CN103941278A - Electron beam emittance measuring equipment and measuring method - Google Patents

Electron beam emittance measuring equipment and measuring method Download PDF

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Publication number
CN103941278A
CN103941278A CN201410199880.XA CN201410199880A CN103941278A CN 103941278 A CN103941278 A CN 103941278A CN 201410199880 A CN201410199880 A CN 201410199880A CN 103941278 A CN103941278 A CN 103941278A
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measuring
electron beam
measurement
target
target chamber
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CN103941278B (en
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江孝国
王远
李洪
张卓
杨兴林
代志勇
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Institute of Fluid Physics of CAEP
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Institute of Fluid Physics of CAEP
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Abstract

The invention discloses electron beam emittance measuring equipment and an electron beam emittance measuring method. The electron beam emittance measuring equipment comprises a measuring target chamber, wherein the output end of the measuring target chamber is provided with a reflector and a measuring window, the measuring target chamber is further provided with a vacuum pump in which an energy conversion target capable of freely rotating along the axis of the target chamber and a measuring mechanism capable of measuring the position of the energy conversion target are arranged. According to the electron beam emittance measuring equipment, the number of parameters joining data fitting can be reduced to 1 by adopting a method of changing the measuring position under a fixed magnetic field parameter condition; furthermore, the mobile energy conversion target indicated by scales and a vacuum motive sealing mechanism are used to guarantee that the vacuum environment of the accelerator can not be damaged and the measurement position data is directly obtained when the measuring position is not changed, so that the working efficiency of the measurement can be greatly improved; in addition, the stability and precision of the fitting can be improved by adopting the way of increasing data measurement points through a plurality of position measurement data.

Description

A kind of electron beam emittance measurement device and measuring method
Technical field
The present invention relates to accelerator development and parameter measurement field, specifically refer to a kind of electron beam emittance measurement device and measuring method.
Background technology
Aspect accelerator development and parameter measurement technical research, the emittance parameter of charged particle beam is the parameter of a most important sign Shu Pinzhi, the emittance of Measurement of Electron Beam exactly, and the debugging to accelerator and improvement, have great importance.But its Measurement accuracy the most difficult work really, main cause is direct measuring method---some defects that pepper hole method itself has that conventionally adopt, as the existence of space charge effect, pepper orifice plate changes the distribution in emittance, hole of bundle and restricted etc. impact thereof, because it has certain requirement and the emittance parameter of electron beam is had to destructiveness electron beam line, make this measurement mechanism and Correlation method for data processing method thereof be subject to larger restriction, therefore the range of application of the measuring technique based on this principle is also severely limited.Another effective measuring method of emittance is three gradient method, is also current more general measuring method, and it can also Further Division be specifically three profile methods and three gradient method.Three profile methods are on three diverse locations on beam axis, to measure three sections of line, obtain emittance by matrix computations again, owing to there being multiple unknown numbers in solution matrix process, need to carry out matching to search out a rational result to the combination of these unknown numbers, because unknown number number is more, in the time that initial parameter range is selected unreasonablely, matrix equation may be an ill-condition equation, the various possibilities that exist after combination make solving result have larger instability, also there is situation about not restraining in solution procedure, make to solve and have certain difficulty, need to carry out in a vacuum owing to measuring, the replacing of measuring position each time can cause the destruction of accelerator pipe vacuum and the significantly increase of work period, according to existing practical work experience, substantially can only carry out the measurement of a point in next day of situation of overtime work, on more large-scale accelerator, work in this manner, the surveying work cycle can be longer, is also unfavorable for the maintenance of accelerator.And three gradient method are also the one of three profile methods, just bundle profile survey position is fixed in a plane on beam axis, by changing the parameter in updrift side magnetic field with the diameter of adjusting measuring position place bundle section, and measure three section numerical value simultaneously, as shown in Figure of description 1, calculate emittance according to the method for solving of above-mentioned matrix again, therefore also there is certain problem, although this measuring method is not destroyed accelerator pipe vacuum, but fitting parameter has still comprised the magnetic field changing, need the parameter of matching still more, if it is improper that parameter is selected, may there is bigger difference in fitting result, especially measure at place with a tight waist, the measuring error impact of beam spot diameter, is larger, as shown in Figure of description 4.
