CA2407209A1 - Stamping tool, method for structuring a surface of a workpiece and use of an anodized surface layer - Google Patents
Stamping tool, method for structuring a surface of a workpiece and use of an anodized surface layer Download PDFInfo
- Publication number
- CA2407209A1 CA2407209A1 CA002407209A CA2407209A CA2407209A1 CA 2407209 A1 CA2407209 A1 CA 2407209A1 CA 002407209 A CA002407209 A CA 002407209A CA 2407209 A CA2407209 A CA 2407209A CA 2407209 A1 CA2407209 A1 CA 2407209A1
- Authority
- CA
- Canada
- Prior art keywords
- stamping
- hollow chambers
- structured
- stamping tool
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B30—PRESSES
- B30B—PRESSES IN GENERAL
- B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
- B30B15/06—Platens or press rams
- B30B15/065—Press rams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
Abstract
The invention relates to a stamping tool, to a method for producing the same , to a method for structuring a surface of a workpiece and to a use for an anodized surface layer. A surface layer with cavities formed without a model , by anodic oxidation, is used as a die to enable simple, inexpensive stamping in the nanometer range.
Description
STAMPING TOOL, METHOD FOR STRUCTURING A SURFACE OF A
WORKPIECE AND USE OF AN ANODIZED SURFACE LAYER
s The present invention relates to a stamping tool having a structured stamping sur-face, a method for producing a stamping tool having a structured stamping sur-face, a method for structuring a surface of a work piece and use of a surface layer provided with open hollow chambers by anodic oxidation.
io Stamping constitutes a non-cutting manufacturing method for producing a relief like or structured surface on a work piece. A stamping tool with a profiled or structured stamping surface is used for this. The stamping surface is pressed with such a stamping force onto the surface to be structured of the work piece or rolled on this, so that the work piece becomes plastic and flows into depressions is in the stamping tool or the stamping surface. Due to the considerable stamping forces employed, the stamping tool and the stamping surface are usually made of metal.
It is very expensive to manufacture a stamping tool with a very finely structured 20 or profiled stamping surface. To create a so-called "moth eye structure" -evenly arranged, egg carton-like bumps - or fine grooves in the nanometre range, it is known from practice to use a lighting pattern with periodic intensity modulation for illuminating photo-sensitive material via two interfering laser beams.
After the illuminated material develops, a periodic surface structure results, which is 2s moulded into other materials using various replication methods and finally into nickel, for example, by electroforming. This type of manufacturing is very ex-pensive and is suited only for structuring even surfaces.
In the present invention nanometre range is understood to mean profiling or 3o structuring with structural widths < 1000 nm, especially < S00 nm. The structural width designates the dimension by which individual structural elements, such as bumps, are repeated, that is, for example the average distance of adjacent bumps from one another or of depressions from one another.
_ 2' - _.
In the nanometre range lithographic methods for structuring a stamping surface of a stamping tool can still only be used in a limited way. It should be noted here that the wavelength of the visible light alone is already 400 to 750 nm. In each case lithographic methods are very costly.
s DE 197 27 132 C2 discloses the manufacturing of a stamping tool by means of electrolytic machining. During electrolytic machining a metallic stamping sur-face of the stamping tool is treated electrolytically, wherein, being an anode in a fast-flowing electrolyte, the metal of the stamping surface is located at a minimal distance opposite a cathode and is dissolved in surface terms. The metal or the stamping surface contains the structure determined by the form of the cathode, and the cathode thus forms a recipient vessel that is shaped electrochemically.
DE 197 27 132 C2 also provides the use of a cylindrical rotation electrode, whose covering surface presents a negative form of the desired stamping struc-is ture. Here, too, there is considerable expense involved and structuring in the nanometre range is at least only partly possible.
Object of the present invention is to provide a stamping tool, a method for manu-facturing a stamping tool, a method for structuring a surface of a work piece and 2o a use of a surface layer provided with open hollow chambers, wherein structuring in the nanometre range is enabled in a simple and cost-effective manner.
The above object is achieved by a stamping tool according to claim 1, by a method according to claim 10 or 15 or by a use according to claim 17. Advanta-2s genus embodiments are subject of the sub-claims.
An essential idea of the present invention is to use a porous oxide layer and espe-cially a surface layer, formed via anodic oxidation and provided with open hol-low chambers, as stamping surface of a stamping tool. This leads to several ad-3o vantages.
First, an oxide layer, especially the preferably provided aluminium oxide, is rela-tively hard. With respect to the often very high stamping forces this is an advan-tage for being able to stamp work pieces of various materials and for achieving a 3s long tool life of the stamping tool.
Second, model-free oxidation is very easy and cost-effective to carry out. In par-ticular, producing hollow chambers is (quasi) independent of the form and con-figuration of the cathodes employed, so a model or negative form is not required, s as in electrolytic machining.
Third, the provided model-free forming of open hollow chambers via anodic oxi-dation enables structures to be manufactured in the nanometre range very easily and cost-effectively. In particular, structural widths of 500 nm and less, even 100 to nm and less are possible.
Fourth, depending on choice of procedural conditions the configuration -regular or irregular - and the surface density of the hollow chambers can be varied as re-quired.
is Fifth, by likewise simply varying the procedural conditions - especially by variation of the voltage during anodising - the form of the hollow chambers and thus the structure of the stamping surface can be adjusted and varied.
2o Sixth, the anodically oxidised surface layer can be used directly, thus without further moulding, as the stamping surface of a stamping tool.
Further advantages, properties, features and goals of the present invention will emerge from the following description of a preferred embodiment with reference 2s to the drawing. The sole figure shows a very schematic sectional elevation of a proposed stamping tool and a work piece structured therewith.
3o In a highly simplified sectional elevation, the figure shows a proposed stamping tool 1 with a structured, i.e. profiled or relief like stamping surface 2. The stamping surface 2 is formed by a flat side of a surface layer 3, which is provided with open hollow chambers 4 produced by anodic oxidation.
-4_ ..
In the illustrative example, the surface layer is applied to a support 5 of the stamping tool 1. For example, the surface layer 3 is applied to the support 5 by plasma coating. But the surface layer 3 can also be formed directly by the support S, and thus be a surface area of the support 5.
s It is understood that the surface layer 3 can also be deposited on the support S
using other methods.
In the illustrative example the surface layer 3 preferably consists of aluminium io which is applied to the support S especially via plasma coating and adheres well to the support 5 preferably made of metal, especially iron or steel.
The surface layer 3 is oxidised anodically at least partially in the illustrative ex-ample to the depth of a covering layer 6, whereby the hollow chambers 4 are is formed in the surface layer 3. The hollow chambers 4 are formed immediately and/or without any model or pattern, i.e. the arrangement, distribution, form and the like of the hollow chambers 4 - as opposed to electrolytic machining - is, thus, at least essentially independent of the surface shape and the proximity of the cathode (not shown) used in oxidation. Moreover, according to the invention, 2o the "valve effect", namely the occurring, independent formation of hollow cham bers 4 during oxidation or anodisation of the surface layer 3, - at least in par ticular in the so-called valve metals - is used. This immediate or undefined for mation of the hollow chambers 4 does not preclude an additional (before or after) formation or structuring of the stamping surface 2 or the hollow chambers 4 by 2s means of a negative form.
