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Publication numberCN100481306 C
Publication typeGrant
Application numberCN 200310121178
Publication date22 Apr 2009
Filing date22 Dec 2003
Priority date22 Dec 2003
Also published asCN1632906A
Publication number200310121178.3, CN 100481306 C, CN 100481306C, CN 200310121178, CN-C-100481306, CN100481306 C, CN100481306C, CN200310121178, CN200310121178.3
Inventors刘志凯, 杨少延, 柴春林, 蒋渭生
Applicant中国科学院半导体研究所
Export CitationBiBTeX, EndNote, RefMan
External Links: SIPO, Espacenet
Ion source device for low-energy ion beam material preparing method
CN 100481306 C
Abstract  translated from Chinese
本发明涉及离子束技术,是一种可在低能离子束材料制备方法中应用的离子源装置,包括弧室体和坩埚两部分,每部分配有辅助加热装置。 The present invention relates to an ion beam technology, an ion source device can be applied in the preparation of a low energy ion beam method materials, including arc chamber body and the crucible of two parts, each assigned an auxiliary heating device. 弧室体与坩埚成一体且前后分离,之间有排进气孔连通;弧室体内装有上下双螺旋状灯丝,增大了弧室热功率和发射的电子密度,灯丝位于上下两端,减小了离子直接溅射,灯丝后有反射板;坩埚为立式,内筒有两种,反应器型可盛装与工作气体反应的固体源材料,工作气体自上而下通过源材料并与之充分反应,蒸发器型可盛装能蒸发出材料气氛的源材料,可调整辅助加热及灯丝电流来控制源的工作温度。 Arc chamber body and the crucible into one and before separation between the exhaust air inlet in communication; arc chamber body with upper and lower double helical filament, increasing the arc chamber and the electron density of the thermal power emitted by the filament is located in upper and lower ends, reducing the ion sputtered directly, after the filament has a reflection plate; crucible is vertical, the inner cylinder, there are two, the reactor type can be reacted with a working gas containing a solid source material, the working gas downwardly through the source material and with the The sufficient reaction, an evaporator-type material can be dressed can atmosphere evaporated source material, and adjust the auxiliary heating source filament current to control the operating temperature. 本发明结构简单实用,工作性能稳定、束流品质好、离化效率高、源材料选择范围广、产生离子种类多。 The present invention is simple and practical structure, stable performance, good beam quality, high ionization efficiency, wide choice of source material to produce many kinds of ions. 可用于其他离子束相关技术。 The ion beam can be used for other related technologies.
Claims(9)  translated from Chinese
1. 一种用于低能离子束材料制备方法的离子源装置,包括弧室体与坩埚两部分,每部分配有辅助加热装置,其特征是:弧室体与坩埚成一体且分置于前后部,弧室体后壁有排进气孔与坩埚连通;弧室体内上下两端各装有一根螺旋状灯丝,两灯丝外侧各有一反射板,弧室体前壁的前盖板上有离子引出狭缝;坩埚采用立式,由外壁、内筒和测温热偶构成,外壁与内筒间有空腔,所述排进气孔在坩埚外壁前侧面与弧室体相连通。 1. A process for preparing an ion source means low energy ion beam method for the material, including the arc chamber body and the crucible into two parts, each assigned an auxiliary heating device, characterized in that: the arc chamber body and the integral crucible and divided into front and rear Ministry of the posterior wall of the arc chamber with an exhaust air inlet in communication with the crucible; the upper and lower ends of each arc chamber body is equipped with a helical filament, filament two lateral plates each have a reflection on the front cover of the front wall of the arc chamber ion leads slit; crucible with vertical, from the outer wall, the inner tube and thermocouple temperature structure, between the outer wall and the inner tube with a cavity, the exhaust air intakes in the front side of the outer wall of the crucible body communicates with the arc chamber.
2. 如权利要求1所述的离子源装置,其特征是:所述螺旋状灯丝由弧室体侧面上下两端的灯丝座安装孔装到弧室体内,然后与灯丝座连接固定;灯丝座有上下两套,每套包括长短两支座体,长支座体上安装有反射板,灯丝座与弧室体之间有绝缘陶瓷套。 2. The ion source apparatus according to claim 1, characterized in that: said helical filament from the filament seat mounting hole of the arc chamber body attached to the side of the upper and lower ends of the arc chamber body, and then connected to the filament mount securing; filament block has down two sets, each including two seat body length, mounted on a long reflection plate holder, ceramic insulating sleeve between the seat and the arc chamber filament body.
3. 如权利要求1所述的离子源装置,其特征是:所述坩埚内筒,为反应器型坩埚内筒或蒸发器型坩埚内筒。 The ion source apparatus according to claim, characterized in that: the crucible inner tube, the reactor tube type crucible or evaporator-type crucible inner cylinder.
4. 如权利要求3所述的离子源装置,其特征是:所述反应器型柑埚内筒,内筒上盖有进气孔,底部有筛形出气孔,可盛装与工作气体反应的固体源材料,工作气体是自上而下通过源材料并与之充分反应。 The ion source apparatus according to claim 3, characterized in that: said reactor type citrus crucible inner cylinder, the inner cylinder carries the inlet port, the bottom of the sieve-shaped pores, the reaction can be dressed with a working gas solid source material, the working gas is from top to bottom by the source material and with an adequate response.
5. 如权利要求3所述的离子源装置,其特征是:所述蒸发器型坩埚内筒,内筒上,有出气孔,可盛装能蒸发出材料气氛的源材料。 5. The ion source apparatus according to claim 3, characterized in that: the upper evaporator type crucible inner cylinder, the inner cylinder, there is a vent, evaporated material can be an atmosphere containing source material.
6. 如权禾f要求1所述的离子源装置,其特征是:所述弧室体内的两灯丝是并联接到灯丝加热电源的,弧室体两侧的辅助加热装置的左右两套加热丝是串联接到弧室加热电源上的,坩埚两侧的辅助加热装置的左右两套加热丝是串联接到坩埚加热电源上的。 6. Right Wo f claim 1, wherein the ion source means, characterized in that: the arc chamber body and coupled to two filament is the filament heating power supply, the auxiliary heating means around the body of the arc chamber on either side of the two sets of heating wire is serially connected to the heating power source on the arc chamber, the left and right auxiliary heating means on both sides of the crucible is serially connected to the two sets of heating wire on the power supply of the heating crucible.
7. 如权利要求6所述的离子源装置,其特征是:通过调整辅助加热装置的弧室加热电源、坩埚加热电源及灯丝加热电源的电流来控制该离子源装置的工作温度,其工作温度范围为150〜85(TC。 7. The ion source apparatus according to claim 6, characterized in that: the arc chamber by adjusting the heating power of the auxiliary heating device, the crucible is heated filament heating power supply and the power supply current to control the operating temperature of the ion source device, its working temperature range of 150~85 (TC.
8. 如权利要求5所述的离子源装置,其特征是:所述蒸发器型坩埚内筒内的源材料为作为固体源材料的氯化物。 The ion source apparatus according to claim 8., characterized in that: said evaporator barrel type crucible as a solid source material is a chloride source material.
9. 如权利要求4所述的离子源装置,其特征是:反应器型坩埚内筒内的固体源材料为氧化物或单质金属。 9. The ion source apparatus according to claim 4, characterized in that: the reactor type crucible inner cylinder solid source material is an oxide or elemental metal.
Description  translated from Chinese

