CN101116086A - 读取编码微珠的方法和设备 - Google Patents
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Abstract
提供一种用于读取其上具有代码的微珠的方法和设备,其中代码被投射在傅里叶平面上并且从傅里叶平面读取该代码。微珠的形体尺寸可以是1-1000微米(μm)或更小。通过使入射光散射离开微珠而将代码投射在傅里叶平面上。将从微珠散射的光引导通过具有用于将代码投射在傅里叶平面上的变换透镜的光学装置,并利用电荷耦合器件(CCD)或其他类似装置在傅里叶平面上读取代码。代码可以包括具有不同折射率或相位、包括折射率差的周期性材料层;具有不同相位或振幅的周期性空间调制;用于对傅里叶平面内的信息进行编码的周期性二元相位变化;用于对微珠上的信息进行编码的光子晶体,其中穿孔图案导致入射光和散射光之间的干涉在远场中形成空间和光谱特性曲线,这些空间和光谱特性曲线对于穿孔图案是唯一的;或者可以利用单个光敏内区、一系列纵向孔、不同的荧光区、或者预制件中的材料的同心环而在微珠中形成代码。
Description
相关申请的交叉引用
本申请要求于2004年11月16日申请的美国临时专利申请第60/628,897号(WFVA/CyVERA号为714-1.9/CV0056PR)的权益,该专利申请在此整体引入作为参照。
下面的案例包含如下也涉及本文公开的内容的主题并且在此整体引入作为参考:2003年1月22日申请的、序列号为60/441,678、题为“Hybrid Random Bead/Chip Microarray(混合随机珠/芯片微阵列)”的美国临时专利申请(代理人案卷号为CC-0574);2003年8月20日申请的、序列号为10/645,689、题为“Diffraction Grating-BasedOptical Identification Element(基于衍射光栅的光学识别元件)”的美国专利申请(代理人案卷号为CC-0648);2003年8月20日申请的、序列号为10/645,686、题为“End Illuminated Bragg Grating basedOptical Identification Element(基于末端照明的布拉格光栅的光学识别元件)”的美国专利申请(代理人案卷号为CC-0649);2003年9月12日申请的、序列号为10/661,031、题为“End Illuminated BraggGrating based Optical Identification Element(基于末端照明的布拉格光栅的光学识别元件)”的美国专利申请(代理人案卷号为CC-0649A);2003年9月12日申请的、序列号为10/661,082、题为“Method and Apparatus for Labeling Using DiffractionGrating-based Encoded Optical Identification Elements(用于利用基于衍射光栅的编码光学识别元件进行标示的方法和设备)”的美国专利申请(代理人案卷号为CC-0650);2003年9月12日申请的、序列号为10/661,115、题为“Assay Stick(化验棒)”的美国专利申请(代理人案卷号为CC-0651);2003年9月12日申请的、序列号为10/661,836、题为“Method and Apparatus for Aligning Microbeadsin order to Interrogate the Same(用于对准微珠以便询问这些微珠的方法和设备)”的美国专利申请(代理人案卷号为CC-0652);2003年9月12日申请的、序列号为10/661,254、题为“Chemical SynthesisUsing Diffraction Grating-based Encoded Optical Elements(利用基于衍射光栅的编码光学元件的化学合成)”的美国专利申请(代理人案卷号为CC-0653);2003年9月12日申请的、序列号为10/661,116、题为“Method