CA2063982A1 - Photosensitive composition based on acrylates - Google Patents

Photosensitive composition based on acrylates

Info

Publication number
CA2063982A1
CA2063982A1 CA002063982A CA2063982A CA2063982A1 CA 2063982 A1 CA2063982 A1 CA 2063982A1 CA 002063982 A CA002063982 A CA 002063982A CA 2063982 A CA2063982 A CA 2063982A CA 2063982 A1 CA2063982 A1 CA 2063982A1
Authority
CA
Canada
Prior art keywords
weight
meth
acrylate
photosensitive composition
aliphatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002063982A
Other languages
French (fr)
Other versions
CA2063982C (en
Inventor
Bettina Steinmann
Rolf Wiesendanger
Adrian Schulthess
Max Hunziker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2063982A1 publication Critical patent/CA2063982A1/en
Application granted granted Critical
Publication of CA2063982C publication Critical patent/CA2063982C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images

Abstract

A liquid photosensitive composition comprising (1) 40 to 80 % by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and a molecular weight (Mw) of 500 to 10 000, (2) 5 to 40 % by weight of a hydroxyl group containing aliphatic or cycloaliphatic di(meth)acrylate, (3) 0 to 40 % by weight of a mono(meth)acrylate or of a mono-N-vinyl compound having a Mw of not more than 500, (4) 0.1 to 10 % by weight of a photoinitiator, (5) 0 to 30 % by weight of an aliphatic or cycloaliphatic: di(meth)acrylate which differs from (2), of an aliphatic tri(meth)acrylate or of an aromatic di- or tri(meth)acrylate, and (6) 0 to 5 % by weight of customary additives, such that the proportion of components (1) to (6) together is 100 % by weight.

The composition is a photosensitive composition which can be polymerised by irradiation with actinic light and which is suitable for the production preferably.of three-dimensional objects by the stereolithographic technique.
CA002063982A 1991-03-27 1992-03-25 Photosensitive composition based on acrylates Expired - Fee Related CA2063982C (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH93691 1991-03-27
CH19992 1992-01-23
CH199/92-4 1992-01-23
CH936/91-5 1992-01-23

Publications (2)

Publication Number Publication Date
CA2063982A1 true CA2063982A1 (en) 1992-09-28
CA2063982C CA2063982C (en) 2002-05-28

Family

ID=25683853

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002063982A Expired - Fee Related CA2063982C (en) 1991-03-27 1992-03-25 Photosensitive composition based on acrylates

Country Status (7)