Depending on how completely or how deeply the surface layer 3 is oxidised, or whether the surface layer 3 is formed directly by the support 5, the surface Iayer 3 can correspond to the oxidised covering layer 6. In this case, for example, the 3o intermediate layer 7, which is comprised of aluminium in the illustrative example and which promotes very good adhesion between the covering layer 6 and the support 5, can be omitted.
For example, according to an alternative embodiment, the uncoated support 5 can 3s be oxidised anodically on its surface forming the stamping surface 2 by forma-tion of a porous oxide layer or hollow chambers 4. This is possible for example for a support 5 made of iron or steel, especially stainless steel. In this case the surface layer 3 then corresponds to the covering layer 6, i.e. the oxidised layer.
s Aluminium and iron or steel, especially stainless steel, have already been named as particularly preferred material, used at least substantially for forming the ano-dically oxidised surface layer 3 or the covering layer 6. However, silicon and ti-tanium as well as other valve metals for example can also be used.
to In the illustrative example the proportions in size are not presented true to scale.
The stamping tool 1 or its stamping surface 2 preferably has a structural width S
in the nanometre range, especially from 30 to 600 mm and preferably from 50 to 200 mm.
~s The hollow chambers 4 or their openings have an average diameter D of essen-tially 10 to S00 mm, preferably 15 to 200 mm and especially 20 to 100 run.
In the illustrative example the hollow chambers 4 are designed essentially 20 lengthwise, wherein their depth T is preferably at least approximately 0.5 times the above-mentioned, average diameter D and especially approximately 1.0 to 10 times the diameter D.
The hollow chambers 4 are designed here at least substantially similarly in shape.
2s In particular, the hollow chambers 4 are designed substantially cylindrically. But the hollow chambers 4 can also present a form deviating therefrom, for example they can be designed substantially comically.
In general; the hollow chambers 4 can also have a cross-section varying in its 3o depth T in form and/or diameter. In addition to this, the hollow chambers 4 can be designed substantially comically as a rough structure for example, and pro-vided along their walls with many fine depressions (small hollow chambers) to form a fine structure in each case.
' CA 02407209 2002-10-23 The hollow chambers 4 are preferably distributed at least substantially uniformly over the surface of the surface layer 3 or over the stamping surface 2.
However, uneven distribution is also feasible.
s The hollow chambers or their openings are preferably distributed over the stamping surface 2 with a surface density of 1O9 to 10''/cm2. In the illustrative example the surface density is substantially constant over the stamping surface 2.
But the surface density can also vary partially on the stamping surface 2 as re-quired.
The area of the openings of the hollow chambers 4 is, at the most, preferably of the extension area of the stamping surface 2. A sufficiently high stability or carrying capacity of the stamping surface 2 or the surface layer 3/covering layer 6 is hereby achieved with respect to the high stresses arising during the stamping.
is In general, the form, configuration, surface density and the like of the hollow chambers 4 can be controlled by corresponding choice of the procedural condi-tions during anodic oxidation. For example, with oxidation of aluminium under potentiostatic conditions - with at least substantially constant voltage - an at 20 least substantially even cross-section of the hollow chambers 4 is achieved over their depth T, i.e. an at least substantially cylindrical form. Accordingly, the form of the hollow chambers 4 can be influenced by varying the voltage. For example, galvanostatic oxidation - i.e. at an at least substantially constant current -leads to a somewhat conical or hill-like form of the hollow chambers 4, so that a type 2s of "moth eye structure" or the like can be formed in this way. The surface density of the hollow chambers 4, i.e. the number of hollow chambers 4 per surface unit the stamping surface 2, depends inter alia on the voltage and the current during anodising.
3o As required, the hollow chambers 4 can vary in their form, depth and/or surface density over the stamping surface 2, especially partially, and/or be designed only partly on the stamping surface 2.
And, if required, the stamping surface 2 can also be modified before and/or after 3s oxidation - creation of the hollow chambers 4 - for example via a lithographic p d -'7-process, etching and/or other, preferably material-stripping methods, for example to create a rough structure in the form of paths, ridges, areas with or without hollow chambers 4, large-surface bumps or depressions and the like on the stamping surface 2.
Chemical sizing, especially by partial etching of oxide material, can also be car-ried out to modify the stamping surface 2 or the hollow chambers 4. In this way the surface ratio of the opening surfaces of the hollow chambers 4 to the exten-sion area of the stamping surface 2 can be varied or increased. It is understood io that other modifications of the stamping surface 2 or of the hollow chambers 4 can also be made, depending on reaction time and intensity.
A particular advantage of the proposed solution is that the stamping surface 2 can also be designed in a curved manner - for example cylindrically - or bulged -for Is example lenticular or hemispherical. In particular the stamping surface 2 can have practically any shape at all. Compared to the prior art it is thus not neces-sary that the stamping surface 2 or the surface of the surface layer 3/covering layer 6 is at least substantially even.
2o The figure also shows a work piece 8, likewise in a highly simplified, not true-to-scale sectional diagram, in the already stamped state, i.e. with a surface 9 already structured by the stamping tool 1. Stamping takes places especially by the stamping tool 1 being pressed with a corresponding stamping force onto the sur-face 9 of the work piece 8 to be structured, so that the material of the work piece 2s 8 flows at least partially into the hollow chambers 4. Here it is not necessary that the work piece 8, as illustrated diagrammatically in the figure, is designed in a monobloc manner. Instead, the work piece 8 can also present another type of sur-face layer or surface coating or the like, not illustrated here, which forms the sur-face, 9 and is structured or designed in a relief like manner by means of the 3o stamping tool 1.
Instead of the stamp-like embossing the stamping tool 1 can be unrolled with cor-responding shaping/form of the stamping surface 2 and/or the surface 9 to be structured. By way of example the stamping surface 2 and/or the surface 9 to be _8-structured can be designed in a curved manner - for example cylindrically - or in a bulged manner to enable reciprocal unrolling for structuring the surface 9.
Both a die stamping process and also a rolling stamp process can be realised with s the proposed solution.
Furthermore, the proposed solution can be used for embossing as well as closed-die coining or coining. A corresponding abutment for the work piece 8 or a cor-responding countertool is not illustrated for clarification purposes.
io The proposed stamping tool 1 allows very fine structuring of the work piece 8 or its surface 9. If needed the work piece 8 or the surface 9 can also be profiled or structured repeatedly, first with a rough structured stamping tool -optionally manufactured also in customary fashion - and then with the finer structured pro-is posed stamping tool 1. A lower stamping force is employed, especially during the second stamping procedure using the finer stamping tool 1 and/or, in an in-termediate step, the surface 9 is hardened in order not to fully neutralise the rough structure produced at first stamping, but to achieve superposition from the rough structure and the fine structure of both stamping tools. Thus, it is possible, 2o for example, to create on the surface 9 relatively large bumps of the order of 0.1 to 50 ~,m each with several, relatively small protrusions, for example of the order of 10 to 400 nm, on the surface 9 of the work piece 8.