一种用于低能离子束材料制备方法的离子源装置 Ion source device for preparing a low energy ion beam method for materials

技术领域 FIELD

本发明涉及离子束技术,是一种可在低能离子束材料制备方法中应用的离子源装置,具有结构简单、工作性能稳定、束流品质好、离化效率高、 可选择利用的源材料范围广等特点,该装置也适用于其他相关离子束技术。 The present invention relates to an ion beam technology, an ion source device can be applied in the preparation of a low-energy ion beam material method, has a simple structure, stable performance, good beam quality, high ionization efficiency, optional use of source materials range extensive features, the device is also applicable to other related ion beam technology.

背景技术 BACKGROUND

质量分离的低能离子束材料制备方法是一种处于发展中的材料制备新技术,也可简称低能离子束材料制备方法。 Low Energy Ion Beam Materials Preparation mass separation is a preparation materials in the development of new technology, can also be referred to as a low energy ion beam material preparation methods. 与己经成熟的其他离子束材料制备方法,如离子溅射、离子注入、离子刻蚀、等离子体沉积等不同, 该方法是采用经质量分离的低能材料离子进行材料的生长与制备。 And have proven the other ion beam preparation methods, such as ion sputtering, ion implantation, plasma etching, plasma deposition, this method is the use of low energy material by mass-separation ion were grown and prepared material. 可用于难提纯、高熔点及特种功能材料的生长,也可用于材料的高浓度掺杂、浅结杂质注入及溅射刻蚀等。 Can be used in difficult purification, the growth of high melting point and special functional materials can also be used for high concentration of doping material, shallow junction impurity implantation and sputter etching. 因可选择制备材料范围广,该方法是探索制备新材料的一种强有力的工艺手段。 Choose a wide range of materials due to the preparation of this approach is to explore new materials for preparing a powerful means of technology.

