CA1152787A - Method for manufacturing in-line hologram lens - Google Patents

Method for manufacturing in-line hologram lens

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Publication number
CA1152787A
CA1152787A CA000377059A CA377059A CA1152787A CA 1152787 A CA1152787 A CA 1152787A CA 000377059 A CA000377059 A CA 000377059A CA 377059 A CA377059 A CA 377059A CA 1152787 A CA1152787 A CA 1152787A
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Canada
Prior art keywords
wave beam
photo
hologram
sensitive layer
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000377059A
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French (fr)
Inventor
Chiaki Kojima
Kosuke Miyahara
Kayoko Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
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Publication of CA1152787A publication Critical patent/CA1152787A/en
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/32Holograms used as optical elements
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00Optical: systems and elements
    • Y10S359/90Methods
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146Laser beam

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Head (AREA)

Abstract

ABSTRACT OF THE DISCLOSURE
A method of producing an inline hologram lens is disclosed which includes the steps of producing a diffracted wave beam by a diffraction device, producing a spherical wave beam by an optical device, providing the diffracted wave beam perpendicularly incident on a photo -sensitive layer as a reference wave beam, providing, simultaneously, the spherical wave beam perpendicularly incident on the photo-sensitive layer as a subject wave beam through the diffraction device, and developing the photo-sensitive layer to produce an inline hologram lens.

Description

BACXG~OUND OF T}~E INVENTION

Pield of the Invent~on Th~ pre~ent invention relates generally to a S method of producing a hologram lens and i8 directed more particularly to a method of producing an ~nline hologram lens.

DQscription of the Prior ~rt In the art, there ha~ b~en proposed no method which can ea~ily produc2 an inline hologram lens with a large ~A.(numerical aper~ure).

OB;rECTS AND SllP~ARY OF THE I = ION

Accordingly, an object of the present invention i8 to provide a novel method of producing an inline hologram lens.
Another ob~ect of the invention i8 to provide a novel method of producing an in}ine 'hologram len~ by ~imple manner.
A further ob~ect of the invention i8 to provide a mothod of producing an inlins hologrnm len~ without usinq an off-axis holo~ram 1en8 as a mother lens.
According to an aspect of the present invention, ~ method of producing an inline hologram len8 i~ provided which comprises the step3 of:
~A) produc~ng a diffracted wave be~m by a diffraction device;
tB~ producing a spherical wave bea~ by an optical device;
(C~ pro~iding ~aid diffr~cted wave be~m perpendicularly 7i~37 incident on a photo-sen~itiv~ layer as a reference wave beam;
~D~ providi~g, 3imultaneously, ~aid spherical wave beam perpendicularly incident on ~aid photo-sensitive layer as a subject wave beam through said diffraction device;
and (E) developing said photo-~ensitive layer to produce said inline hologram l~n8~
The other object~, features and advantage~ of the present invention will become apparent fram the following descr~ption ta~en in coniunction with the accompanyin~
dra~ing~ through which the like referencas de3ignate the ~ame element~ and parts.

BRIEF DE8CRIP~ION OF T~E DRAWINGS

Fig~. 1 to 4 are respect~vely schematic diagram~
used to explain the record and repr~duction methods of prior art hologram leAses;
Fig. 5 i~ a ~chematic diagr2m used to expla~n the r~cord method of a prior art inline hologram lens;
Fig. 6 i6 a schematic diagram showing an example of the record method of the previously proposed method of making an inline hologram len~;
Fig. 7 is a schemAtic diagram ~howing another oxample of th~ record method of ths prevloualy proposed method of pro~ucing an inline hologr~m l~ns;
Fig. 8 is a sche~atic diagram used to explain an example o~ thQ me~hod of mRking an o~f-axis hologram lens u~ed in the example~ shown in Figs. 6 and 7;

~15~787 ~ig. 9 i8 a cro3~-sectional view showing the hologram lens made by u~ing the record method shown in Fig. 6, 7 or 8;
Fig~. 10 and 11 are respectively schematic diagram~ showing example~ of the duplication record met~od~
of an inline hologram le~;
Figs. 12 and 13 are respectively 3chematic d iagrams showing example~ of the record ~ethods of the method~ making inline hologram lenae~ according to the inv~ntion; a~d Fi~. 14 i~ a schematic diagram showin~ an exampl2 of the optlcal information or signal reproductio~ apparatus.