of Manufacturing of a Diffractiongrating-based identification Element(制造基于衍射光栅的识别元件的方法)”的美国专利申请(代理人案卷号为CC-0654);2003年11月14日申请的、序列号为60/519,932、题为“DiffractionGrating-Based Encoded Microparticles for MultiplexedExperiments(用于多重实验的基于衍射光栅的编码微粒)”的美国临时专利申请(代理人案卷号为CC-0678);以及2004年1月22日申请的、序列号为10/763,995、题为“Hybrid Random bead/chip basedmicroarray(基于混合随机珠/芯片的微阵列)”的美国专利申请(代理人案卷号为CV-0054)。
发明背景
1.技术领域
本发明涉及一种用于读取光学元件上的代码的方法和设备;并且尤其是涉及一种利用傅里叶平面分析技术来读取微珠上的代码的方法和设备,所述微珠的尺寸通常是1-1000微米。
2.背景技术
单独可识别的微小微珠在药品发现、染色体组(genomic)、化学和安全中有许多应用。微珠是非常小的物体,通常其形体尺寸是1-1000微米(μm)。这些微珠可以是圆柱体、立方体、矩形或任何其他形状。通常,微珠由基于硅石的玻璃构成。编码微珠是单独可识别的。有许多方法可用于对微珠进行编码。用于对微珠进行编码的公知方法包括荧光强度和/或色彩、化学技术、粒子上的空间标记和射频编码。但是,公知的方法包含利用昂贵的、高分辨率的光学技术来对微珠的代码进行成像和读取。
例如,图1示出了本领域公知的用于读取编码粒子或微珠的空间成像技术,该空间成像技术通常被标为10′,并且包括:入射光源12′,用于使入射光穿过微珠14;和包括成像透镜16的成像光学系统,以便将微珠14的图像投射在成像平面18上,用以利用昂贵的、高分辨率的成像设备20来读取该图像。在微珠14与像平面18之间,成像透镜16被布置在与微珠14和像平面18中的每一个都相隔两个焦距的距离处。成像光学系统对于提供读取或解释微珠上的代码所需的高分辨率图像也是很昂贵的。
鉴于此,在工业上需要一种对微珠进行编码和解码的不太昂贵的方法。
发明内容
在最广泛的意义上,本发明提供一种用于读取其上具有代码的微珠的新颖且独特的方法和设备,其中代码被投射在傅里叶平面上并且从傅里叶平面读取该代码。
在操作中,通过首先将入射光(反射或透射地)散射离开微珠而将代码投射在傅里叶平面上。从微珠散射的光被引导通过具有将代码投射在傅里叶平面上的变换透镜的光学装置,并且利用傅里叶平面读取装置在傅里叶平面上进行读取,该傅里叶平面读取装置包括电荷耦合器件(CCD)或其他适当的傅里叶平面读取装置以及用于执行傅里叶平面分析的处理器。在微珠和傅里叶平面之间,变换透镜被布置在与微珠和傅里叶平面中的每一个都相隔一个焦距的距离处,而电荷耦合器件(CCD)或其他适当的傅里叶平面读取装置被布置在傅里叶平面上。本发明的核心在于对从微珠和光学装置散射之后投射在傅里叶平面上的光的空间频率进行分析。
微珠的形体尺寸可以是1-1000微米(μm)或更小。
代码可以包括:具有不同吸收、折射率或相位、包括折射率差的周期性的材料层;具有不同相位或振幅的周期性的空间调制;用于对傅里叶平面内的信息进行编码的周期性的二元相位变化;用于对微珠上的信息进行编码的光子晶体,其中穿孔图案导致在入射光和散射光之间的干涉形成远场中的空间和光谱特性曲线,这些空间和光谱特性曲线对于穿孔图案是唯一的;或者可以利用单个光敏内区、一连串纵向孔、不同的荧光区、或者预制件中的材料的同心环而在微珠中形成代码。实际上,本发明应用于读取在微珠中形成的任何唯一和可重复的代码,所述代码可被投射在傅里叶平面上并且从傅里叶平面读取,这些代码包括现有技术中为了读取而在目前以其他方式成像在像平面上的代码。
本发明还提供用于对微珠进行编码的新颖且独特的傅里叶散射技术,以及提供其上具有代码的一种或多种新颖且独特的微珠,根据这里公开的方法可以将代码投射在傅里叶平面上并且从傅里叶平面读取代码。