用于低能离子束材料制备方法的设备系统目前有两种, 一是单离子束设备系统,只可用单一离子进行材料的生长或制备,另一种是双离子束设 Equipment system preparation method for low energy ion beam material present, there are two, one single ion beam equipment system, available only single ions growth or preparation of materials, the other is a dual ion beam set

备系统,可利用两种离子进行材料的生长或制备,比如附图2所示中的低能双离子束系统可制备合成双元素的化合物薄膜。 Standby systems, can be used both ions were grown or prepared materials, such as shown in the drawings 2 Dual low energy ion beam system with double element compound thin film synthesis can be prepared. 无论哪种设备,其离子 Either the device, and its ion

束装置部分都由如下五部分构成:离子源、磁分析器、电(磁)四极透镜、 静电偏转板、减速透镜(详见附图2)。 Beam device part by the following five components: an ion source, magnetic analyzer, electric (magnetic) quadrupole lenses, electrostatic deflection plates, deceleration lens (see Figure 2). 而离子源是低能离子束材料制备系统中最重要的组成部分,用来制备材料的离子由该装置产生,其离化效率、 束流品质、产生离子种类以及工作的稳定性决定着低能离子束材料制备系统的工作性能。 The ion source is a low energy ion beam material preparation system is the most important part of the preparation of the material used to produce ions from the device, its ionization efficiency, beam quality and stability of the work to produce ion species determines the low energy ion beam performance material preparation system. 目前用于低能离子束材料制备系统的离子源主要有两种类 Currently ion source materials for the preparation of low energy ion beam systems are mainly two categories

型:弗瑞曼(Freeman)型和伯纳斯(B园s)型。 Type: Freeman (Freeman) and Berners-type (B Park s) type. 在该技术发展的初期, 多采用弗瑞曼(Freeman)型离子源,该型离子源热功率高,可产生离子的种类多,虽可利用高工作温度的固体源材料作为工作物质,但因其阴极灯丝工作时易受离子的直接溅射而很快的消耗变细,灯丝的使用寿命短, 因而影响了其工作稳定性,束流品质及离化效率不是很好,也限制了其在 In the early development of the technology, the use of Freeman (Freeman) type ion source, the type of ion source heat high power, can produce more types of ions, although the use of high operating temperatures can be solid source material as the working substance, but a cathode filament work susceptible direct sputter ion rather quickly tapers consumption, shorter service life of the filament, thereby affecting the stability of their work, the ionization efficiency and beam quality is not very good, but also limit its

低能离子束材料制备技术中的广泛使用。 Low Energy Ion Beam Materials preparation techniques widely used. 伯纳斯(Bermis)型离子源是另一类型在低能离子束材料制备技术中使用的离子源,其束流品质和工作稳定性优于弗瑞曼(Freeman)型离子源,但原有的伯纳斯(Bernus)型离子源阴极灯丝位于弧室体上端,热功率较小,虽对气体工作物质离化效率很高,但不适宜采用高工作温度的固体源材料作为工作物质,因而可产生的离子种类有限,这制约了其在低能离子束材料制备技术中的广泛使用。 Berners (Bermis) type ion source is another type of ion source material at low energy ion beam technology used in the preparation of its superior beam quality and job stability Freeman (Freeman) type ion source, but the original Berners (Bernus) cathode filament type ion source is located in the upper end of the arc chamber, thermal power is small, although the working substance for gas ionization efficiency is high, but not suitable for high operating temperature of the solid source material as the working substance, which can be ion species produced limited, which restricts their widespread use in low energy ion beam material preparation techniques. 如何提高离子源的工作稳定性、离化效率与束流品质,扩展可选择利用的源材料范围,增加可产生的离子种类,仍是目前低能离子束材料制备技术发展所要解决的技术问题。 How to improve the stability of operation of the ion source, ionization efficiency and beam quality, use of source material selectively extended range, increased ion species can produce, the technical problem is still present, low energy ion beam technology for preparing materials to be solved.