DESCRIPTION OF T~E PREFERRED EMBO~IMENTS
Before de~cribing the prese~t inventlon, a hologram ns wlll be de~crlbed. As the hologram lens, there a~e proposed an inline hologram lens and an off-axis hologræm len~ in the art~ The recording and reproducing theory of : 20 the two hologr~m lense~ will ~e now briefly d~scribed.
Firstly, those of the off-axi~ hologram len8 will be described. A~ shown ln Fig. 1, on a record ~urface ~photo-sen~itive sur~ace) r of a hologram record medium ~R, r~adia~ed are a record 8ub~ ect wave beam tspherical wave ~5 beam) A and a record referenc~ wave beam (plane or spherical wave beam) ~ each at the inc~deDt angle of abo~t 45 with re~p~ct to the no~mal to th~ ~urface r and at the both ~ide of the normal, namely at the of f-axis, ~o ~hat an off-axi~
hologr~m len~ portlon ~L' of, for example, a disc~hape or 3~ ~llipse-shape, which consists of a graphic interference 115;27~37 image or pattern, i8 recorded. The description of the developing treatment of the recorded surface r will be omitted. In this case, the record subject wav~ beam A
i8 provided by uging an optical lens and i8 ~uch a beam which conver~es or focu~es at a point P and diverge~
after the point P. Further, both the beams A and B are pro~ided from the laeer beam emitted from the ame laser light source. Thus, an off-axis hologram len~ OX-L ls made.
When the off-~xis ho~ogram len~ O~-L ~ reproduced, a6 shown in Fig. 2, a reproduction refer~nce wave beam B' similar to the beam B ~hown in Fig. 1 is irradiated on the off-axis hologram len8 portion ~L' from the ~ide opposite to the record 0urface r along the extending line of record reference wave beam ~ shown in Fig. 1. Then, a reproduc~ion ~ub~ect wave beam A' i8 reproducea from the ~iae of record surface r ~hich b~am A' ~8 converged or focu~sed at a p~int P'. ~n the contrary, when the reproduction reference wave b~am B' i~ irr~diatea on the record surface r of record medium ~R same as the record reference wAve beam B in Fig.
1 but different to that of Fig. 2, a reproduction sub~ect wave beam i~ reproduced from the sur~ace of record medium ER opposite to the record surface r which 19 diverged along the extending line of record sub~ect wave beam A in Fig. 1.
Now, the inline hologram lens will be described.
As ~hown in Fig. 3, the r~cord sub~ct wave beam [spherical wave beam) A and the record referenoe wave beam (plane or ~pherical beam) B are irradiated on the record surface r of hologram record medium ~, which beams A and B are coinci-d~nt in optical axis in the normal direction of the ~urface r i.e. inline with ~ach o~er, to form or record an inline 115~7~7 hologram len~ portion ~IL con~isting of a graphic interference images or pattern. The other of the inline hologram lens i substantially same a~ that shown ln Fig. 1. Thu3, an inline hologram lens IN-L is produced.
S ~hen the inl~ne hologram len~ IN-L is reproduced, if, a~ ~hown in Fig. 4, a reproduction reference wave beam B' ~imilar to the record referQnce wave beam B shown in Pig.
3 i~ irradiated on the inline hologram len~ por~ion ~L from the side oppo lte to the record ~urface r of record medium ~R along the extending line of ~e~m B, a reproduced subject - wave beam A' i~ re~roduced from the reçord ~urface r which converge~ or focu3ses at a point P'. I~ thi~ ~ase, it is al80 po~ble that the reprcduction r~fere~ce wa~e beam ~8 ~rxadiated on the recor~ surface r of hologram record medium ~R to reproduce the diverglng sub~ect wave bea~. The other of Fig. 4 15 ~ubstantially same as that of Fig. 2.
The hologram lens thus made i8 light in weight and ~mall in size. Further, by desirably Relecting a ~other lens, which i3 to provide a sub~eet wave beam, a lens with a ~esired N. A.(numerical aperture) and an operating distance can be made, and lt can be mas~-produced ~y dupli-cation ~ame in character$~tic.
By the way, an ob~ective lens, which i~ used a~, for example, an op*lcal signal reproduction head in an opt~cal signal reproduction apparatus, has a rather large N.A., and in the art an op~$cal lens, ~onsisting o~ a numb~r of len# sets slmilar to the ob~ectlve lens of a ~icroscope, i~ u~ed wi~ely. ~owever, such an objective len~ can not be made small in sLze and light in weight, ~o ~hat upon focussing serv~ ~ince the objective lens i~ moved ;27~37 up and down, a rather large mechanical en~rgy ls required and hence ~he ~ervo device becomes larye in 8iZ~ and com-plicated in construction.
Therefore, it i5 de~red to use the above hologram len~ as the Qbject1ve len~ of a~ optical signal reproduction head. ~owever, an off-axls hologram lens i8 not desired a~
the objective len~ of the optical ~ignal reproduction head by the following reasons.
One of the reasons i8 as foll~ws. Since the objective lens i~ ~ed up and down by the f~cussing servo a8 degcribea above~ it i~ necessary that the reproduction reference wave b~am i~ sLmultaneou~ly moved up and down in paxallel to b~ irradiated positively on the len6 portion of tho off-ax~ hologram l~n~. $n th~ ca~e of an i~lin~
hologram lens, if its optical axis i~ parallel to the normal to th~ inline bologram lens portion ~L, sinc~ the moving direction of the lens i~ coincident with the direc-tion of the reproduction reference wave beam, it i8 u~nece~ary to ~ove the reproductioll reference wave b~am ~imultaneously.
~he other of the reasons i6 as follow~. It i~
nece~6ary that the of~-axis hologram lens is rotated and adjusted ~or the reproduction reference wavo beam about three axe~ perpendicular with one anoth~r with the accu-racy of about + O. 5 to bring the focussing or converglny point and the optical axi~ of the reproduction ~ub~ect wave beam to a predetermined po~ltion. This ad~ustment, howevar, is very complicated and a~no~t Lmpossible when th~ ~.A. of ~he le~s 1~ large. The inline hologram lens i~ a~mo~t free of the above difficult adju~bm~nt.

