CN103008310A - Non-defect optical element cleaning method - Google Patents
Non-defect optical element cleaning method Download PDFInfo
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- CN103008310A CN103008310A CN2012105751173A CN201210575117A CN103008310A CN 103008310 A CN103008310 A CN 103008310A CN 2012105751173 A CN2012105751173 A CN 2012105751173A CN 201210575117 A CN201210575117 A CN 201210575117A CN 103008310 A CN103008310 A CN 103008310A
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Abstract
The invention provides a non-defect optical element cleaning method. In an optical element processing process, optical elements are cleaned, the pollution of auxiliary materials to glazed surfaces is reduced. The method comprises the four procedures: cleaning with acetic acid lotion, cleaning with APG (Alkyl Polyglucoside) lotion, cleaning with pure water and dehydrating with acetone. After the processing is finished, the optical elements are cleaned again. The method is suitable for cleaning finished plates after each surface of a single-side or multi-side precise optical element is polished, so that the purpose of reducing the adhesive force of each polishing auxiliary material to the precise optical elements after polishing the elements is achieved; the pollution of the auxiliary materials to the glazed surfaces is reduced, so that the final optical cleaning difficulty is reduced, and the grade of the surface defects of the optical element is enhanced.
Description
Technical field
The present invention relates to the optical processing technology field, be particularly related to the cleaning method in a kind of zero defect optical element process, the one-tenth dish that the method is applicable to after each mirror polish of precision optics part is finished cleans, and purpose is to improve the beauty defects grade of optical element.
Background technology
The Ultraprecision Machining ability has become an important embodiment of current national science and technology level, when ultraprecise processing reaches inferior nanometer scale, its surperficial clean-up performance becomes an important technical indicator, the cleaning method that is applied at present this field is a lot, solution dissolving, microcorrosion method and ultrasonic method, million methods, plasma method etc. are arranged, but these cleaning methods all are the cleaning methods for the optical element finished product, when some microfabrication auxiliary material, cross when strong such as the adsorption capacity of polishing powder, just above-mentioned cleaning method can not be brought into play its effect fully.Therefore, need a kind of auxiliary material that can effectively reduce of research badly to the pollution of polished surface, reduce the difficulty that final optics cleans, improve the cleaning method of the beauty defects grade of optical element.
Summary of the invention
The object of the present invention is to provide a kind of zero defect optical element cleaning method, the method can improve the surface cleanness degree of precision optics part effectively.
To achieve these goals, the present invention has adopted following technical scheme:
A kind of zero defect optical element cleaning method may further comprise the steps:
In the optical element process, optical element is cleaned, reduce auxiliary material to the pollution of polished surface, machine and rear optical element is cleaned again.
In the described process optical element cleaned and may further comprise the steps: at first the aqueous acetic acid with mass fraction 20-40% soaks optical element 3-5min, then with pure water optical element is washed, washing time is 5-10s, after the flushing, use zero level long wool absorbent cotton to dip in distillation acetone and in 1-2min, finish wiping dehydration to the optical element surface.Aqueous acetic acid soaks rear so that the polishing powder from rare earth adhesive ability that adsorbs in the part process reduces, and most of polishing powder is removed in distillation acetone wiping dehydration.
In the described process optical element is cleaned further comprising the steps of: before with pure water optical element being washed, the optical element pH after the Dichlorodiphenyl Acetate aqueous solution soaking is that 7-8, mass fraction are the APG washing lotion aqueous solution soaking 3-5min of 3-5%.So that the adhesive ability of the molecule that adsorbs in the part process reduces, and most of molecule is removed in distillation acetone wiping dehydration after the APG washing lotion aqueous solution soaking.
Compared with prior art, the present invention has the following advantages: the present invention cleans immediately to optical element in the optical element process, can effectively reduce auxiliary material to the pollution of polished surface, thereby reduce the difficulty that final optics cleans, improve the beauty defects grade of optical element, the one-tenth dish that is applicable to after single face or each mirror polish of multiaspect precision optics part are finished cleans.