发明内容 SUMMARY

本发明的目的是为了克服低能离子束材料制备系统原使用的离子源装置的技术不足,提供一种适于低能离子束材料制备方法用的新型离子源装置。 The purpose of the present invention is to overcome the low energy ion beam material preparation system is inadequate technology ion source device originally used to provide new ion source device suitable for preparing a low energy ion beam method used material.

本发明的再一目的是所提供的新型离子源装置,能产生元素周期表中大部分元素的离子,特别是能得到用其他材料制备方法难以制备的高熔点、难提纯材料的离子。 A further object of the present invention is a novel ion source apparatus is provided, which can produce ions of most elements in the periodic table, in particular high melting point can be obtained by other preparation methods are difficult to prepare, purify by ion difficult.

本发明解决技术问题所采用的技术方案是- Technical solutions to solve the technical problem of the invention is used -

1、 改进原有的伯纳斯(Bermjs)型离子源弧室体的结构设计-改进后的弧室体内上下两端装有两根螺旋状阴极灯丝,两侧有辅助加 An improved design of the original Berners (Bermjs) type ion source arc chamber body - the body of the upper and lower ends of the arc chamber is equipped with two spiral improved cathode filament assist both sides plus

热装置,灯丝后面还装有反射板。 Thermal device is also equipped with reflective panels behind the filament. 其特点是: Its characteristics are:

1) 阴极灯丝位于弧室体内上下两端,可增加放电室的空间,减少工作时灯丝受离子直接溅射,提高灯丝使用寿命和保持工作状态的稳定; 1) located in the cathode filaments upper and lower ends of the arc chamber body, the space of the discharge vessel can be increased, while reducing the work of the filament directly by ion sputtering, improve the service life of the filament and to maintain a steady state;

2) 螺旋状双灯丝可增加热阴极发射的原初电子密度,再加上灯丝的后面反射板对电子的反射作用,可以提高离化效率; Primary electron density 2) double helical filament hot cathode emission increase, coupled with the reflex reflector plate on the back of the filament electron, ionization efficiency can be improved;

3) 双灯丝是并联到灯丝加热电源上的,在弧室体内上下两端加热, 再加上两侧的辅助加热装置,可使弧室体内工作时的温度场分布均匀,提高了离子源的热功率。 3) dual filament is parallel to the filament heating power, heating in the arc chamber body upper and lower ends, plus auxiliary heating device on both sides, can make the body work arc chamber temperature field distribution, improve the ion source Thermal power.

2、 改进原有离子源的坩埚结构设计-坩埚与弧室体设计成一体且分置于前后部,弧室体后壁有排进气孔与弧相通。 2, the ion source to improve the original design of the crucible - the crucible and the arc chamber body and is designed to be integrated into the front and rear sub-arc chamber body posterior wall air intake and exhaust arc connected. 坩埚釆用立式设计,由外壁、内筒、辅助加热装置和测温热偶等几部分构成。 Crucible preclude the use of vertical design, the outer wall of the inner cylinder, auxiliary heating device and thermocouple temperature measurement of several parts. 坩埚内筒设计成两种形式: Crucible inner cylinder is designed to take two forms:

1) 反应器型: 1) Reactor type:

该结构内筒上盖有进气孔,下端有筛形气孔与外壁间的空腔相通,可装与反应气体发生化学反应的小碎快固体源材料,比如氧化物或单质金属源材料。 Cylinder cover has inlet holes within the structure, the lower end of the sieve-shaped pore has a cavity communicating with the outer walls, can be installed quickly small pieces of solid source material occurs with the reaction gas a chemical reaction, such as an oxide or elemental metal source material. 工作时,反应气体可从坩埚上盖的进气孔进入,进气孔上有带进气嘴的导管与离子源外装反应气体的容器相通,靠针形阀控制进气的流量,反应气体自上而下通过固体源材料,并携带反应生成的工作气氛,由坩埚内筒底部进入内筒与外壁间的空腔,然后再经坩埚前外壁与弧室体后壁间的一排进气孔进入弧室体内离化出离子;此种设计可保证反应气体与源材料充分反应,提高源材料的利用率。 In operation, the reactive gas may enter from the crucible cover the inlet port, into the gas nozzle of the container with the ion source outer conduit communicating the reaction gas inlet holes, by a needle valve to control the flow of intake air, since the reaction gas the top down through the solid source material, and carry the reaction of the working atmosphere, from the bottom of the crucible inner tube into the inner tube and the outer walls of the cavity, and then after the crucible wall and the arc chamber body in front of a row of intramural air inlet into the arc chamber of the ion from the body; reactive gas such design ensures sufficient reaction with the source material, to improve the utilization of the source material.