本发明的一个重要优点在于,傅里叶平面分析能够使用基本上不太昂贵的代码读取器和代码读取光学系统(诸如CCD阵列),因为微珠上的代码并不必为了被解释而以高级分辨率来成像。
另一个优点在于,当为了制作微珠而从预制件抽出光学细丝然后切成更小的部分时,可以在大面积上写入不变(translationallyinvariant)的代码。
又一个优点在于,因为该代码被投射在傅里叶平面或“远场”中并且在该傅里叶平面或“远场”中读取代码,所以读取器并不需要昂贵或强大的成像和放大光学系统来形成珠/粒子的高分辨率的放大图像,以读取该代码。这与例如针对其上印刷有条形码的小粒子实际上将珠本身成像来确定代码的现有技术不同。
附图说明
没有按照比例绘制的附图包括下图:
图1示出本领域中公知的用于读取编码粒子或微珠的空间成像技术的图。
图2示出根据本发明的用于读取编码粒子或微珠的新技术的图。
图2a示出根据本发明的用于读取编码粒子或微珠的新技术的另一幅图。
图3示出如图2中所示的微珠或光学元件102的图。
图4示出多层金属粒子的傅里叶平面读出(readout)的例子,其不需要高分辨率成像系统。
图5示出基于从预制件抽出并切割从而形成根据本发明的微珠的细丝中的不同内区几何形状的傅里叶散射技术的例子。
图6示出利用光子晶体微粒的傅里叶散射技术的另一例子,光子晶体微粒根据本发明对信息进行编码。
具体实施方式
图2示出了利用傅里叶变换技术来读取具有写在其上的代码104(例如参见图3)的微珠或其他适当光学元件的光学装置,傅里叶变换技术一般被标为100,光学元件一般被标为102,其中将代码104投射在傅里叶平面106上并且从傅里叶平面106读取。
在操作中,通过使入射光从入射光源108穿过微珠102和具有变换透镜110的光学装置而将代码104投射在傅里叶平面106上,该变换透镜110用于将代码104集中在傅里叶平面106上,并且利用傅里叶平面读取装置112来在傅里叶平面106上读取代码104,该傅里叶平面读取装置112包括电荷耦合器件(CCD)或其他适当的傅里叶平面读取装置以及用于执行傅里叶平面分析的处理器。在微珠102和傅里叶平面106之间,变换透镜110被布置在与微珠102和傅里叶平面106中的每一个都相隔大约一个焦距f的距离处,同时电荷耦合器件(CCD)或其他适当的傅里叶平面读取装置被布置在该傅里叶平面上。CCD装置112处的光位于傅里叶平面处,并且代表微珠102中的合成折射率变化的傅里叶变换。本发明的核心在于对穿过微珠和光学装置或者散射离开微珠和光学装置之后被投射在傅里叶平面106上的光的空间频率进行分析。
用于将代码104(图3)集中在傅里叶平面106上的、包括变换透镜110的傅里叶变换光学系统在本领域中是公知的,并且本发明的范围不意图被限制为任何特定类型或种类的傅里叶变换光学系统。此外,本发明的范围意在包括利用带有或不带有这种变换透镜的、目前已知或将来研发出的其他光学装置。
电荷耦合器件(CCD)或其他适当的傅里叶平面读取装置是本领域公知的不昂贵的光学装置,并且本发明的范围不意图被限制为任何特定类型或种类的傅里叶平面读取装置。
光学装置100也包括傅里叶平面变换处理器114,用于执行傅里叶平面分析以便根据合成的折射率变化来确定代码。傅里叶平面变换处理器114可以利用硬件、软件、固件或其某种组合来实现。在典型的软件实现方案中,傅里叶平面变换处理器114可以是一个或多个基于微处理器的体系结构,该体系结构具有微处理器、随机存取存储器(RAM)、只读存储器(ROM)、输入/输出装置和控制装置以及与之连接的数据和地址总线。编程领域的技术人员能够对这种基于微处理器的实现方案进行编程,从而在没有不当实验的情况下执行这里所描述的功能。本发明的范围不意图被限制为利用已知或将来研发出的技术的任何特定实现方案。此外,处理器114可以形成傅里叶平面读取装置112的部分,或者可被实现为独立的模块或处理单元。最后,本发明的范围还意图包括实现一个或多个步骤而经由在傅里叶平面变换处理器、控制器或光学系统中的其他适当模块中运行的计算机程序来实现本发明,这包括但不限于执行傅里叶平面分析来根据合成的折射率变化而确定代码。