The specific embodiment
The invention will be further described below in conjunction with embodiment.
In the optical element process, optical element is cleaned, reduce auxiliary material to the pollution of polished surface, machine and rear optical element is cleaned according to existing method again.The cleaning of in the process optical element being carried out is referring to following examples.
Embodiment one:
1) utilizing mass fraction is that 30% acetic acid water lotion soaks 5min;
2) through after the step 1), utilizing pH=7, mass fraction is 5% APG washing lotion aqueous solution soaking 5min;
3) through step 2) after, utilize pure water to wash, the washing time of each optical element is 6s;
4) through after the step 3), use zero level long wool absorbent cotton to dip in distillation acetone is finished the optical element surface in 1min wiping dehydration.Detect piece surface without attachment material with 50 power microscopes.Final finished detects piece surface without attachment material with 500 power microscopes.
Embodiment two:
1) utilizing mass fraction is that 40% acetic acid water lotion soaks 3min;
2) through after the step 1), utilizing pH=8, mass fraction is 3% APG washing lotion aqueous solution soaking 5min;
3) through step 2) after, utilize pure water to wash, the washing time of each optical element is 8s;
4) through after the step 3), use zero level long wool absorbent cotton to dip in distillation acetone is finished the optical element surface in 2min wiping dehydration.Detect piece surface without attachment material with 50 power microscopes.Final finished detects piece surface without attachment material with 500 power microscopes.
Embodiment three:
1) utilizing mass fraction is that 20% acetic acid water lotion soaks 3min;
2) through after the step 1), utilizing pH=8, mass fraction is 5% APG washing lotion aqueous solution soaking 3min;
3) through step 2) after, utilize pure water to wash, the washing time of each optical element is 10s;
4) through after the step 3), use zero level long wool absorbent cotton to dip in distillation acetone is finished the optical element surface in 2min wiping dehydration.Detect piece surface without attachment material with 50 power microscopes.Final finished detects piece surface without attachment material with 500 power microscopes.
The APG washing lotion aqueous solution adopts APG washing lotion (RQ1512) and water preparation in above-described embodiment one to three.
Embodiment four:
1) utilizing mass fraction is that 20% acetic acid water lotion soaks 3min;
2) through after the step 1), utilize pure water to wash, the washing time of each optical element is 10s;
3) through step 2) after, use zero level long wool absorbent cotton to dip in distillation acetone is finished the optical element surface in 2min wiping dehydration.Detect piece surface with 50 power microscopes a small amount of attachment material is arranged.Final finished detects piece surface with 500 power microscopes the pettiness attachment
Reference examples:
Part is not cleaned in the process, only carry out wiping.Detect piece surface with 50 power microscopes more attachment material is arranged.Final finished detects piece surface with 500 power microscopes less attachment.
Claims (3)
1. zero a defect optical element cleaning method is characterized in that, may further comprise the steps:
In the optical element process, optical element is cleaned, reduce auxiliary material to the pollution of polished surface, machine and rear optical element is cleaned again.
2. described a kind of zero defect optical element cleaning method according to claim 1, it is characterized in that: in the described process optical element cleaned and may further comprise the steps: at first the aqueous acetic acid with mass fraction 20-40% soaks optical element 3-5min, then with pure water optical element is washed, washing time is 5-10s, after the flushing, with distilling acetone to the wiping dehydration of optical element surface.
