CN106527059A - Interested region use method in laser direct writing field - Google Patents
Interested region use method in laser direct writing field Download PDFInfo
- Publication number
- CN106527059A CN106527059A CN201611267978.XA CN201611267978A CN106527059A CN 106527059 A CN106527059 A CN 106527059A CN 201611267978 A CN201611267978 A CN 201611267978A CN 106527059 A CN106527059 A CN 106527059A
- Authority
- CN
- China
- Prior art keywords
- region
- dmd
- emerging
- laser direct
- micro mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
Abstract
The invention relates to the laser direct writing field, specifically to an interested region use method in the laser direct writing field. In the prior art, the overall layout of a digital micromirror device on laser direct writing equipment is often used, which causes the shortcomings of relatively low refresh rate of the digital micromirror device, high data size in refreshing, and relatively short service life. The invention provides the interested region use method for the digital micromirror device in the laser direct writing field. A partial region in the digital micromirror device is selected as an interested region to be input in use while the other part is an idle region; and after a micromirror unit in the interested region is aged, and reflective efficiency declines when production requirement cannot be satisfied, the idle region is started. By adoption of the use method, the repeated utilization rate of the digital micromirror device is improved, hardware cost input in post maintenance is reduced, and the service life of the digital micromirror device is prolonged.
Description
Technical field
The present invention relates to laser direct-writing field, and in particular to the emerging region using method of sense in laser direct-writing field.
Background technology
It is in existing laser direct writing equipment, commonly used to DMD (Digital Micromirror
Devices, abbreviation DMD), DMD is to perform mechanical movement to realize the dress of optical function with digital voltage signal control micromirror
Put..Current silicon micromachining technology has been able to process the high-quality dmd chip for meeting technological requirement, on a silicon chip
Hundreds of thousands or up to a million micro-reflectors can be once manufactured, the general rectangular permutation of these micro-reflectors is arranged on DMD.
In prior art, the using method of DMD is such, and DMD is typically mounted on scan axises, and DMD is along sweeping
Direction that axle moved along a straight line back and forth is retouched scanning direction, or DMD is maintained static, object to be exposed does straight line under DMD back and forth
Scanning direction is also named in motion, the direction of this linear motion.In scanning process, installation site two kinds of situations of presence of DMD, one
It is that positive installation also makes DMD directly sweep to plant, i.e. on DMD, the line direction or column direction of micro mirror array are identical with scanning direction；It is another kind of
Be it is diagonally-installed also cry DMD incline use, i.e. on DMD, the line direction and column direction of micro mirror array are different from scanning direction, he
There is an angle.When DMD is inclined to be used, DMD micro mirror units have the movement locus of oneself, and we are referred to as the micro mirror list
The scan line of unit.Under specific angle, the spacing between the adjacent scan line of DMD is equal.In this case, if
The line number for participating in scanning in DMD is enough, then, in same scan line, can there are at least two or more DMD micro mirrors
Unit, the line number at minimum interval between the DMD micro mirror units of these same scan lines is periodically occur, this row
One number time is referred to as obliquity factor.
In prior art, often justifying face uses the DMD on laser direct writing equipment, due to digital micromirror device
Part is made up of substantial amounts of micro mirror unit, and when some micromirrors Elementary Function fails, whole DMD is scrapped, in addition micro mirror
Unit after life-time service also can ageing failure cause DMD to scrap, also can be scrapped because of the damage of indivedual micro mirror units in advance；
The premature failure of DMD, causes the shortcoming that DMD utilization rate is not high and service life is relatively short.
The content of the invention
Present invention aim at providing a kind of sense in laser direct-writing field emerging region using method, digital micro-mirror can be improved
The utilization rate of device, extends the service life of DMD.
In order to realize foregoing invention purpose, the present invention provides a kind of sense in laser direct-writing field emerging region using method, choosing
In selecting DMD, subregion is used as emerging regional inputs are felt, and other parts are left unused；Feel the micro mirror unit in emerging region
Aging or some micromirrors unit is damaged, it is impossible to when meeting Production requirement, enable idle region.
Preferably, when DMD is inclined to be used, the micro mirror unit line number that the described emerging region of sense is opened is number
The integral multiple of the word micro-mirror devices tilt factor.