`
27~37 From the above, it will be understood that the inline hologram len~ i8 desired a~ an objecti~e lens of an optical signal reproducing head.
Although the record manner of the inline hologram len~ is described briefly with reference to Fig. 3, it will be de~cribed in more detail with refer~nce to Fig. 5. The record subject wave ~eam A and record refarence wave be~m 8, which are coincident in optical axi~ on the normal to th~ record surface r of hologram record medium ~R, are ir-radiated on a circular ares of record surface (:photo -~e~2sitiYe surf cs) r c~f hcJlogram rec~r~ m~ a form the Lnline hologram len~ portion ~L which con~ist~ of graphic interfere~ce pattern~. In thi~ cas~, both beama A and B are provided by the laser b~am f rom a laser beam .
or l~ght sourc~ LS.
~he record ~ubject ~ave beam A i8 prepa~ed by the following manner. A part of the laser beam ~plane wave beam) from the la~er light ~ouxce LS i8 irradiated through two beam splitters SPl and SP2 on a mother 1en8 (optical convsx lens) Ll to provide a Rpherical wave beam which is focu~ed at a point P (which corresponds to the rear focal point of l~n~ Ll) and then div~rged therefrom.
This spherical wave beam i~ u~ed as the record sub~ect wave beam A. ~hile, tlle record reference wave b~am B i8 prepared by the foll~win~ manner. A part of the laser beam from the laser light source LS i8 reflected on the bea~ splitt~r SPl, further ref~Pcted on two mirro~ 1 and M2 and then incident on an auxiliary lens loptical convex lens) L2. The beam pas~d through the lens L2 i~ focussed at a center point Q of ~he beam splitter SP2 (which point 3~15i ;27~37 Q correspond~ to the rear focal point of lens L2), then reflec~ed on the beam ~plitter SP2 and passed through the mother lens Ll to be the record reference wave beam B
(which i~ a parallel plane wave beam).
In this case, the N.A. of inline hologram len~
IN-L thus made depends upon the ~.A. of mother lens Ll, 80 that when this inline hologram lens I~-L is used as the objective lens of the above-mentioned opt~cal signal reproducing head, it i3 neces~ary to select the N.A. of i~1ine hologram lens I~-L rather large. Therefore, in this case, lense~ with large N.A. must be of course used as the lenses Ll and L2.
When an ordinary optical lens is used as each of the lenses Ll and L2, a lens consisting a nw~er of len~ set~ must be us0d as in the objective ~eni o~ a microscope. As the ~A. becomes larye, the focal points of lenses Ll and L2 are positioned within the mirror cylinder with the result that the record method of the inline hologram le~s shown in Fig. 5 becom~s impossible to be practised.
In order to avoi d 'chis problem, the following record mekhod of an inline hologram lens with large N.A.
ha~ been propo~ed. That ~ 8, a beam splitter is provided in opposing relation to a hologram record medium, an optical lens consisting of a number of lens sets is located at the opposite side of the beam splitter as an obj ective l~:ns, the laser beam from a laser light source is incident on the objecti~e lens, the diverging beam emitted therefrom is irradiated on the hologram record medium through the beam splitter a~ a recor~ subjeet wave beam, the laser beam _ g _ i ~15~7i~7 i8 also incident on an auxiliary len~ to be a record re-ference wave beam, this record reference wave beam i8 reflected on the ab~ve beam splitter, and then the reflected beam i9 irradlated on the hologram record medium.
With the above record method, since the record subject wave beam (~pherical beam) ~rom th~ objective lens pas~es through the beam plitter, it i~ subjected to aberratlon. To avoid this defect, it ~ neceq~ary that a speci~l objective len~ i8 u~ed to thereby correct the aber-ration of the record subjec~ wave beam or a ~imilar beam spl$tter i5 provided upon reproduction. ~his i8, however, not ~o prefOEred in view of practical use.
In view of the above, the applicant of thi~
application, propos¢d a method for manufacturing an inline hologram lens with a large N.A. which can ea~ily manufacture an inline hologram len8, Now, an example of the method for manufacturing the above ~nline hologram lens will be described with reference to Fig. 6. In this example, an off-axi.~ hologram lens OX-~, which i8 made by using a record subject wave b~am and a record reference beam in off-axis with each other, i~ used as a m~ther len~ (ob;ective lens). T~e method of making the off-axis holoqram lens OX-L, especiAlly its re~ord method will be deacribed later wlth reference to Fig.
8. The off-axis hologram lens OX-L i8 formed of a hologram record medium ~2, which consists of a glass substratQ BS
and a pho~o-sensltive layer kecord layer) ~ coated on the glass ~ub~trate ~S. On the center portion of photo-~en~itive layer ~, recorded ~ a disc-shaped of ~-axi8 hologram lens portion ~L' which i~ then developed as de3cribed later.

In thi~ ca~e, the off-axia hologram lens OX-L is so formed that when a reproduction reference wave beam (plane or ~pherical wave b~am, in this example, the plane wave beam i~ used) B' is irradiated on the lens portion HL' in th~
photo-~ensitive layer K through the gla~s substrate BS at the angle of about 45 with respe~t to the normal to the len~ portion ~L', a reproduction subject wave baam A' is reproduced from the p~oto-~ensit~ve layer R which ha~ the optical aXiB along the normal .and i8 focussed at a po~t P.
In Fig. 6, ~Rl designates a hologram record medium on ~hich an in~ne holo~ra~ len9 ~ to b~
formed and which i8 formed of a glas~ sub~trate ~S and a photo-sens~ti~e layer K coated there~n.
Th~ off-axis hologram len~ OX-~, serving as the mother lens, i8 faced to the hologram record mediwm HRl.
In thi~ case, the off-axl~ hologr~m len~ OX-L i8 so located for the hologram record medlum ~Rl that the photo-sensitive layer X of the former i8 faced in parallel ~o the photo -sensitive layer K of the latter wi~th a predetermined distance.
The la~er beam (parallel plane wave ~eam) ~rom a laser light source LS i8 partially reflected on a beam splitter SP, furth~r re~lected on a mirror M, and the re-flected beam (p~rallel plane wave beam) thereon i~ irradiated on the photo-sen~itive layer K off-axl~ hologram len~ OX-L
through the gla~s substrate BS thereof as the reproduction reference wave beam B'. ~hen, from the o~f-axls hologram len~ OX-L, reproduced ia the reproduction 8ub; ect w~Ye beam A' which i8 focussed 3t the point P and th~n diver~ed there-from. Th~s beam A' i~ incident on the photo-aensitive layer `` 3~