The proposed solution very easily and cost-effectively enables very fine struc-2s turfing of the surface 9. Accordingly, there is a very broad area of application. For example, such especially very fine structuring can be utilised in anti-reflex lay-ers, for altering radiation emission of structured surfaces, in sensory analysis, in catalysis, in self cleaning surfaces, in improving surface wetability and the like.
In particular, the proposed solution also extends to the use of work pieces 8 with 3o structured surfaces 9 that have been structured by use of the proposed stamping tool 1 for the purposes mentioned hereinabove.
In particular the proposed solution is suited for stamping synthetic materials - for example PMMA (polymethyl methacrylates), Teflon or the like, metals - for ex-ample gold, silver, platinum, lead, idium, cadmium, zinc or the like, polymer coatings - for example paints, dyes or the like, and inorganic coating systems etc.
Expressed in general terms, an essential aspect of the present invention is using a s surface layer with hollow chambers formed by anodic oxidation as bottom die or upper die, to enable surface structuring in the nanometre range.
WORKPIECE AND USE OF AN ANODIZED SURFACE LAYER
s The present invention relates to a stamping tool having a structured stamping sur-face, a method for producing a stamping tool having a structured stamping sur-face, a method for structuring a surface of a work piece and use of a surface layer provided with open hollow chambers by anodic oxidation.
io Stamping constitutes a non-cutting manufacturing method for producing a relief like or structured surface on a work piece. A stamping tool with a profiled or structured stamping surface is used for this. The stamping surface is pressed with such a stamping force onto the surface to be structured of the work piece or rolled on this, so that the work piece becomes plastic and flows into depressions is in the stamping tool or the stamping surface. Due to the considerable stamping forces employed, the stamping tool and the stamping surface are usually made of metal.
It is very expensive to manufacture a stamping tool with a very finely structured 20 or profiled stamping surface. To create a so-called "moth eye structure" -evenly arranged, egg carton-like bumps - or fine grooves in the nanometre range, it is known from practice to use a lighting pattern with periodic intensity modulation for illuminating photo-sensitive material via two interfering laser beams.
After the illuminated material develops, a periodic surface structure results, which is 2s moulded into other materials using various replication methods and finally into nickel, for example, by electroforming. This type of manufacturing is very ex-pensive and is suited only for structuring even surfaces.
In the present invention nanometre range is understood to mean profiling or 3o structuring with structural widths < 1000 nm, especially < S00 nm. The structural width designates the dimension by which individual structural elements, such as bumps, are repeated, that is, for example the average distance of adjacent bumps from one another or of depressions from one another.
_ 2' - _.
In the nanometre range lithographic methods for structuring a stamping surface of a stamping tool can still only be used in a limited way. It should be noted here that the wavelength of the visible light alone is already 400 to 750 nm. In each case lithographic methods are very costly.
s DE 197 27 132 C2 discloses the manufacturing of a stamping tool by means of electrolytic machining. During electrolytic machining a metallic stamping sur-face of the stamping tool is treated electrolytically, wherein, being an anode in a fast-flowing electrolyte, the metal of the stamping surface is located at a minimal distance opposite a cathode and is dissolved in surface terms. The metal or the stamping surface contains the structure determined by the form of the cathode, and the cathode thus forms a recipient vessel that is shaped electrochemically.
DE 197 27 132 C2 also provides the use of a cylindrical rotation electrode, whose covering surface presents a negative form of the desired stamping struc-is ture. Here, too, there is considerable expense involved and structuring in the nanometre range is at least only partly possible.
Object of the present invention is to provide a stamping tool, a method for manu-facturing a stamping tool, a method for structuring a surface of a work piece and 2o a use of a surface layer provided with open hollow chambers, wherein structuring in the nanometre range is enabled in a simple and cost-effective manner.
The above object is achieved by a stamping tool according to claim 1, by a method according to claim 10 or 15 or by a use according to claim 17. Advanta-2s genus embodiments are subject of the sub-claims.
An essential idea of the present invention is to use a porous oxide layer and espe-cially a surface layer, formed via anodic oxidation and provided with open hol-low chambers, as stamping surface of a stamping tool. This leads to several ad-3o vantages.
First, an oxide layer, especially the preferably provided aluminium oxide, is rela-tively hard. With respect to the often very high stamping forces this is an advan-tage for being able to stamp work pieces of various materials and for achieving a 3s long tool life of the stamping tool.
Second, model-free oxidation is very easy and cost-effective to carry out. In par-ticular, producing hollow chambers is (quasi) independent of the form and con-figuration of the cathodes employed, so a model or negative form is not required, s as in electrolytic machining.
Third, the provided model-free forming of open hollow chambers via anodic oxi-dation enables structures to be manufactured in the nanometre range very easily and cost-effectively. In particular, structural widths of 500 nm and less, even 100 to nm and less are possible.
Fourth, depending on choice of procedural conditions the configuration -regular or irregular - and the surface density of the hollow chambers can be varied as re-quired.
is Fifth, by likewise simply varying the procedural conditions - especially by variation of the voltage during anodising - the form of the hollow chambers and thus the structure of the stamping surface can be adjusted and varied.
2o Sixth, the anodically oxidised surface layer can be used directly, thus without further moulding, as the stamping surface of a stamping tool.
Further advantages, properties, features and goals of the present invention will emerge from the following description of a preferred embodiment with reference 2s to the drawing. The sole figure shows a very schematic sectional elevation of a proposed stamping tool and a work piece structured therewith.
3o In a highly simplified sectional elevation, the figure shows a proposed stamping tool 1 with a structured, i.e. profiled or relief like stamping surface 2. The stamping surface 2 is formed by a flat side of a surface layer 3, which is provided with open hollow chambers 4 produced by anodic oxidation.
-4_ ..
In the illustrative example, the surface layer is applied to a support 5 of the stamping tool 1. For example, the surface layer 3 is applied to the support 5 by plasma coating. But the surface layer 3 can also be formed directly by the support S, and thus be a surface area of the support 5.
s It is understood that the surface layer 3 can also be deposited on the support S
using other methods.
In the illustrative example the surface layer 3 preferably consists of aluminium io which is applied to the support S especially via plasma coating and adheres well to the support 5 preferably made of metal, especially iron or steel.
The surface layer 3 is oxidised anodically at least partially in the illustrative ex-ample to the depth of a covering layer 6, whereby the hollow chambers 4 are is formed in the surface layer 3. The hollow chambers 4 are formed immediately and/or without any model or pattern, i.e. the arrangement, distribution, form and the like of the hollow chambers 4 - as opposed to electrolytic machining - is, thus, at least essentially independent of the surface shape and the proximity of the cathode (not shown) used in oxidation. Moreover, according to the invention, 2o the "valve effect", namely the occurring, independent formation of hollow cham bers 4 during oxidation or anodisation of the surface layer 3, - at least in par ticular in the so-called valve metals - is used. This immediate or undefined for mation of the hollow chambers 4 does not preclude an additional (before or after) formation or structuring of the stamping surface 2 or the hollow chambers 4 by 2s means of a negative form.
Depending on how completely or how deeply the surface layer 3 is oxidised, or whether the surface layer 3 is formed directly by the support 5, the surface Iayer 3 can correspond to the oxidised covering layer 6. In this case, for example, the 3o intermediate layer 7, which is comprised of aluminium in the illustrative example and which promotes very good adhesion between the covering layer 6 and the support 5, can be omitted.