Preferably, the micro mirror unit line number in the described emerging region of sense is less than the one of the total micro mirror unit line number of DMD
Half.
Preferably, the micro mirror unit line width in the described emerging region of sense selects the micro mirror unit line width phase with DMD
Together.
The method have technical effect that：
（1）In selecting DMD, subregion is used as emerging regional inputs are felt, and other parts are left unused；Feel emerging region
After micro mirror unit is aging, reflection efficiency drops to when can not meet production requirement, enables idle region.So feel old on emerging region
After changing failure, idle region can be then used by so that DMD regains a military service cycle.Numeral can so be improved micro-
Mirror device recycling rate of waterused, the input of hardware cost when reducing later maintenance, extends the length of service of DMD；Other part
Using DMD, the refresh rate of DMD can be increased, while decreasing the data volume in process of data communication.
（2）It is in prior art, when DMD is inclined to be used, on the upper straight lines along scanning direction of DMD, often solid through one
There is a micro mirror unit in fixed line number cycle, the obliquity factor of the line number in this line number cycle DMD.This
In bright preferred version, the integral multiple that the micro mirror unit line number opened in emerging region is DMD obliquity factor is felt.So may be used
So that after emerging regional inputs use is felt on DMD, it is ensured that the number of times by reirradiation of each exposure position is identical.
（3）If the micro mirror unit line number in the emerging region of sense is higher than the half of the total micro mirror unit line number of DMD, then
Feel emerging region and idle region to replace when using, no enough being substituted with line number is felt emerging region by idle region, is replaced
Exposure effect in front and back cannot be consistent.The preferred version of the present invention requires the micro mirror unit line number in the emerging region of sense less than numeral
The half of the total micro mirror unit line number of micro mirror element.After so may insure to feel emerging region ageing failure, idle region can be complete
Substitute the emerging region of sense to be operated, it is ensured that the concordance of exposure effect before and after replacement.
（4）DMD is maximally utilized in order to reach, the line width for feeling micro mirror unit on emerging region is maximized as far as possible, this
The area coverage of the scan stripes band of sample single sweep operation is maximum, can improve exposure rate.As the preferred version of the present invention, feel emerging
Micro mirror unit line width of the line width of the micro mirror unit in region using DMD so that the scan efficiency in the emerging region of sense is maximized.
Description of the drawings
Fig. 1 be embodiment 1 in feel position view of the emerging region in DMD；
Fig. 2 be embodiment 2 in feel position view of the emerging region in DMD；
Fig. 3 be embodiment 3 in feel position view of the emerging region in DMD.
Specific embodiment
Technical scheme is clearly and completely described below in conjunction with drawings and Examples.
Embodiment 1：
Referring to the drawings 1, embodiment 1 to be embodied as situation as follows：
（1）3 forward direction of DMD directly sweeps use；
（2）DMD 3 is divided into two regions, and one is idle region 2 to feel emerging region 1 and another；Gan Xing areas
Domain 1 is first come into operation, and after feeling emerging 1 ageing failure of region or damaging, enables idle region 2.So can exponentially extend numeral
The service life of micro mirror element 3.
（3）Feel the micro mirror unit line width of the micro mirror unit line width for DMD 3 in emerging region 1.So can be with maximum
Change the scan efficiency of DMD 3.
Embodiment 2：
Referring to the drawings 2, embodiment 2 to be embodied as situation as follows：
（1）3 forward direction of DMD directly sweeps use；
（2）DMD 3 is divided into 4 regions, and one is the emerging region 1 of sense and idle region 2, idle region 5, idle area
Domain 6；
（3）Feel emerging region 1 first to come into operation, after feeling emerging 1 ageing failure of region or damaging, enable idle region 2.
（4）After 2 ageing failure of idle region or damage, idle region 5 is enabled.
（5）After 5 ageing failure of idle region or damage, idle region 6 is enabled.
（6）Feel the micro mirror unit line width of the micro mirror unit line width for DMD 3 in emerging region 1.So can be with maximum
Change the scan efficiency of DMD 3.
