CA2239785A1 - Polariser made from brewster plates - Google Patents

Polariser made from brewster plates

Info

Publication number
CA2239785A1
CA2239785A1 CA002239785A CA2239785A CA2239785A1 CA 2239785 A1 CA2239785 A1 CA 2239785A1 CA 002239785 A CA002239785 A CA 002239785A CA 2239785 A CA2239785 A CA 2239785A CA 2239785 A1 CA2239785 A1 CA 2239785A1
Authority
CA
Canada
Prior art keywords
polariser
light
polarising
angle
optical axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002239785A
Other languages
French (fr)
Other versions
CA2239785C (en
Inventor
Friedrich Lullau
Claus Mayer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xeikon IP BV
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2239785A1 publication Critical patent/CA2239785A1/en
Application granted granted Critical
Publication of CA2239785C publication Critical patent/CA2239785C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Abstract

A polariser (14) for polarising by reflection, in particular for polarising ultraviolet light when wide apertures are used, is provided with transparent plane-parallel plates each of which is inclined at an angle to the light entering parallel to the optical axis (10). To improve transmission of p-polarised light and reduce transmision of s-polarised light, it is proposed that a number of plane-parallel plates should be inclined in the same direction relative to the optical axis (10) and arranged in a stack, the angle (17) of the incident light relative to the perpendicular (16) to the plate in question being within the Brewster angle range.
CA002239785A 1995-12-08 1996-12-06 Polariser made from brewster plates Expired - Fee Related CA2239785C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19545821.4 1995-12-08
DE19545821A DE19545821A1 (en) 1995-12-08 1995-12-08 Device for exposing printing plates
PCT/EP1996/005473 WO1997022021A1 (en) 1995-12-08 1996-12-06 Polariser made from brewster plates

Publications (2)

Publication Number Publication Date
CA2239785A1 true CA2239785A1 (en) 1997-06-19
CA2239785C CA2239785C (en) 2004-07-20

Family

ID=7779548

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002239785A Expired - Fee Related CA2239785C (en) 1995-12-08 1996-12-06 Polariser made from brewster plates

Country Status (6)

Country Link
US (1) US6074065A (en)
EP (1) EP0865617B1 (en)
JP (1) JP2000501850A (en)
CA (1) CA2239785C (en)
DE (2) DE19545821A1 (en)
WO (1) WO1997022021A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE256303T1 (en) * 1998-04-29 2003-12-15 Cst Gmbh METHOD FOR PRODUCING SCREEN PRINTING FORMS AND AN EXPOSURE DEVICE THEREFOR
EP1141780B1 (en) 1998-12-11 2004-02-25 Basys Print GmbH Systeme für die Druckindustrie An exposure device
DE19944759A1 (en) 1999-09-17 2001-03-22 Basys Print Gmbh Systeme Fuer Procedure for the synchronization of positioning and exposure processes
DE10012017A1 (en) * 2000-03-11 2001-09-13 Basysprint Gmbh Sys Druckind Printing plate exposure device, has optical error and/or tolerance compensation device incorporated in electronic image processing device controlling light modulator
DE10031414B4 (en) * 2000-06-28 2004-02-12 Carl Zeiss Jena Gmbh Device for combining optical radiation
US20030206337A1 (en) * 2002-05-06 2003-11-06 Eastman Kodak Company Exposure apparatus for irradiating a sensitized substrate
WO2005121900A1 (en) * 2004-06-10 2005-12-22 Carl Zeiss Smt Ag Lighting unit of a microlithographic projection exposure system
JP2008535007A (en) * 2005-04-02 2008-08-28 パンチ グラフィックス プレプレス ジャーマニー ゲーエムベーハー Printing plate exposure equipment
US20060238602A1 (en) * 2005-04-26 2006-10-26 Heidelberger Druckmaschinen Aktiengesellschaft Imaging method and apparatus for imaging a printing plate
DE102014105064A1 (en) 2014-04-09 2015-05-21 Carl Zeiss Laser Optics Gmbh Optical polarizer and optical system with such a polarizer

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3439968A (en) * 1965-06-25 1969-04-22 North American Rockwell Infrared radiation brewster's angle polarizer
US3912920A (en) * 1974-02-06 1975-10-14 Josuke Kubota Polarized light illumination device
DE3327689C1 (en) * 1983-08-01 1984-12-20 Wilhelm Staub Gmbh, 6078 Neu-Isenburg Printed circuit board exposure apparatus
US4863246A (en) * 1986-08-14 1989-09-05 Optical Coating Laboratory, Inc. Optical system and components for optical disk reader
FR2654844B1 (en) * 1989-11-21 1993-04-16 Scanera Sc Ste Civile Rech LIGHT POLARIZATION DEVICE.
US5049901A (en) * 1990-07-02 1991-09-17 Creo Products Inc. Light modulator using large area light sources
US5751480A (en) * 1991-04-09 1998-05-12 Canon Kabushiki Kaisha Plate-like polarizing element, a polarizing conversion unit provided with the element, and a projector provided with the unit
DE4128439A1 (en) * 1991-08-27 1993-03-04 Huf Hans Joachim Dr Contact exposure unit for photosensitive material, e.g. offset or flexoprinting plates, PCB(s) or foils - has rest and pressure system for photosensitive coated material in contact with original and light source radiating UV light exposing material through original
US5384659A (en) * 1992-04-20 1995-01-24 Mitsubishi Denki Kabushiki Kaisha Condenser lens, polarizing element, light source apparatus, and projection display apparatus
FR2693561B1 (en) * 1992-07-10 1994-09-30 Alphaprime Polarized light source and overhead projector using this source.
GB2272277B (en) * 1992-10-19 1995-09-20 Marconi Gec Ltd Display devices
JPH06138413A (en) * 1992-10-29 1994-05-20 Canon Inc Plate type polarized light separating device and polarized light illuminating device using the same
FR2714489B1 (en) * 1993-12-27 1996-03-01 Centre Nat Rech Scient Optical device sensitive to polarization.
EP0746800B1 (en) * 1994-02-21 2001-10-10 Lüllau, Friedrich Process and device for the photomechanical production of structured surfaces, in particular for exposing offset plates
JP2915317B2 (en) * 1995-02-28 1999-07-05 インターナショナル・ビジネス・マシーンズ・コーポレイション Light guide unit, liquid crystal display device and polarization method
JP3146998B2 (en) * 1996-09-12 2001-03-19 ウシオ電機株式会社 Polarized light irradiator for photo-alignment of alignment film of liquid crystal display device
US5973833A (en) * 1997-08-29 1999-10-26 Lightware, Inc. High efficiency polarizing converter

Also Published As

Publication number Publication date
DE19545821A1 (en) 1997-06-12
CA2239785C (en) 2004-07-20
EP0865617B1 (en) 2001-10-24
WO1997022021A1 (en) 1997-06-19
JP2000501850A (en) 2000-02-15
DE59608027D1 (en) 2001-11-29
EP0865617A1 (en) 1998-09-23
US6074065A (en) 2000-06-13

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Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed

Effective date: 20131206