-02-26 2001-01-09 3M Innovative Properties Company Retroreflective articles having polymer multilayer reflective coatings
US6503564B1 (en) 1999-02-26 2003-01-07 3M Innovative Properties Company Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile
US6358570B1 (en) 1999-03-31 2002-03-19 Battelle Memorial Institute Vacuum deposition and curing of oligomers and resins
US6506461B2 (en) 1999-03-31 2003-01-14 Battelle Memorial Institute Methods for making polyurethanes as thin films
US6573652B1 (en) 1999-10-25 2003-06-03 Battelle Memorial Institute Encapsulated display devices
US7198832B2 (en) * 1999-10-25 2007-04-03 Vitex Systems, Inc. Method for edge sealing barrier films
US6548912B1 (en) 1999-10-25 2003-04-15 Battelle Memorial Institute Semicoductor passivation using barrier coatings
US20090191342A1 (en) * 1999-10-25 2009-07-30 Vitex Systems, Inc. Method for edge sealing barrier films
US6413645B1 (en) 2000-04-20 2002-07-02 Battelle Memorial Institute Ultrabarrier substrates
US6623861B2 (en) 2001-04-16 2003-09-23 Battelle Memorial Institute Multilayer plastic substrates
US20100330748A1 (en) 1999-10-25 2010-12-30 Xi Chu Method of encapsulating an environmentally sensitive device
US6866901B2 (en) * 1999-10-25 2005-03-15 Vitex Systems, Inc. Method for edge sealing barrier films
US20070196682A1 (en) * 1999-10-25 2007-08-23 Visser Robert J Three dimensional multilayer barrier and method of making
US6492026B1 (en) 2000-04-20 2002-12-10 Battelle Memorial Institute Smoothing and barrier layers on high Tg substrates
AUPQ859000A0 (en) 2000-07-06 2000-07-27 Commonwealth Scientific And Industrial Research Organisation Apparatus for surface engineering
WO2002004552A1 (en) * 2000-07-06 2002-01-17 Commonwealth Scientific And Industrial Research Organisation A process for modifying the surface of a substrate containing a polymeric material by means of vaporising the surface modifying agent
US6468595B1 (en) * 2001-02-13 2002-10-22 Sigma Technologies International, Inc. Vaccum deposition of cationic polymer systems
US6599584B2 (en) * 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
AU2002305393A1 (en) * 2001-05-04 2002-11-18 General Atomics O2 and h2o barrier material
US20090208754A1 (en) * 2001-09-28 2009-08-20 Vitex Systems, Inc. Method for edge sealing barrier films
US6888305B2 (en) * 2001-11-06 2005-05-03 Universal Display Corporation Encapsulation structure that acts as a multilayer mirror
US6597111B2 (en) 2001-11-27 2003-07-22 Universal Display Corporation Protected organic optoelectronic devices
US6765351B2 (en) * 2001-12-20 2004-07-20 The Trustees Of Princeton University Organic optoelectronic device structures
US7012363B2 (en) * 2002-01-10 2006-03-14 Universal Display Corporation OLEDs having increased external electroluminescence quantum efficiencies
GB0207350D0 (en) * 2002-03-28 2002-05-08 Univ Sheffield Surface
US6897474B2 (en) * 2002-04-12 2005-05-24 Universal Display Corporation Protected organic electronic devices and methods for making the same
US6835950B2 (en) 2002-04-12 2004-12-28 Universal Display Corporation Organic electronic devices with pressure sensitive adhesive layer
US8900366B2 (en) * 2002-04-15 2014-12-02 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US8808457B2 (en) 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
KR100475849B1 (ko) * 2002-04-17 2005-03-10 한국전자통신연구원 습식 공정에 의하여 형성된 엔캡슐레이션 박막을 갖춘유기 전기발광 소자 및 그 제조 방법
US20040028931A1 (en) 2002-06-26 2004-02-12 Bletsos Ioannis V. Coated sheet materials and packages made therewith