In the present embodiment, 3 points of one piece of DMD is 4 parts so that the service life of DMD 3 improves 4
Times.
Embodiment 3：
Referring to the drawings 3, embodiment 3 to be embodied as situation as follows：
（1）DMD 3 is inclined and is used；
（2）The obliquity factor of DMD 3 is 2；
（3）3 points of DMD is two regions, and one is idle region 2 to feel emerging region 1 and another；
（4）It is required that the number of repetition for feeling emerging region 1 is 4, feel the micro mirror unit line number opened in emerging region 1 and be multiplied by equal to obliquity factor
Number of repetition.In the present embodiment, it is 8 rows to feel the micro mirror unit line number opened in emerging region 1.Feel after emerging region 1 comes into operation, each
Exposure position is felt emerging 1 reirradiation of region 4 times.
（5）Feel emerging region 1 first to come into operation, after feeling emerging 1 ageing failure of region or damaging, enable idle region 2.So may be used
To extend the service life of DMD 3.
（6）Feel the micro mirror unit line width of the micro mirror unit line width for DMD 3 in emerging region 1.So can be with maximum
Change the scan efficiency of DMD 3.
It should be appreciated that above-described embodiment is used only for explaining the present invention, the present invention is not limited to, institute is with good grounds
The other embodiment that the principle of the invention draws, within protection scope of the present invention.
Claims (4)
1. the emerging region using method of a kind of sense in laser direct-writing field, it is characterised in that：Select subregion in the middle part of DMD
Domain is used as emerging regional inputs are felt, and other parts are left unused；Feel emerging region micro mirror unit is aging or some micromirrors unit is damaged,
When can not meet Production requirement, idle region is enabled.
2. the emerging region using method of sense in a kind of laser direct-writing field according to claim 1, it is characterised in that work as numeral
When micro-mirror devices tilt is used, the micro mirror unit line number that the described emerging region of sense is opened is the whole of DMD obliquity factor
Several times.
3. the emerging region using method of sense in a kind of laser direct-writing field according to claim 1, it is characterised in that described
Feel the half of the micro mirror unit line number less than the total micro mirror unit line number of DMD in emerging region.
4. the emerging region using method of sense in a kind of laser direct-writing field according to claim 1, it is characterised in that described
The micro mirror unit line width for feeling emerging region selects identical with the micro mirror unit line width of DMD.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611267978.XA CN106527059A (en) | 2016-12-31 | 2016-12-31 | Interested region use method in laser direct writing field |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611267978.XA CN106527059A (en) | 2016-12-31 | 2016-12-31 | Interested region use method in laser direct writing field |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106527059A true CN106527059A (en) | 2017-03-22 |
Family
ID=58336497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611267978.XA Pending CN106527059A (en) | 2016-12-31 | 2016-12-31 | Interested region use method in laser direct writing field |
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| Country | Link |
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| CN (1) | CN106527059A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5815303A (en) * | 1997-06-26 | 1998-09-29 | Xerox Corporation | Fault tolerant projective display having redundant light modulators |
| CN101244647A (en) * | 2007-02-12 | 2008-08-20 | 深圳市大族激光科技股份有限公司 | Modularization exposure system |
| WO2010092189A1 (en) * | 2009-02-16 | 2010-08-19 | Micronic Laser Systems Ab | Reconfigurable micro-mechanical light modulator and method |
-
2016
- 2016-12-31 CN CN201611267978.XA patent/CN106527059A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5815303A (en) * | 1997-06-26 | 1998-09-29 | Xerox Corporation | Fault tolerant projective display having redundant light modulators |
| CN101244647A (en) * | 2007-02-12 | 2008-08-20 | 深圳市大族激光科技股份有限公司 | Modularization exposure system |
| WO2010092189A1 (en) * | 2009-02-16 | 2010-08-19 | Micronic Laser Systems Ab | Reconfigurable micro-mechanical light modulator and method |
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| SE01 | Entry into force of request for substantive examination | ||
| CB03 | Change of inventor or designer information |
Inventor after: Yu Qingping Inventor before: Yu Qingping Inventor before: Wang Yungang Inventor before: Chen Xiutao |
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Application publication date: 20170322 |
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