For example, according to an alternative embodiment, the uncoated support 5 can 3s be oxidised anodically on its surface forming the stamping surface 2 by forma-tion of a porous oxide layer or hollow chambers 4. This is possible for example for a support 5 made of iron or steel, especially stainless steel. In this case the surface layer 3 then corresponds to the covering layer 6, i.e. the oxidised layer.
s Aluminium and iron or steel, especially stainless steel, have already been named as particularly preferred material, used at least substantially for forming the ano-dically oxidised surface layer 3 or the covering layer 6. However, silicon and ti-tanium as well as other valve metals for example can also be used.
to In the illustrative example the proportions in size are not presented true to scale.
The stamping tool 1 or its stamping surface 2 preferably has a structural width S
in the nanometre range, especially from 30 to 600 mm and preferably from 50 to 200 mm.
~s The hollow chambers 4 or their openings have an average diameter D of essen-tially 10 to S00 mm, preferably 15 to 200 mm and especially 20 to 100 run.
In the illustrative example the hollow chambers 4 are designed essentially 20 lengthwise, wherein their depth T is preferably at least approximately 0.5 times the above-mentioned, average diameter D and especially approximately 1.0 to 10 times the diameter D.
The hollow chambers 4 are designed here at least substantially similarly in shape.
2s In particular, the hollow chambers 4 are designed substantially cylindrically. But the hollow chambers 4 can also present a form deviating therefrom, for example they can be designed substantially comically.
In general; the hollow chambers 4 can also have a cross-section varying in its 3o depth T in form and/or diameter. In addition to this, the hollow chambers 4 can be designed substantially comically as a rough structure for example, and pro-vided along their walls with many fine depressions (small hollow chambers) to form a fine structure in each case.
' CA 02407209 2002-10-23 The hollow chambers 4 are preferably distributed at least substantially uniformly over the surface of the surface layer 3 or over the stamping surface 2.
However, uneven distribution is also feasible.
s The hollow chambers or their openings are preferably distributed over the stamping surface 2 with a surface density of 1O9 to 10''/cm2. In the illustrative example the surface density is substantially constant over the stamping surface 2.
But the surface density can also vary partially on the stamping surface 2 as re-quired.
The area of the openings of the hollow chambers 4 is, at the most, preferably of the extension area of the stamping surface 2. A sufficiently high stability or carrying capacity of the stamping surface 2 or the surface layer 3/covering layer 6 is hereby achieved with respect to the high stresses arising during the stamping.
is In general, the form, configuration, surface density and the like of the hollow chambers 4 can be controlled by corresponding choice of the procedural condi-tions during anodic oxidation. For example, with oxidation of aluminium under potentiostatic conditions - with at least substantially constant voltage - an at 20 least substantially even cross-section of the hollow chambers 4 is achieved over their depth T, i.e. an at least substantially cylindrical form. Accordingly, the form of the hollow chambers 4 can be influenced by varying the voltage. For example, galvanostatic oxidation - i.e. at an at least substantially constant current -leads to a somewhat conical or hill-like form of the hollow chambers 4, so that a type 2s of "moth eye structure" or the like can be formed in this way. The surface density of the hollow chambers 4, i.e. the number of hollow chambers 4 per surface unit the stamping surface 2, depends inter alia on the voltage and the current during anodising.
3o As required, the hollow chambers 4 can vary in their form, depth and/or surface density over the stamping surface 2, especially partially, and/or be designed only partly on the stamping surface 2.
And, if required, the stamping surface 2 can also be modified before and/or after 3s oxidation - creation of the hollow chambers 4 - for example via a lithographic p d -'7-process, etching and/or other, preferably material-stripping methods, for example to create a rough structure in the form of paths, ridges, areas with or without hollow chambers 4, large-surface bumps or depressions and the like on the stamping surface 2.
Chemical sizing, especially by partial etching of oxide material, can also be car-ried out to modify the stamping surface 2 or the hollow chambers 4. In this way the surface ratio of the opening surfaces of the hollow chambers 4 to the exten-sion area of the stamping surface 2 can be varied or increased. It is understood io that other modifications of the stamping surface 2 or of the hollow chambers 4 can also be made, depending on reaction time and intensity.
A particular advantage of the proposed solution is that the stamping surface 2 can also be designed in a curved manner - for example cylindrically - or bulged -for Is example lenticular or hemispherical. In particular the stamping surface 2 can have practically any shape at all. Compared to the prior art it is thus not neces-sary that the stamping surface 2 or the surface of the surface layer 3/covering layer 6 is at least substantially even.
2o The figure also shows a work piece 8, likewise in a highly simplified, not true-to-scale sectional diagram, in the already stamped state, i.e. with a surface 9 already structured by the stamping tool 1. Stamping takes places especially by the stamping tool 1 being pressed with a corresponding stamping force onto the sur-face 9 of the work piece 8 to be structured, so that the material of the work piece 2s 8 flows at least partially into the hollow chambers 4. Here it is not necessary that the work piece 8, as illustrated diagrammatically in the figure, is designed in a monobloc manner. Instead, the work piece 8 can also present another type of sur-face layer or surface coating or the like, not illustrated here, which forms the sur-face, 9 and is structured or designed in a relief like manner by means of the 3o stamping tool 1.
Instead of the stamp-like embossing the stamping tool 1 can be unrolled with cor-responding shaping/form of the stamping surface 2 and/or the surface 9 to be structured. By way of example the stamping surface 2 and/or the surface 9 to be _8-structured can be designed in a curved manner - for example cylindrically - or in a bulged manner to enable reciprocal unrolling for structuring the surface 9.
Both a die stamping process and also a rolling stamp process can be realised with s the proposed solution.
Furthermore, the proposed solution can be used for embossing as well as closed-die coining or coining. A corresponding abutment for the work piece 8 or a cor-responding countertool is not illustrated for clarification purposes.
io The proposed stamping tool 1 allows very fine structuring of the work piece 8 or its surface 9. If needed the work piece 8 or the surface 9 can also be profiled or structured repeatedly, first with a rough structured stamping tool -optionally manufactured also in customary fashion - and then with the finer structured pro-is posed stamping tool 1. A lower stamping force is employed, especially during the second stamping procedure using the finer stamping tool 1 and/or, in an in-termediate step, the surface 9 is hardened in order not to fully neutralise the rough structure produced at first stamping, but to achieve superposition from the rough structure and the fine structure of both stamping tools. Thus, it is possible, 2o for example, to create on the surface 9 relatively large bumps of the order of 0.1 to 50 ~,m each with several, relatively small protrusions, for example of the order of 10 to 400 nm, on the surface 9 of the work piece 8.
The proposed solution very easily and cost-effectively enables very fine struc-2s turfing of the surface 9. Accordingly, there is a very broad area of application. For example, such especially very fine structuring can be utilised in anti-reflex lay-ers, for altering radiation emission of structured surfaces, in sensory analysis, in catalysis, in self cleaning surfaces, in improving surface wetability and the like.
In particular, the proposed solution also extends to the use of work pieces 8 with 3o structured surfaces 9 that have been structured by use of the proposed stamping tool 1 for the purposes mentioned hereinabove.