Country Link
US (1) US5476749A (en)
EP (1) EP0506616B1 (en)
JP (1) JP3252331B2 (en)
KR (1) KR100199479B1 (en)
CA (1) CA2063982C (en)
DE (1) DE59209143D1 (en)
HK (1) HK1005630A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995013565A1 (en) * 1993-11-10 1995-05-18 W.R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW418346B (en) * 1993-03-05 2001-01-11 Ciba Sc Holding Ag Photopolymerisable compositions containing tetraacrylates
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
WO1995012146A1 (en) * 1993-10-26 1995-05-04 Toray Industries, Inc. Dry lithographic forme
DE4424101A1 (en) * 1994-07-08 1996-01-11 Basf Lacke & Farben Radiation-curable lacquers and their use in the production of matt lacquer films
JP3117394B2 (en) * 1994-11-29 2000-12-11 帝人製機株式会社 Optical three-dimensional molding resin composition
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
RU2074673C1 (en) * 1995-06-01 1997-03-10 Межотраслевой научно-технический комплекс "Микрохирургия глаза" Elastic artificial crystalline lens and method for manufacturing same
JPH0971707A (en) * 1995-06-29 1997-03-18 Takemoto Oil & Fat Co Ltd Photocurable composition for plastic mold and plastic mold
EP0763779A3 (en) * 1995-09-18 1997-07-30 Mitsubishi Chem Corp Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate
EP0802455B1 (en) * 1996-04-15 2002-10-16 Teijin Seiki Co., Ltd. Use of a photocurable resin composition for the production of a stereolithographed object
WO1997042549A1 (en) 1996-05-09 1997-11-13 Dsm N.V. Photosensitive resin composition for rapid prototyping and a process for the manufacture of 3-dimensional objects
US5910979A (en) * 1997-10-20 1999-06-08 At&T Corp. Method for billing local communication services provided by an interexchange communication network
US6201036B1 (en) * 1998-07-21 2001-03-13 Mezhoiraslevoi Nauchno-Tekhnichesky Komplex “Mikrokhirurgia Glaza” Light-curable polymer material, method for making an elastic intraocular lens, and an elastic intraocular lens
US6187374B1 (en) 1998-09-02 2001-02-13 Xim Products, Inc. Coatings with increased adhesion
DE19851567A1 (en) * 1998-11-09 2000-05-11 Emtec Magnetics Gmbh Binder composition for magnetic recording media and photoinitiator mixture curable by UV radiation
JP3855929B2 (en) 2000-05-29 2006-12-13 日立化成工業株式会社 Photosensitive resin composition, photosensitive element, method for producing resist pattern, and method for producing printed wiring board
JP2002148802A (en) * 2000-11-07 2002-05-22 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for sandblast and photographic sensitive film using the same
US6811937B2 (en) 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US20040054025A1 (en) * 2002-06-20 2004-03-18 Lawton John A. Compositions comprising a benzophenone photoinitiator
FR2856145B1 (en) * 2003-06-16 2005-09-02 Michelin Soc Tech DETECTION OF THE REVOLUTIONS OF A PNEUMATIC ASSEMBLY AND WHEEL, USING THE TERRESTRIAL MAGNETIC FIELD.
US7375144B2 (en) * 2005-06-16 2008-05-20 Eastman Chemical Company Abrasion resistant coatings
KR100771367B1 (en) 2005-07-25 2007-10-30 주식회사 엘지화학 Resin having excellent mechanical physical property, and photosensitive composition comprising the same
JP5063127B2 (en) * 2007-02-06 2012-10-31 株式会社Ａｄｅｋａ Polymerizable optically active compound and polymerizable composition containing the polymerizable optically active compound
US20110201717A1 (en) * 2007-12-28 2011-08-18 E. I. Du Pont De Nemours And Company Actinically curable adhesive composition
KR20100112149A (en) * 2007-12-28 2010-10-18 이 아이 듀폰 디 네모아 앤드 캄파니 Thermally and actinically curable adhesive composition
CN109956682B (en) 2011-02-18 2022-05-17 肖特公开股份有限公司 Solder glass, insulating sleeve and device comprising insulating sleeve
CN103361021A (en) * 2013-07-24 2013-10-23 吴波 Optical transparent adhesive with low shrinkage
JP6337523B2 (en) * 2014-03-07 2018-06-06 東洋インキＳｃホールディングス株式会社 Active energy ray polymerizable resin composition and laminate
ITUB20154169A1 (en) 2015-10-02 2017-04-02 Thelyn S R L Self-lubricating substrate photo-hardening method and apparatus for the formation of three-dimensional objects.
EP3658602A4 (en) 2017-07-25 2021-04-14 3M Innovative Properties Company Photopolymerizable compositions including a urethane component and a reactive diluent, articles, and methods
US11904031B2 (en) 2017-11-22 2024-02-20 3M Innovative Properties Company Orthodontic articles comprising polymerized composition comprising at least two free-radical initiators
CN111372959B (en) 2017-11-22 2022-09-02 3M创新有限公司 Photopolymerizable compositions, articles, and methods comprising a urethane component and a monofunctional reactive diluent
JP7015682B2 (en) * 2017-12-06 2022-02-03 ナガセケムテックス株式会社 Resin composition for stereolithography
US11616302B2 (en) 2018-01-15 2023-03-28 Rogers Corporation Dielectric resonator antenna having first and second dielectric portions
US11633908B2 (en) * 2018-03-02 2023-04-25 Formlabs, Inc. Latent cure resins and related methods
KR20210005628A (en) 2018-04-20 2021-01-14 디에스엠 아이피 어셋츠 비.브이. Radiation curable composition for additive manufacturing
EP3813764A2 (en) 2018-06-29 2021-05-05 3M Innovative Properties Company Orthodontic articles prepared using a polycarbonate diol, polymerizable compositions, and methods of making the articles
JP7010455B2 (en) 2018-06-29 2022-01-26 スリーエム イノベイティブ プロパティズ カンパニー Orthodontic articles prepared using polycarbonate diol and its manufacturing method
CN112367959A (en) 2018-06-29 2021-02-12 3M创新有限公司 Orthodontic articles comprising cured free-radically polymerizable compositions having improved strength in aqueous environments
US11225535B2 (en) 2018-06-29 2022-01-18 3M Innovative Properties Company Photopolymerizable compositions including a polyurethane methacrylate polymer prepared using a polycarbonate diol, articles, and methods
GB201814535D0 (en) 2018-09-06 2018-10-24 Uea Enterprises Ltd Intraocular devices
US11552390B2 (en) 2018-09-11 2023-01-10 Rogers Corporation Dielectric resonator antenna system
GB2594171A (en) 2018-12-04 2021-10-20 Rogers Corp Dielectric electromagnetic structure and method of making the same
CN113906066A (en) * 2019-05-30 2022-01-07 罗杰斯公司 Photocurable composition for stereolithography, stereolithography method using the same, polymer assembly formed by stereolithography method, and device comprising the polymer assembly
US20230002631A1 (en) 2019-11-07 2023-01-05 Basf Se Water-washable compositions for use in 3d printing
US11482790B2 (en) 2020-04-08 2022-10-25 Rogers Corporation Dielectric lens and electromagnetic device with same
US11413819B2 (en) 2020-09-03 2022-08-16 NEXA3D Inc. Multi-material membrane for vat polymerization printer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4100141A (en) * 1976-07-02 1978-07-11 Loctite (Ireland) Limited Stabilized adhesive and curing compositions
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates
EP0286594A2 (en) * 1987-04-06 1988-10-12 Ciba-Geigy Ag Process for the production of photographically structurable coatings
EP0378144B1 (en) * 1989-01-10 1995-03-08 Ciba-Geigy Ag Photocurable compositions
DE59010008D1 (en) * 1989-10-27 1996-02-08 Ciba Geigy Ag Photosensitive mixture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995013565A1 (en) * 1993-11-10 1995-05-18 W.R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed

Also Published As

Publication number Publication date
EP0506616B1 (en) 1998-01-21
HK1005630A1 (en) 1999-01-15
KR100199479B1 (en) 1999-06-15
EP0506616A1 (en) 1992-09-30
US5476749A (en) 1995-12-19
KR920018522A (en) 1992-10-22
JPH05224412A (en) 1993-09-03
CA2063982C (en) 2002-05-28
DE59209143D1 (en) 1998-02-26
JP3252331B2 (en) 2002-02-04

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