2) 蒸发器型: 2) Evaporator type:

该内筒下端封死,上部靠近内筒盖处开有小的出气孔,可蒸发的固体源材料工作物质(如氯化物)装在内筒里。 The lower end of the sealed inner tube, the upper lid at the open and close of the inner cylinder with small pores, solid source material can be vaporized working substance (such as chloride) is mounted inside the inner tube. 通过调节辅助加热(坩埚加热、 By adjusting the auxiliary heating (heating the crucible,

弧室加热)及灯丝加热电源的电流,来控制加热温度,温度范围为150~850 'c。 Heating the arc chamber) and the filament heating power supply current, to control the heating temperature, the temperature range of 150 ~ 850 'c. 蒸发出来的源材料工作气氛由上部的小孔进入内筒与外壁间空腔,然 The source material is vaporized working atmosphere from the upper aperture into the inner cylinder and the outer walls of the cavity, and then

后再经坩埚前外壁与弧室体后壁间的进气孔进入弧室体内离化。 Then through the front wall of the crucible and the arc chamber body after intramural air intake into the arc chamber body ionization.

坩埚的多功能设计拓展了可利用的源材料工作物质的选择范围,气体、氧化物、氯化物、单质金属或其他固体工作物质都可能在该离子源中产生出离子。 The multi-functional design of the crucible expands the range of options available source material of the working substance, gas, oxides, chlorides, elemental metal or other solid material may produce a working ions in the ion source.

具体说,为达到上述目的,本发明的技术解决方案是提供一种用于低能离子束材料制备方法的离子源装置,包括弧室体与坩埚两部分,每部分配有辅助加热装置,其弧室体与坩埚成一体且分置于前后部,弧室体后壁 Specifically, in order to achieve the above object, the technical solution of the invention is to provide a low energy ion beam ion source apparatus for preparation of materials, including the arc chamber body and the crucible into two parts, each assigned an auxiliary heating means, which arc chamber body and the crucible into one and divided into front and rear, the rear wall of the arc chamber body

有排进气孔与坩埚连通;弧室体内上下两端各装有一根螺旋状灯丝,两灯丝外侧各有一反射板,弧室体前壁的前盖板上有离子引出狭缝;坩埚采用立式,由外壁、内筒和测温热偶构成,外壁与内筒间有空腔,外壁位于内部的部分与弧室体后壁为一体,相连通的排进气孔设于其上。 There are rows of air inlet in communication with the crucible; the upper and lower ends of each arc chamber body is equipped with a helical filament, filament two lateral plates have a reflective, ion extraction slit on the front cover of the front wall of the arc chamber; crucible adopt legislation style, from the outer wall, the inner tube and thermocouple temperature structure, between the outer wall and the inner tube has a cavity wall is located inside the body portion and the rear wall of the arc chamber as a whole, communicating exhaust intakes located thereon.

所述的离子源装置,其螺旋状灯丝由弧室体侧面上下两端的灯丝座安装孔装入弧室体,然后与灯丝座连接固定;灯丝座有上下两套,每套包括长短两支座体,长支座体上安装有反射板,灯丝座与弧室体之间有绝缘陶瓷套。 Ion source means, the helical filament by filament seat mounting holes arc chamber body side upper and lower ends of the arc chamber into the body, and then connect with the filament seat fixed; filament seat up and down two sets, each including the length of the two seats body mounted on the long seat body with a reflective plate, insulating ceramic sleeve seat between the filament and arc chamber body.

所述的离子源装置,其所述坩埚内筒,为反应器型坩埚内筒或蒸发器型坩埚内筒。 Said ion source means, which the crucible inner tube, the reactor tube type crucible or evaporator-type crucible inner cylinder.

所述的离子源装置,其所述反应器型坩埚内筒,内筒上盖有进气孔, 底部有筛形出气孔,可盛装与工作气体反应的固体源材料,工作气体是自上而下通过源材料并与之充分反应。 The ion source apparatus of the reactor type crucible inner cylinder, the inner cylinder covered with air intake, the bottom of the sieve-shaped vent holes, and may be a solid source material containing reactive working gas, the working gas is from top Under the source material by and with the full response.

