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Publication numberCN103698827 A
Publication typeApplication
Application numberCN 201310547673
Publication date2 Apr 2014
Filing date6 Nov 2013
Priority date6 Nov 2013
Publication number201310547673.4, CN 103698827 A, CN 103698827A, CN 201310547673, CN-A-103698827, CN103698827 A, CN103698827A, CN201310547673, CN201310547673.4
Inventors周常河, 李树斌, 曹红超, 吴俊 , 刘昆, 黄巍
Applicant中国科学院上海光学精密机械研究所
Export CitationBiBTeX, EndNote, RefMan
External Links: SIPO, Espacenet
Vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization
CN 103698827 A
Abstract
The invention discloses a vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization with 1550nanometer wavelength. The beam-splitting grating has the grating period of 2108-2010 nanometers, the inclination angle of 20-21 degrees, the ridge depth of 2982-2984 nanometers and the ridge width of 1576-1578 nanometers. When TE polarized light is in a vertical incidence manner, the transmission light is split into two beams of light with equal intensity, the total diffraction efficiency of the two beams of light is more than 95%, and the uniformity is superior to 4%. The quartz 1*2 beam-splitting tilted grating is processed by combining an electron beam direct-write device with micro-electronics deep etching process, is convenient in material selection and low in construction cost, can be subjected to large-scale production and has important practical prospect.
Claims(2)  translated from Chinese
1.一种用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅,其特征在于该分束光栅的光栅周期为2108〜2110纳米,倾斜角为20〜21度,脊深为2982〜2984纳米,脊宽为1576〜1578纳米。 1. A method for the 1550 nm wavelength of the TE polarization beam vertically incident on the quartz 1X2 tilted gratings, wherein the grating period of the grating for splitting 2108~2110 nm, the inclination angle of 20~21 degrees, the ridge is deeply 2982 ~2984 nm, ridge width of 1576~1578 nm.
2.根据权利要求1所述的TE偏振的垂直入射石英IX 2分束倾斜光栅,其特征在于所述的分束光栅的光栅周期为2109纳米,倾斜角为20.1度,脊深为2983纳米,脊宽为1577.5纳米。 The TE 1 of claim polarized perpendicularly incident beam quartz IX 2 tilted gratings, wherein the grating period of the grating of the beam is 2109 nm, the inclination angle of 20.1 degrees, the ridge depth of 2983 nm, ridge width of 1577.5 nm.
Description  translated from Chinese

TE偏振的垂直入射石英1 X 2分束倾斜光栅 TE polarized normal incidence quartz 1 X 2 splitting grating tilt

技术领域 FIELD

[0001] 本发明涉及透射分束光栅,特别是一种用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅。 [0001] The present invention relates to a transmission grating beam, particularly a wavelength of 1550 nm for the TE polarization perpendicular to the incident beam is inclined quartz 1X2 grating.

背景技术 BACKGROUND

[0002] 分束器是光学系统中的基本元件,在光学系统中有着重要的应用。 [0002] The beam splitter is an optical system of the basic components, has important applications in the optical system. 在光通信、光信息处理、光子晶体制作、全息等等系统中有着不可替代的作用。 Plays an irreplaceable role in optical communications, optical information processing, production of photonic crystals, etc. holographic system. 由于传统的多层膜结构分束器工艺复杂,成本昂贵,而且激光破坏阈值不高,因此限制多层膜结构的广泛应用。 As the traditional multilayer film structure beamsplitter complex process, expensive, and laser damage threshold is not high, thus limiting widely used multilayer film structure. 熔融石英是一种理想的光栅材料,它具有高光学质量:不但具有稳定的性能,而且具有高的损伤阈值和高衍射效率。 Fused silica is an ideal grating material, which has high optical quality: not only has a stable performance, but also has a high damage threshold and a high diffraction efficiency. 采用先进的微电子工艺,制作光栅的工艺流程十分简单。 Uses advanced microelectronic technology, production process is very simple grating. 因此,刻蚀高密度深刻蚀熔融石英倾斜光栅作为新型的分束器件具有广泛的应用前景。 Therefore, high-density etching deep etching of fused silica as a new tilt grating splitting device has broad application prospects. 对于倾斜石英光栅,由于其不对称结构特点,可以实现不对称分束的功能,这样可以使倾斜光栅更方便的应用在光学系统中。 For quartz grating tilt, due to its asymmetric structure characteristic, can be realized asymmetric splitting function, which can make application more convenient inclined grating in the optical system.

