CN102956421A - Ion source filament and clamping device therefor - Google Patents
Ion source filament and clamping device therefor Download PDFInfo
- Publication number
- CN102956421A CN102956421A CN2011102411353A CN201110241135A CN102956421A CN 102956421 A CN102956421 A CN 102956421A CN 2011102411353 A CN2011102411353 A CN 2011102411353A CN 201110241135 A CN201110241135 A CN 201110241135A CN 102956421 A CN102956421 A CN 102956421A
- Authority
- CN
- China
- Prior art keywords
- filament
- ion source
- clamping device
- ion
- coupling bar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention discloses an ion source filament used for an ion implanter and a clamping device for the ion source filament. An ion source used for the ion implanter can produce wide belts or flat belts, the filament and the clamping device for the filament allow for normal operation of the ion source, and accordingly stable strong electrons are produced. The clamping device for the filament mainly comprises the filament (1), a filament connecting rod (2), a graphite support plate (3), an insulated ceramic seat (4), a filament clamp (5), a power input belt (6) and the like. The clamping device for the filament is characterized in that the special filament (1) is disposed on the filament connecting rod (2), and the special filament clamp (5) is connected with the filament connecting rod (2) and the power input belt (6); and the filament (1) can emit high-strength electrons, and the filament clamp (5) can firmly fix the filament connecting rod (2) and transmit high voltage. Detailed explanation of operation principle of the clamping device for the filament is shown and a specific implementation scheme is given in an instruction book.
Description
Technical field
The present invention relates to a kind of ion source filament and clamping device thereof, be particularly suitable for the ion implantor in the semiconductor manufacturing equipment.
Background technology
Ion implantor is the exemplary apparatus that the semiconductor technology intermediate ion mixes, and ion source produces the ion beam that needs doping, and ion beam passes through quality analysis, correction, acceleration again, is transferred to the silicon chip surface that is in target chamber end process cavity.
Along with the semiconductor device integrated level is more and more higher, semiconductor manufacturing equipment becomes increasingly complex, and ionogenic line is required also more and more higher, therefore also more and more higher for the requirement of ion source filament.For injection technology, the ion implantor of low-yield large line is the direction of development, and the ion source that is applicable to such ion implantor need to produce broadband bundle or flat-shaped band bundle.The present invention just is being based on such ion source of application and is designing.
Summary of the invention
For the requirement of existing semiconductor technology intermediate ion implanter equipment development, the present invention designs a kind of filament for ion source of ion implanter and clamping device thereof.This device relates to a kind of for ionogenic special filament, is used for emission forceful electric power, with a large amount of electronics of exciting electrode output.
This device also relate to a kind of clamping filament clamping device, this device comprises filament coupling bar and silk folder, wherein a silk sandwiched meter adopts special knife-edge shape, is used for clamping filament coupling bar; The filament two ends embed in the filament coupling bar.
This device also is designed into a kind of power supply input tape and connecting that silk presss from both sides, and it adopts two Bolt Connection.
The present invention has following distinguishing feature:
1. functional effect is obvious;
2. simple in structure, be convenient to processing and manufacturing;
Description of drawings
Fig. 1 be a kind of for ion source filament and clamping device assembly thereof etc. axle survey view.
Fig. 2 is the front view of ion source filament.
Fig. 3 is the front view of silk folder.
Embodiment
The invention will be described further below in conjunction with the drawings and specific embodiments, but not as the restriction to patent of the present invention.
The invention discloses a kind of ionogenic filament and clamping device thereof for ion implantor, as shown in Figure 1, and ion implantor uses together with ion source.This ion source can produce broadband bundle or flat-shaped band bundle.This device is for making its normal operation forceful electric power subflow.This device mainly comprises: filament (1), filament coupling bar (2), graphite support plate (3), insulating ceramics seat (4), silk folder (5) and power supply input tape (6) etc.
Filament (1) is embedded on the filament coupling bar (2) as shown in Figure 1; Wherein filament (1) adopts the labyrinth type rotational symmetry structure, as shown in Figure 2, increases the length that electric current passes through by this kind structure, so that filament produces a large amount of electronics.