In particular the proposed solution is suited for stamping synthetic materials - for example PMMA (polymethyl methacrylates), Teflon or the like, metals - for ex-ample gold, silver, platinum, lead, idium, cadmium, zinc or the like, polymer coatings - for example paints, dyes or the like, and inorganic coating systems etc.
Expressed in general terms, an essential aspect of the present invention is using a s surface layer with hollow chambers formed by anodic oxidation as bottom die or upper die, to enable surface structuring in the nanometre range.
Claims (18)
1. Stamping tool (1) with a structured stamping surface (2), wherein the stamping surface (2) is formed by an anodically oxidised surface layer (3) or covering layer (6) with open hollow chambers (4) created by anodic oxi-dation, wherein the hollow chambers (4) have opening areas with an aver-age diameter (D) of 10 to 500 nm- and/or the structural width (S) of the stamping surface (2) is 30 to 600 nm.
2. Stamping tool according to claim 1, characterized in that the hollow cham-bers (4) have opening areas with an average, preferably at least essentially uniform diameter (D) of 15 to 200 nm, preferably of 20 to 100 nm.
3. Stamping tool according to claim 1 or 2, characterized in that the structural width (S) of the stamping surface (2) is 50 to 200 nm.
4. Stamping tool according to any one of the previous claims, characterized in that the hollow chambers (4) have a depth (T), which is at least 0.5 times the average diameter (D) of the hollow chambers (4) and is especially greater than the average diameter (D) of the hollow chambers (4).
5. Stamping tool according to any one of the previous claims, characterized in that the hollow chambers (4) are designed conically.
6. Stamping tool according to any one of the previous claims, characterized in that the hollow chambers (4) vary in their form, depth and/or surface den-sity over the stamping surface (2), especially partially, and/or are designed only partially on the stamping surface (2).
7. Stamping tool according to any one of the previous claims, characterized in that the stamping surface (2) comprises both a fine and rough structure.
8. Stamping tool according to any one of the previous claims, characterized in that the stamping surface (2) is curved, preferably bulged.
9. Stamping tool according to any one of the previous claims, characterized in that the surface layer (3) or the covering layer (6) with the hollow chambers (4) consists at least substantially of aluminium oxide, silicon oxide, iron oxide, oxidised steel and/or titanium oxide.
10. Method for producing a stamping tool (1) with a structured stamping sur-face (2), wherein a surface layer (3) or covering layer (6) of the stamping tool (1) forming the stamping surface (2) is oxidised at least partially ano-dically for generating model-free open hollow chambers (4), so that hollow chambers (4) uniformly shaped and/or at least essentially evenly distributed over the surface or surface area of the stamping surface (2) are formed.
11. Method according to claim 10, characterized in that the surface layer (3) or covering layer (6) is oxidised potentiostatically.
12. Method according to claim 10, characterized in that the surface layer (3) or covering layer (6) is oxidised with varying voltage, especially galvanostati-cally.
13. Method according to any one of claims 10 to 12, characterized in that alu-minium, silicon, iron, steel and/or titanium is/are oxidised.
14. Method according to any one of claims 10 to 13, characterized in that the stamping surface (2) is modified before and/or after oxidising, especially for producing a rough structure, especially by lithographic methods, etching and/or other, preferably material-stripping methods.
15. Method for structuring a surface (9) of a work piece (8) by means of a stamping tool (1) with a structured stamping surface (2), characterized in that the surface (9) to be structured is structured by means of a stamping tool (1) according to any one of claims 1 to 9, wherein the stamping surface (2) of the stamping tool (1) is pressed on to the surface (9) to be structured and/or rolled thereon.
16. Method according to claim 15, characterized in that the stamping surface (2) of the stamping tool (1) is pressed and/or rolled on the surface (9) to be structured with a preferably predetermined stamping force and/or the sur-face (9) is first roughly structured in a first step by means of a first stamp-ing tool (1) and is then finely structured by means of a second stamping tool (2) in a second step, especially with reduced stamping force and/or es-pecially after preferably chemical hardening of the surface (9).
17. Use of a surface layer (3) or covering layer (6) provided with open hollow chambers (4) by anodic oxidation and thus structured in the manometer range, especially of a stamping tool (1) according to any one of claims 1 to 9, wherein the surface layer (3) or covering layer (6) with the hollow chambers (4) is used as stamping surface (2) for structuring a surface (9) of a work piece (8).
18. Use according to claim 17, characterized in that the surface layer (3) or covering layer (6) is formed at least substantially of aluminium oxide, sili-con oxide, iron oxide, oxidised steel and/or titanium oxide.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10020877A DE10020877C1 (en) | 2000-04-28 | 2000-04-28 | Stamping tool has a structured stamping surface with an anodically oxidized surface layer or a covering layer having open hollow chambers produced by anodic oxidation |
| DE10020877.0 | 2000-04-28 | ||
| PCT/EP2001/004650 WO2001083198A1 (en) | 2000-04-28 | 2001-04-25 | Stamping tool, method for structuring a surface of a workpiece and use of an anodized surface layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2407209A1 true CA2407209A1 (en) | 2002-10-23 |
Family
ID=7640229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002407209A Abandoned CA2407209A1 (en) | 2000-04-28 | 2001-04-25 | Stamping tool, method for structuring a surface of a workpiece and use of an anodized surface layer |
Country Status (16)
| Country | Link |
|---|---|
| EP (1) | EP1289734B1 (en) |
| JP (5) | JP4265729B2 (en) |
| KR (1) | KR20020089527A (en) |
| CN (1) | CN1437528A (en) |
| AT (1) | ATE270954T1 (en) |
| AU (2) | AU5632301A (en) |
| BR (1) | BR0110378A (en) |
| CA (1) | CA2407209A1 (en) |
| DE (2) | DE10020877C1 (en) |
| DK (1) | DK1289734T3 (en) |
| ES (1) | ES2222993T3 (en) |
| NO (1) | NO20025117L (en) |
| PL (1) | PL358199A1 (en) |