Summary of the invention
The object of the present invention is to provide a kind of electron beam emittance measurement device and measuring method, the replacing that solves the measuring position each time of current electron beam emittance measurement existence can cause the destruction of accelerator pipe vacuum and significantly increase, the fitting parameter of work period still to comprise the magnetic field changing, and needs the large problem of the more error causing of parameter of matching.
Object of the present invention is achieved through the following technical solutions:
A kind of electron beam emittance measurement device, comprise measurement target chamber, be provided with catoptron and measurement window at the output terminal of measuring target chamber, on described measurement target chamber, vacuum pump is also installed, the measuring mechanism that an energy conversion target that can move freely along the axis of measuring target chamber is also installed in described measurement target chamber and measures energy conversion target position.Traditional electron beam emittance measurement is to measure by the acceleration pipeline of a vacuum, the replacing of measuring position each time can cause the destruction of accelerator pipe vacuum and the significantly increase of work period, for this problem, applicant is through years of researches, invent technical scheme of the present invention: adopt and measuring energy conversion target of target indoor location, energy conversion target is vertical with the axis of measuring target chamber, movement by energy conversion target on measurement target chamber axis, can realize the measurement of carrying out diverse location under the condition of non-destructive assay target chamber vacuum environment, greatly reduce workload, and do not destroy vacuum environment and can make the magnetic field of its distribution of measurement each time more stable, then measure and show the particular location of energy conversion target by increasing a measuring mechanism, then utilize correction three gradient method to carry out the measurement of emittance, revise three gradient method cardinal principles as follows: on accelerator axis, the radius R of the electron beam spot of a certain position can change with the change of its upstream axial magnetic field B, if measuring the section of the electron beam spot under different magnetic field distributes, can obtain one group of (R, B) measurement data points, and can also solve the electron beam spot Envelope equation under different magnetic field according to theoretical principle, can obtain a R-B calculated curve, this curve mainly depends on three unknown parameters, electron beam spot radius R in initial plane, the angle of divergence R ' of electron beam, the emittance ε n of electron beam.If by R-B calculated curve matching (R, B) measurement data points, in the time that meeting, actual measurement data and theoretical curves just can obtain the matching solution of these three unknown parameters including beam emittance ε n; Wherein the angle of divergence of electron beam and measuring position are to the Range-based of initial position, and Equivalent Magnetic Field initial position is relevant with magnetic field, so in the time that magnetic field arranges change, it also changes thereupon, so matching is actually three parameters is carried out, therefore, the present invention adopts the mode of traverse measurement, increase the mode that diverse location place is measured simultaneously, utilize measuring mechanism to determine the location parameter of energy conversion target, effectively reduce the number of parameters that needs matching, improved stability and the precision of matching, can obtain more reliable emittance supplemental characteristic; It is the minimum place of diameter near with a tight waist that the method requires the measuring position of beam spot diameter, simultaneously, and measuring position is not limited to three positions of electron beam, can have compared with multiposition, this data processing method is in conjunction with the measuring principle of running target, while adopting more measurement data points to carry out matching, convergence, stability and the precision of measurement result matching can be higher.
In described measurement target chamber, leading screw is installed, one end of leading screw forms operating portion through an end face measuring target chamber, on the leading screw of measuring in target chamber, the collar matching with leading screw is installed, and described energy conversion target is fixedly connected on the collar.Concretely, any technical scheme that can realize energy conversion target and be all applicable in the structure of the measurement target indoor moving of vacuum environment the application, one is wherein to adopt leading screw to carry out transmission, by control and adjust the position of energy conversion target in the rotation of measuring target field operation leading screw, manipulate outward thereby realize at measurement target chamber.
In described measurement target chamber, the rule being parallel to each other with leading screw is also installed, on the collar or energy conversion target, the indicateing arm corresponding with rule is installed, on described measurement target chamber, be provided with observation window.Measuring mechanism of the present invention can be any structure that can realize energy conversion target position, the present invention has adopted one wherein: utilize the collar or the energy conversion target that move along leading screw to move relative to leading screw, the rule of display position is set thereon, pass through observation window, just can directly read location parameter, utilize the rotation of leading screw, also can realize the fixed point setting of energy conversion target.
In described measurement target chamber, the guide pole being parallel to each other with leading screw is also installed, on described energy conversion target, the guide runner being sleeved on guide pole is installed.By guide pole is set, can make the movement of energy conversion target stable, avoid occurring deviation.