所述的离子源装置,其所述蒸发器型柑埚内筒,内筒上部有出气孔, 可盛装能蒸发出材料气氛的源材料。 Said ion source means, which the citrus type evaporator crucible inner cylinder, the inner cylinder has an upper vent, can be dressed energy source material evaporated material atmosphere.

所述的离子源装置,其所述弧室体内的两灯丝是并联接到灯丝加热电源的,弧室体两侧的辅助加热装置的左右两套加热丝是串联接到弧室加热电源上的,坩埚两侧的辅助加热装置的左右两套加热丝也是串联接到坩埚加热电源上的。 Said ion source means, which said arc chamber body and coupled to two filament is the filament heating power supply, heating wire around two sides of the arc chamber body is an auxiliary heating device connected to the arc chamber in series to the heating power source , the left and right auxiliary heating means on both sides of the crucible is serially connected to the two sets of heating wire on the power supply of the heating crucible.

所述的离子源装置,可通过调整辅助加热装置的弧室加热电源、坩埚加热电源及灯丝加热电源的电流来控制该离子源装置的工作温度,其工作 Said ion source means, the heating power can be adjusted by means of auxiliary heating the arc chamber, and the crucible was heated filament heating power supply current to control the operating temperature of the ion source device, its working

温度范围为150〜85(TC。 Temperature range is 150~85 (TC.

所述的离子源装置,其所述源材料,为气体、氧化物、氯化物、单质金属的固体工作物质。 Said ion source means, which the source material is a gas, oxides, chlorides, elemental metal solid working material.

本发明的有益效果是:1)离子源的弧室体与坩埚设计成一体且前后分离,结构简单实用;2)工作性能稳定、束流品质好、离化效率高、可产生的离子种类多;3)源材料选择范围广且利用率高,降低了材料制备的成本。 The beneficial effects of the present invention are: 1) the arc chamber body and the crucible of the ion source is designed integrally and before separation, simple and practical structure; 2) performance and stability, good beam quality, high efficiency of ionization, ion species can produce multi- ; 3) a wide range of source material selection and utilization, reducing the cost of the material prepared. 4)该发明适用于低能离子束材料制备方法及其他相关离子束技术。 4) The invention is applicable to the preparation of low energy ion beam methods and other related materials ion beam technology.

本发明具有结构简单、工作性能稳定、束流品质好、离化效率高、可选择利用的源材料范围广等特点。 The present invention has a simple structure, stable performance, good beam quality, high ionization efficiency, wide range of source material selectively use features. 可产生元素周期表中大部分元素的离子,特别是能得到用其他材料制备方法难以制备的高熔点、难提纯材料的离子。 Can produce ions of most elements in the periodic table, in particular high melting point can be obtained by other preparation methods are difficult to prepare, purify by ion difficult. 离子源产生的离子种类多,利于发挥低能离子束材料制备方法可广泛探索制备新材料的工艺特点。 Ion species produced by the ion source and more conducive to play the low energy ion beam preparation methods can be widely explored new materials preparation process characteristics.

附图说明 Brief Description

图1. 1本发明离子源装置结构的侧向剖面图; 图1. 2本发明离子源装置结构的纵向前剖面图;图1. 3本发明离子源装置结构的横向剖面图; 图1.4本发明离子源装置的埘埚内筒剖面图; 图1. 5本发明离子源装置的电路示意图; 图2低能双离子束材料制备系统示意图。 FIG side sectional view 1.1 ion source apparatus according to the invention; Figure 1. Figure 2 a longitudinal front sectional view of the present invention means the structure of the ion source; FIG transverse sectional view 1.3 ion source apparatus according to the invention; Fig. 1.4 Shí crucible sectional view of the inner cylinder ion source device of the invention; a circuit diagram of the ion source device of the invention 1.5; Figure 2 low energy dual ion beam material preparation system diagram.

具体实施方式 DETAILED DESCRIPTION

本发明的离子源装置结构和电路原理图如图1所示。 The ion source assembly structure and circuit diagram of the invention shown in Figure 1.