US7224116B2 (en) * 2002-09-11 2007-05-29 Osram Opto Semiconductors Gmbh Encapsulation of active electronic devices
US20040048033A1 (en) * 2002-09-11 2004-03-11 Osram Opto Semiconductors (Malaysia) Sdn. Bhd. Oled devices with improved encapsulation
US6887733B2 (en) * 2002-09-11 2005-05-03 Osram Opto Semiconductors (Malaysia) Sdn. Bhd Method of fabricating electronic devices
US7193364B2 (en) * 2002-09-12 2007-03-20 Osram Opto Semiconductors (Malaysia) Sdn. Bhd Encapsulation for organic devices
US7510913B2 (en) * 2003-04-11 2009-03-31 Vitex Systems, Inc. Method of making an encapsulated plasma sensitive device
US7648925B2 (en) * 2003-04-11 2010-01-19 Vitex Systems, Inc. Multilayer barrier stacks and methods of making multilayer barrier stacks
US20040202708A1 (en) * 2003-04-14 2004-10-14 3M Innovative Properties Company Transdermal drug delivery device with translucent inorganic barrier layer
US20040238846A1 (en) * 2003-05-30 2004-12-02 Georg Wittmann Organic electronic device
US7051282B2 (en) * 2003-06-13 2006-05-23 Microsoft Corporation Multi-layer graphical user interface
US7052772B2 (en) * 2003-08-14 2006-05-30 3M Innovative Properties Company Material for packaging electronic components
US6998648B2 (en) * 2003-08-25 2006-02-14 Universal Display Corporation Protected organic electronic device structures incorporating pressure sensitive adhesive and desiccant
WO2005021833A2 (en) * 2003-08-28 2005-03-10 Surface Innovations Limited Apparatus for the coating and/or conditioning of substrates
CN1296515C (zh) * 2004-05-13 2007-01-24 上海交通大学 自辉光等离子体基离子注入或者注入且沉积装置
US20050269943A1 (en) * 2004-06-04 2005-12-08 Michael Hack Protected organic electronic devices and methods for making the same
FR2874606B1 (fr) * 2004-08-26 2006-10-13 Saint Gobain Procede de transfert d'une molecule organique fonctionnelle sur un substrat transparent
US20060145599A1 (en) * 2005-01-04 2006-07-06 Reza Stegamat OLEDs with phosphors
DE112005003484A5 (de) * 2005-03-31 2008-07-24 Applied Materials Gmbh & Co. Kg Vorrichtung und Verfahren zum Beschichten von Substraten
US7767498B2 (en) 2005-08-25 2010-08-03 Vitex Systems, Inc. Encapsulated devices and method of making
KR20080080154A (ko) * 2005-12-29 2008-09-02 쓰리엠 이노베이티브 프로퍼티즈 컴파니 코팅 공정을 위한 물질의 분무화 방법
JPWO2007111092A1 (ja) 2006-03-24 2009-08-06 コニカミノルタエムジー株式会社 透明バリア性シートおよび透明バリア性シートの製造方法
EP2000300A4 (en) 2006-03-24 2009-08-05 Konica Minolta Med & Graphic TRANSPARENT BARRIER SHEET AND METHOD FOR PRODUCING SAME
WO2007111074A1 (ja) 2006-03-24 2007-10-04 Konica Minolta Medical & Graphic, Inc. 透明バリア性シート及び透明バリア性シートの製造方法
EP2000297A1 (en) 2006-03-24 2008-12-10 Konica Minolta Medical & Graphic, Inc. Transparent barrier sheet and method for producing transparent barrier sheet
US8088502B2 (en) * 2006-09-20 2012-01-03 Battelle Memorial Institute Nanostructured thin film optical coatings
US8606591B2 (en) * 2006-11-10 2013-12-10 The Charlotte-Mecklenburg Hospital Authority Systems, methods, and computer program products for determining an optimum hernia repair procedure
CN101573228B (zh) 2006-12-28 2015-08-05 3M创新有限公司 用于薄膜金属层形成的成核层
BRPI0720867A2 (pt) * 2006-12-29 2014-03-04 3M Innovative Properties Company. Método para fabricação de filmes inorgânicos ou híbridos inorgânicos/orgânicos
US20090162667A1 (en) * 2007-12-20 2009-06-25 Lumination Llc Lighting device having backlighting, illumination and display applications
WO2009086095A2 (en) * 2007-12-28 2009-07-09 3M Innovative Properties Company Flexible encapsulating film systems
WO2010002755A2 (en) 2008-06-30 2010-01-07 3M Innovative Properties Company Method of making inorganic or inorganic/organic hybrid barrier films