Described leading screw is at least provided with an O RunddichtringO through the position of measuring target chamber end face.By one or more O RunddichtringO is set, by mutual suitable extruding to ensure the close contact of movable contact face but can move the motive seal effect that obtains vacuum the friction in the situation that, can ensure the collimation of lead screw shaft and then ensure the stability of rotating, improve vacuum seal performance by the mode of injecting vacuum grease fat again, realize the motive seal requirement of condition of high vacuum degree.
Described energy conversion target adopts the piezoid of polishing to make.In the parameter measurement of electron beam, conventionally use the target based on Qie Lunkefu radiation theory, its structure comprises a quartzy thin slice, thereafter side grinding sand forms hair side, visible ray is had to very strong scattering process, the real space resolution of this target can reduce because of the impact of target thickness and frosted hair side, and then measuring error is increased, finding after this problem, inventor has invented energy conversion target and has solved this problem after years of researches, simply say to be exactly that the quartzy thin slice of light is thrown to obtain very much on two sides, and its thickness is reduced as far as possible, it is to carry out luminous principle with energy exchange after electronics bombardment material to obtain luminescent image, luminous point is exactly electronics bombarded point, luminously in the target of this structure can not spread, overcome the prejudice that has hair side on traditional Qie Lunkefu radiation theory target structure, therefore can improve measuring accuracy, for traditional Qie Lunkefu irradiation targets, image definition tool is significantly improved.
A kind of electron beam emittance measurement method, comprises the following steps:
(a) fix a rational magnetic field, make electron beam measure lateral cross section on target chamber axis direction be distributed in measuring process in steady state (SS);
(b) by the position of the energy conversion target shown in conversion rule, while measuring diverse location, near the beam spot diameter, of front and back position electron beam is with a tight waist;
(c) data of measuring according to step (b), utilize three gradient method to carry out matching to parameter of electron beam initial transmissions degree ε n, and in the time that matched curve meets with measurement curve, this value is exactly the emittance numerical value of electron beam.
The present invention is based on principle and the data processing requirement of revising three gradient method Measurement of Electron Beam emittances, first adopt the number of parameters to 1 reduce participation data fitting by the method for change measuring position under fixed magnetic field Parameter Conditions time, can reduce on the one hand workload and the difficulty of matching, the stability of matching and precision data processing can be improved again time; Utilize the movable energy conversion target of graduation indication and vacuum dynamic seal mechanism to ensure can not destroy the vacuum environment of accelerator in the time changing measuring position, and directly obtain measuring position data, can increase substantially surveying work efficiency; Adopt energy conversion target to replace Qie Lunkefu irradiation targets, after energy conversion target bombards material with electronics, luminous principle acquisition luminescent image is carried out in energy exchange, luminous point is exactly electronics bombarded point, luminously in the target of this structure can not spread, overcome the prejudice that has hair side on traditional Qie Lunkefu radiation theory target structure, therefore can improve measuring accuracy, for traditional Qie Lunkefu irradiation targets, image definition tool is significantly improved; By multiple position measurements, increase the form of data measurement points to improve stability and the precision of matching.