| PT (1) | PT1289734E (en) |
| RU (1) | RU2002130256A (en) |
| WO (1) | WO2001083198A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE43694E1 (en) | 2000-04-28 | 2012-10-02 | Sharp Kabushiki Kaisha | Stamping tool, casting mold and methods for structuring a surface of a work piece |
| US8465160B2 (en) | 2008-12-25 | 2013-06-18 | Sharp Kabushiki Kaisha | Liquid tank, viewing device for under-liquid observation, and optical film |
| US8597767B2 (en) | 2008-03-04 | 2013-12-03 | Sharp Kabushiki Kaisha | Optical element, roller type nanoimprinting apparatus, and process for producing die roll |
Families Citing this family (74)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10154756C1 (en) * | 2001-07-02 | 2002-11-21 | Alcove Surfaces Gmbh | Use of a surface layer or covering layer provided with open hollow chambers by anodic oxidation for structuring a surface of a cast part and/or workpiece |
| FR2811316B1 (en) * | 2000-07-06 | 2003-01-10 | Saint Gobain | TRANSPARENT TEXTURE SUBSTRATE AND METHODS OF OBTAINING SAME |
| JP4647812B2 (en) * | 2001-03-23 | 2011-03-09 | 財団法人神奈川科学技術アカデミー | Method for producing anodized porous alumina |
| EP1435301B1 (en) * | 2001-09-14 | 2008-03-05 | The Yokohama Rubber Co., Ltd. | Pneumatic tire having a sealant layer and process for producing the same |
| KR101190657B1 (en) * | 2003-04-21 | 2012-10-15 | 삼성전자주식회사 | Manufacturing method of self-ordered nanochannel-array and manufacturing method of nano dot using the nanochannel-array |
| JP2006053220A (en) * | 2004-08-10 | 2006-02-23 | Olympus Corp | Member having antireflection part, molding die for the member and method of manufacturing the die |
| JP4368384B2 (en) * | 2004-12-03 | 2009-11-18 | シャープ株式会社 | Antireflection material, optical element, display device, stamper manufacturing method, and antireflection material manufacturing method using stamper |
| US7649198B2 (en) | 2005-12-28 | 2010-01-19 | Industrial Technology Research Institute | Nano-array and fabrication method thereof |
| WO2007144826A2 (en) * | 2006-06-13 | 2007-12-21 | Csem Centre Suisse D'electronique Et De Microtechnique Sa | Pharmaceutical tablets with diffractive microstructure and compression tools for producing such tablets |
| US7713768B2 (en) | 2006-06-14 | 2010-05-11 | Kanagawa Academy Of Science And Technology | Anti-reflective film and production method thereof, and stamper for producing anti-reflective film and production method thereof |
| KR101214663B1 (en) * | 2006-06-30 | 2012-12-21 | 카나가와 아카데미 오브 사이언스 앤드 테크놀로지 | Mold, process for manufacturing mold, and process for producing sheet |
| CN101398558B (en) * | 2007-09-27 | 2010-09-08 | 北京京东方光电科技有限公司 | Reflection-permeation array substrate and method for manufacturing same |
| KR101124707B1 (en) * | 2007-10-08 | 2012-03-19 | 재단법인서울대학교산학협력재단 | The formative method of functional nano pattern |
| EP2249330A1 (en) | 2008-02-22 | 2010-11-10 | Sharp Kabushiki Kaisha | Display device |
| JP4875203B2 (en) | 2008-02-27 | 2012-02-15 | シャープ株式会社 | Roller type nanoimprint apparatus and method for producing nanoimprint sheet |
| JP5176618B2 (en) * | 2008-03-17 | 2013-04-03 | 株式会社村田製作所 | Imprint mold and imprint method using the same |
| KR101049220B1 (en) * | 2008-04-14 | 2011-07-13 | 한국기계연구원 | Manufacturing method of stamp for imprint lithography |
| CN102016651B (en) | 2008-06-06 | 2013-05-22 | 夏普株式会社 | Antireflection film, optical element comprising antireflection film, stamper, process for producing stamper, and process for producing antireflection film |
| US20110005412A1 (en) | 2008-12-17 | 2011-01-13 | Akiyoshi Fujii | Roller imprinter and production method of imprinted sheet |
| JP4531131B1 (en) | 2008-12-26 | 2010-08-25 | シャープ株式会社 | Method for manufacturing mold and method for manufacturing antireflection film using mold |
| US20110278770A1 (en) | 2009-01-30 | 2011-11-17 | Akinobu Isurugi | Mold, mold manufacturing method and method for manufacturing anti-reflection film using the mold |
| EP2405036B1 (en) | 2009-03-05 | 2017-11-08 | Sharp Kabushiki Kaisha | Mold manufacturing method and electrode structure for use therein |
| US8580135B2 (en) | 2009-04-09 | 2013-11-12 | Sharp Kabushiki Kaisha | Die and method of manufacturing same |
| DE102009017424B4 (en) * | 2009-04-15 | 2014-10-23 | Automotive Lighting Reutlingen Gmbh | Attachment optics for a light source and illumination device for a motor vehicle with such an attachment optics |
| US9025250B2 (en) | 2009-04-24 | 2015-05-05 | Sharp Kabushiki Kaisha | Antireflection film, method for manufacturing antireflection film, and display apparatus |
| US8545708B2 (en) | 2009-04-30 | 2013-10-01 | Sharp Kabushiki Kaisha | Mold and manufacturing method therefor |
| WO2010143503A1 (en) | 2009-06-12 | 2010-12-16 | シャープ株式会社 | Antireflection film, display device and light transmissive member |
| WO2011027746A1 (en) | 2009-09-04 | 2011-03-10 | シャープ株式会社 | Method for forming anodized layer, method for producing mold, method for producing antireflective film, and mold and antireflective film |
| US9127371B2 (en) | 2009-10-09 | 2015-09-08 | Sharp Kabushiki Kaisha | Mold and production method for same, and anti-reflection film |
| EP2489764B1 (en) * | 2009-10-14 | 2022-11-30 | Sharp Kabushiki Kaisha | Die and method for manufacturing die, and anti-reflection coating |
| JP4916597B2 (en) * | 2009-10-28 | 2012-04-11 | シャープ株式会社 | Mold, mold manufacturing method and antireflection film |
| US20120213971A1 (en) * | 2009-11-06 | 2012-08-23 | Sharp Kabushiki Kaisha | Method for producing die, and die |
| CN102639307B (en) | 2009-11-27 | 2014-08-06 | 夏普株式会社 | Method for producing die and moth-eye structure |
| JP4595044B2 (en) * | 2009-12-16 | 2010-12-08 | 財団法人神奈川科学技術アカデミー | Mold made of anodized porous alumina and method for producing the same |
| US9193096B2 (en) | 2010-02-24 | 2015-11-24 | Sharp Kabushiki Kaisha | Die, die production method, and production of antireflection film |
| US8889220B2 (en) | 2010-03-08 | 2014-11-18 | Sharp Kabushiki Kaisha | Mold release treatment method, mold, method for producing anti-reflective film, mold release treatment device, and washing/drying device for mold |
| WO2011111697A1 (en) * | 2010-03-09 | 2011-09-15 | シャープ株式会社 | Method for forming anodized layer, method for producing mold and method for producing antireflective film |
| JP2011206938A (en) * | 2010-03-29 | 2011-10-20 | Kanagawa Acad Of Sci & Technol | Mold for thermal imprint, method of manufacturing the mold and method of manufacturing resin material using the mold |