US9184410B2 (en) * 2008-12-22 2015-11-10 Samsung Display Co., Ltd. Encapsulated white OLEDs having enhanced optical output
US9337446B2 (en) * 2008-12-22 2016-05-10 Samsung Display Co., Ltd. Encapsulated RGB OLEDs having enhanced optical output
US20100167002A1 (en) * 2008-12-30 2010-07-01 Vitex Systems, Inc. Method for encapsulating environmentally sensitive devices
US8394463B1 (en) 2009-01-23 2013-03-12 Medtronic Minimed, Inc. Crosslinking compounds at negative pressures and materials made by such methods
US8590338B2 (en) 2009-12-31 2013-11-26 Samsung Mobile Display Co., Ltd. Evaporator with internal restriction
EP2522034A1 (en) 2010-01-06 2012-11-14 Dow Global Technologies LLC Moisture resistant photovoltaic devices with elastomeric, polysiloxane protection layer
DE102010000479A1 (de) * 2010-02-19 2011-08-25 Aixtron Ag, 52134 Vorrichtung zur Homogenisierung eines verdampften Aerosols sowie Vorrichtung zum Abscheiden einer organischen Schicht auf einem Substrat mit einer derartigen Homogenisierungseinrichtung
CN104637755B (zh) * 2013-11-15 2017-02-22 核工业西南物理研究院 分层水冷式辉光放电电极
KR102345944B1 (ko) 2013-12-19 2021-12-31 쓰리엠 이노베이티브 프로퍼티즈 캄파니 배리어 필름 및 이를 채용하는 진공 단열 패널
CN105887464B (zh) * 2016-05-04 2018-04-20 盐城工学院 一种多功能自清洁纺织品的整理方法
CN106622891B (zh) * 2016-08-30 2023-12-01 江苏菲沃泰纳米科技股份有限公司 一种紫外辐照辅助等离子体聚合表面涂层装置及方法
CN107537266B (zh) * 2017-10-10 2023-05-05 北京恒丰亚业科技发展有限公司 一种高温热解气体的除尘系统及除尘方法
CN111204819B (zh) * 2020-01-21 2022-03-11 西北师范大学 一种利用液体阴极辉光放电等离子体技术制备纳米Co3O4的方法
CN112495691B (zh) * 2020-10-27 2022-04-12 南京科赫科技有限公司 一种烟气净化用滤袋深度镀膜装置
WO2022243790A1 (en) 2021-05-19 2022-11-24 3M Innovative Properties Company Packaged abrasive articles
CN113564378B (zh) * 2021-07-21 2022-10-25 上海交通大学 一种低温等离子体还原溶液中贵金属离子的装置

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475307A (en) * 1965-02-04 1969-10-28 Continental Can Co Condensation of monomer vapors to increase polymerization rates in a glow discharge
FR1393629A (fr) 1965-09-13 1965-03-26 Continental Oil Co Procédé et appareil pour enduire des feuilles en matières solides
US3607365A (en) 1969-05-12 1971-09-21 Minnesota Mining & Mfg Vapor phase method of coating substrates with polymeric coating
US4098965A (en) 1977-01-24 1978-07-04 Polaroid Corporation Flat batteries and method of making the same
JPS55129345A (en) * 1979-03-29 1980-10-07 Ulvac Corp Electron beam plate making method by vapor phase film formation and vapor phase development
US4581337A (en) 1983-07-07 1986-04-08 E. I. Du Pont De Nemours And Company Polyether polyamines as linking agents for particle reagents useful in immunoassays
US4842893A (en) 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US5032461A (en) 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
DE3571772D1 (en) 1984-03-21 1989-08-31 Ulvac Corp Improvements in or relating to the covering of substrates with synthetic resin films
US4695618A (en) 1986-05-23 1987-09-22 Ameron, Inc. Solventless polyurethane spray compositions and method for applying them
WO1987007848A1 (en) 1986-06-23 1987-12-30 Spectrum Control, Inc. Flash evaporation of monomer fluids
US4954371A (en) * 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
JPH07105034B2 (ja) 1986-11-28 1995-11-13 株式会社日立製作所 磁気記録体
JP2627619B2 (ja) 1987-07-13 1997-07-09 日本電信電話株式会社 有機非晶質膜作製方法
US4847469A (en) 1987-07-15 1989-07-11 The Boc Group, Inc. Controlled flow vaporizer
JPH02183230A (ja) 1989-01-09 1990-07-17 Sharp Corp 有機非線形光学材料及びその製造方法
JP2678055B2 (ja) 1989-03-30 1997-11-17 シャープ株式会社 有機化合物薄膜の製法
US5792550A (en) 1989-10-24 1998-08-11 Flex Products, Inc. Barrier film having high colorless transparency and method
