CN102879999A - 正性操作的可光成像的底部抗反射涂层 - Google Patents
正性操作的可光成像的底部抗反射涂层 Download PDFInfo
- Publication number
- CN102879999A CN102879999A CN2012103931082A CN201210393108A CN102879999A CN 102879999 A CN102879999 A CN 102879999A CN 2012103931082 A CN2012103931082 A CN 2012103931082A CN 201210393108 A CN201210393108 A CN 201210393108A CN 102879999 A CN102879999 A CN 102879999A
- Authority
- CN
- China
- Prior art keywords
- acid
- coating
- photoresist
- antireflective coating
- coating compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
- Y10S438/952—Utilizing antireflective layer
Abstract
Description
Claims (19)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/808,884 | 2004-03-25 | ||
US10/808,884 US20050214674A1 (en) | 2004-03-25 | 2004-03-25 | Positive-working photoimageable bottom antireflective coating |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005800118695A Division CN1942826B (zh) | 2004-03-25 | 2005-03-23 | 正性操作的可光成像的底部抗反射涂层 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102879999A true CN102879999A (zh) | 2013-01-16 |
CN102879999B CN102879999B (zh) | 2014-12-24 |
Family
ID=34962084
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210393108.2A Active CN102879999B (zh) | 2004-03-25 | 2005-03-23 | 形成正像的方法 |
CN2005800118695A Active CN1942826B (zh) | 2004-03-25 | 2005-03-23 | 正性操作的可光成像的底部抗反射涂层 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005800118695A Active CN1942826B (zh) | 2004-03-25 | 2005-03-23 | 正性操作的可光成像的底部抗反射涂层 |
Country Status (9)
Country | Link |
---|---|
US (3) | US20050214674A1 (zh) |
EP (1) | EP1738225B1 (zh) |
JP (3) | JP5008079B2 (zh) |
KR (2) | KR20120000111A (zh) |
CN (2) | CN102879999B (zh) |
MY (1) | MY147755A (zh) |
SG (2) | SG183655A1 (zh) |
TW (2) | TWI407259B (zh) |
WO (1) | WO2005093513A2 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115386081A (zh) * | 2022-09-01 | 2022-11-25 | 武汉大学 | 一种原位热交联反应构筑二阶非线性光学聚合物材料的方法 |
WO2024002277A1 (zh) * | 2022-06-30 | 2024-01-04 | 华为技术有限公司 | 抗反射涂层材料和集成电路及制备方法、电子设备 |
Families Citing this family (102)
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US20050214674A1 (en) | 2004-03-25 | 2005-09-29 | Yu Sui | Positive-working photoimageable bottom antireflective coating |
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US7781149B2 (en) * | 2005-03-23 | 2010-08-24 | Asml Netherlands B.V. | Reduced pitch multiple exposure process |
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Cited By (3)
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WO2024002277A1 (zh) * | 2022-06-30 | 2024-01-04 | 华为技术有限公司 | 抗反射涂层材料和集成电路及制备方法、电子设备 |
CN115386081A (zh) * | 2022-09-01 | 2022-11-25 | 武汉大学 | 一种原位热交联反应构筑二阶非线性光学聚合物材料的方法 |
CN115386081B (zh) * | 2022-09-01 | 2023-07-28 | 武汉大学 | 一种原位热交联反应构筑二阶非线性光学聚合物材料的方法 |
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EP1738225A2 (en) | 2007-01-03 |
US20080090184A1 (en) | 2008-04-17 |
JP2008501985A (ja) | 2008-01-24 |
KR20070043698A (ko) | 2007-04-25 |
CN1942826A (zh) | 2007-04-04 |
US20080038666A1 (en) | 2008-02-14 |
JP5019338B2 (ja) | 2012-09-05 |
CN1942826B (zh) | 2012-11-28 |
WO2005093513A2 (en) | 2005-10-06 |
SG183655A1 (en) | 2012-09-27 |
JP2011150365A (ja) | 2011-08-04 |
JP2012103723A (ja) | 2012-05-31 |
JP5391462B2 (ja) | 2014-01-15 |
KR20120000111A (ko) | 2012-01-03 |
TWI407259B (zh) | 2013-09-01 |
TWI407257B (zh) | 2013-09-01 |
US8039202B2 (en) | 2011-10-18 |
TW200600974A (en) | 2006-01-01 |
US20050214674A1 (en) | 2005-09-29 |
WO2005093513A3 (en) | 2006-02-23 |
TW201214049A (en) | 2012-04-01 |
MY147755A (en) | 2013-01-15 |
JP5008079B2 (ja) | 2012-08-22 |
US7824837B2 (en) | 2010-11-02 |
KR101241468B1 (ko) | 2013-03-08 |
CN102879999B (zh) | 2014-12-24 |
SG183654A1 (en) | 2012-09-27 |
EP1738225B1 (en) | 2018-11-14 |
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