[0003] Jijun Feng等人设计了一种布拉格角入射下的高效率透射式矩形熔石英偏振无关1X2分束光栅,其衍射效率非常高【在先技术I J.Feng et al.,Appl.0pt.48,5636-5641 (2009)】。 [0003] Jijun Feng, who designed a highly efficient transmission type rectangular fused silica under a Bragg angle incident beam polarization independent 1X2 grating diffraction efficiency is very high [prior art I J.Feng et al., Appl.0pt .48,5636-5641 (2009)]. 以上光栅都是基于矩形结构,倾斜光栅不仅可以增加设计的灵活性,还可以实现垂直入射O级和-1级1X2分束的功能。 Above are based on a rectangular grating structure, tilted grating can not only increase the flexibility of the design, you can also achieve normal incidence O level and -1 1X2 splitting function.

[0004] 倾斜光栅是利用微电子深刻蚀工艺,在基底上加工出的具有倾斜槽形的光栅。 [0004] inclined grating deep etching using microelectronic technology, processing a grating on a substrate having an inclined groove shape. 高密度倾斜光栅的衍射理论,不能由简单的标量光栅衍射方程来解释,而必须采用矢量形式的麦克斯韦方程并结合边界条件,通过编码的计算机程序精确地计算出结果。 High-density inclined diffraction grating theory, can not be explained by simple scalar diffraction grating equation, but must be in the form of vector Maxwell equations and boundary conditions combined to accurately calculate the results by computer program coding. Moharam等人已给出了严格I禹合波理论的算法【在先技术2:MGMoharam et al., J.0pt.Soc.Am.A.12,1077(1995)】,可以解决这类高密度光栅的衍射问题。 Moharam, who has been given a strict co-wave theory I Yu prior art algorithm [2:. MGMoharam et al, J.0pt.Soc.Am.A.12,1077 (1995)], can solve this kind of high-density Diffraction gratings. 但据我们所知,目前为止,还没有人针对常用1550纳米波长给出在熔融石英基片上制作的TE偏振IX 2倾斜分束光栅。 But as far as we know, so far, no one has given the molten quartz substrate produced TE polarization IX 1550 nm wavelength used for two tilted beam grating. `发明内容 `SUMMARY

[0005] 本发明要解决的技术问题是提供一种用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅。 Quartz normal incidence [0005] The technical problem to be solved by the present invention is to provide a wavelength of 1550 nm for TE polarization 1X2 beam tilt grating. 当TE偏振光在垂直入射时,该光栅可以使入射光分成2束等强度的透射光,这2束透射光的总效率大于95%,并且均匀性优于4%。 When the TE-polarized light at normal incidence, the grating may be divided into transmitted light 2 incident light beam of equal strength, the overall efficiency of the two beams of transmitted light is greater than 95%, and the uniformity of better than 4%. 因此,该分束光栅具有重要的实用价值。 Thus, the splitting grating has important practical value.

[0006] 本发明的技术解决方案如下: [0006] The technical solution of the present invention are as follows:

[0007] —种用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅,其特点在于该分束光栅的光栅周期为2108~2110纳米,倾斜角为20~21度,脊深为2982~2984纳米,脊宽比为1576~1578纳米。 [0007] - Quartz 1X2 perpendicularly incident beam inclined grating species for 1550 nm wavelength of the TE polarization, characterized in that the grating period of the splitting grating is 2108 ~ 2110 nm, the angle of inclination is 20 to 21 degrees, the ridge is deeply 2982 ~ 2984 nm, ridge width ratio of 1576 ~ 1578 nm.