图2a
图2a示出与图2中的光学装置类似的傅里叶变换技术的另一例子,其中波长为λ的入射光24入射在微珠的衬底10中的光栅12上,所述波长λ例如是已知频率的双Nd:YAG激光器的532nm或者是公知的氦氖激光器的632nm,微珠诸如图2中的102。假设λ在衬底的光学透射范围内(在下文更多地进行讨论),则如果需要可以使用任何其他的入射波长λ。入射光24的一部分如虚线25所示的那样直接穿过光栅12。其余的光24由光栅12反射并形成多个光束26-36,每个光束都具有与入射波长λ相同的波长λ,并且每个光束都具有表示在光栅12中存在的间距(Λ1-Λn)的不同的角。反射光26-36穿过变换透镜37,在微珠102和傅里叶平面106之间,该变换透镜37被布置在与微珠102和傅里叶平面106中的每一个都相隔大约一个焦距f的距离处。变换透镜37提供聚焦光束46-56,这些光束46-56在傅里叶平面106上被成像在CCD照相机60上的位置122、124、126、128、130、132处。与上面讨论的一致,代替透镜37或者除了透镜37之外,可以使用其他成像光学系统来提供照相机60上的光学图像/信号的所需特性(例如,光点、线、圆、椭圆等),这取决于衬底的形状和输入光学信号。并且,可以使用其他装置来代替CCD照相机,以便读取/捕获出射光。
图3:微珠或光学元件102
图3例如示出微珠102,该微珠102包括具有不同反射率的周期性材料层形式的代码104,这在本领域是公知的。具有不同反射空间104a、104b、104c、...104o的材料可以包括代表逻辑“ 0”的反射率(通常用主线(lead line)104b、104e、104f等表示的空白区来标出),而具有其他反射率的材料可以代表逻辑“1”(用单元104a、104c、104d等标出),或反之亦然。如图所示,如果将反射率的逻辑表示法反转,那么代码104代表二项数“101110010011001”或“010001101100110”。与上面讨论的一致,本发明的范围不意图被限制为任何特定的代码或编码方法或技术。此外,本发明的范围意在与公知的编码技术、形成如本文描述的本发明的部分的编码技术、以及将来研发出的编码技术结合使用。
可替换地,代码104可以包括具有不同相位、包括折射率差的周期性材料层;具有不同相位或振幅的周期性空间调制;用于对傅里叶平面中的信息进行编码的周期性二元相位变化;用于对微珠上的信息进行编码的光子晶体,其中穿孔图案导致入射光和散射光之间的干涉形成远场中的空间和光谱特性曲线,这些空间和光谱特性曲线对于穿孔图案是唯一的;或者可以利用单个光敏内区、一系列纵向孔、不同的荧光区、或者预制件中的材料的同心环而在微珠中形成代码104。实际上,本发明应用于读取任何唯一和可重复的代码,这些代码包括为了读取而在现有技术中以其他方式被成像在像平面上的代码。
微珠或光学元件102的尺寸可以是微观的,其尺寸为长度在1-1000微米的范围内或更小;或者对于更大的应用来说,微珠或光学元件102的长度可以是1.0-1000毫米或更大。外径可以小于1000微米,并且对于较大的应用来说可以是在1.0-1000毫米的范围内。利用与本发明的研发结合研发的制造技术,可以抽出一条光纤或一个衬底并将其处理来产生几十万甚至一百万或更多的这种唯一的微珠。可以使用这样的微珠或光学元件102,其中利用衬底,所述衬底诸如内区的折射率小于或等于外区的折射率的光学衬底。举例来说,读取器涉及均在2004年2月19日申请的、序列号为60/546,445(CV-35)、60/546,435(CV-53)、60/547,013(CV-65)的临时专利申请以及在2003年9月12日申请的序列号为661,836(CC-652)的申请中所公开的光学元件,所有这些申请在此引入作为参考。本发明的范围不意图被限制为微珠或光学元件102的类型、种类、形状或尺寸。本发明的范围意在包括目前已知以及将来研发出的光学衬底。
图4:
图4示出多层金属粒子的傅里叶平面读出的例子,这种读出不需要高分辨率成像系统。图2和4中类似的元件用相同的参考编号来标示。在该例子中,微珠102具有周期性空间调制(振幅或相位)形式的代码104,该周期性空间调制将入射光108通过变换透镜110反射到傅里叶平面上,其中周期性产生能够相应地读取和解释的“点”或位。
重要的是要注意,尽管原则上可以使用模拟图案在傅里叶平面中进行编码,但是仅利用两个“级”通常是有利的,其中这些级可以是相位(索引)变化和/或吸收变化。例如,可以在傅里叶平面中读出一种公知的编码技术的金属分层粒子,从而不需要高分辨率显微镜。在从预制件拉出光学细丝之后可以将相位或振幅的周期性调制“写”入该光学细丝中,从而使在单批中被编码的粒子的数量很灵活。
图5和6:用于对微珠进行编码的其他傅里叶散射技术
本发明还提供用于对微珠进行编码的许多不同类型的傅里叶散射技术,这些微珠能够利用本文描述的傅里叶平面分析技术来进行读取。例如,和/或能够设想内区的许多不同的几何形状,这些几何形状能够导致切割好的微珠的唯一可识别的标记,为列举一些例子,这些标记包括:单个光敏内区(图5A)、一系列纵向孔(图5B)、不同的荧光区(图5C)、或者预制件中的材料的同心环(图5D)。这些标记或图案可以在从预制件抽出并切割以形成微珠的光学细丝的内区和/或外区中形成。微珠上的这些图案是唯一的且可重复的,并且可以利用本文中示出和描述的傅里叶平面分析技术来读取。
图6示出利用根据本发明对信息进行编码的光子晶体微粒的傅里叶散射技术的又一个例子。穿孔图案致使入射光和散射光之间的干涉在远场中形成空间和光谱特性曲线,这些空间和光谱特性曲线对于穿孔图案是唯一的。在操作中,向其中具有光子晶体的微珠102′提供入射光,从而产生辐射图案和光谱,该辐射图案和光谱对信息唯一地进行编码,所述信息可以利用本文中描述的傅里叶平面分析技术来读取。
本发明的范围不意图被限制为利用目前已知或将来研发出的技术从预制件抽出的细丝的内区和/或外区中形成的任何特定图案。
图7:成像属性
参考图7,根据下面公知的原理描述了已知的正透镜402的成像属性。如果物体404位于远离透镜402的距离so处,即位于“物平面”内,那么透镜402将在远离透镜402的距离si处形成物体404在“像平面”中的像406。so和si之间的已知关系可被写成如下所述:
其中,f是透镜402的焦距,而so大于透镜402的焦距。像相对于物体的尺寸(或者放大率M)具有已知的关系:
其中,M是用物体404的尺寸去除像406的尺寸。因此,如果透镜402被置于远离物体404的距离f处,那么像405在远离透镜402的无穷远的距离处成为无穷大。出于讨论的目的,假定透镜402是如位于与透镜的平面平行的平面上那样无穷大、无穷薄(即,线),并且没有像差。
图8:傅里叶属性
参考图8,可以基于下面已知的原理来描述透镜402的傅里叶属性。如果将透镜402放置在电场分布408前面的距离f处,那么透镜402将在远离透镜402的距离f(即,在“傅里叶平面”411处)形成与初始电场轮廓408的傅里叶变换相对应的电场分布410。傅里叶平面图像也被称为具有不同比例的“远场”像,例如大于大约20个瑞利(Rayleigh)范围。特别地,对于具有预定强度或峰值和DC偏移的电场正弦波408,透镜402所提供的傅里叶平面411中的最终的傅里叶变换强度图案将是三个δ函数(或光点)410、412、414,这些函数对应于在点412处的DC值、点410处的信号波(sign wave)408的正频率值以及点414处的信号波408的负的频率值。点412处的光的强度对应于正弦波408的DC值,而点410、414处的光的强度对应于正弦波408的峰值。
将上面的傅里叶平面讨论与诸如元件112(图2)的光学读取器所读取的在诸如元件102(图2)的珠或粒子上印刷的条形码联系起来,正弦波408可以对应于具有单个空间周期的珠102上的条形码,效率<100%,并且其中光束412以相对于光栅矢量的法线(珠的纵轴8)成0度角而入射在该珠上。
根据图7和8应该进一步理解,如果将透镜402放置在远离入射电场408的距离so处,那么该透镜将在离开距离si处提供放大率为so/si的电场408的图像(未示出)。