K of hologrzm record medium HRl as the record subject wave beam A.
The laser beam from the laser light ~ource LS
part~ally pa88e8 through the beam ~plltter SP, through the off-axis hologram len~ OX-L and i~ incident on the photo -sensitive layer K of holsgram record medium ~Rl a8 the record reference wave beam B which i~ in inline relation to the record sub~ect wave bea~ ~ tnamely, the beam~ A and B are coincident in optical axi8). Thus, a di~c-shaped ~line hologram len~ portion ~L i9 f~rmed on th~ center portion of photD-sensitive l~yer ~ of record medium ~Rl.
~h~s recora med~um ~Rl ia then sub~ecte~ to dev~loping process, which will be described later, to ba an inline hologram lens IN-L.
Another example of the record method will be de~cribed with reference to Fig. 7. In this example, the off-axis hologram lens OX-L ~erving as the ther len~ i8 ~o located for the hologra~ record medium HRl that the gla88 substrate BS of the former i8 in contact with the photo-sen~itive layer K of the latter which are dispo~ed similar to that shown in Fig. ~. Then, the racording as the inline hologram len~ IN-L i~ carried out. In this ca~e, the reproduction and record ~ubject wave beams A' and A
~ecome each such a spherical wave beam which diverges from an imag~nal point P.
Now, a dew ription will be g~ven on the manner to manufacture the off-axi~ hologram lens OX-L, which i8 u~ed as the ~othar len8, with reference to Pig. 8. A record subject wave ~gpherical wave~ bea~ A is irradiated on the photo-~en~iti~e layer X o hologr~m record medium ~R2, which ~ ~5~7~37 further includes the gla~s 3ub~trate BS, in ~uch a manner that the optical axi5 of the beam A i8 coincident wlth the normal to the photo-~en~itive layer K, and a record reference wave (parallel plane wave) beam B i8 al80 irradiated on khe photo-~en~it~ve layer K in ~uch a manner that it~ optical axl~ ~nter~ects the normal at about 45. Thus, a disc-shaped of f-axis hologram lens portion H~' i8 recorded on the center portion of the photo-sensi~ive layer K. Thereafter, the photo-~ensitive layer R i8 develop~d to pro~ide the off-axis hologram lens OX-L. In this ca~e, the record subject wave beam A 18 provided by the following manner. That i8, the laser beam ~parallel plane wave bea~) from a laser light ~ource LS 18 partially p~8~ed through a beam ~plitter SP, then incident on an auxiliary lens (optical lens) L2, and then focus~ed at a polnt Q (rear focal point of lens L2).
The spherical wave beam diverging from the point Q 1~
incident on a mother len~ Ll (ob~ective lens and made of a number of opt~cal len~ ~et~) to focus the beam at a point P. The spherical wave beam d~verg~g from the point P i3 u~ed aR the record ~ubject wave bea~l A.
The record reference wave beam B i8 prov~ded by the following manner. That is, the la~r be2m from the la~er light source LS i8 partlally reflected on ~he beam ~plitter SP, ~nd then further reflected on a mirror M.
The beam re~lected o~ the mirror M 18 u~ed a~ the record reference wave beam B.
An objecti~e lens of a microscope with the W.A.
of, for example, O.~ or O.5 i5 employed a~ the mother len5 Ll. The aperture of off-~xiY hologram len~ portion EL ' i8 selected, for example, ~m~ in diameter and the opera~ion -i37 distance thereof is, for example, 2.3mm. Accordingly, in th$~ case, the aperture and operation distance of the ~nline holo~ram len8 portlon ~L of inline hologram lens IN-L sho~n in Fi~. 6 i9 det~rmined by a predetermined distance betw~een the point P and the inline hologram len~
~ortion ~L in Pig. 6.
A~ the la~er light ao~rces LS used in the example5 of Figs. 6, 7 and 8, such la~er light aources may be used which produce ths follo~ing laser beam , re~pecti~ely.
Argon laser beam ( A ~ 4880 A ~
~rypton las~ beam ~ ~ 3 647} ~ ) Coloring la~er beam ~ ~ e 6330 A ) ~e-Ne laRer beam ( A ~ 6328 A ~
The kind of photo-sen~itive layers ~ of hologram racord medium~ ~Rl and HR2 shown in Fig~. 6, 7 and 8 is ~el~cted in ~ccordance with the la~er beams.
Next, an example of making th~ hologram record medlums ~Rl, ~R2 and hologram lenses I~-L, OX-L will be now descr$bed. Th~t is, a ~uitable amount of layer hardening agent such a~ aqueou~ solution of gelat~n added with formaldehyde or glyoxal ~ kept at about 40-C, while a glas3 substrate with the thickn~ss o~ lmm and a spinner are kept al80 at about 40-C. Then, the aqueou~ 301ution of gelatin i8 coated on the gla88 ~ubstrate by the ~pinner. In th1s ca~e, the coating thic~n~ss of gelatin aqueous ~olution on the glass substrate is ~elected such that the thickness of dried coating i8 5~m in the hologram record medium for the off-axis hologr~m lens and 15 ~m for that of the inli~e hologram len8. The gelatin aqueou solution coated on the gla~s ~ubstrate i# dried .to be a gelatin lay~r which is a mother material of the photo-sen8itive layer.
Next~ the proce~s to.give the photo-~ensitivity to the gelatin layer will be de~cribed.
The photo-~ensitivity to the blue or green color beam i~ give~ to the gelatin layer by the following manner.
That i~, the ~elatin layer i~ immer~ed in 2 to 10 wei~ht percents of aqueous solution of ammonium bichromate ~n about 10 m~nutes, then taken out gradually therefrom, held vert~c~lly and th~n dried in a darkroom.
The photo-sen~itiv$ty to the red color ~eam i~
given to the gelatin layer by ~uch a manner that a aqueous ~olu~ion of 2 we~ght ~ of 2mmon$um b~chroma~e and 1 x 10 3 mol~ of methylene blue coloring agent i~ added w~th ammoniu~ to have abo~t 10 p~, then the gelatin layer i8 immersed ln this aqueous solutiQn in about 10 minutes and then dried in the flowing atmo~phere ~ncluding ammonia and dr~ed nitrogen.