US5204314A (en) 1990-07-06 1993-04-20 Advanced Technology Materials, Inc. Method for delivering an involatile reagent in vapor form to a CVD reactor
US5711816A (en) 1990-07-06 1998-01-27 Advanced Technolgy Materials, Inc. Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same
US5362328A (en) 1990-07-06 1994-11-08 Advanced Technology Materials, Inc. Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem
JP2755844B2 (ja) 1991-09-30 1998-05-25 シャープ株式会社 プラスチック基板液晶表示素子
US5372851A (en) 1991-12-16 1994-12-13 Matsushita Electric Industrial Co., Ltd. Method of manufacturing a chemically adsorbed film
US5759329A (en) 1992-01-06 1998-06-02 Pilot Industries, Inc. Fluoropolymer composite tube and method of preparation
JP2958186B2 (ja) 1992-04-20 1999-10-06 シャープ株式会社 プラスチック基板液晶表示素子
US5427638A (en) 1992-06-04 1995-06-27 Alliedsignal Inc. Low temperature reaction bonding
US5652192A (en) 1992-07-10 1997-07-29 Battelle Memorial Institute Catalyst material and method of making
GB9215928D0 (en) 1992-07-27 1992-09-09 Cambridge Display Tech Ltd Manufacture of electroluminescent devices
US5260095A (en) 1992-08-21 1993-11-09 Battelle Memorial Institute Vacuum deposition and curing of liquid monomers
DE4232390A1 (de) 1992-09-26 1994-03-31 Roehm Gmbh Verfahren zum Erzeugen von siliciumoxidischen kratzfesten Schichten auf Kunststoffen durch Plasmabeschichtung
JPH06182935A (ja) 1992-12-18 1994-07-05 Bridgestone Corp ガスバリア性ゴム積層物及びその製造方法
ATE233939T1 (de) 1993-10-04 2003-03-15 3M Innovative Properties Co Vernetztes acrylatbeschichtungsmaterial zur herstellung von kondensatordielektrika und sauerstoffbarrieren
US5440446A (en) 1993-10-04 1995-08-08 Catalina Coatings, Inc. Acrylate coating material
US5654084A (en) 1994-07-22 1997-08-05 Martin Marietta Energy Systems, Inc. Protective coatings for sensitive materials
US6083628A (en) 1994-11-04 2000-07-04 Sigma Laboratories Of Arizona, Inc. Hybrid polymer film
US5607789A (en) 1995-01-23 1997-03-04 Duracell Inc. Light transparent multilayer moisture barrier for electrochemical cell tester and cell employing same
US5620524A (en) 1995-02-27 1997-04-15 Fan; Chiko Apparatus for fluid delivery in chemical vapor deposition systems
US5811183A (en) 1995-04-06 1998-09-22 Shaw; David G. Acrylate polymer release coated sheet materials and method of production thereof
US5554220A (en) 1995-05-19 1996-09-10 The Trustees Of Princeton University Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities
JPH08325713A (ja) 1995-05-30 1996-12-10 Matsushita Electric Works Ltd 有機質基材表面への金属膜形成方法
US5629389A (en) 1995-06-06 1997-05-13 Hewlett-Packard Company Polymer-based electroluminescent device with improved stability
DE69631136T2 (de) 1995-06-30 2004-09-23 Commonwealth Scientific And Industrial Research Organisation Verbesserte oberflächenbehandlung von polymeren
US5681615A (en) 1995-07-27 1997-10-28 Battelle Memorial Institute Vacuum flash evaporated polymer composites
JPH0959763A (ja) 1995-08-25 1997-03-04 Matsushita Electric Works Ltd 有機質基材表面への金属膜形成方法
US5723219A (en) 1995-12-19 1998-03-03 Talison Research Plasma deposited film networks
DE19603746A1 (de) 1995-10-20 1997-04-24 Bosch Gmbh Robert Elektrolumineszierendes Schichtsystem
US5686360A (en) 1995-11-30 1997-11-11 Motorola Passivation of organic devices
US5811177A (en) 1995-11-30 1998-09-22 Motorola, Inc. Passivation of electroluminescent organic devices
US5684084A (en) 1995-12-21 1997-11-04 E. I. Du Pont De Nemours And Company Coating containing acrylosilane polymer to improve mar and acid etch resistance