The present invention compared with prior art, has following advantage and beneficial effect:
A kind of electron beam emittance measurement of 1 the present invention device, adopt the mode of traverse measurement, increase the mode that diverse location place is measured simultaneously, utilize measuring mechanism to determine the location parameter of energy conversion target, effectively reduce the number of parameters that needs matching, improve stability and the precision of matching, can obtain more reliable emittance supplemental characteristic; It is the minimum place of diameter near with a tight waist that the method requires the measuring position of beam spot diameter, simultaneously, and measuring position is not limited to three positions of electron beam, can have compared with multiposition, this data processing method is in conjunction with the measuring principle of running target, while adopting more measurement data points to carry out matching, convergence, stability and the precision of measurement result matching can be higher;
A kind of electron beam emittance measurement of 2 the present invention device, by one or more O RunddichtringO is set, by mutual suitable extruding to ensure the close contact of movable contact face but can move the motive seal effect that obtains vacuum the friction in the situation that, can ensure the collimation of lead screw shaft and then ensure the stability of rotating, improve vacuum seal performance by the mode of injecting vacuum grease fat again, realize the motive seal requirement of condition of high vacuum degree;
A kind of electron beam emittance measurement of 3 the present invention device, adopt energy conversion target to replace Qie Lunkefu radiation theory target, simply say to be exactly that the quartzy thin slice of light is thrown to obtain very much on two sides, and its thickness is reduced as far as possible, it is to carry out luminous principle with energy exchange after electronics bombardment material to obtain luminescent image, luminous point is exactly electronics bombarded point, luminously in the target of this structure can not spread, overcome the prejudice that has hair side on traditional Qie Lunkefu radiation theory target structure, therefore can improve measuring accuracy, for traditional Qie Lunkefu irradiation targets, image definition tool is significantly improved,
A kind of electron beam emittance measurement of 4 the present invention method, adopt the number of parameters to 1 reduce participation data fitting by the method for change measuring position under fixed magnetic field Parameter Conditions time, can reduce on the one hand workload and the difficulty of matching, the stability of matching and precision data processing can be improved again time; Utilize the movable energy conversion target of graduation indication and vacuum dynamic seal mechanism to ensure can not destroy the vacuum environment of accelerator in the time changing measuring position, and directly obtain measuring position data, can increase substantially surveying work efficiency; Adopt energy conversion target to replace Qie Lunkefu irradiation targets, after energy conversion target bombards material with electronics, luminous principle acquisition luminescent image is carried out in energy exchange, luminous point is exactly electronics bombarded point, luminously in the target of this structure can not spread, overcome the prejudice that has hair side on traditional Qie Lunkefu radiation theory target structure, therefore can improve measuring accuracy, for traditional Qie Lunkefu irradiation targets, image definition tool is significantly improved; By multiple position measurements, increase the form of data measurement points to improve stability and the precision of matching.
Brief description of the drawings
Accompanying drawing described herein is used to provide the further understanding to the embodiment of the present invention, forms the application's a part, does not form the restriction to the embodiment of the present invention.In the accompanying drawings:
Fig. 1 is the measuring principle figure of three gradient method;
Fig. 2 be measurement mechanism of the present invention partly cut open front view;
Fig. 3 is the left view of Fig. 2;
Fig. 4 is matched curve schematic diagram of the prior art;
Fig. 5 is the matched curve schematic diagram of the embodiment of the present invention;
Structural representation of the present invention.
Mark and corresponding parts title in accompanying drawing:
1-measures target chamber, 2-energy conversion target, 3-leading screw, 6-rule, 7-observation window, 8-catoptron, 9-measurement window, the 10-collar, 11-vacuum pump, 12-indicateing arm, 13-guide pole, 14-guide runner, 15-O RunddichtringO.
Embodiment
For making the object, technical solutions and advantages of the present invention clearer, below in conjunction with embodiment and accompanying drawing, the present invention is described in further detail, and exemplary embodiment of the present invention and explanation thereof are only for explaining the present invention, not as a limitation of the invention.
Embodiment
As shown in Fig. 2 to 3, a kind of electron beam emittance measurement of the present invention device, comprise and measure target chamber 1, measurement target chamber 1 adopts multiple assemblies to enclose and forms, be on the whole cylindric, its one end is as the end of injecting of electron beam, transparent glass is installed, the other end is provided with the anisodiametric end face of two ring-types, be connected with the passage turning to by flange at this section, catoptron 8 and measurement window 9 are installed turning in passage, in measurement window 9, for transparent quartzy glass window is installed, take so that the luminescent image of target can spread out of the camera that is placed on side; In measurement target chamber 1, leading screw 3 is installed, leading screw 3 is positioned at the top of measuring target chamber 1 axis; One end of leading screw 3 forms operating portion through measuring the anisodiametric end face of two ring-types of target chamber 1, two O RunddichtringOs 15 is installed measuring between target chamber 1 end face and leading screw 3, and seals with vacuum seal grease; The collar 10 matching with leading screw 3 is installed on leading screw 3, and energy conversion target 2 is fixedly connected on the collar 10; In measurement target chamber 1, the rule 6 being parallel to each other with leading screw 3 is also installed, on the collar 10, be provided with indicateing arm 12, above measuring target chamber 1, offer observation window 7, can directly read location parameter, measure in target chamber 1 guide pole 13 being parallel to each other with leading screw 3 is also installed, the guide runner 14 being sleeved on guide pole 13 is installed on energy conversion target 2; In the side of measuring target chamber 1, vacuum pump 11 is installed; Energy conversion target 2 adopts quartzy thin slice to make, and polishing is carried out on two sides, and thickness is the smaller the better; Activity that it should be noted that energy conversion target 2 in the present embodiment realizes by leading screw 3, as the replacement of this function, also can be other type of belt drive and drive mechanism, such as flat tooth bars etc., measuring structure can be also other survey instrument, such as Infrared survey etc.