By the ~bove manner, the hologram record medium consisting of the qlas~ sub~trate and the photo-~ens~ive layer R coated thereon i8 manufactured.
The explosure to the photo-sensitive layer K of the hologram record medium i~ carried out as described in connection with F$gs. ~, 7 and 8. In this case, the ir-radiation energy density of the laser beam is ~elect~d about 100 to lOOOmJ/cm2.
The hologram record medium, whose photo-~ensitive lay~r is expo8ed, i3 immers~d in water. When the photo -~ns~t~v¢ layer ha~ the photo-sensiti~ity to the blue or green color beam, it i~ immer~ed in the flowing water at about 20~C in about one hDur, while whQn the photo-sensiti~e 7~7 layer has the photo-sen~itivity to the red color beam, it is immer~ed in water at a~out 40C in about 30 minute~.
Thereafter, the hologra~ record medlum i~ immersed in aqueous solutlon of 50 ~ isopropanol ~n about 10 m~nutes, then dripped in agueou~ solution of 90 ~ isopropanol in several seconds, ~hen i~mer~ed in lOO % isopropanol in about 10 minutes, and then rapidly dried by hot wind.
~hus, the developing treatme~t i~ finished.
T~e photo-sen~itive layer, who~e mother material 0 i8 a gelatin layer, has moisture absorption property, so that i~ it i~ lef~ as it is, there may occur such a fear that ~he hologram len~ disappears. To avoid thi~ fear, a~
shown in Fig. 9, a cover glass CG with the thic~ness of about 150~m i8 bonded to the photo-~en~itive layer K by means of resin wh~ch will be hardened by ultraviolet rays.
Thus, th~ hologram lenses OX-L and IN-L are made, re~tively.
In the drawings other than Flg. 9, the co~er ~lass CG i8 omitted.
Now, the manner to duplicate a ~lave inline hologram len~ IN-L' by uslng the inline hologram lens IN-L
thus produced as the mother len~ will be described.
As ~hown in Fig. 10, hologram record mediu~ ~Rl ~nd ~Rl' are 80 disposed that the photo-sensitive layer K
of the latter, which i~ to be a ~lave inline hologram lens IN-L' is fac~d to the photo-~nsitive la~er K of the former, which is 50 S in diffraction efficiency, with a predetermined d~stance. Th~n, the laser beam from ~ laser light ~ource LS is irr~diated on the glass sub~trate ~S of hologram record medium ~1. In this case, a part of the beam tSO ~) - 30 is u~ed a~ a reproduction reference wave b~am B' and the _ 1 6 --3~ 7 rema~ning beam (50~) i8 u~ed a~ a record reference wave beam R for the hologram record medium ~Rl'. Thus, from the mother inli~e hologram len8 ~N-L, reproduced i8 a reproduction ~ubject wave be2m A' which ia focuased at a point P 3nd which i8 in turn irradiated on the holograQ
record medium ~1' as a record sub~ect wave beam A to record or form a hologram len8 portion EL on the phot~
-s~nsitive layer K thereof.
A ~lave inline hologxam 1~ IN-L' can be al~o dupl$cated by the mannex ~hown iA Fig. 11. In this case, the photo-~en~itive lay~r x o~ hologra~ record medium ~R~' '~ 8 ill dlrect CoAtaCt with ~he gla~ ~ubgtrate BS of ~other inl~ne hologram len8 IN-~. In this ca~o, r~product~on and record 8ub~oct wave beam6 A' and A are both apherical wave lS beams dlverged from an imaginal point P.
According to the above de~cribed method of pro-duclng ~n ~nline hologram lens, a previously prepar~d off-~xis hologram lens ia ~ed aa the mother len8 to make tho inline hologram len~. Therefo~e, if such a moth~r l~n8 i8 prepared, the inline h~logram len8 CaA be sasily manu-factursd.
The above m~thod, however, propo~es the following problem. ~hat is, the extra proce~s to make the off-axis hologrlm lens, whi¢h aerve~ as the mother len~, i8 necessary.
Further, it is ~ece~3ary that the of~-axis hologram l~n~ serv~ng a~ the mother len~ i~ rotated for the reproduc-tion reference wave bcam about three axes intersectLng at the right angl~ with each other with the accuracy of + 0.5 and ad~usted for the focu~ g point and optiaal axi~ of the r~production ~ubject wave bea~ to be brvught to a pr~determLned 115;~7 position. Such ad~ustment i8 very troublsome and very difficult e~pQcially when its N.A. i~ large. This i8 c~used by the fact that the distribution of the graphic interference pattern3 of the off-axis hologram len~ i~
not a point s~mmetry different from that of the inline hologram len~ but the pitch of the graphic in~erference patter~s i8 changed from large to small in the radiu~
direction.
Further, owing to the above graphic i~terference pattern d~stribution of the off-axis hologram len~, when the th~ ckn~9 of the photo-sen~itive layer increa~es durinq the moisture proces~ after the expo~ure of the photo-~E~i~ive layer whose mother material is gelatîn, the inclination of the graphic i~terferenc~ pattsrn o~ the cross-section thereof lS is varied and hence the characteristics of the lens become different. rrhis ph~nomenon becomes large as the N.A. of the off-axis hologram len~ becomes large, which results in that the hologram lens can not be u~ed practically.
~n example of the method of producing an inline hologram lens according to the prQse~t inventivn, in which no o~f-axis hologram len~ i8 used, will be hereinbelow described with reference to ~ig. 12.
In Fig. 12, re~rence letters ~Rl designates a hologram record medium on which an inline hologram lens IN-L i5 recorded and which con~ists of a glass substrate BS and a photo-sen~itive layer trecord layer~ R coated on the glass substrate BS.
A fir3t opticaL elament (mother lens) Ll i~
pxovided to radiate a 3pherical wave beam which is, ~or example, an objective len~ of a ~icroscope with the N.A.