因此,本发明检测傅里叶平面处的珠102上的条形码的傅里叶变换的像,该像表现为傅里叶平面中的CCD照相机(或编码照相机)上的多条线。因此,读取器112并不需要昂贵的成像光学系统来获得珠102的图像。
相反,如图1中所示,如果通过获得珠14的像来检测珠14上的代码,例如如果代码仅仅作为珠14上所印刷的系列条纹,那么读取器/检测器20将需要获得具有足够放大率的珠14的放大像,以允许编码照相机读取这些条纹并由此获得珠14上的代码。
在这点上,如果珠上的代码的外观看起来像条形码或数字代码,那么傅里叶平面内的像将看起来不像条形码或数字代码,而是像在珠上看到的条形码或数字代码的傅里叶变换。类似地,如果傅里叶平面中的代码的像看起来像条形码或数字代码,那么珠上的代码的外观将不可能看起来像条形码或数字代码,因为其将是在傅里叶平面中看到的条形码或数字代码的傅里叶逆变换。因此,可能所希望的是使傅里叶平面具有简单的数字图像,这很容易识别来保持检测器简单。在那种情况下,珠上的实际代码本身将可能与条形码或数字代码一样难理解。
图9-11:读出光束
投射在傅里叶平面上的读出光束的技术要求在于,必须具有足够大的空间相干性Lc,以分辨用于识别诸如微珠的物体的相邻频率分量。图9示出空间相干长度和两个相邻空间频率之间的关系(图9中示意性地示出)。空间相干长度的一般要求是1/Lc<1/λ1-1/λ2。
图10示出由图11中所示的空间频率分量组成的物体的反射率的例子。信息被包含在傅里叶分量的功率振幅和空间频率中。识别物体的特别稳定的方法将是观察是否存在特定的傅里叶空间频率,并且选择阈值来确定特定的频率是否对应于逻辑“1”或逻辑“0”(即数字编码)。如果在图11的例子中选择0.1的阈值,那么对应的数字代码对于所分析的五个空间频率是11011。
本发明的范围
本文中描述的任何一个实施例的尺寸和/或几何形状仅仅是出于说明的目的,因而,鉴于本文的教导,如果需要可以使用任何其他尺寸和/或几何形状,这取决于应用、大小、性能、制造要求或其他因素。
应该理解,除非本文另作说明,否则关于本文的特定实施例所描述的特征、特性、替换方案或修改中的任何一个也可被应用、用于本文描述的任何其他实施例或与本文描述的任何其他实施例结合。并且,本文的附图没有按照比例绘制。
尽管已经相对于示范性实施例描述和说明了本发明,但是在不背离本发明的精神和范围的情况下可以对本文进行上述和各种其他的增加和省略。
此外,本发明还包括结构特点、元件的组合以及部件的布局,这些将在下文阐明的结构中举例说明。
因此,可以看到,能够有效地达到上面阐明的目的以及根据前面的描述显而易见的那些目的,并且由于在不背离本发明范围的情况下可以对上面的结构进行某些改变,所以上面的描述中包含的并且在附图中示出的所有主题都应当被解释为说明性而非限制性的。
Claims (31)
1.一种用于读取微珠的方法,该微珠上具有代码,其中,代码被投射在傅里叶平面上并且从傅里叶平面读取该代码。
2.根据权利要求1所述的方法,其中,通过使入射光散射离开微珠而将代码投射在傅里叶平面上。
3.根据权利要求1所述的方法,其中,利用电荷耦合器件(CCD)或其他适当的傅里叶平面读取装置从傅里叶平面读取所述代码。
4.根据权利要求1所述的方法,其中,在微珠和傅里叶平面之间,变换透镜被布置在与微珠和傅里叶平面中的每一个均相隔大约一个焦距f的距离处。
5.根据权利要求1所述的方法,其中,傅里叶平面变换处理器执行傅里叶平面分析,以根据合成的折射率变化来确定代码。
6.根据权利要求1所述的方法,其中,微珠中的代码采取具有不同反射率的周期性材料层的形式,该材料包括具有不同反射空间的材料。
7.根据权利要求1所述的方法,其中,微珠中的代码采取以下形式:具有不同相位、包括折射率差的周期性材料层;具有不同相位或振幅的周期性空间调制;用于在傅里叶平面中对信息进行编码的周期性二元相位变化;用于对微珠上的信息进行编码的光子晶体,其中,穿孔图案致使入射光和散射光之间的干涉在远场中形成空间和光谱特性曲线,所述空间和光谱特性曲线对于穿孔图案是唯一的;或者可以利用单个光敏内区、一系列纵向孔、不同的荧光区或者预制件中的材料的同心环在微珠中形成代码。