该离子源装置,包括弧室体1和坩埚11两部分,每部分配有辅助加热装置:弧室加热装置2、坩埚加热装置12。 The ion source apparatus, comprising an arc chamber body and the crucible 11 into two parts, each assigned with an auxiliary heating device: the arc chamber heating device 2, the crucible heating means 12. 弧室体1与坩埚11设计成 The arc chamber 1 and the crucible 11 is designed to

一体且前后分离,之间有排进气孔9连通。 One before and separation between the exhaust air intake 9 connectivity. 弧室体1的内腔也称弧室或真空放电室,弧室内有上下双螺旋状灯丝3 (直热式阴极)和反射板4。 1, the arc chamber body cavity or chamber, also known as vacuum arc discharge chamber, the arc chamber has upper and lower double helical filament 3 (directly heated cathode) and the reflection plate 4. 弧室壁处于阳极电位,也称阳极壁,后壁有排进气孔9与坩埚11相通,前壁的前盖板7上有离子引出狭缝8。 Arc wall at the anode potential, also known as the anode wall, a back wall with an exhaust inlet holes 9 and the crucible 11 communicates with the anterior wall of the front cover 7 ion extraction slit 8. 双螺旋状灯丝3可由弧室体1侧面上下两端的灯丝座安装孔装入,然后装上灯丝座5固定,灯丝座5有上下两套,每套设计成有长短两支座体,长支座体5-l可安装反射板4,灯丝座5与弧室体1之间有绝缘陶瓷套5-3绝缘。 Double helical filament filament seat mounting holes 3 arc chamber body by the side of the upper and lower ends of a load, and then loaded filament fixed seat 5, Block 5 upper and lower sets of filaments, each designed to have a length of two seat body, long branch on 5-l seat body may be mounted reflector plate 4, base 5 and the arc chamber filament body having an insulating ceramic insulating sleeve 5-3 between 1. 坩埚11位于弧室体1的后面, 采用立式设计,由外壁、内筒13、辅助坩埚加热装置12和测温热偶18 等几部分构成。 Crucible 11 is located behind the arc chamber body 1, the use of vertical design, by the outer wall, the inner cylinder 13, an auxiliary heating means of the crucible 12 and the temperature of several parts thermocouple 18 and the like. 坩埚内筒13有两种形式,反应器型坩埚内筒13-1,其上盖有进气孔13-la,底部有筛形出气孔13-lb,可盛装需与工作气体反应的固体源材料,工作气体是自上而下通过源材料并与之充分反应;蒸发器型坩埚内筒13-2上部有出气孔13-2b,可盛装可蒸发出材料气氛的源材料。 Crucible inner cylinder 13 has two forms, reactor type crucible inner cylinder 13-1, which carries the air intake 13-la, the bottom of the sieve-shaped vent 13-lb, can be dressed up with a working gas source need solid reaction materials, working gas is a top-down through the source material and with an adequate response; the upper part of the crucible type evaporators have a vent tube 13-2 13-2b, can be dressed to the source material as the evaporation atmosphere. 通过调整辅助加热电源26、 25及灯丝加热电源23的电流来控制离子源的工作温度。 By adjusting the auxiliary heating power source 26, 25 and filament heating current power source 23 to control the operating temperature of the ion source.

本发明的离子源电源参数见表1,其工作原理与通常的伯纳斯Bernus 型离子源工作原理相同。 Ion source power supply parameters of the present invention are shown in Table 1, it works with the usual type ion source Berners Bernus work on the same principle. 工作时,先通工作气体或调整辅助加热电源26、 25及灯丝加热电源23的电流蒸发出材料气氛,工作气体、反应生成或蒸发出的材料气氛由坩埚ll进入到弧室(真空放电室)体内,控制进入弧室的进气量,应使离子源弧室外的真空度不大于5x10—5Torr;然后加源正高压21、弧压24、源附加磁铁电流27,调整灯丝加热电源23、弧室加热电源25、柑埚加热电源26的电流使弧室和坩埚11处于额定的工作温度(该温度因源材料类别不同而不同);热阴极3(双螺旋状灯丝)内部的自由电子获得足够能量飞出金属表面,发射出的电子称为原初电子,原初电子在源磁场中作加速螺旋渐进运动并获得更大的动量,高能的电子与材料气氛碰撞使其放电离化出带正电的离子,并在弧室(放电室)内形成稳定的等 Work, work to pass gas or adjust the auxiliary heating power 26, 25 and 23 of the filament heating current power evaporated material atmosphere, working gas or vapor atmosphere reacts material issued by the crucible ll into the arc chamber (vacuum discharge chamber) body control intake air into the arc chamber, should make outdoor vacuum arc ion source is not greater than 5x10-5Torr; then add a positive high voltage source 21, arc voltage 24, additional magnet current source 27, to adjust the heating filament power supply 23, the arc Room heating power source 25, the heating current supply citrus crucible 26 causes the arc chamber and the crucible 11 at nominal operating temperature (the temperature depends on the type of material from different sources differ); hot cathode 3 (double helical filament) inside the free electrons gaining sufficient energy flying metal surface, called the primary electrons emitted electrons, the original source of electrons in a magnetic field for accelerating spiral of progressive movement and gain greater momentum, high-energy electrons collide with the material so that the discharge from the atmosphere of a positively charged ions, and is formed in the arc chamber (discharge chamber) stability and the like