3. described a kind of zero defect optical element cleaning method according to claim 2, it is characterized in that: in the described process optical element is cleaned further comprising the steps of: before with pure water optical element being washed, the optical element pH after the Dichlorodiphenyl Acetate aqueous solution soaking is that 7-8, mass fraction are the APG washing lotion aqueous solution soaking 3-5min of 3-5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201210575117.3A CN103008310B (en) | 2012-12-26 | 2012-12-26 | Non-defect optical element cleaning method |
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| CN201210575117.3A CN103008310B (en) | 2012-12-26 | 2012-12-26 | Non-defect optical element cleaning method |
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| CN103008310A true CN103008310A (en) | 2013-04-03 |
| CN103008310B CN103008310B (en) | 2015-03-11 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104762622A (en) * | 2015-03-24 | 2015-07-08 | 中国船舶重工集团公司第七二五研究所 | A treatment method for brightening surfaces of copper nickel alloy tubes |
| CN109622503A (en) * | 2018-12-04 | 2019-04-16 | 天津津航技术物理研究所 | A kind of lossless cleaning method after laser gyro cavity optical manufacturing |
| CN113857139A (en) * | 2021-09-10 | 2021-12-31 | 四川富乐德科技发展有限公司 | Cryopump purge |
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| SU841158A2 (en) * | 1980-01-30 | 1985-03-30 | Предприятие П/Я А-7526 | Method of cleaning optical glass |
| JP2001107089A (en) * | 1999-10-07 | 2001-04-17 | Jsr Corp | Cleaning agent for semiconductor part, cleaning of the same, polishing composition, and polishing method |
| US6252725B1 (en) * | 1998-08-18 | 2001-06-26 | Trw Inc. | Semiconductor micro epi-optical components |
| JP2002273358A (en) * | 2001-03-22 | 2002-09-24 | Olympus Optical Co Ltd | Method for cleaning optical element |
| JP2002336804A (en) * | 2001-05-15 | 2002-11-26 | Nikon Corp | Method for cleaning optical part and exposure device |
| CN1720110A (en) * | 2002-12-03 | 2006-01-11 | 株式会社尼康 | Pollutant removal method and apparatus, and exposure method and apparatus |
| CN101972756A (en) * | 2010-08-30 | 2011-02-16 | 苏州五方光电科技有限公司 | Lens cleaning process during processing |
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2012
- 2012-12-26 CN CN201210575117.3A patent/CN103008310B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU841158A2 (en) * | 1980-01-30 | 1985-03-30 | Предприятие П/Я А-7526 | Method of cleaning optical glass |
| US6252725B1 (en) * | 1998-08-18 | 2001-06-26 | Trw Inc. | Semiconductor micro epi-optical components |
| JP2001107089A (en) * | 1999-10-07 | 2001-04-17 | Jsr Corp | Cleaning agent for semiconductor part, cleaning of the same, polishing composition, and polishing method |
| JP2002273358A (en) * | 2001-03-22 | 2002-09-24 | Olympus Optical Co Ltd | Method for cleaning optical element |
| JP2002336804A (en) * | 2001-05-15 | 2002-11-26 | Nikon Corp | Method for cleaning optical part and exposure device |
| CN1720110A (en) * | 2002-12-03 | 2006-01-11 | 株式会社尼康 | Pollutant removal method and apparatus, and exposure method and apparatus |
| CN101972756A (en) * | 2010-08-30 | 2011-02-16 | 苏州五方光电科技有限公司 | Lens cleaning process during processing |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104762622A (en) * | 2015-03-24 | 2015-07-08 | 中国船舶重工集团公司第七二五研究所 | A treatment method for brightening surfaces of copper nickel alloy tubes |
| CN104762622B (en) * | 2015-03-24 | 2017-07-25 | 中国船舶重工集团公司第七二五研究所 | A kind of processing method of corronil tubing surface-brightening |
| CN109622503A (en) * | 2018-12-04 | 2019-04-16 | 天津津航技术物理研究所 | A kind of lossless cleaning method after laser gyro cavity optical manufacturing |
| CN113857139A (en) * | 2021-09-10 | 2021-12-31 | 四川富乐德科技发展有限公司 | Cryopump purge |
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| CN103008310B (en) | 2015-03-11 |
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