~L15;~7~37 of 0.4 or 0.5.
A second optical ele~ent DG i~ provided to radiate the diffracted wave beam. In general, a diffractlon grating may ~Q used as the ~econd optical element DG, but in this example a plane wave hologram i9 employed as the second optical element DG. This plane wa~e hologram D~ i8 mad~
of a hologxam record mediu~ ~R3 con~isting of a glass substrate BS and a photo-~ensitiYe layer (record layer) K
coated thereon ~n which an o f f-axi~ plane wave ho~ogram por~ion HL~ o~ a disc-~hape is recorded on the center of the photo~sen~itive layer R and thereafter it i8 subjectad to the developing process similar to th~t ~et forth a~o~e.
In this caæe, the record subject wave beam and the record reference wave b~am ar~ both a plane wave beam. The optical axl8 of the reoord subject beam i8 selected to be coincident with the normal to the photo-sens~tive layer K
and an angle ~ of the optical axis of the record reference wa~e be~ to that of the record subject wave beam ~s selected as will be de wribed later.
The mother lens Ll i8 located to oppose the holo~ram record medium HRl and the plane wave hologram DG
i8 located therebetween. In this case, the hologram record m~dium ERl and the plane wave hologram DG are 80 located that their photo-~ensitive layers K are both at the ~ide of the m~ther len~ Ll and alao in parallel to each other.
The laser beam (parallel plane wave beam) from a commo~ laser light source (f~r ~xample, ar~on, krypton, coloring, ~e-Ne laser light ~ources, which are not shown) is converged at a point ~by a len~ (not s~own) to b~ a diver~ing spherical wave beam from the point Q, whioh is ~S2~37 then incident on the mother len~ Ll to be converged at a point P from which a spherical wave beam with no spherical aberration i~ diverged. This diverging spherical wave beam is irradiated as the record 8~)~ ect wave beam A on S the photo-sensitive layer R o~ th~ hologram record medium ~Rl through the plane wave hologram DG under such a condition that the optical axi8 X 0~ the diverging spherical wave bea~
i8 coincident with the re~pective normals to the photo -sen~itive layers R of the plane wave hologram DG and the hologram record medium Further, the la3er.b.eam (paral lel plane wave beam~
frsm the common laser light source i8 cbanged in it~ direction by a beam splitter, mirror or the like (not ~hown) and then irradiated a~ the reproduction re~erence wave beam B' on the hologram pcrtlon ~L" of the photo-sensitive layer R of the plane wave hologram DG under such a condition that the optical axi~ ~' of the plane wave beam changed in its dlrection lntersects the optical axis X at the angle 9 (which i8 such an angle that the mother lens Ll does not beco~e an ob~tacle to the plane wave beam, ~or example, 70~).
The reproduce~l subject wave beam ~plane wave beam) from the plane wave hologram DG is irradiated on the photo-sensitive layer K of the hologram record rnedium H:~l a~ the record reference wave beun B. This record reference wave beam B
corre~ponds to the reproduction reference wave beam B' whose optical path ~lrection i3 changed . The record sub; ect wave be~am A and the record reference wave beam B are in an inline relation, that i~, their opti<::al axe6 X are each co$ncident with the nor~al to the photo-~ensitive layer R of the hologram record medium ~Rl and als~ co~ncident with each other as ' ~5~87 shown in Flg. 12 or otherwise parallel to each other.
By this manner, an inline hologram lens portion H~ of a di~c-shape i~ formed on the center of ~he photo -~ensitive layer X o~ the holo~ram record medium ~Rl, wh~ch ~ then ~u~jected to the developing proce8s sLmilar to that de~cribed previously to p~oduce an inline hologram len~
lN-~.
Anothex example o~ the invention will be now descr~bed with reference to Fig. 13. In thi~ example a8 the second optical element DG, an off-axis hologram len~
with a small N.A. is used. In this cas~, the plane wave beam from the common la~er llg~t ~ource (for example, sem$conductor la~er light source) i8 irradiated a~ the reproductlon reference wave beam B' on a hologram len~
portion ~L" of the photo-sensiti~e layer K (which is coated on a glas~ 3ubstrate BS) of an off-axis hologram lens DG.
The reproduction subject wave beam ~which is a spherical ~ave beam near a plane wave benm and converges after hologram record medium HRl) from the off-ax~s hologram lens
2~ DG i8 irrad~ated as the re~ord refer~nce wa~e beam B on the photo-sen~itive layer K of the hologram record medium ~Rl.
Th~ other proce~er are ~ubs~a~tially ~imilar to tho~e of the method de~cribed in connection w~th Fig. 12. By this manner, a~ ~nline hologram len~ IN-~ iB made~
~5 Now, an optical information (signal) reproduction apparatu~, which u8e8 the inline hologram lens produc~d by the method of the invention 3hown in Fig. 12 or 13 and reproduces a recorded infprmat~on (signal) on an opt$cal ; record medium (di~c), will be de~cribed with reference to Fig. 14, and also the relation between the optical record ~:15~7~37 medium and the inline hologram lens will be described.
~n Fig. 14, reference letters RD generally dèsignate an optical record medium which con~i~ts of a tran~par~nt substrate DB (made of, ~or example, vinyl chlaride), a reflection dLaphragm or layer RL ~made of, for example, aluminium diaphraym) coated to cov~r all the surface of pits and land~ formed on the lower surface of the tra~-parent substrate DB and a protective diaphragm or layer ~for example, PV~ GL coated on the lower surface of the rRflection diæphragns RL to cover the ~ame.
The inliue hologram lens IN-L (which serves a~
an o~iective len5 form~ng a part of the reproduction mean~) made of the method of the invention shown in Fig~ 12 or 13 is so located that the photo sensitive layer K thereof faces in parallel to the substrate DB of the record medlum RD. Then, the reproduction re~erence wave beæm ~which i8 the pla~e wave beam B' in the case of the making method shown in Fig. 12, while the ~iverging shperical wave beam B" in the case of the ma~ing method ~hown in Fig. 13) is irradiated on the inline hologram lens portion EL from the ~ide of the glass sub~trate BS o~ ~he inline hologram lens IN-L, and the reproduction ~ubject wave beam or conver~ing or focusslng spherical wave beam A' at the pit or land of the reflection dlaphragm (layer) RL obtained fxom the lnl~ne hologram len~ portlon HL is irradiated as the repro-duction beam on the reflection dlaphragm (layer) RL through the sub~trat~ DB of the record m~diwm RD. The reflected beam on the reflection dlaphragm ~layer3 RL goes back through the path of the beams ~ beams B' (ox ~") and im-pinge6 on a photo-electric conversion element (which is ~L15;~ 17 also enou~h when the laser light source ls a semic~nductor la~er light source though not shown) and i~ xeproduced a~ an electrical signal.
In the case that the record medium RD is optical-ly reproduce~ from the side of its transparent substrate D~ as shown in Fig. 14, if the reproduction ~ubject wav~
beam A' is a ~pherical wa~e beam with no ~pherical aberration, ~hi3 spherical wave beam i~ influanced by ~pherical aberrati~n when it passe~ through the tran~parent ubstrate DB with the 1~ ~hickness t which is the optical path length. Thus, the reflected wave beam becomes to haYe a spherical a~erration~
Therefore, ~n the ca~e o~ Pigs. 12 and 13, if it i~ formed that a spherical wave beam~ with no ~pherical aberration i8 derlved ~rom the m~the~ len~ Ll and the thick-~e~s of the second optical element DG, which is the optica~
pa~h length, i8 selected approximately ~ t, the record ~ub~ect wave beam A in Fig. ~2 and 13 becomes the ~pherical wave beam with a spherical aberration. Thus, the reproduc-tion sub~ct wave beam A' ~rradiated on the record medium RD becomes a begm with a spherical aberration. Therefore, when this beam paa~es through the tran~parent ~ub~trate DB, the beam~ecome~ to have no aberration, whereby the spherical aberration caused by the tran~parent substrate DB of the record medium RD can be corrected. Thus, the reflectea wave beam with no spherical aberration can be obtained.
In ~hiB case, the practical thickness t of the second optical elemen~ DG and that t of the txansparent sub3trate DB of the record medium RD are both l.lmm and the refracti~e inde~ thereof iQ a~out 1.5.
When the reproduction beam is irradiated on the 7~37 optical record medium RD from its front s$de, the reproduc-tion beam i~ required to have ~ubstantially no aberration.
In this case, it i~ suf f icient that in consideratior~ of ~he optical path length or thickne~ t of the second optical element DG, a spherical wave bea~ with a spherical aberra-tion can ~e radiated from the mother lens Ll and ~hen pa~ses through the ~econd optical element DG to correct the ~pherical aberration.
According to the method of the present invention described above, an inline hologram lens good in accuracy can be easily manufactured. In other words, it ~ecomes unneces~ary to prepare or use an o~f-axi~ ho~o~xam lens ~ervi~g a~ a mother len~, 80 that the number of processes can ~e reduced. Further, by the ~ame reason, an ac¢urate ~other lens ~uch as an objective lens of a ~icroscope is used as t~le first optical element ~o tha~ an in~ine hologram len~ high in accuracy can be made.
Even if the second optical element i8 any of a diffra~an yrating, plane wave hologram or off-axis hologram len~ with a small N.A., it is carried out to change the d~rection of the optical path of a plane wave beaM or that near a ~pherical wave beam. Therefore, the relative pv~ition-al relation of the second optical element to the first optical element and the hologram record medium on which the lnl$na hologram lens i~ recorded can ~e easily adjusted.
~urther, if it $s so made that the first optical element radiate~ a ~pherical wave beam with no s~llerical aberration and the thickne~ or optical path length of the second optical element i~ selected substantially equal to the thickness or optical path length of the transparent ~ody of the opt~cal record medium through which the reproduction : beam pa~ses, ~he reflected wave beam with no spherical aberration can be produced eYen when there i8 a tran~parent body thxough which the reproduction beam for the record medium passea.
It will be apparent that many modifications and variations could be effected by one skilled in the art w~thout departing from the 8pirlt8 or scope of the ~ovel concepts of the pre~ent invention, ~o that the spirit~ or scope of th~ invention should be determined by the appe~ded claims only.

-.25 -

Claims (8)

WE CLAIM AS OUR INVENTION
1. A method of producing an inline hologram lens, comprising the steps of:
(A) producing a diffracted wave beam by a diffraction device;
(B) producing a spherical wave beam by an optical device;
(C) providing said diffracted wave beam perpendicularly incident on a photo-sensitive layer as a reference wave beam;
(D) providing, simultaneously, said spherical wave beam perpendicularly incident on said photo-sensitive layer as a subject wave beam through said diffraction device;
and (E) developing said photo-sensitive layer to produce said inline hologram lens.
2. A method of producing an inline hologram lens according to claim 1, wherein said optical device is an objective lens with a large numerical aperture.
3. A method of producing an inline hologram lens according to claim 2, wherein said step of producing a diffracted wave beam includes the steps of:
(a) recording on a further photo-sensitive layer a graphic interference pattern which results from simultaneous exposure of said further photo-sensitive layer to a first plane wave as a reference wave beam and a second plane wave beam as a subject wave beam, said beams being off-axis in respect to each other with said subject wave beam being incident perpendicular to said further photo-sensitive layer;

(b) developing said further photo-sensitive layer to form an off-axis hologram;
(c) positioning said off-axis hologram parallel to said photo-sensitive layer; and (d) providing an off-axis reference wave beam incident on said off-axis hologram.
4. A method of producing an inline hologram lens according to claim 2, wherein said step of producing a dif-fracted wave beam includes the steps of:
(i) recording on a further photo-sensitive layer a graphic interference pattern which results from simultaneous exposure of said further photo-sensitive layer to a first plane wave as a reference wave beam and a spherical wave beam produced by a lens with a small numerical aperture as a subject wave beam, said beam being off-axis in respect to each other with said subject wave beam being incident prependicular to said further photo-sensitive layer;
(ii) developing said further photo-sensitive layer to form an off-axis hologram lens;
(iii) positioning said off-axis hologram lens parallel to said photo-sensitive layer; and (iv) providing an off-axis reference wave beam incident on said off-axis hologram lens.
5. A method of producing an inline hologram lens according to claim 2, wherein said diffraction device is a diffraction grating.
6. A method of producing an inline hologram lens according to claim 2, wherein said reference and subject wave beams are provided as coherent beams.
7. A method of producing an inline hologram lens, comprising the steps of:
producing a coherent diffracted wave beam by diffraction means;
producing a coherent spherical wave beam by objective lens means separate from said diffraction means;
providing said diffracted wave beam perpendicularly incident on a photo-sensitive layer as a reference wave beam;
simultaneously providing said spherical wave beam perpendicularly incident on said photo-sensitive layer as a subject wave beam through said diffraction means; and developing said photo-sensitive layer to produce said inline hologram lens.
8. A method of producing an inline hologram lens according to claim 1, wherein said objective lens means includes an objective lens with a large numerical aperture.
CA000377059A 1980-05-14 1981-05-07 Method for manufacturing in-line hologram lens Expired CA1152787A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP6379580A JPS56161582A (en) 1980-05-14 1980-05-14 Production of in-line hologram lens
JP63795/80 1980-05-14

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CA (1) CA1152787A (en)
DE (1) DE3119240C2 (en)
FR (1) FR2483642A1 (en)
GB (1) GB2076991B (en)
NL (1) NL193960C (en)

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US4517280A (en) * 1982-11-04 1985-05-14 Sumitomo Electric Industries, Ltd. Process for fabricating integrated optics
JPS60108802A (en) * 1983-11-18 1985-06-14 Fuji Photo Film Co Ltd Method and device for optical beam synthesis
CA1257392A (en) * 1985-03-20 1989-07-11 Masayuki Kato Optical pickup with hologram lenses
DE68922773T2 (en) * 1988-03-25 1995-09-28 Fujitsu Ltd Light beam scanner.
KR101524336B1 (en) * 2011-11-15 2015-06-11 엘지디스플레이 주식회사 Thin Flat Type Converge Lens

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US3602570A (en) * 1968-06-20 1971-08-31 Rca Corp Apparatus for making annular holograms
DE2323931C3 (en) * 1972-05-20 1978-03-02 Centralne Laboratorium Optyki, Warschau Holographic microscope
US3807829A (en) * 1973-04-30 1974-04-30 Hughes Aircraft Co Extended-field holographic lens arrays
JPS5821265B2 (en) * 1974-10-18 1983-04-28 富士写真フイルム株式会社 Hologram lens
US3940204A (en) * 1975-01-23 1976-02-24 Hughes Aircraft Company Optical display systems utilizing holographic lenses
US4072395A (en) * 1976-05-24 1978-02-07 The United States Of America As Represented By The Secretary Of The Navy Microscope
JPS606518B2 (en) * 1977-06-09 1985-02-19 日本電気株式会社 Manufacturing method of hologram wavefront conversion element
US4245882A (en) * 1977-11-04 1981-01-20 Environmental Research Institute Of Michigan Doubly modulated on-axis thick hologram optical element
AU535350B2 (en) * 1979-05-07 1984-03-15 Sony Corporation Inline hologram lens

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JPH0150910B2 (en) 1989-11-01
DE3119240C2 (en) 1994-02-03
DE3119240A1 (en) 1982-04-29
FR2483642A1 (en) 1981-12-04
NL193960C (en) 2001-03-02
FR2483642B1 (en) 1985-04-12
JPS56161582A (en) 1981-12-11
NL193960B (en) 2000-11-01
NL8102357A (en) 1981-12-01
US4393126A (en) 1983-07-12
GB2076991B (en) 1984-02-22
GB2076991A (en) 1981-12-09

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