[0008] 最佳的分束光栅的光栅周期为2109纳米,倾斜角为20.1度,脊深为2983纳米,脊宽比为1577.5纳米。 Grating period [0008] the best splitting grating is 2109 nm, the inclination angle of 20.1 degrees, 2983 nanometers deep ridges, ridge width ratio of 1577.5 nm.

[0009] 本发明的技术效果如下:[0010] 特别是当分束光栅的光栅周期为2109纳米,倾斜角为20.1度,脊深为2983纳米,脊宽比为1577.5纳米,该光栅透射光的总效率大于95%,并且均匀性优于4%。 [0009] Technical effects of the present invention are as follows: [0010] especially when the grating period splitting grating is 2109 nm, the inclination angle of 20.1 degrees, the ridge depth of 2983 nm, ridge width ratio of 1577.5 nm, the grating of the transmitted light Total efficiency greater than 95%, and the uniformity of better than 4%. 利用电子束直写装置结合微电子深刻蚀工艺,可以大批量、低成本地生产,刻蚀后的光栅性能稳定、可靠,具有重要的实用前景。 Using electron beam direct writing device combines microelectronics deep etching process, can high-volume, low cost production, stable performance etched gratings, reliable, and has important practical prospects. 本发明具有使用灵活方便、均匀性较好、衍射效率较高等优点,是一种非常理想的衍射光学元件。 The invention has the use of flexible, good uniformity and high diffraction efficiency, etc., is an ideal diffractive optical elements.

附图说明 Brief Description

[0011] 图1是本发明1550纳米波长的TE偏振高效率垂直入射石英IX 2分束倾斜光栅的几何结构。 [0011] FIG. 1 is a wavelength of 1550 nm the present invention, the TE polarization efficiency quartz IX 2 vertically incident beam inclined grating geometry.

[0012] 图中,I代表区域I (折射率为Ii1), 2代表区域2 (折射率为n2),3代表入射光,4、5分别代表TE模式下的_1、0级衍射光。 [0012] FIG, I representative region I (refractive index Ii1), 2 representative region 2 (refractive index n2), 3 representative of the incident light, representing _1,0 4,5-order diffracted light of TE mode. d为光栅周期,h为光栅深度,0in为入射角,(^为倾斜角。 d is the grating period, h is the grating depth, 0in is the angle of incidence, (^ for the tilt angle.

[0013] 图2是本发明要求范围内一个实施例的0、_1级总衍射效率随波长变化的曲线。 [0013] Figure 2 is an example of the present invention requires 0 _1 level overall diffraction efficiency varies with the wavelength range of the curve within an embodiment. 具体实施方式 DETAILED DESCRIPTION

[0014] 下面结合实施例和附图对本发明作进一步说明,但不应以此限制本发明的保护范围。 [0014] The following Examples and the accompanying drawings of the present invention is further illustrated, but not to limit the scope of the present invention.

[0015] 先请参阅图1,图1是本发明TE偏振垂直入射石英1X2分束倾斜光栅的几何结构。 [0015] First, please refer to FIG. 1, FIG. 1 of the present invention is a normal incidence the TE polarization splitting quartz 1X2 tilted grating geometry. 图中,区域1、2都是均匀的,分别为空气(折射率Ii1=I)和熔融石英(折射率n2=l.44462 )。 Drawing, regions 1, 2 are uniform, respectively, air (refractive index Ii1 = I) and fused silica (refractive index n2 = l.44462). 3为入射光,4和5为出射光。 3 is the incident light, 4 and 5 for outgoing light. d为光栅周期,为倾斜角,h为光栅深度,b为脊宽。 d is the grating period, as the tilt angle, h is the grating depth, b is the land width. TE偏振入射光对应于电场矢量的振动方向垂直于入射面,其垂直入射到光栅。 TE polarized incident light corresponding to the vibration direction of the electric field vector is perpendicular to the incident surface, which is incident perpendicular to the grating. 由图可见,本发明用于波长为1550纳米波段的TE偏振石英透射分束斜光栅,该分束光栅的光栅周期为2108~2110纳米,倾斜角为20~21度,脊深为2982~2984纳米,脊宽比为1576~1578纳米。 Seen from the figure, the present invention is applied to a wavelength of 1550 nm band of the TE polarization beam oblique quartz transmission grating, the grating period of the sub-beam grating is 2108 ~ 2110 nm, the angle of inclination is 20 to 21 degrees, the ridge depth of 2982 ~ 2984 nm, ridge width ratio of 1576 ~ 1578 nm.