When use, when the emittance of this measurement device electron beam, first utilize vacuum pump 11 extracting vacuum, vacuum tightness requires to reach 1X10 -4more than Pa, its allowed leakage is 1.33X10 -6pa.L/s; Fix a rational magnetic field, make electron beam measure lateral cross section on target chamber axis direction be distributed in measuring process in steady state (SS); By the position of the energy conversion target shown in conversion rule, while measuring diverse location, near the beam spot diameter, of front and back position electron beam is with a tight waist; The data of measuring according to step (b), utilize as the measuring method of Fig. 1 tri-gradient method parameter of electron beam initial transmissions degree ε n are carried out to matching, and in the time that matched curve meets with measurement curve, this value is exactly the emittance numerical value of electron beam.
Utilize the measuring method of the present embodiment, as shown in Figure 5, wherein 20 is that electron beam is matched curves of 20 along the raw data measurement point, 21 of the radius of each position of axis 23 in the matched curve obtaining; As shown in Figure 4, wherein 20 is that electron beam is matched curves of 20 along the raw data measurement point, 21 of the radius of three positions of axis 23 in the matched curve obtaining with respect to the measurement mechanism based on ultimate principle and measuring method; Can learn thus, the increase that the present invention counts due to measurement data, the minimizing of fitting parameter quantity are improved a lot stability, the precision etc. of data fitting, can obtain result more accurately.
Above-described embodiment; object of the present invention, technical scheme and beneficial effect are further described; institute is understood that; the foregoing is only the specific embodiment of the present invention; the protection domain being not intended to limit the present invention; within the spirit and principles in the present invention all, any amendment of making, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.

Claims (7)

1. an electron beam emittance measurement device, comprise and measure target chamber (1), be provided with catoptron (8) and measurement window (9) at the output terminal of measuring target chamber (1), vacuum pump (11) is also installed on described measurement target chamber (1), it is characterized in that: the measuring mechanism that an energy conversion target (2) that can move freely along the axis of measuring target chamber (1) is also installed in described measurement target chamber (1) and measures energy conversion target (2) position.
2. a kind of electron beam emittance measurement device according to claim 1, it is characterized in that: in described measurement target chamber (1), leading screw (3) is installed, one end of leading screw (3) forms operating portion through an end face measuring target chamber (1), on the leading screw (3) of measuring in target chamber (1), the collar (10) matching with leading screw (3) is installed, described energy conversion target (2) is fixedly connected on the collar (10).
3. a kind of electron beam emittance measurement device according to claim 2, it is characterized in that: the rule (6) being parallel to each other with leading screw (3) is also installed in described measurement target chamber (1), the indicateing arm (12) corresponding with rule (6) is installed on the collar (10) or energy conversion target (2), on described measurement target chamber (1), is provided with observation window (7).
4. a kind of electron beam emittance measurement device according to claim 2, it is characterized in that: the guide pole (13) being parallel to each other with leading screw (3) is also installed in described measurement target chamber (1), the guide runner (14) being sleeved on guide pole (13) is installed on described energy conversion target (2).
5. according to a kind of electron beam emittance measurement device described in any one in claim 2 to 4, it is characterized in that: described leading screw (3) is at least provided with an O RunddichtringO (15) through the position of measuring target chamber (1) end face.
6. a kind of electron beam emittance measurement device according to claim 1, is characterized in that: described energy conversion target (2) adopts the quartzy thin slice of polishing to make.
7. an electron beam emittance measurement method, is characterized in that, comprises the following steps:
(a) fix a rational magnetic field, make electron beam measure lateral cross section on target chamber axis direction be distributed in measuring process in steady state (SS);
(b) by the position of the energy conversion target shown in conversion rule, while measuring diverse location, near the beam spot diameter, of front and back position electron beam is with a tight waist;
(c) data of measuring according to step (b), utilize three gradient method to carry out matching to parameter of electron beam initial transmissions degree ε n, and in the time that matched curve meets with measurement curve, this value is exactly the emittance numerical value of electron beam.
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