离子体状态;源附加磁铁27的磁场作用可有效地增长电子运动的路径, 增加电子和气体原子或分子的碰撞次数。 Plasma state; additional magnet magnetic field source 27 can effectively increase the path of electron motion, increasing the number of collisions of electrons and gas atoms or molecules. 另外,离化产生的离子在磁场中沿着磁力线作螺旋渐进运动,增加了离子在弧室(放电室)内的停留时间, 大大增大了等离子体的密度;最后调整聚焦引出极电压22,使离子加速成形,由弧室前盖板7的离子引出狭缝8引出离子束28。 Further, ionization generation of ions along the magnetic field lines in the magnetic field as a progressive movement of the coil, an increase of the ion in the arc chamber (discharge chamber) the residence time, greatly increasing the density of the plasma; last adjust the focus extraction electrode voltage 22, accelerating ions formed by the front cover of the arc chamber of the ion extraction slit 7 8 28 leads to the ion beam. 本发明离子源装置的工作温度范围为15(TC到850°C。 Operating temperature range of the ion source apparatus of the present invention is 15 (TC to 850 ° C.

利用低能离子束材料制备方法进行材料的生长与制备过程如下(可参见附图2):由离子源产生的离子束28是高能的,其能量通常为几十千电子伏特(KeV);高能离子束经低能离子束材料制备系统的磁分析器(也称质量分析器)的磁场选择分析后,获得所要材料的同位素纯的高能离子束; 同位素纯的高能离子束经电(或磁)四极透镜的二次聚焦后,再由静电偏转板的电场偏转进入生长室;生长室内有一减速透镜装置,可使同位素纯的高能离子的能量降低至几十到几百电子伏特(eV),变成低能离子;最后,利用得到的同位素纯的低能离子在衬底上进行材料的生长与制备。 The use of low energy ion beam material preparation methods of growth and preparation of materials as follows (see Figure 2): from the ion source 28 is a high-energy ion beam, and its energy is typically tens of thousands of electron volts (KeV); high-energy ions beam low energy ion beam by the magnetic analyzer material preparation system (also called the analyzer) after selection of the magnetic field analysis, to obtain isotopically pure desired material high energy ion beam; isotopically pure by high-energy ion beam electric (or magnetic) quadrupole after the second focus lens, and then an electric field by electrostatic deflection plates deflect into the growth chamber; growth chamber with a deceleration lens system that allows the energy isotopically pure energetic ions is reduced to several tens to hundreds of electron volts (eV), becomes low energy ion; Finally, the resulting low energy ion isotopically pure grown on the substrate material and the preparation was. 表2列举了本发明的一些实施例。 Table 2 lists some embodiments of the present invention.

表l:新型离子源电源参数表 Table l: new ion source power parameter table

<table>table see original document page 8</column></row> <table>注:1) xl0-2稳定度要求的电源均由交流稳压器供电,并通过调压器实现连续可调2)线路要有防打火措施,正商压与聚焦联锁,真空、冷却水与源工作状态联锁 <Table> table see original document page 8 </ column> </ row> <table> Note: 1) by the exchange regulator power supply xl0-2 stability requirements, and implemented by the regulator continuously adjustable 2 ) have anti-ignition circuit measures positive pressure and focus interlock manufacturers, vacuum, cooling water and a source of work status interlock

表2:新型离子源产生的离子举例 Table 2: The new ion source produces ions example

<table>table see original document page 9</column></row> <table> <Table> table see original document page 9 </ column> </ row> <table>

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Classifications
International ClassificationH01J27/02, H01J37/08
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