| JP5027346B2 (en) | 2010-03-31 | 2012-09-19 | シャープ株式会社 | Mold, mold manufacturing method, and antireflection film manufacturing method |
| WO2011136229A1 (en) | 2010-04-28 | 2011-11-03 | シャープ株式会社 | Method for forming anodized layer |
| JP5027347B2 (en) | 2010-04-28 | 2012-09-19 | シャープ株式会社 | Mold and mold manufacturing method |
| WO2011145625A1 (en) | 2010-05-19 | 2011-11-24 | シャープ株式会社 | Die inspection method |
| WO2012029570A1 (en) | 2010-08-30 | 2012-03-08 | シャープ株式会社 | Method for forming anodized layer and mold production method |
| KR101960105B1 (en) * | 2010-09-29 | 2019-03-19 | 니폰 라이트 메탈 컴퍼니 리미티드 | Stamp, article, and method for manufacturing said stamp and article |
| JP5595511B2 (en) | 2010-10-08 | 2014-09-24 | シャープ株式会社 | Method for producing anodized film |
| US9128220B2 (en) | 2010-11-29 | 2015-09-08 | Sharp Kabushiki Kaisha | Light guide body with continuously variable refractive index, and devices using such body |
| WO2012073820A1 (en) | 2010-11-30 | 2012-06-07 | シャープ株式会社 | Electrode structure, substrate holder, and method for forming anodic oxidation layer |
| WO2012137664A1 (en) | 2011-04-01 | 2012-10-11 | シャープ株式会社 | Mold production method |
| JP5856286B2 (en) | 2012-03-26 | 2016-02-09 | シャープ株式会社 | Mold release processing method and manufacturing method of antireflection film |
| JP5824399B2 (en) * | 2012-03-30 | 2015-11-25 | 富士フイルム株式会社 | Resin mold for nanoimprint and manufacturing method thereof |
| SG11201408156PA (en) | 2012-06-06 | 2015-03-30 | Sharp Kk | Mold base material, production method for mold base material, mold production method, and mold |
| JP5641085B2 (en) * | 2012-07-30 | 2014-12-17 | 大日本印刷株式会社 | Method for manufacturing antireflection article, and method for manufacturing mold for manufacturing antireflection article |
| WO2014021376A1 (en) | 2012-07-31 | 2014-02-06 | 大日本印刷株式会社 | Antireflective article, image display device, production mold for antireflective article, and production method for antireflective article production mold |
| US9442222B2 (en) | 2012-07-31 | 2016-09-13 | Dai Nippon Printing Co., Ltd. | Antireflective article, image display device, and production mold for antireflective article |
| US10549458B2 (en) | 2014-04-14 | 2020-02-04 | Sharp Kabushiki Kaisha | Mold, method for producing mold, anti-reflection film and method for producing anti-reflection film |
| CN108990977B (en) | 2014-04-22 | 2022-03-08 | 夏普株式会社 | Film, laminate, sterilization method, and method for reactivating surface of film |
| CN106456817B (en) | 2014-04-28 | 2019-06-18 | 夏普株式会社 | Filter and container with bactericidal effect |
| DE102014210798A1 (en) | 2014-06-05 | 2015-12-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Mold, process for its manufacture and use, and plastic film and plastic component |
| CN106662415B (en) | 2014-08-07 | 2018-11-30 | 夏普株式会社 | Heat exchanger, metal component, electric heater, beverage supply device and cover of the lunch box |
| CN107148335B (en) | 2014-11-06 | 2019-04-30 | 夏普株式会社 | The manufacturing method of mold and the manufacturing method of antireflection film |
| US10675788B2 (en) | 2014-11-12 | 2020-06-09 | Sharp Kabushiki Kaisha | Method for producing mold |
| WO2016080245A1 (en) | 2014-11-20 | 2016-05-26 | シャープ株式会社 | Synthetic polymer film having surface provided with bactericidal activity |
| JP6401298B2 (en) | 2014-12-25 | 2018-10-10 | シャープ株式会社 | Method for preserving food, food film, food container and food handling method |
| AT517019B1 (en) * | 2015-04-02 | 2017-02-15 | Zkw Group Gmbh | Lighting device and motor vehicle headlights |
| CN107709419B (en) | 2015-06-23 | 2020-09-08 | 夏普株式会社 | Synthetic polymer film having surface with bactericidal action |
| US10375953B2 (en) | 2015-07-17 | 2019-08-13 | Sharp Kabushiki Kaisha | Synthetic polymer film having surface that is provided with bactericidal action, and film comprising same |
| WO2017047344A1 (en) | 2015-09-17 | 2017-03-23 | シャープ株式会社 | Synthetic polymer film provided with surface having sterilizing effect, method for manufacturing synthetic polymer film and sterilization method using surface of synthetic polymer film |
| JP6552645B2 (en) | 2015-12-28 | 2019-07-31 | シャープ株式会社 | Printing intaglio, method of producing printing intaglio, method of producing printed matter, and printed matter |
| US11335831B2 (en) | 2017-03-29 | 2022-05-17 | Sharp Kabushiki Kaisha | Optical device case and optical device |
| EP3459353B1 (en) | 2017-09-26 | 2022-04-20 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, photocurable resin composition, manufacturing method of synthetic polymer film, and sterilization method with use of surface of synthetic polymer film |
| JP6751731B2 (en) | 2018-02-21 | 2020-09-09 | シャープ株式会社 | Synthetic polymer membrane and method for manufacturing synthetic polymer membrane |
| JP6761437B2 (en) | 2018-03-15 | 2020-09-23 | シャープ株式会社 | Synthetic polymer membranes with a bactericidal surface, plastic products with synthetic polymer membranes, sterilization methods using the surface of synthetic polymer membranes, photocurable resin compositions, and methods for producing synthetic polymer membranes. |
| DE102019133656A1 (en) * | 2019-12-10 | 2021-06-10 | HELLA GmbH & Co. KGaA | Lighting device for a motor vehicle and a method for producing such a lighting device |
| CN110983404A (en) * | 2019-12-30 | 2020-04-10 | 江苏乐彩印刷材料有限公司 | Environment-friendly energy-saving CTP (computer to plate) lithographic printing material |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4190321A (en) * | 1977-02-18 | 1980-02-26 | Minnesota Mining And Manufacturing Company | Microstructured transmission and reflectance modifying coating |
| JPH0516228A (en) * | 1991-04-15 | 1993-01-26 | Dainippon Printing Co Ltd | Gloss-mat type shaped film |
| JP3004127B2 (en) * | 1992-07-15 | 2000-01-31 | エヌ・イーケムキャット株式会社 | Method for producing porous metal oxide |
| KR100473691B1 (en) * | 1994-11-16 | 2005-04-14 | 가부시키가이샤 고베 세이코쇼 | Vacuum chamber made of aluminum or its alloy |
| CH689395A5 (en) * | 1995-03-16 | 1999-03-31 | Alusuisse Lonza Services Ag | Process for the continuous anodic oxidation of strip or wire of aluminum. |
| JPH0967173A (en) * | 1995-08-31 | 1997-03-11 | Univ Tohoku | Production of porous alumina tube |
| JPH09155972A (en) * | 1995-12-12 | 1997-06-17 | Ykk Corp | Water repellant film and its manufacture |
| JPH09202979A (en) * | 1996-01-26 | 1997-08-05 | Ngk Insulators Ltd | Embossing method for metal mold |
| JPH1016008A (en) * | 1996-07-02 | 1998-01-20 | Sharp Corp | Mold for molding plastics and injection molding device using this mold |