8.根据权利要求1所述的方法,其中,微珠的尺寸是微观的,其长度在1-1000微米的范围内或更小。
9.根据权利要求1所述的方法,其中,微珠的长度为1.0-1000毫米或更大。
10.根据权利要求1所述的方法,其中,微珠具有内区的折射率小于或等于其外区的折射率的衬底。
11.根据权利要求1所述的方法,其中,可以利用许多不同类型的傅里叶散射技术中的任何一种对微珠进行编码,所述技术包括:单个光敏内区和/或外区;一系列纵向孔;不同的荧光区;或者预制件中的材料的同心环。
12.根据权利要求1所述的方法,其中,可以利用傅里叶散射技术对微珠进行编码,该傅里叶散射技术使用对信息进行编码的光子晶体微粒,其中,穿孔图案致使入射光和散射光之间的干涉在远场中形成空间和光谱特性曲线,所述空间和光谱特性曲线对于穿孔图案是唯一的。
13.根据权利要求1所述的方法,其中,供给其中具有光子晶体的微珠的入射光形成辐射图案和光谱,该辐射图案和光谱对信息进行唯一地编码,所述信息可以利用傅里叶平面分析技术来读取。
14.根据权利要求1所述的方法,其中,投射在傅里叶平面上的读出光束具有空间相干性Lc,该空间相干性Lc大得足以分辨用于识别微珠的相邻频率分量。
15.根据权利要求14所述的方法,其中,该方法包括以下步骤:通过观察是否存在特定的傅里叶空间频率来识别微珠,并且选择阈值来确定特定的频率是对应于逻辑“1”还是对应于逻辑“0”。
16.一种用于读取微珠的光学装置,该微珠上具有代码,其中,代码被投射在傅里叶平面上,并且由傅里叶平面读取装置来读取该代码。
17.根据权利要求16所述的光学装置,其中,通过使来自光源的入射光散射离开微珠而将代码投射在傅里叶平面上。
18.根据权利要求16所述的光学装置,其中,利用电荷耦合器件(CCD)或其他适当的傅里叶平面读取装置从傅里叶平面读取所述代码。
19.根据权利要求16所述的光学装置,其中,在微珠和傅里叶平面之间,变换透镜被布置在与微珠和傅里叶平面中的每一个均相隔大约一个焦距f的距离处。
20.根据权利要求16所述的光学装置,其中,傅里叶平面变换处理器执行傅里叶平面分析,以根据合成的折射率变化来确定代码。
21.根据权利要求16所述的光学装置,其中,微珠中的代码采取具有不同反射率的周期性材料层的形式,该材料包括具有不同反射空间的材料。
22.根据权利要求16所述的光学装置,其中,微珠中的代码采取以下形式:具有不同相位、包括折射率差的周期性材料层;具有不同相位或振幅的周期性空间调制;用于在傅里叶平面中对信息进行编码的周期性二元相位变化;用于对微珠上的信息进行编码的光子晶体,其中,穿孔图案致使入射光和散射光之间的干涉在远场中形成空间和光谱特性曲线,所述空间和光谱特性曲线对于穿孔图案是唯一的;或者可以利用单个光敏内区、一系列纵向孔、不同的荧光区或者预制件中的材料的同心环在微珠中形成代码。
23.根据权利要求16所述的光学装置,其中,微珠的尺寸是微观的,其长度在1-1000微米的范围内或更小。
24.根据权利要求16所述的光学装置,其中,微珠的长度为1.0-1000毫米或更大。
25.根据权利要求16所述的光学装置,其中,微珠具有内区的折射率小于或等于其外区的折射率的衬底。
26.根据权利要求16所述的光学装置,其中,可以利用许多不同类型的傅里叶散射技术中的任何一种对微珠进行编码,所述技术包括单个光敏内区和/或外区;一系列纵向孔;不同的荧光区;或者预制件中的材料的同心环。
27.根据权利要求16所述的光学装置,其中,可以利用傅里叶散射技术对微珠进行编码,该傅里叶散射技术使用对信息进行编码的光子晶体微粒,其中,穿孔图案致使入射光和散射光之间的干涉在远场中形成空间和光谱特性曲线,所述空间和光谱特性曲线对于穿孔图案是唯一的。
28.根据权利要求16所述的光学装置,其中,供给其中具有光子晶体的微珠的入射光形成辐射图案和光谱,该辐射图案和光谱对信息进行唯一地编码,所述信息可以利用傅里叶平面分析技术来读取。