Adopt special silk folder (5) to connect filament coupling bar (2) and power supply input tape (6), wherein silk folder (5) adopts the knife-edge structure, as shown in Figure 2, such structure is clamping filament coupling bar (2) firmly both, and good conductivity is arranged again.
Graphite support plate (3) is installed on the insulating ceramics seat (4), is used for supporting accessory structure.
Insulating ceramics seat (4) adopts two Bolt Connection with silk folder (5), increases connect fastening.Wherein,, insulating ceramics seat (4) is used for connecting of whole filamentray structure and other devices, and plays the effect of isolated high voltage.
Power supply input tape (6) passes through two Bolt Connection with silk folder (5), and wherein power supply input tape (6) adopts the deformable metal material, is easy to join with power supply.
Specific embodiment of the present invention elaborates content of the present invention.For persons skilled in the art, any apparent change of without departing from the premise in the spirit of the present invention it being done all consists of the infringement to patent of the present invention, will bear corresponding legal liabilities.
Claims (6)
1. ion source filament clamping device extremely is specially adapted to the ion implantor ion source.A kind of ion implantor ion source can produce broadband bundle or flat-shaped band bundle, for making its normal operation a kind of filament of invention and filament clamping device, to produce stable forceful electric power.Mainly comprise: filament (1), filament coupling bar (2), graphite support plate (3), insulating ceramics seat (4), silk folder (5) and power supply input tape (6) etc.
2. such as claim 1 described a kind of ion source filament clamping device extremely, this device characteristic is, adopts special filament (1) to be installed on the filament coupling bar (2).
3. such as claim 1 described a kind of ion source filament clamping device extremely, this device characteristic is, adopts special silk folder (5) to connect filament coupling bar (2) and power supply input tape (6).
4. such as claim 1 described a kind of ion source filament clamping device extremely, this device characteristic is, silk folder (5) and power supply input tape (6) are by two Bolt Connection.
5. such as claim 2 described a kind of ion source filaments clamping device extremely, this device characteristic is, ionogenic filament (1) adopts the labyrinth type rotational symmetry structure.
6. such as claim 3 described a kind of ion source filaments clamping device extremely, this device characteristic is, silk folder (5) adopts the knife-edge structure, and both clamping filament coupling bar (2) firmly had again good conductivity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102411353A CN102956421A (en) | 2011-08-22 | 2011-08-22 | Ion source filament and clamping device therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102411353A CN102956421A (en) | 2011-08-22 | 2011-08-22 | Ion source filament and clamping device therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102956421A true CN102956421A (en) | 2013-03-06 |
Family
ID=47765101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011102411353A Pending CN102956421A (en) | 2011-08-22 | 2011-08-22 | Ion source filament and clamping device therefor |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102956421A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105355531A (en) * | 2015-10-30 | 2016-02-24 | 中国电子科技集团公司第四十八研究所 | Filament clamping device for ion sources |
| CN107924798A (en) * | 2015-08-26 | 2018-04-17 | 艾克塞利斯科技公司 | Cam-actuated filament clamp |
| CN110729159A (en) * | 2019-10-12 | 2020-01-24 | 武汉新芯集成电路制造有限公司 | Installation device of ion source |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5262652A (en) * | 1991-05-14 | 1993-11-16 | Applied Materials, Inc. | Ion implantation apparatus having increased source lifetime |
| US5821677A (en) * | 1996-12-05 | 1998-10-13 | Eaton Corporation | Ion source block filament with laybrinth conductive path |
| CN2758967Y (en) * | 2004-12-23 | 2006-02-15 | 北京中科信电子装备有限公司 | Ion source suspension reflecting electrode |
| CN2891269Y (en) * | 2006-03-17 | 2007-04-18 | 北京中科信电子装备有限公司 | Apparatus for insulation between ion source cathode, heating electron gun, and arc chamber |
| CN2922115Y (en) * | 2006-04-24 | 2007-07-11 | 北京中科信电子装备有限公司 | Long-life ion source heating electronic gun filament fixing device |
| CN101296881A (en) * | 2005-10-28 | 2008-10-29 | 东洋炭素株式会社 | Graphite member for beam-line internal member of ion implantation apparatus |
-
2011
- 2011-08-22 CN CN2011102411353A patent/CN102956421A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5262652A (en) * | 1991-05-14 | 1993-11-16 | Applied Materials, Inc. | Ion implantation apparatus having increased source lifetime |
| US5517077A (en) * | 1991-05-14 | 1996-05-14 | Applied Materials, Inc. | Ion implantation having increased source lifetime |
| US5821677A (en) * | 1996-12-05 | 1998-10-13 | Eaton Corporation | Ion source block filament with laybrinth conductive path |
| CN2758967Y (en) * | 2004-12-23 | 2006-02-15 | 北京中科信电子装备有限公司 | Ion source suspension reflecting electrode |
| CN101296881A (en) * | 2005-10-28 | 2008-10-29 | 东洋炭素株式会社 | Graphite member for beam-line internal member of ion implantation apparatus |
| CN2891269Y (en) * | 2006-03-17 | 2007-04-18 | 北京中科信电子装备有限公司 | Apparatus for insulation between ion source cathode, heating electron gun, and arc chamber |
| CN2922115Y (en) * | 2006-04-24 | 2007-07-11 | 北京中科信电子装备有限公司 | Long-life ion source heating electronic gun filament fixing device |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107924798A (en) * | 2015-08-26 | 2018-04-17 | 艾克塞利斯科技公司 | Cam-actuated filament clamp |
| CN107924798B (en) * | 2015-08-26 | 2019-12-10 | 艾克塞利斯科技公司 | Cam actuated filament clamp |
| CN105355531A (en) * | 2015-10-30 | 2016-02-24 | 中国电子科技集团公司第四十八研究所 | Filament clamping device for ion sources |
| CN110729159A (en) * | 2019-10-12 | 2020-01-24 | 武汉新芯集成电路制造有限公司 | Installation device of ion source |
| CN110729159B (en) * | 2019-10-12 | 2022-05-31 | 武汉新芯集成电路制造有限公司 | Installation device of ion source |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Yang et al. | The piezotronic effect of zinc oxide nanowires studied by in situ TEM | |
| RU2011107318A (en) | ION GENERATION DEVICE AND ELECTRICAL INSTRUMENT | |
| WO2010107600A3 (en) | Resistively heated small planar filament | |
| TW200625507A (en) | Wafer support member and semiconductor manufacturing system using the same | |
| CN102956421A (en) | Ion source filament and clamping device therefor | |
| WO2004068541A3 (en) | Wafer handling apparatus | |
| JP5015869B2 (en) | Modular gas ion source | |
| MXPA01012467A (en) | Current measuring apparatus for battery. | |
| KR102164563B1 (en) | Clamp heater having plane heater | |
| US9355825B2 (en) | Ionization vacuum gauge | |
| SE0102539D0 (en) | Air Purifier | |
| CN105097413B (en) | Novel ion source and ionization method | |
| DE60207105D1 (en) | Wafer transfer device with electrical conductivity and method for its production | |
| CN101378029B (en) | Dual-electrode electrostatic chuck | |
| WO2009044564A1 (en) | Electron source and electron beam device | |
| CN104143737B (en) | Switch mode current test type electrical connector | |
| JP2013232600A (en) | Thermionic power generation element | |
| RU2013116732A (en) | DEVICE FOR POWER SUPPLY OF THE COMPONENT IN THE EXHAUST GAS EXHAUST SYSTEM | |
| US6479814B2 (en) | Ion source for ion attachment mass spectrometry apparatus | |
| TW201618343A (en) | Manufacturing process of the thermoelectric conversion element | |
| JP2010002420A (en) | Hydrogen flame ionization detector and gas chromatograph using detector | |
| CN207488438U (en) | A kind of adaptable LED detection jigs | |
| ATE495900T1 (en) | INK SAG AND INK CAPTURE DEVICE | |
| CN101458986B (en) | Magnetic field generating device | |
| CN2779595Y (en) | Lon source magnetic field generating apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| DD01 | Delivery of document by public notice |
Addressee: Zhongkexin Electronic Equipment Co., Ltd., Beijing Document name: Notification that Application Deemed to be Withdrawn |
|
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130306 |