US5955161A (en) 1996-01-30 1999-09-21 Becton Dickinson And Company Blood collection tube assembly
US5763033A (en) 1996-01-30 1998-06-09 Becton, Dickinson And Company Blood collection tube assembly
US5716683A (en) 1996-01-30 1998-02-10 Becton, Dickinson And Company Blood collection tube assembly
US5683771A (en) 1996-01-30 1997-11-04 Becton, Dickinson And Company Blood collection tube assembly
US5738920A (en) 1996-01-30 1998-04-14 Becton, Dickinson And Company Blood collection tube assembly
US5731948A (en) 1996-04-04 1998-03-24 Sigma Labs Inc. High energy density capacitor
US6106627A (en) 1996-04-04 2000-08-22 Sigma Laboratories Of Arizona, Inc. Apparatus for producing metal coated polymers
US5731661A (en) 1996-07-15 1998-03-24 Motorola, Inc. Passivation of electroluminescent organic devices
US5902688A (en) 1996-07-16 1999-05-11 Hewlett-Packard Company Electroluminescent display device
US5693956A (en) 1996-07-29 1997-12-02 Motorola Inverted oleds on hard plastic substrate
US5844363A (en) 1997-01-23 1998-12-01 The Trustees Of Princeton Univ. Vacuum deposited, non-polymeric flexible organic light emitting devices
US5948552A (en) 1996-08-27 1999-09-07 Hewlett-Packard Company Heat-resistant organic electroluminescent device
WO1998010116A1 (en) 1996-09-05 1998-03-12 Talison Research Ultrasonic nozzle feed for plasma deposited film networks
KR19980033213A (ko) 1996-10-31 1998-07-25 조셉제이.스위니 스퍼터링 챔버내의 미립자 물질 발생 감소 방법
US5821692A (en) 1996-11-26 1998-10-13 Motorola, Inc. Organic electroluminescent device hermetic encapsulation package
US5912069A (en) 1996-12-19 1999-06-15 Sigma Laboratories Of Arizona Metal nanolaminate composite
US5872355A (en) 1997-04-09 1999-02-16 Hewlett-Packard Company Electroluminescent device and fabrication method for a light detection system
US5965907A (en) 1997-09-29 1999-10-12 Motorola, Inc. Full color organic light emitting backlight device for liquid crystal display applications
US5902641A (en) 1997-09-29 1999-05-11 Battelle Memorial Institute Flash evaporation of liquid monomer particle mixture
US6224948B1 (en) 1997-09-29 2001-05-01 Battelle Memorial Institute Plasma enhanced chemical deposition with low vapor pressure compounds
US6194487B1 (en) 1997-11-14 2001-02-27 Sharp Kabushiki Kaisha Method of manufacturing modified particles
US6045864A (en) 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
DE19802740A1 (de) 1998-01-26 1999-07-29 Leybold Systems Gmbh Verfahren zur Behandlung von Oberflächen von Substraten aus Kunststoff
US5996498A (en) 1998-03-12 1999-12-07 Presstek, Inc. Method of lithographic imaging with reduced debris-generated performance degradation and related constructions
US5904958A (en) 1998-03-20 1999-05-18 Rexam Industries Corp. Adjustable nozzle for evaporation or organic monomers
US6146225A (en) 1998-07-30 2000-11-14 Agilent Technologies, Inc. Transparent, flexible permeability barrier for organic electroluminescent devices
US6207239B1 (en) * 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition of conjugated polymer

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* Cited by examiner, † Cited by third party
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CN107058982A (zh) * 2017-01-23 2017-08-18 无锡荣坚五金工具有限公司 一种具有多层结构防液涂层的制备方法
CN107058982B (zh) * 2017-01-23 2018-06-19 江苏菲沃泰纳米科技有限公司 一种具有多层结构防液涂层的制备方法

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US20010019747A1 (en) 2001-09-06
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US6627267B2 (en) 2003-09-30
CN1272142A (zh) 2000-11-01
US6656537B2 (en) 2003-12-02
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