29.根据权利要求16所述的光学装置,其中,投射在傅里叶平面上的读出光束具有空间相干性Lc,该空间相干性Lc大得足以分辨用于识别微珠的相邻频率分量。
30.根据权利要求29所述的光学装置,其中,该方法包括以下步骤:通过观察是否存在特定的傅里叶空间频率来识别微珠;并且选择阈值来确定,特定的频率是对应于逻辑“1”还是对应于逻辑“0”。
31.根据权利要求1所述的方法,其中,该方法进一步包括经由在处理器、控制器或光学系统中的其他适当模块中运行的计算机程序来实现该方法的步骤。
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JP4734530B2 (ja) * | 2005-09-09 | 2011-07-27 | 新オプトウエア株式会社 | 検索方法 |
US7623624B2 (en) * | 2005-11-22 | 2009-11-24 | Illumina, Inc. | Method and apparatus for labeling using optical identification elements characterized by X-ray diffraction |
US7830575B2 (en) | 2006-04-10 | 2010-11-09 | Illumina, Inc. | Optical scanner with improved scan time |
-
2005
- 2005-11-16 DE DE602005019791T patent/DE602005019791D1/de active Active
- 2005-11-16 US US11/281,907 patent/US8081792B2/en active Active
- 2005-11-16 EP EP05851776A patent/EP1869615B1/en active Active
- 2005-11-16 AT AT05851776T patent/ATE459933T1/de not_active IP Right Cessation
- 2005-11-16 EP EP10000325A patent/EP2194485B1/en active Active
- 2005-11-16 WO PCT/US2005/041731 patent/WO2006055736A1/en active Application Filing
- 2005-11-16 AU AU2005307746A patent/AU2005307746B2/en not_active Ceased
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AU2005307746A1 (en) | 2006-05-26 |
EP1869615A1 (en) | 2007-12-26 |
AU2005307746B2 (en) | 2011-05-12 |
US8081792B2 (en) | 2011-12-20 |
US8565475B2 (en) | 2013-10-22 |
WO2006055736A1 (en) | 2006-05-26 |
US9268983B2 (en) | 2016-02-23 |
EP2194485A1 (en) | 2010-06-09 |
CA2587674A1 (en) | 2006-05-26 |
EP1869615B1 (en) | 2010-03-03 |
US20140103114A1 (en) | 2014-04-17 |
ATE459933T1 (de) | 2010-03-15 |
EP2194485B1 (en) | 2012-10-17 |
US20120074225A1 (en) | 2012-03-29 |
DE602005019791D1 (de) | 2010-04-15 |
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