[0016] 在如图1所示的光栅结构下,本发明采用严格耦合波理论【在先技术2】计算了石英倾斜光栅在1550纳米波段的衍射效率。 [0016] In the grating structure shown in Figure 1, the present invention employs rigorous coupled-wave theory [2] calculated prior art quartz tilt diffraction efficiency at 1550 nm band.

[0017] 表1给出了本发明一系列实施例,表中d为光栅周期,为倾斜角,h为光栅深度,b为脊宽,λ为入射波长,Unifromity为2个端口的衍射均匀性,η为衍射效率。 [0017] Table 1 shows a series of embodiments of the present invention, the table d is the grating period, for the inclination angle, h is the grating depth, b is the land width, λ is the incident wavelength, Unifromity for two ports diffraction uniformity , η is the diffraction efficiency. 在制作本发明用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅的过程中,适当选择光栅周期、倾斜角和刻蚀深度就可以在一定的带宽内得到高衍射效率和均匀性较好的透射1X2分束光栅。 In the production of the present invention is applied to a wavelength of 1550 nm TE polarization beam vertically incident on the quartz 1X2 tilted grating process, appropriately selected grating period, the inclination angle and the etching depth can obtain a high diffraction efficiency and uniformity within a certain bandwidth preferred transmission 1X2 separating grating.

[0018] 图2是本发明要求范围内一个实施例的0、_1级总衍射效率随波长变化的曲线。 [0018] Figure 2 is an example of the present invention requires 0 _1 level overall diffraction efficiency varies with the wavelength range of the curve within an embodiment.

[0019] 本发明的TE偏振高效率倾斜石英透射分束光栅,利用电子束直写装置结合微电子深刻蚀工艺,可以大批量、低成本地生产,刻蚀后的光栅性能稳定、可靠,具有重要的实用前景,具有使用灵活方便、均匀性较好、衍射效率较高等优点,是一种非常理想的衍射光学元件。 [0019] TE polarization of the present invention is highly efficient beam tilt quartz transmission grating, using electron beam direct writing device combined with microelectronics deep etching process can be high-volume, low cost production, stable performance grating after etching, reliable, important practical outlook, with the use of flexible, good uniformity and high diffraction efficiency, etc., is an ideal diffractive optical elements.

[0020] 表1TE偏振光垂直入射时波长为1550nm时光在2个端口的总衍射效率和均匀性。 [0020] Table 1TE vertically incident polarized light having a wavelength of 1550nm time on the two ports of the total diffraction efficiency and uniformity.

[0021] [0021]

Figure CN103698827AD00051
Patent Citations
Cited PatentFiling datePublication dateApplicantTitle
CN103364856A *9 Jul 201323 Oct 2013中国科学院上海光学精密机械研究所TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating
EP1341026A2 *26 Feb 20033 Sep 2003Canon Kabushiki KaishaBeam splitting element and optical apparatus using it
US6927891 *23 Dec 20029 Aug 2005Silicon Light Machines CorporationTilt-able grating plane for improved crosstalk in 1ŚN blaze switches
Classifications
International ClassificationG02B27/10, G02B5/18
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2 Apr 2014C06Publication
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