| EP0931859B1 (en) * | 1996-08-26 | 2008-06-04 | Nippon Telegraph And Telephone Corporation | Method of manufacturing porous anodized alumina film |
| DE19701568C1 (en) * | 1997-01-17 | 1998-07-23 | Karlsruhe Forschzent | Structured layer formation for micro-engineered functional system |
| DE19708776C1 (en) * | 1997-03-04 | 1998-06-18 | Fraunhofer Ges Forschung | Anti-reflection coating for glass or plastics panels used in windows, display screens etc. |
| FR2762862B1 (en) * | 1997-04-30 | 1999-07-16 | Guial | METHOD FOR MANUFACTURING A CALENDERING CYLINDER AND SHEETS OF THERMOPLASTIC FILMS OBTAINED BY ROLLING A THERMOPLASTIC RESIN USING SUCH A CYLINDER |
| DE19727132C2 (en) * | 1997-06-26 | 2000-02-03 | Hueck Engraving Gmbh | Method and device for producing an embossed structure on an embossing tool used for the surface shaping of press laminates |
| JP3886082B2 (en) * | 1997-11-12 | 2007-02-28 | キヤノン株式会社 | Nanostructure and manufacturing method thereof |
| JP2000071290A (en) * | 1998-08-28 | 2000-03-07 | Teijin Ltd | Manufacture of antireflection article |
-
2000
- 2000-04-28 DE DE10020877A patent/DE10020877C1/en not_active Expired - Fee Related
-
2001
- 2001-04-25 PT PT01929602T patent/PT1289734E/en unknown
- 2001-04-25 ES ES01929602T patent/ES2222993T3/en not_active Expired - Lifetime
- 2001-04-25 DE DE50102858T patent/DE50102858D1/en not_active Expired - Lifetime
- 2001-04-25 JP JP2001580058A patent/JP4265729B2/en not_active Expired - Lifetime
- 2001-04-25 AU AU5632301A patent/AU5632301A/en active Pending
- 2001-04-25 RU RU2002130256/02A patent/RU2002130256A/en not_active Application Discontinuation
- 2001-04-25 DK DK01929602T patent/DK1289734T3/en active
- 2001-04-25 AU AU2001256323A patent/AU2001256323B2/en not_active Ceased
- 2001-04-25 KR KR1020027014341A patent/KR20020089527A/en not_active Application Discontinuation
- 2001-04-25 AT AT01929602T patent/ATE270954T1/en not_active IP Right Cessation
- 2001-04-25 PL PL01358199A patent/PL358199A1/en unknown
- 2001-04-25 CN CN01811497A patent/CN1437528A/en active Pending
- 2001-04-25 EP EP01929602A patent/EP1289734B1/en not_active Expired - Lifetime
- 2001-04-25 WO PCT/EP2001/004650 patent/WO2001083198A1/en active IP Right Grant
- 2001-04-25 CA CA002407209A patent/CA2407209A1/en not_active Abandoned
- 2001-04-25 BR BR0110378-4A patent/BR0110378A/en not_active IP Right Cessation
-
2002
- 2002-10-24 NO NO20025117A patent/NO20025117L/en not_active Application Discontinuation
-
2008
- 2008-04-02 JP JP2008095737A patent/JP5307435B2/en not_active Expired - Lifetime
- 2008-11-27 JP JP2008303126A patent/JP4265816B2/en not_active Expired - Lifetime
- 2008-11-27 JP JP2008303127A patent/JP4420967B2/en not_active Expired - Lifetime
-
2009
- 2009-05-18 JP JP2009120019A patent/JP5025683B2/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE43694E1 (en) | 2000-04-28 | 2012-10-02 | Sharp Kabushiki Kaisha | Stamping tool, casting mold and methods for structuring a surface of a work piece |
| USRE44830E1 (en) | 2000-04-28 | 2014-04-08 | Sharp Kabushiki Kaisha | Stamping tool, casting mold and methods for structuring a surface of a work piece |
| USRE46606E1 (en) | 2000-04-28 | 2017-11-14 | Sharp Kabushiki Kaisha | Stamping tool, casting mold and methods for structuring a surface of a work piece |
| US8597767B2 (en) | 2008-03-04 | 2013-12-03 | Sharp Kabushiki Kaisha | Optical element, roller type nanoimprinting apparatus, and process for producing die roll |
| US8465160B2 (en) | 2008-12-25 | 2013-06-18 | Sharp Kabushiki Kaisha | Liquid tank, viewing device for under-liquid observation, and optical film |
Also Published As
| Publication number | Publication date |
|---|---|
| NO20025117D0 (en) | 2002-10-24 |
| DE10020877C1 (en) | 2001-10-25 |
| JP2009052147A (en) | 2009-03-12 |
| JP4265816B2 (en) | 2009-05-20 |
| JP2008248388A (en) | 2008-10-16 |
| JP5025683B2 (en) | 2012-09-12 |
| JP2009191368A (en) | 2009-08-27 |
| AU5632301A (en) | 2001-11-12 |
| JP2009041116A (en) | 2009-02-26 |
| EP1289734B1 (en) | 2004-07-14 |
| ATE270954T1 (en) | 2004-07-15 |
| WO2001083198A1 (en) | 2001-11-08 |
| RU2002130256A (en) | 2004-05-27 |
| KR20020089527A (en) | 2002-11-29 |
| DK1289734T3 (en) | 2004-10-25 |
| PT1289734E (en) | 2004-10-29 |
| DE50102858D1 (en) | 2004-08-19 |
| NO20025117L (en) | 2002-10-24 |
| AU2001256323B2 (en) | 2004-08-05 |
| JP2003531962A (en) | 2003-10-28 |
| ES2222993T3 (en) | 2005-02-16 |
| JP5307435B2 (en) | 2013-10-02 |
| JP4265729B2 (en) | 2009-05-20 |
| EP1289734A1 (en) | 2003-03-12 |
| JP4420967B2 (en) | 2010-02-24 |
| BR0110378A (en) | 2003-02-04 |
| PL358199A1 (en) | 2004-08-09 |
| CN1437528A (en) | 2003-08-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU2001256323B2 (en) | Stamping tool, method for structuring a surface of a workpiece and use of an anodized surface layer | |
| US7066234B2 (en) | Stamping tool, casting mold and methods for structuring a surface of a work piece | |
| Landolt et al. | Electrochemical micromachining, polishing and surface structuring of metals: fundamental aspects and new developments | |
| Madore et al. | Electrochemical micromachining of controlled topographies on titanium for biological applications | |
| EP1016621A3 (en) | Method for producing narrow pores and structure having the narrow pores, and narrow pores and structure produced by the method | |
| KR101165396B1 (en) | Forming method of nano structure using the metal nano ring pattern | |
| CN107148335B (en) | The manufacturing method of mold and the manufacturing method of antireflection film | |
| CN110241450B (en) | Porous anodic alumina template and preparation method and application thereof | |
| EP1401633A1 (en) | Casting mould and usage of an anodically oxidized surface layer | |
| CN1091040C (en) | Multiple layered engraving copper relief | |
| WO1987006534A2 (en) | Ink transfer roller with oxide layer | |
| JPS5847473B2 (en) | Surface treatment method for aluminum or aluminum alloy | |
| JP2003513752A (en) | Element to be implanted in body tissue and device for producing the element | |
| JPH0211782A (en) | Production of ornamental material made of titanium | |
| WO2006077743A1 (en) | Decorative material and process for producing the same | |
| TH18983B (en) | A method for producing dies with embossed cavity faces | |
| TH30969A (en) | A method for producing dies with embossed cavity faces | |
| JPS602693A (en) | Surface treatment for patterning aluminum alloy |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |