CA2077727A1 - Optical interrogation system for use in constructing flat tension shadow mask crts - Google Patents

Optical interrogation system for use in constructing flat tension shadow mask crts

Info

Publication number
CA2077727A1
CA2077727A1 CA002077727A CA2077727A CA2077727A1 CA 2077727 A1 CA2077727 A1 CA 2077727A1 CA 002077727 A CA002077727 A CA 002077727A CA 2077727 A CA2077727 A CA 2077727A CA 2077727 A1 CA2077727 A1 CA 2077727A1
Authority
CA
Canada
Prior art keywords
shadow mask
optical interrogation
flat tension
interrogation system
tension shadow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002077727A
Other languages
French (fr)
Other versions
CA2077727C (en
Inventor
Richard W. Midland
Boris Rozansky
Thomas W. Tepe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zenith Electronics LLC
Original Assignee
Zenith Electronics LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zenith Electronics LLC filed Critical Zenith Electronics LLC
Publication of CA2077727A1 publication Critical patent/CA2077727A1/en
Application granted granted Critical
Publication of CA2077727C publication Critical patent/CA2077727C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/18—Assembling together the component parts of electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/42—Measurement or testing during manufacture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/18—Assembling together the component parts of the discharge tube
    • H01J2209/185—Machines therefor, e.g. electron gun assembling devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/07—Shadow masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)

Abstract

An optical interrogation system has camera arrays useful for determining the locations of a plurality of apertures on a flat tension shadow mask and fiducial marks on a screened front panel of a CRT. The system determines the actual location of apertures or fiducial marks with respect to the cameras field of view.
By eliminating gray scaling, and processing only for light/dark transitions in single-bit binary valued pixels from each of the cameras in parallel, i.e., simultaneously, remarkable rapidity is obtained in the interrogation of widely spaced fields with mini-mal hardware. The system may also be used to interrogate mask support surfaces on the front panel prior to welding the mask thereto.
CA002077727A 1991-11-27 1992-09-08 Optical interrogation system for use in constructing flat tension shadow mask crts Expired - Fee Related CA2077727C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US799,590 1991-11-27
US07/799,590 US5145432A (en) 1991-11-27 1991-11-27 Optical interprogation system for use in constructing flat tension shadow mask CRTS

Publications (2)

Publication Number Publication Date
CA2077727A1 true CA2077727A1 (en) 1993-05-28
CA2077727C CA2077727C (en) 2002-04-02

Family

ID=25176286

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002077727A Expired - Fee Related CA2077727C (en) 1991-11-27 1992-09-08 Optical interrogation system for use in constructing flat tension shadow mask crts

Country Status (4)

Country Link
US (1) US5145432A (en)
KR (1) KR100291607B1 (en)
CA (1) CA2077727C (en)
MX (1) MX9206673A (en)

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JP3658110B2 (en) * 1995-11-27 2005-06-08 キヤノン株式会社 Manufacturing method and manufacturing apparatus for image display device
US5768443A (en) * 1995-12-19 1998-06-16 Cognex Corporation Method for coordinating multiple fields of view in multi-camera
US5825483A (en) * 1995-12-19 1998-10-20 Cognex Corporation Multiple field of view calibration plate having a reqular array of features for use in semiconductor manufacturing
US5872870A (en) * 1996-02-16 1999-02-16 Cognex Corporation Machine vision methods for identifying extrema of objects in rotated reference frames
US5909504A (en) * 1996-03-15 1999-06-01 Cognex Corporation Method of testing a machine vision inspection system
US6259827B1 (en) 1996-03-21 2001-07-10 Cognex Corporation Machine vision methods for enhancing the contrast between an object and its background using multiple on-axis images
US6298149B1 (en) 1996-03-21 2001-10-02 Cognex Corporation Semiconductor device image inspection with contrast enhancement
US5949901A (en) * 1996-03-21 1999-09-07 Nichani; Sanjay Semiconductor device image inspection utilizing image subtraction and threshold imaging
US5978502A (en) * 1996-04-01 1999-11-02 Cognex Corporation Machine vision methods for determining characteristics of three-dimensional objects
US5943089A (en) * 1996-08-23 1999-08-24 Speedline Technologies, Inc. Method and apparatus for viewing an object and for viewing a device that acts upon the object
US6137893A (en) * 1996-10-07 2000-10-24 Cognex Corporation Machine vision calibration targets and methods of determining their location and orientation in an image
US5960125A (en) 1996-11-21 1999-09-28 Cognex Corporation Nonfeedback-based machine vision method for determining a calibration relationship between a camera and a moveable object
US5953130A (en) * 1997-01-06 1999-09-14 Cognex Corporation Machine vision methods and apparatus for machine vision illumination of an object
US6075881A (en) * 1997-03-18 2000-06-13 Cognex Corporation Machine vision methods for identifying collinear sets of points from an image
US5974169A (en) * 1997-03-20 1999-10-26 Cognex Corporation Machine vision methods for determining characteristics of an object using boundary points and bounding regions
US6141033A (en) * 1997-05-15 2000-10-31 Cognex Corporation Bandwidth reduction of multichannel images for machine vision
KR100257826B1 (en) * 1997-06-09 2000-07-01 윤종용 Method and apparatus for adjusting screen gradient in a video display device
US6608647B1 (en) 1997-06-24 2003-08-19 Cognex Corporation Methods and apparatus for charge coupled device image acquisition with independent integration and readout
US5978080A (en) * 1997-09-25 1999-11-02 Cognex Corporation Machine vision methods using feedback to determine an orientation, pixel width and pixel height of a field of view
US6025854A (en) * 1997-12-31 2000-02-15 Cognex Corporation Method and apparatus for high speed image acquisition
US6282328B1 (en) 1998-01-28 2001-08-28 Cognex Corporation Machine vision systems and methods for morphological transformation of an image with non-uniform offsets
US6236769B1 (en) 1998-01-28 2001-05-22 Cognex Corporation Machine vision systems and methods for morphological transformation of an image with zero or other uniform offsets
US6215915B1 (en) 1998-02-20 2001-04-10 Cognex Corporation Image processing methods and apparatus for separable, general affine transformation of an image
US6381375B1 (en) 1998-02-20 2002-04-30 Cognex Corporation Methods and apparatus for generating a projection of an image
JP2000200551A (en) * 1998-10-26 2000-07-18 Toshiba Corp Method and device for manufacturing cathode-ray tube
US6687402B1 (en) 1998-12-18 2004-02-03 Cognex Corporation Machine vision methods and systems for boundary feature comparison of patterns and images
US6381366B1 (en) 1998-12-18 2002-04-30 Cognex Corporation Machine vision methods and system for boundary point-based comparison of patterns and images
KR100357948B1 (en) 1999-11-10 2002-10-25 삼성에스디아이 주식회사 Flat type color CRT
US6684402B1 (en) 1999-12-01 2004-01-27 Cognex Technology And Investment Corporation Control methods and apparatus for coupling multiple image acquisition devices to a digital data processor
US6748104B1 (en) 2000-03-24 2004-06-08 Cognex Corporation Methods and apparatus for machine vision inspection using single and multiple templates or patterns
US7006669B1 (en) 2000-12-31 2006-02-28 Cognex Corporation Machine vision method and apparatus for thresholding images of non-uniform materials
TW541570B (en) * 2001-01-18 2003-07-11 Matsushita Electric Ind Co Ltd Method of assembling color CRT and assembling device
KR100407169B1 (en) * 2001-08-08 2003-11-28 박수관 Screen and electrode alignment apparatus in the process of the ultra slim flat panel display and testing method thereof
US6727125B2 (en) * 2002-04-17 2004-04-27 Sharp Laboratories Of America, Inc. Multi-pattern shadow mask system and method for laser annealing
US7295352B2 (en) * 2002-05-23 2007-11-13 Hewlett-Packard Development Company, L.P. Scanning apparatus
US8111904B2 (en) 2005-10-07 2012-02-07 Cognex Technology And Investment Corp. Methods and apparatus for practical 3D vision system
US8162584B2 (en) 2006-08-23 2012-04-24 Cognex Corporation Method and apparatus for semiconductor wafer alignment
EP2185344B1 (en) * 2007-08-23 2018-06-13 3D Systems, Inc. Automatic geometric calibration using laser scanning reflectometry
US9254641B2 (en) * 2013-08-05 2016-02-09 Asm Technology Singapore Pte. Ltd. Screen printer, and method of cleaning a stencil of a screen printer
US20170095827A1 (en) * 2014-04-30 2017-04-06 Advantech Global, Ltd Universal Alignment Adapter
US20170208825A1 (en) * 2016-01-21 2017-07-27 Alan Backus Gaseous transfer device

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Publication number Priority date Publication date Assignee Title
US4556902A (en) * 1984-01-19 1985-12-03 Rca Corporation System and method for measuring the area and dimensions of apertures in an opaque medium
US4711579A (en) * 1986-08-12 1987-12-08 H. Fred Johnston System for automatically inspecting a flat workpiece for holes
US4717955A (en) * 1987-03-31 1988-01-05 Rca Corporation RAM interface control circuit
JPS6448344A (en) * 1987-08-17 1989-02-22 Mitsubishi Electric Corp Tensely laying method for shadow mask
US4834686A (en) * 1987-12-29 1989-05-30 Zenith Electronics Corporation Rail mapping method and apparatus
US4902257A (en) * 1988-07-22 1990-02-20 Zenith Electronics Corporation Methods and apparatus for making flat tension mask color cathode ray tubes
US4998901A (en) * 1988-07-22 1991-03-12 Zenith Electronics Corporation Method and apparatus for making flat tension mask color cathode ray tubes
IE882350L (en) * 1988-07-29 1990-01-29 Westinghouse Electric Systems Image processing system for inspecting articles
US4980570A (en) * 1990-02-23 1990-12-25 Riken Denshi Co., Ltd Device for determining location of apertures

Also Published As

Publication number Publication date
CA2077727C (en) 2002-04-02
MX9206673A (en) 1993-05-01
KR100291607B1 (en) 2001-09-17
US5145432A (en) 1992-09-08
KR930011052A (en) 1993-06-23

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